|
|||||
|
|
Sliding behavior of water droplets on line-patterned hydrophobic surfaces |
|
| Authors: | Shunsuke Suzuki Akira Nakajima Kouichi Tanaka Ayako Hashimoto Yoshikazu Kameshima Kiyoshi Okada |
| Institution: | a Department of Metallurgy and Ceramic Science, Graduate School of Science and Engineering, Tokyo Institute of Technology, 2-12-1 O-okayama, Meguro-ku, Tokyo 152-8552, Japan b Kanagawa Academy of Science and Technology, 308 East, Kanagawa Science Park, 3-2-1 Sakado, Takatsu-ku, Kawasaki-shi, Kanagawa 213-0012, Japan c Center for Collaborative Research, The University of Tokyo, 4-6-1 Komaba, Meguro-ku, Tokyo 153-8904, Japan |
| Abstract: | We prepared line-patterned hydrophobic surfaces using fluoroalkylsilane (FAS) and octadecyltrimethoxysilane (ODS) then investigated the effect of line direction on sliding behavior of water droplets by direct observation of the actual droplet motion during sliding. Water droplets slide down with a periodic large deformation of the contact line and sliding velocity fluctuation that occurred when they crossed over the 500-μm ODS line regions in FAS regions on a Si surface tilted at 35°. These behaviors are less marked for motion on a 100-μm line surface, or on lines oriented parallel to the slope direction. Smaller droplets slide down with greater displacement in the line direction on 500-μm line patterning when the lines were rotated at 13° in-plane for the slope direction. This sliding behavior depended on the droplet size and rotation angle, and is accountable by the balance between gravitational and retentive forces. |
| Keywords: | Surface patterning 81 65 Cf In liquid-solid interfaces 68 08 Bc Photolithography 85 40 Hp |
| 本文献已被 ScienceDirect 等数据库收录！ | |