共查询到17条相似文献,搜索用时 171 毫秒
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在强电场条件下,由阴极通过场致发射产生的电子具有很强的空间电荷效应,因此真空二极管的空间电荷限制电流是设计高功率微波源等强流电子束器件时需要考虑的重要参数.场致发射电流密度只和阴极材料、阴极表面电场等有关,而空间电荷效应则会受二极管电压、间隙距离等因素的影响.为研究二极管间隙距离对场致发射过程中空间电荷效应的影响,建立了由场致发射阴极构成的一维平板真空二极管物理模型,利用第一性原理的粒子模拟方法,研究了二极管间隙距离和外加电压等参数变化时的阴极表面电场随时间的演变特性,得到了阴极表面稳态电场和二极管间隙距离之间的关系.结果表明,场致发射过程开始后,阴极表面电场先有个振荡过程,随后趋于稳定;在同一外加电场条件下,间隙距离越长,稳态电场的绝对值越小,且达到稳态所需的时间也越长;间隙距离越短,当阴极表面电场达到稳定状态时,二极管间隙区的电场分布变化越剧烈. 相似文献
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热场致发射阴极所产生的强流电子束具有很强的空间电荷效应,为研究该效应对热场致发射过程中诺廷汉(Nottingham)效应的影响机理,在理论分析的基础上,用数值方法研究了不同逸出功和多个外加电场条件下考虑空间电荷效应对诺廷汉效应结果的影响,并与不考虑空间电荷效应时的情形进行了对比. 结果表明:空间电荷效应的强弱会显著影响到阴极表面的稳态电场,进而对诺廷汉效应产生不可忽略的影响;当逸出功在3.0–4.52 eV、外加电场在3×109–9×109 V/m范围内时,考虑空间电荷效应的影响后,热场致发射电子所带走的平均能量较不考虑空间电荷效应时增加0–2.5 eV,且温度越高或外加电场越大时,该增加值越大;考虑空间电荷效应对诺廷汉效应的影响后,热场致发射电子从阴极带走的平均能量随外加电场的增加呈非线性下降规律;当阴极表面温度较高时,诺廷汉效应中的冷却效应随二极管间隙距离的变大而增强.
关键词:
热场致发射
诺廷汉效应
空间电荷效应
阴极表面电场 相似文献
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提出了一种新型二次电子倍增阴极强流二极管,并对其进行了动力学理论简化模型和蒙特卡罗数值模拟的对比验证研究。首先,基于设计结构原型,根据二次电子发射特性进行合理简化,建立了动力学模型,获得了电子速度、位移以及渡越时间的解析结果,并结合Vaughan的二次电子产额模型,确定了该新型二次电子倍增阴极强流二极管的理论工作区间;其次,理论分析了施加径向电场的重要意义,并给出了二次电子运动特征参数(最大位移、渡越时间、碰撞能量等)的理论预估结果;最后,对该新型二次电子倍增阴极强流二极管进行了蒙特卡罗模拟研究,获得了电子的运动轨迹、碰撞能量以及二次电子倍增工作区间等物理图像,并将蒙特卡罗数值模拟结果与理论结果进行了比对,两者吻合程度较好,对可能的误差来源进行了分析讨论。理论和模拟结果表明:新型二次电子倍增阴极强流二极管概念可行,工作区间内通过调整施加电场与磁场幅值,可有效达到电子运动状态可控的目标。另外,理论粗估了二次电子倍增饱和条件下的阴极发射电流密度,结果表明:发射电流密度可达kA/cm2水平,具备强流发射特性;增加外加径向场强幅值可有效提升发射电流密度。最后,对该新型二次电子倍增阴极设计步骤和依据进行了讨论。 相似文献
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采用丝网印刷和涂敷方法制备了两种碳纳米管阴极,并研究了两种阴极的强流脉冲发射特性,表征了阴极表面碳纳米管的形貌及分布.研究结果表明在脉冲宽度为100 ns、电压为1.64×106 V的脉冲电场下,涂敷法制备阴极的场发射电流最高达5.11 kA,最高发射电流密度达260 A/cm2.丝网印刷法制备阴极的场发射稳定性优于涂敷法制备阴极,但其发射电流低.阴极表面发射体的形貌与分布影响了阴极的脉冲发射性能.碳纳米管阴极的脉冲发射机理为爆炸电子发射.碳纳米管阴极可以作为强
关键词:
碳纳米管
阴极
脉冲发射
强电流 相似文献
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以闪光二号加速器为研究平台,实验研究了前沿80 ns和34 ns脉冲电压下的二极管工作稳定性,通过对比实验结果和数值模拟结果,分析了脉冲前沿对二极管启动时间、阴极发射均匀性和阻抗重复性的影响,探讨了脉冲前沿对平面阴极二极管工作状态的影响机制。实验结果表明:脉冲前沿、二极管启动时间增加时,二极管的阻抗重复性降低;平面阴极易于在中心位置形成强区域发射,等离子体覆盖整个阴极发射面的时间随脉冲前沿增大而增加;屏蔽效应对阴极发射的影响随前沿增加而变大,进而导致阴极表面不均匀强点发射,等离子体运动速度增加,阴极有效发射面积减小,在等离子体运动速度和阴极有效发射面积共同作用下,二极管工作稳定性下降。 相似文献
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A hexagon pitch carbon nanotube (CNT) array vertical to
the normal gate of cold cathode field emission displayer (FED) is
simulated by solving the Laplace equation. The calculated results
show that the normal gate causes the electric field around the CNT
tops to be concentrated and emission electron beam become a column.
The field enhancement factor and the emission current intensity step
up greatly compared with those of diode structure. Emission current
density increases rapidly with the decrease of normal-gate aperture.
The gate voltage exerts a critical influence on the emission
current. 相似文献
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In this paper we investigated the surface morphology and emission property of polymer velvet in a cathode test system powered by a ∼400 ns, ∼400 kV pulsed generator. After a series of pulse shots, the velvet surface exhibited an obvious decrease in the amount of emitters, namely, the smoothing of microprotrusions, indicating a lower field enhancement factor or a higher turn-on electric field than that for no shots. As the velvet cathode lifetime proceeded, the beam degradation was observed in terms of the voltage pulse length, maximum emission current, and rise time of diode current. Further, the average current density significantly decreased during a 100 pulse shot test, from 280 to 160 A/cm2. The surface discharge caused many plasma spots on the velvet surface. The cathode plasma expands towards the anode, directly leading to the diode gap closure. The degradation in the velvet performance after high-current emission may be related to this behavior of cathode plasma. Finally, the electron emission mechanisms, how to affect the surface morphology of velvet, are presented. 相似文献
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Relation between space-charge-limiting current and electric field enhancement factor at curved surface cathode 下载免费PDF全文
A two-dimensional solution of space-charge-limiting current for a high current vacuum diode with a spherical cathode is presented. The relation between space-charge-limiting current and electric field enhancement factor at the cathode surface for the diode with a curved surface cathode is also discussed. It is shown that compared with the current given by the conventional Child—Langmuir law, which describes the one-dimensional space-charege-limiting current, the two-dimensional space-charge-limiting current in such a diode is enhanced due to the electric-field enhancement along the cathode surface. Among practical parameter ranges, enhancement factor ηb approximately satisfies ηb ≈ Aβn, where β is the electric field enhancement factor at the cathode surface, and n is a constant between 1 and 2, which is confirmed to be universal for the diodes with curved surface cathodes. 相似文献
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采用悬浮球模型,结合对称的镜像电荷层方法,对静电场中纳米碳管阵列的场增强因子进行了计算,并在考虑极板间距的情况下,对其计算结果做了修正.结果表明:纳米碳管阵列的间距对纳米碳管阵列的场发射性能影响很大.当纳米碳管阵列中碳管间距小于碳管高度时,场增强因子随间距的减小而急剧减小;而当碳管间距显著大于碳管高度时,场增强因子几乎不变.但当考虑阴阳极之间单位面积通过的场发射电流时,可论证当管间距与管高度相若时,能使场发射电流密度最佳(最大).另外,极板间距对场增强因子的影响很小,但是可以通过减小极板间距,来降低纳米碳管作为场发射体的场发射的开启电压,优化纳米碳管的场发射性能.
关键词:
纳米碳管阵列
场增强因子
开启电压 相似文献
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The generation of a 250-μs-wide electron beam in a plasma-emitter diode is studied experimentally. A plasma was produced by a pulsed arc discharge in hydrogen. The electron beam is extracted from a circular emission hole 3.8 mm in diameter under open plasma boundary conditions. The beam accelerated in the diode gap enters into a drift space in the absence of an external magnetic field through a hole 4.1 mm in diameter made in the anode. The influence of electron current deposition at the edge of the anode hole on the beam’s maximum attainable current, above which the diode gap breaks down, is studied for different accelerating voltages and diode gaps. The role of processes occurring on the surface of the electrodes is shown. For an accelerating voltage of 32 kV, a mean emission current density of 130 A/cm2 is achieved. The respective mean strength of the electric field in the acceleration gap is 140 kV/cm. Using the POISSON-2 software package, the numerical simulation of the diode performance is carried out and the shape of steady plasma emission boundaries in the cathode and anode holes is calculated. The influence of the density of the ion current from the anode plasma surface on the maximum attainable current of the electron beam is demonstrated. 相似文献