i线投影光刻曝光系统的光学设计

叙述具有同轴对准特性的光学投影物镜双远心结构和均匀照明光学系统原理。为了满足ｉ线光刻所需的光学传递函数要求，讨论了光刻分辨率和数值孔径的关系。设计了一种新的双远心投影物镜，其数值孔径ＮＡ＝０．４２，放大倍率Ｍ＝－１／５，像场尺寸１５ｍｍ×１５ｍｍ（直径２１·２ｍｍ），共轭距Ｌ＝６０２ｍｍ。用光学设计程序ＺＥＭＡＸ－ＸＥ计算此ｉ线物镜的像质。设计结果说明，整个视场内波差＜λ／４，ＭＴＦ＞０．５５，当空间频率为７１５ｐａｉｒｌｉｎｅｓ／ｍｍ，使用波长为３６５士３ｎｍ时。可以实现０．７μｍ光刻分辨率；照明均匀器，由８１个小方型透镜组成一方列阵。用本文模拟计算软件ＯＰＥＮＧ计算被照像平面上的光能分布，说明实际系统的照明不均匀性为土２％。     

亚微米投影光刻物镜光学制造技术

本文报告亚微米光刻５倍ｇ线与ｉ线投影光刻物镜的光学制造技术。讨论超高精度要求的球面曲率半径、透镜中心厚度、球面面形与透镜偏心差等各项指标的综合控制技术与检测方法。着重介绍了作者所发展的大口径高精度双胶合透镜的计算机辅助无变形胶合技术。给出了加工检测结果以及镜头的主要性能指标。     

0.7微米i线投影曝光系统光刻物镜的设计与试制

介绍了微电子专用关键设备０．７μｍｉ线投影曝光系统光刻物镜的主要技术指标，及设计试制中解决的关键单元技术和试制结果。结果表明，数值孔径ＮＡ＝０．４２，光刻工作分辨力０．６μｍ，像场尺寸１４．６ｍｍ×１４．６ｍｍ，畸变＜±０．１μｍ的５倍精缩投影光刻物镜已试制成功。物镜具有双远心和有温度气压控制补偿，在满足高精度成像的同时，又能同时满足暗场同轴对准的特点。     

投影光刻物镜的计算机辅助装调

针对投影光刻物镜苛刻的像质要求,将计算机辅助装调(CAA)技术引入投影光刻物镜的装调过程中,建立了相应的数学模型。选取33个视场Fringe Zernike多项式的4~37项,以及畸变作为校正对象,并选取19个结构参量作为补偿器。通过将CODE V的宏功能和Matlab结合,采集灵敏度矩阵和像质数据。提出用奇异值分解求加权最小二乘解的方法计算补偿量,通过权重因子实现对不同视场上不同Zernike项系数或畸变的改进。将补偿后光刻物镜的性能和理想光刻物镜对比,发现相比于设计镜头,装调后镜头的平均波前均方根(RMS)大约差0.004λ,平均畸变大约差1nm,该方法可以将系统波像差和畸变恢复到接近设计水平。     

用于数字光刻的非对称式投影物镜设计

针对DMD数字光刻,利用ZEMAX光学设计软件,设计出了一套适用于型号 0.7XGA DMD的10片式光刻投影物镜。该物镜采用非对称性结构,前组为改进的三分离物镜,后组为匹兹伐物镜加平像场镜,分辨率为2 m,近轴放大倍率为-0.15,像方数值孔径NA为0.158,全视场波像差小于/20 ,畸变小于0.014%,焦深为20 m,通过各项评价可知系统已经达到了衍射极限。在对该镜头进行公差分析后,利用Monte Carlo方法,模拟组装加工了100组镜头,得到90%的镜头MTF＞0.46,50%的镜头MTF＞0.51,证明了这种非对称性结构加工和校装的可能性。     

超高数值孔径Schwarzschild投影光刻物镜的光学设计

针对45nm及以下节点光刻相关技术的研究需求,确定了实验型投影光刻物镜的结构型式及设计指标。依据像差理论在非同心小遮拦的Schwarzschild反射系统中添加折射补偿镜组来进一步减小系统的中心遮拦,扩大像方数值孔径。设计了一套小中心遮拦,数值孔径为1.20的Schwarzschild折反式投影光刻物镜。设计结果表明,该投影光刻物镜工作带宽为100pm,像方视场为50μm,线中心遮拦比为13%,光学分辨力为80nm时(6240lp/mm)的系统调制传递函数大于0.45,全视场最大畸变为6.5nm,满足了45nm深紫外(DUV)浸没光刻实验平台对投影光刻物镜的需求。     

数字灰度光刻成像物镜设计

为了研究数字灰度光刻成像系统中栅格效应对像质的影响.在成像系统优化参量已有的研究基础上,综合考虑工作效率、光刻准确度、加工制造成本等因素,设计了一种能够有效消除数字灰度光刻成像栅格效应的光刻物镜.此光刻物镜技术指标为,数值孔径NA＝0.3,工作波长λ＝442 nm,倍率10×,分辨率R≤1.2 μm,焦深4 μm,且镜片数量少,光学加工、光学校装公差要求低.结果表明,该镜头完全满足数字灰度光刻高质量成像的需要.     

摆动法选配物镜的原理及应用

在光学仪器的装校过程中,常常碰到选配物镜的问题,特别是在光学测距仪中,对物镜的选配要求很严,其焦距相对误差往往只允许万分之几。由于物镜焦距相对误差(即倍率差)的存在,在视场中不同位置进行测距时将导致线视差(或角视差)产生变化,从而得到不同的     

0.35 μm分步重复投影光刻物镜设计

介绍０．３５μｍ分步重复投影光刻物镜的设计要点，包括数值孔径、结构形式的确定、材料的选择。介绍了光刻物镜设计的难点、创新点及设计结果。     

大视场投影光刻物镜的畸变特性检测

畸变特性是光刻物镜的关键指标,目前少有报道,提出了一种大视场投影光刻物镜畸变测量原理,测量系统和测量数据的处理方法. 利用该装置对研制的口径6英寸,分辨率3 μm的物镜进行了测量,得出该物镜在全视场的畸变值小于2.0 μm.     

大口径精密投影光刻制版镜头的光学装校

对于大口径精密投影光刻制版镜头来说 ,透镜的应力变形和中心误差对整个系统的成像质量有较大影响。详细介绍了一种减小应力变形的特殊结构和在一种光学装校过程中多镜组整体对接的方法 ,给出了对接前后的偏心测量数据以及镜头实际曝光的图形。     

SLM-based maskless lithography for TFT-LCD

Maskless photolithographic methods have been developed using digital micromirror devices (DMDs) and grating light valves (GLVs), which are spatial light modulators (SLMs), because liquid crystal display (LCD) panel industries spend huge amounts of money for the cost of TFT (thin film resist)-LCD photomasks. The technology has been developed for implementing 2 μm bitmap resolutions, which is a requirement for the lithographic process, though the process time is still slow for mass-production system. A DMD-based maskless exposure uses 405 nm-wavelength semiconductor lasers as an illumination source and optical engines that contain DMDs, micro lens arrays (MLAs), and projection lenses. A GLV-based system consists of UV lasers and optical write engines, which are constructed with the GLV, grating optics, and imaging lenses. Since many companies have been trying to overcome the time limitations, the maskless technology will be realized in the LCD industry in near future.     

Photolithographic fabrication of thin film lenses

A method is described for obtaining thin film lenses using photolithographic techniques. The lens profile is approximated by an N-step phase quantization. Experimental results for a two-level lens array on photoresist and a four-level plastic moulded lens are discussed.     

Simplified system configuration for real-time Fourier transformation of optical pulses in amplitude and phase

Real-time Fourier transformation (RTFT) of optical waveforms in amplitude and phase (i.e. transform-limited RTFT) is a fundamental operation that enables the realization of many interesting ultrafast signal processing applications, including wavelength-tunable optical pulse filtering, all-optical temporal correlations and convolutions and temporal imaging, among others. In this paper, we demonstrate that under certain conditions, a single time lens (quadratic-phase temporal modulator) followed by a suitable dispersive delay line can be used to implement transform-limited RTFT of optical pulses. The design specifications and constraints of the proposed transform-limited RTFT systems are derived and discussed. As compared with the conventional methods, the proposed design does not require the use of an input dispersive device preceding the time lens or a second time lens after dispersion, thus resulting in a simpler and more practical alternative for implementing TL-RTFT of optical signals. The feasibility of our proposal to operate on picosecond optical waveforms using electro-optic time lenses has been confirmed by numerical simulations.     

Electromagnetic effects for the resonance-domain IR diffractive optics

Binary optics technology enables the manufacture of arrays of diffractive micro-optical elements which are used in many optoelectronic devices, e.g. the focal plane collection optics. The first-order diffraction grating efficiency decreases in the best part of the resonance-domain region of diffraction, i.e. when the grating period is close to the optical wavelength in the substrate material. A large fraction of the fast binary lens surface relief is built of staircase annular structures whose width is of wavelength scale. Therefore, the rigorous electromagnetic theory of gratings has been applied in this paper to calculate and analyze the diffraction effects for the resonance-domain longwave (8–12 μm) infrared (LWIR) binary optics. It is shown that electromagnetic effects limit the speed of the LWIR first-order diffractive lenses and the optical gain achievable with the diffractive lenses used as the focal plane collection optics in the IR detection systems.     

Grating-lens dispersive delay line

For problems of control and compression of pulses in picoseconds time scale a dispersive delay line based on control of spectral phase of radiation in a device consisting of diffraction grating and lenses is proposed and tested.     

焦线可调光楔列阵系统的研制

针对原形光楔列阵均匀线聚焦光学系统线长不可调的缺点，研制了可连续改变焦线宽纵比的光楔列阵系统，详细分析了它的工作原理，并作了实验验证，得到二者相一致的结果。     

双焦镜片的设计、应用和开发

本文通过对当今眼镜市场上传统产品的比较及配戴使用效果的分析，结合眼睛的调节与适应原理，引出一传统消费的误区，提出了一种眼镜消费的新空间即双焦镜片的应用开发。本文概述了双焦镜片设计的基本原理，并对符合眼睛调节的双焦镜片片形设计、光度调节以及像差理论进行了论证。结论是：双焦镜片可解决中老年眼疾患者看远近物体时需配戴两副不同光焦度眼镜的痛苦；双焦镜片同样适用于年轻人，可缓解眼睛的调节疲劳，防止度数的上升。充分开发双焦镜片的功能，对于卫生用眼，后天防治眼疾有着重要意义。