Si（100）（2×1）表面光学二次谐波强度随温度的变化关系

通过测量基频光波长为１．０６４μｍ时几个不同掺杂类型和掺杂浓度的Ｓｉ（１００）（２×１）样品表面反射二次谐波强度随温度的变化关系，说明在此波长上二次谐波不是来源于表面耗尽场的影响，而是来源于表面态电子。Ｓｉ（１００）（２×１）表面反射二次谐波强度反比于温度的平方。本文提出了一个简单模型，给出了初步解释。     

稀氢氟酸中硅表面氢终端的原位拉曼光谱研究

本文用共焦显微拉曼系统原位观察了Ｓｉ（１００）表面氢终端原子在稀氢氟酸中的变化过程。研究表明：在硅片浸入氢氟酸溶液的初期,表面主要被硅和三个氢原子的结合体（Ｓｉ Ｈ３）以及硅和两个氢原子的结合体（Ｓｉ Ｈ２）所覆盖。随着腐蚀过程的延长,Ｓｉ Ｈ３越来越少,Ｓｉ Ｈ２的信号不断增强,并且,硅和单个氢原子的结合体（Ｓｉ Ｈ）的信号也开始出现。最终,硅表面主要被Ｓｉ Ｈ２所覆盖,有少量Ｓｉ Ｈ３和Ｓｉ Ｈ键。本文还表明,拉曼光谱用来原位观察半导体材料表面终端原子键在溶液中的变化是很有用的工具     

氟化Si（100）表面的结构研究

用Ｈｅ原子衍射研究了氟化Ｓｉ（１００）表面的结构。由Ｈｅ衍射测定表明Ｓｉ的悬空键是氟吸附的位置。Ｆ２与Ｓｉ（１００）２×１反应并不扰乱Ｓｉ－Ｓｉ二聚键，在Ｆ２入射平动能低时反应实际上在氟的复盖度为一个单层上停止进行。提高了Ｆ２入射平动能可经活化而使Ｆ２与氟化的表面进一步反应，而且在高能Ｆ２暴露后观察到无序的表面结构。     

用Z扫描方法测量掺C60有机改良介质的非线性折射率

用Ｚ扫描方法和波长１．０６４μｍ、脉宽１５０ｐｓ的锁模激光测定了Ｃ６０／ＮＨ２－（ＣＨ２）３－Ｓｉ（ＯＣ２Ｈ５）３（简称Ｃ６０／ＫＨ５５０）溶胶和凝胶的三阶光学非线性系数。理论拟合曲线计算得出，溶胶复合材料的非线性折射率ｎ２＝５．６×１０－１２ｅｓｕ，经两天凝结之后的凝胶复合材料的ｎ２＝６．２×１０－１２ｅｓｕ。在相同的激光强度下溶胶和凝胶的不同透过率归因于溶胶液体对激光的非线性散射。     

Si衬底上异质外延金刚石的初始阶段原子H的作用及其界面结构

用高分辨率电子能量损失谱方法研究了原子 Ｈ 与被 Ｃ２ Ｈ２ 吸附的 Ｓｉ（１００） 界面的相互作用．结果显示,在 Ｓｉ（１００） 界面上, Ｓｉ— Ｓｉ 二聚化键和 Ｃ２ Ｈ２ 中的 Ｃ— Ｃ 键被 Ｈ 原子打开,它们分别形成 Ｓｉ— Ｈ, Ｃ— Ｈ 键．用 Ａ Ｍ１ 量子化学方法,计算了 Ｃ２ Ｈ２ 和 Ｃ２ Ｈ４ 在 Ｓｉ（１００） 上的吸附结构,指出了 Ｃ２ Ｈ２ 在 Ｓｉ（１００） 上的吸附位置,进一步讨论了金刚石在 Ｓｉ 异质外延初始阶段的形核机制．计算结果显示：在原子 Ｈ 的作用下,可以显著地降低反应的活化能,有利于 Ｃ Ｈ３ 的产生和 Ｃ Ｈ３ 向 Ｓｉ 衬底的键连．计算结果与实验相符合．     

一类新颖含C60复合材料的合成及其光限制效应的研究

报道了在Ｃ６０与ＮＨ２（ＣＨ２）３Ｓｉ（ＯＣ２Ｈ５）３中的胺基反应生成Ｃ６０－ＮＨ２（ＣＨ２）３Ｓｉ（ＯＣ２Ｈ５）３物质后引入ｒ－缩水甘油醚基丙基三甲氧基硅烷「ＣＨ２ＯＣＨＣＨ２ＯＣＨ２ＣＨ２ＣＨ２Ｓｉ（ＯＣＨ３）３，３－Ｇｌｙｃｉｄｏｘｙｐｒｏｐｌｔｒｉｍｅｔｈｏｘｙｓｉｌａｎｅ，简称ＫＨ５６０」与二甲基二乙氧基硅烷「（ＣＨ３）２Ｓｉ（ＯＣ２Ｈ５）２，Ｄｉｅｔｈｏｘｙｄｉｍｅｔｈｙｌｓｉｌａｎｅ     

稀土金属Sm／Si（100）2×1界面形成电子结构的同步辐射光电子能…

利用同步辐射芯能级和价带光电子能谱研究了室温下Ｓｍ／Ｓｉ（１００）２×１界面的形成与电子结构。实验结果表明，膜生长有几个不同阶段，分别为Ｓｍ原子聚集，反应扩散和金属Ｓｍ膜生长。与Ｓｉ（１１１）７×７相比，Ｓｍ（１００）２×１的界面反应和扩散都得到了加强。     

a－Si：H／a－SiC＿x：H超晶格的界面特性

报道等离子体化学汽相沉积法制备的ａ－Ｓｉ：Ｈ／ａ－ＳｉＣ：Ｈ超晶格的蓝移现象，用小角度Ｘ射线衍射确定超晶格的界面陡度。通过红外测量和常数光电流测量发现，超晶格界面附近存在较高浓度的Ｈ和较多的Ｓｉ－Ｃ键，界面Ｈ的热稳定性较差，界面缺陷态密度为１．２×１０￣（１１）ｃｍ￣（－２）。     

稀土金属Sm/Si(100)2×1界面形成电子结构的同步辐射光电子能谱研究

利用同步辐射芯能级和价带光电子能谱研究了室温下Ｓｍ／Ｓｉ（１００）２×１界面的形成与电子结构．实验结果表明，膜生长有几个不同阶段，分别为Ｓｍ原子聚集（Θ＜０.５ＭＬ）、反应扩散（０.５ＭＬ≤Θ≤４—６ＭＬ）和金属Ｓｍ膜生长．与Ｓｉ（１１１）７×７相比，Ｓｍ在Ｓｉ（１００）２×１的界面反应和扩散都得到加强．结合理论模型，讨论了该界面的形成与界面结构     

散射理论方法应用于重构的β-SiC(100)表面

用Ｐｏｌｍａｎｎ散射理论方法分别计算了理想的和（２×１）重构的β-ＳｉＣ（１００）表面带结构以及层和原子轨道态密度．结果表明，重构的主要影响发生在禁区内，重构的Ｓｉ和Ｃ截断表面都具有半导体性，并且得到的表面带与实验相符．由二聚原子的成键和悬挂键的局域态密度定性地解释了二聚Ｓｉ原子的非对称性和二聚Ｃ原子的对称性     

Dangling-bond logic gates on a Si(100)-(2 × 1)-H surface

Atomic-scale Boolean logic gates (LGs) with two inputs and one output (i.e. OR, NOR, AND, NAND) were designed on a Si(100)-(2 × 1)-H surface and connected to the macroscopic scale by metallic nano-pads physisorbed on the Si(100)-(2 × 1)-H surface. The logic inputs are provided by saturating and unsaturating two surface Si dangling bonds, which can, for example, be achieved by adding and extracting two hydrogen atoms per input. Quantum circuit design rules together with semi-empirical elastic-scattering quantum chemistry transport calculations were used to determine the output current intensity of the proposed switches and LGs when they are interconnected to the metallic nano-pads by surface atomic-scale wires. Our calculations demonstrate that the proposed devices can reach ON/OFF ratios of up to 2000 for a running current in the 10 μA range.     

用低能电子衍射研究氢在Si(100)表面吸附引起的相变

描述了用低能电子衍射(LEED)研究不同温度下在Si(100)-c(8×8)表面吸氢引起的一系列相变过程。实验发现:在液氮温度下,在Si(100)-c(8×8)表面连续吸氢将引起表面经Si(100)-(4×1)-H向(2×1)-H最终向(1×1)-H转变;而在从700℃到室温间的不同温度下饱和吸氢,实验中观察到:Si(100)-c(8×8)表面将先转变至Si(100)-c(4×4)-H,然后至(2×1)-最终至(1×1)-H。     

Atomic structure of Cs grown on Si(0 0 1)(2×1) surface by coaxial impact collision ion scattering spectroscopy

The atomic structure and the saturation coverage of Cs on the Si(0 0 1)(2×1) surface at room temperature have been studied by coaxial impact collision ion scattering spectroscopy (CAICISS). For the atomic structure of saturated Cs/Si(0 0 1)(2×1) surface, it is found that Cs atoms occupy a single adsorption site at T3 on the Si(0 0 1) surface. The height of Cs atoms adsorbed at T3 site is 3.18±0.05 Å from the second layer of Si(0 0 1)(2×1) surface. The saturation coverage estimated from the measured CAICISS intensity ratio and the proposed atomic structure is found to be 0.46±0.06 ML.     

EFFECT OF ATOMIC HYDROGEN ON THE ACETYLENE-ADSORBED Si(100)(2×1) SURFACE AT ROOM TEMPERATURE

High resolution electron energy loss spectroscopy, low energy electron diffraction and quadrupole maas spectrometer (QMS) have been employed to study the effect of atomic hydrogen on the acetylene-saturated pre-adsorbed Si(100)(2×1) surface and the surface phase transition at room temperature. It is evident that the atomic hydrogen has a strong effect on the adsorbed C₂H₂ and the underlying surface structure of Si. The experimental results show that CH and CH₂ radicals co-exist on the Si surface after the dosing of atomic hydrogen; meanwhile, the surface structure changes from Si(100)(2×1) to a dominant of (1×1). These results indicate that the atomic hydrogen can open C=C double bonds and change them into C-C single bonds, transfer the adsorbed C₂H₂ to C₂H_x(x = 3,4) and break the underlying Si-Si dimer, but it cannot break the C-C bond intensively. The QMS results show that some C₄ species axe formed during the dosing of atomic hydrogen. It may be the result of atomic hydrogen abstraction from C₂H_x which leads to carbon catenation between two adjacent C-C directs. The C₄ species formed are stable on Si(100) surfaces up to 1100 K, and can be regarded as the potential host of diamond nucleation.     

Chlorine adsorption on Si(1 1 1) studied by optical methods

The adsorption process of chlorine on Si(1 1 1) has been studied by means of real time surface differential reflectance (SDR) spectroscopy and second harmonic generation (SHG). The structure observed at 3.6 eV in SDR spectra is attributed to transitions including Si–Cl antibonding states. However, the overall feature is due to the removal of the electronic states of the clean surface. Developments of adsorption on Si adatom dangling bonds and breaking of adatom back bonds are obtained from SDR spectra and second harmonic (SH) intensity. They are well fit by the solutions of the rate equations under the assumption of adsorption of atoms without migration, and the initial sticking probability on the dangling bonds and the initial breaking probability of the back bonds are determined. Dependence of the adsorption kinetics on the carrier concentration is briefly reported.     

RHEED studies of Si(100) surface structures induced by Ga evaporation

Si(100) surface structures induced by Ga molecular beam deposition in an ultra-high vacuum have been investigated using a reflection high-energy electron diffraction system (RHEED). It has been found that the Ga evaporation of submonolayer thickness on a clean Si(100) 2 × 1 surface produces surface structures of Si(100) 3 ×2, 5 × 2, 2 ×2 and 8 × 1 sequentially in the temperature range from 350 to 680° C. The RHEED patterns and a two-dimensional phase diagram including five superstructures are presented.     

Ag/Si（111）超薄膜光学二次谐波强度变化与结构相变研究

在130-830K温度范围内,系统研究了Si（111）-√3×√3-Ag和Si（111）-3×1-Ag超薄膜重构表面的光学二次谐波的温度依赖性,分析了信号强度的变化和表面结构之间的关联.结果表明,对于Si（111）-3×3-Ag结构薄膜表面而言,在130K到320 K的温度范围内,表面光学二次谐波信号强度的变化中没有出...     

Selenium adsorption on Cs-covered Si(100) 2×1 surfaces

This report involves the study of Se adsorption on caesiated Si(100) 2×1 surfaces in ultra high vacuum (UHV) using low energy electron diffraction, Auger electron spectroscopy, thermal desorption spectroscopy and work function measurements. Selenium atoms on Cs/Si(100) 2×1 surface adsorb initially on uncaesiated portions of Si and subsequently on the Cs overlayer. The presence of Se increases the binding energy of Cs on Si(100). For Cs and Se coverages above 0.5 ml CsSe and Cs_xSe_ySi_z, compound formation was observed. The coadsorption of Se and Cs induces a high degree of surface disorder, while desorption most probably causes surface etching. The presence of Cs on Si(100) 2×1 surfaces prevents the diffusion of Se into the Si substrate and greatly suppresses the formation of SiSe₂ and SiSe₃, detected when Se is adsorbed on clean Si(100) 2×1 surfaces.     

Surface plasmon effects on surface second harmonic generation during Au nanoparticle deposition onto H–Si(1 1 1)

Deposition of Au nanoparticles from aqueous HF onto H–Si(1 1 1) was studied in situ by surface second harmonic generation (SHG) and ex situ by extinction spectroscopy and non-contact atomic force microscopy (AFM). AFM measurements indicate that the maximum SHG intensities occur at lateral particle diameters of approximately 90–100 nm independent of solution phase composition, but with an intensity that depends on solution phase composition.

Employing the evolution of SHG intensity to monitor lateral cluster growth, simultaneous Au deposition and Si oxidation exhibit apparent kinetic reaction orders of 1/2 and zero with respect to HF and Au(CN)₂⁻, respectively. These results are similar to those obtained purely from ex situ AFM analysis. The variations in SHG intensity with Au(CN)₂⁻ concentration can be related to particle nucleation densities. These results demonstrate the utility of SHG as an in situ probe of particle growth.