Incubation effect and its influence on laser patterning of ITO thin film |
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Authors: | Email author" target="_blank">Shizhou?XiaoEmail author Evgeny?L?Gurevich Andreas?Ostendorf |
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Institution: | (1) Applied Laser Technology, Ruhr-University Bochum, 44801 Bochum, Germany |
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Abstract: | Results are presented on the surface damage thresholds of ITO thin films induced by single- and multi-pulse laser irradiation
at a pulse duration of 10 ps and a wavelength of 1064 nm. For multi-pulse ablation the incubation effect results in a reduction
of the damage threshold, especially apparent at low pulse numbers and very small film thicknesses. The incubation effect attributes
to the accumulation of defect sites and/or the storage of thermal stress-strain energy induced by the incident laser pulses.
An incubation coefficient of S=0.82 has been obtained which is independent on the film thickness in the range of 10–100 nm. In practical applications, the
incubation effect determines the laser patterning structure of ITO films while increasing the pulse overlapping rate. The
width of the patterned line can be predicted by the proposed model involving the laser fluence, the overlapping rate and the
incubation coefficient. |
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Keywords: | |
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