倍频波长分离膜半波孔的消除

指出了膜料色散、膜层折射率非均匀性以及膜厚控制误差积累等是导致半波孔产生的几个因素,其中膜层厚度周期性误差积累和敏感层厚度误差是导致半波孔的主要因素,还指出了半波孔的大小与膜系结构有关.借助计算机做了相应的数值计算,并从理论上进行了深入分析.针对这些因素采取相应的措施,设计和制备了倍频波长分离膜,有效地消除了半波孔.并给出了理论和实验光谱曲线,二者有很好的一致性.     

膜层渗透产生短波通截止滤光片半波孔现象的分析

半波孔现象的出现会极大地影响短波通截止滤光片的光谱性能,已有文献报道膜料色散、膜层折射率非均匀性以及膜厚控制误差积累等是产生半波孔现象的几个可能因素。本文通过模拟计算发现膜层间的相互渗透也是产生半波孔现象的重要原因之一,分析表明不同的渗透模式对半波孔现象的形成及大小具有不同的影响。     

基于等效膜层理论的1/4规整膜系薄膜偏光分束镜

为了设计制作1/4规整膜系的高性能薄膜偏光分束镜,根据三层对称膜系结构的等效膜层理论和截止带理论,设计了两种对称膜系结构的偏光分束镜。利用TFCalc薄膜软件对两种膜系结构偏光分束镜的分光光谱特性进行了模拟。利用电子枪蒸镀法分别制备了两种膜系结构的偏光分束镜(580~780 nm),并利用分光光度计和搭建的消光比测试系统,对两种膜系结构偏光分束镜的透射率和消光比进行了测试。结果表明,两种膜系结构的偏光分束镜在设计分光光谱范围内透射率可以达到90%以上,消光比优于3×10-3,与理论设计吻合得很好。     

SiO_2单层膜的反常色散研究

利用等效折射率概念分析了SiO2单层膜反常色散出现的原因,并在1.1 m镀膜机上证明了理论分析的合理性.结果表明,理论分析与实验结果一致,沿薄膜厚度方向折射率的对称周期变化使薄膜的等效折射率变化在可见光波段与致密膜层的变化不一致,表现出反常色散的现象.膜厚方向折射率变化周期越大,等效折射率随波长增加的趋势就越大,薄膜表现出的反常色散特性越明显.沿膜厚方向折射率变化幅度的对色散特性影响次之.     

LiB3O5晶体上四倍频增透膜设计

采用矢量法设计了三硼酸锂（LiB3O5,LBO）晶体上1 064 nm、532 nm、355 nm和266 nm四倍频增透膜.结果表明,在1 064 nm、532 nm、355 nm和266 nm波长的剩余反射率分别为0.001 9％、0.003 1％、0.006 1％和0.004 7％.根据容差分析,薄膜制备时沉积速率准确度控制在＋6.5％时,基频、二倍频、三倍频和四倍频波长的剩余反射率分别增加至0.24％、0.92％、2.38％和4.37％.当薄膜材料折射率的变化控制在＋3％时,1 064 nm波长的剩余反射率增大为0.18％,532 nm、355 nm和266 nm波长分别达0.61％,0.59％,0.20％.与薄膜物理厚度相比,膜层折射率对剩余反射率的影响大.对膜系敏感层的分析表明,在1 064 nm和266 nm波长,从入射介质向基底过渡的第二层膜厚度变化对剩余反射率的影响最大,其次是第一膜层.在532 nm和355 nm波长,从入射介质向基底过渡的第一和第四膜层是该膜系的敏感层.误差分析也表明,薄膜材料的色散对特定波长的剩余反射率具有明显影响,即1 064 nm、532 nm、355 nm和266 nm波长的剩余反射率分别增加至0.30％、0.23％、0.58％和3.13％.     

利用等效层的消偏振宽带减反膜设计

分析了倾斜入射条件下导致光学薄膜产生偏振的原因,针对不同偏振态的等效导纳与等效相位进行了分析,并计算了对称膜层在45°入射条件下不同偏振态的等效折射率与等效相位厚度,采用等效层方法设计了光学性能良好的600～900 nm波段消偏振宽带减反膜。最后利用电子束蒸发技术制备了薄膜样品,样品的光谱性能完全能够满足使用要求。其中在600～900 nm波段范围内,平均反射率均小于1．38%,反射率的偏振度均低于0．89%。另外,通过对其理论及实验光学性能、角度敏感性、膜层厚度误差敏感性等方面的分析结果可知,对称膜层组合法是设计消除倾斜入射下宽带减反膜偏振效应的一种行之有效的方法。     

三硼酸锂晶体上1064 nm,532 nm,355 nm三倍频增透膜的设计

采用矢量法设计了三硼酸锂晶体上1064 nm、532 nm和355 nm三倍频增透膜,结果表明1064 nm、532 nm和355 nm波长的剩余反射率分别为0.0017%、0.0002%和0.0013%。根据误差分析,薄膜制备时沉积速率精度控制在 5.5%时,1064 nm、532 nm和355 nm波长的剩余反射率分别增加至0.20%、0.84%和1.89%。当材料折射率的变化控制在 3%时,1064 nm处的剩余反射率增大为0.20%,532 nm和355 nm处分别达0.88%和0.24%。与薄膜物理厚度相比,膜层折射率对剩余反射率的影响大。对膜系敏感层的分析表明,在1064 nm和355 nm波长,从入射介质向基底过渡的第二层膜的厚度变化对剩余反射率的影响最大,其次是第一膜层。在532 nm波长,第一和第三膜层是该膜系的敏感层。同时发现,由于薄膜材料的色散,1064 nm5、32 nm和355 nm波长的剩余反射率分别增加至0.15%、0.31%和1.52%。     

探测用宽截止红外双通道帯通滤光片的设计及误差分析

为满足探测1,2丙二醇二硝酸脂有毒气体浓度的红外探测元件抑制带截止深度深、通带内平均透射比高、波纹系数小等要求,采用等效折射率理论与局部优化相结合的设计方法,选用PbTe/ZnSe作为高低折射材料,采用长波通膜系、短波通膜系以及双半波膜系设计了截止深度深、双通道、通带宽度合适的红外滤光片,通带分别为5.9～6.2μm及11.9～12.2μm,通带内平均透射比分别在90%及65%以上;对所设计的膜系进行了薄膜物理厚度和膜层折射率的误差分析。分析表明,薄膜制备时沉积速率精度应控制在3.5%以内,材料折射率的变化应控制在3%以内,与膜层折射率相比,薄膜物理厚度对平均透射比的影响小,并且双半波膜系对厚度以及折射率变化更敏感。     

13.9 nm马赫贞德干涉仪用软X射线分束镜研究

 介绍了13.9 nm马赫贞德干涉仪用软X射线分束镜的设计、制备与性能检测。基于分束镜反射率和透过率乘积最大的评价标准，设计了13.9 nm软X射线激光干涉实验用多层膜分束镜。采用磁控溅射方法在有效面积为10 mm×10 mm、厚度为100 nm的Si3N4基底上镀制了Mo/Si多层膜，制成了多层膜分束镜。利用X射线掠入射衍射的方法测量了Mo/Si多层膜的周期。用扩束He-Ne激光束进行的投影成像方法定性分析了分束镜的面形精度，利用光学轮廓仪完成了分束镜面形精确测量。利用北京同步辐射装置测量了分束镜反射率和透射率，在13.9 nm处，分束镜反射率和透过率乘积达4%。使用多层膜分束镜构建了软X射线马赫贞德干涉仪，并应用于13.9 nm软X射线激光干涉实验中，获得了清晰的含有C8H8等离子体电子密度信息的动态干涉条纹。     

13.9nm软X射线激光用大面积多层膜分束镜研制

 基于分束镜反射率和透射率的乘积为衡量标准的原则,设计了13.9nm软X射线激光干涉测量所需的多层膜分束镜，用磁控溅射法在有效面积达10mm×10mm，厚100nm的氮化硅窗口上镀制Mo/Si多层膜,实现了分束镜制作。用表面轮廓仪实测分束镜面形精度达到nm量级，同步辐射反射率计测试表明,分束镜的反射率和透射率乘积约4%。     

Harmonic beam splitter design and fabrication

Two problems of half-wave hole and high ripples in the transmittance region for a harmonic beam splitter had been pointed out and analyzed. Based on the application of a half-wavelength control and a new admittance matching methods, a harmonic beam splitter was designed and fabricated. The former method eliminated the half-wave hole fundamentally, and the latter smoothed high ripples in the transmittance region effectively. The matching stack consisted of a symmetrically periodic structure and provided a complete matching at the desired wavelength, i.e., both conditions for the equivalent admittance and phase thickness were fulfilled. Furthermore, both the theoretical and the tested curves had been given, and a good agreement between them was obtained.     

Zero dispersion wavelength and dispersion slope control of hollow-core photonic bandgap fibres

This paper investigates the zero dispersion wavelength and dispersion slope control of hollow-core photonic bandgap fibres (PBGFs) by using a full-vector finite element method. By simulation we found that theoretically the zero dispersion wavelength can be tailored by respectively changing the rounded diameter of air holes, pitch, refractive index, normalized thickness of core rings, and hole diameter to pitch ratio. At the same time the tailoring of dispersion slope can also be realized by changing the rounded diameter of air holes or pitch or normalized thickness of core rings. To illustrate the reasonability of fibre designs, this paper also gives the variance of normalized interface field intensity which measures the scattering loss relatively versus wavelength for different designs. From the viewpoint of loss, varying the rounded diameter and the thickness of core ring could shift zero wavelength but it is difficult to get the required parameters within so tiny range in practical drawing of PBGFs, on the other hand, it is possible in practice to respectively alter the pitch and refractive index to shift zero wavelength. But varying hole diameter to pitch ratio is not worthwhile because they each induce large increase of loss and narrowness of transmission bandwidth. The zero dispersion wavelength can be engineered by respectively varying the rounded diameter of air holes, pitch, refractive index, and normalized thickness of core rings without incurring large loss penalties.     

Microstructure parameters and optical properties of cadmium ferrite thin films of variable thickness

CdFe₂O₄ thin films of different thicknesses were deposited onto glass substrates by the thermal evaporation technique. Their structural characteristics were studied by X-ray diffraction (XRD). The microstructure parameters, crystallite size, and microstrain were calculated. It is observed that both the crystallite size increases and microstrain increase with increasing with the film thickness. The fundamental optical parameters like absorption coefficient and optical band gap are calculated in the strong absorption region of transmittance and reflectance spectrum. The refractive indices have been evaluated in terms of the envelope method, which has been suggested by Swanepoel in the transparent region. The refractive index can be extrapolated by the Cauchy dispersion relationship over the whole spectra range, which extended from 400 to 2500 nm. The refractive index, n, increases on increasing the film thickness up to 733 nm and the variation of n with higher thickness lies within the experimental errors.     

The theory of nonlinear dispersion interferometers in the constant intensity approximation

The operation of a dispersion interferometer with intracavity location of a medium under study is analyzed in the constant intensity approximation taking into account the reciprocal influence of a harmonic on the phase of the exciting wave. This approximation allows the effects of phase mismatch and losses in a medium on the course of a nonlinear process to be taken into account simultaneously. Intensity minima of the harmonic (as opposed to the constant field approximation) in the constant intensity approximation are shown to depend on dispersion of the refractive index of the medium under study, which makes it possible to determine dispersion of the refractive index of the substance under study directly and accurately     

4H-SiC基底Al_2O_3/SiO_2双层减反射膜的设计和制备

在4H-SiC基底上设计并制备了Al2O3SiO2紫外双层减反射膜,通过扫描电镜(SEM)和实测反射率谱来验证理论设计的正确性.利用编程计算得到Al2O2和SiO2的最优物理膜厚分别为42.0 nm和96.1 nm以及参考波长λ=280 nm处最小反射率为0.09%.由误差分析可知,实际镀膜时保持双层膜厚度之和与理论值一致有利于降低膜系反射率.实验中应当准确控制SiO2折射率并使Al2O3折射率接近1.715.用电子束蒸发法在4H-SiC基底上淀积Al2O3SiO2双层膜,厚度分别为42 nm和96 nm.SEM截面图表明淀积的薄膜和基底间具有较强的附着力.实测反射率极小值为0.33%,对应λ=276 nm,与理论结果吻合较好.与传统SiO2单层膜相比,Al2O3SiO2双层膜具有反射率小,波长选择性好等优点,从而论证了其在4H-SiC基紫外光电器件减反射膜上具有较好的应用前景.     

Optical parameters of epitaxial GaN thin film on Si substrate from the reflection spectrum

A method has been proposed for determining the optical properties of a thin film layer on absorbing substrates. The film optical parameters such as thickness, refractive index, absorption coefficient, extinction coefficient and the optical energy gap of an absorbing film are retrieved from the interference fringes of the reflection spectrum at normal incidence. The envelopes of the maxima of the spectrum E_M and of the minima E_m are introduced in analytical forms to find the reflectance amplitudes at the interfaces and approximate values of the thin film refractive index. Then, the interference orders and film thickness are calculated to get accurate values of the needed optical parameters. There are no complex fitting procedures or assumed theoretical refractive index dispersion relations. The method is applied to calculate the optical properties of an epitaxial gallium nitride thin film on a silicon (1 1 1) substrate. Good agreement between our results and the published data are obtained.     

带隙型光子晶体光纤的泄露谱分析

利用光束传播法对带隙型光子晶体光纤（photonic crystal fiber, PCF）的泄露谱进行了数值分析.结果表明：PCF泄露谱往往具有多个带隙；泄露谱对PCF结构的变化异常敏感,泄露峰值波长和带隙波长不但与空气孔周期有关,还受空气孔直径的影响；由于PCF的空气孔内可填充液晶,泄露特性对液晶折射率的变化极其敏感,当液晶折射率增大时,峰值泄露波长和带隙波长都向长波漂移.     

Nonlinear imaging microscopy techniques as diagnostic tools for art conservation studies

We present results of the implementation of three-photon excitation fluorescence (3PEF) and third harmonic generation imaging measurements for the precise and nondestructive detection of natural and synthetic varnish layers, which are used for the surface protection of painted artifacts. For this purpose, we employ as an excitation source a compact femtosecond laser operating at 1028 nm. Two-dimensional images of the multilayer structures from different samples are depicted. The third harmonic signals show the interface between the different materials, when its refractive index mismatch is high enough. The depths of different layers of varnishes, presenting similar refractive index, are distinguishable with an axial resolution of approximately 1 microm by employing 3PEF measurements.