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采用气相沉积方法在液相基底表面成功制备了一种具有近似自由支撑的新型铁薄膜系统．该薄膜的生长机制服从所谓的二阶段生长模型：沉积铁原子在液相基底表面首先成核并凝聚成准圆形原子团簇；然后这些原子团簇在液体表面做无规扩散和旋转运动，从而形成分枝状凝聚体(上图)，并随着薄膜名义厚度的增加，分枝状凝聚体逐渐相互连接成网状薄膜，     

带电液体基底表面银原子的凝聚和扩散行为

研究了沉积在带电液体基底(硅油)表面的银原子的凝聚以及扩散行为.先采用热阴极电子发射方法使液体基底表面均匀带电,然后用蒸发沉积方法将银原子沉积到带电的液体基底表面.实验发现:被沉积的银原子首先凝聚成直径约为12μm的准圆形团簇,然后由于库仑排斥力作用而相互离散,所有团簇均向基底的四周边缘漂移;基底表面的团簇数密度n随时间t指数衰减,衰减时间常量Of≈11×10-4s-1;两团簇相互离散的相对平均速率V与它们之间的相对距离L在统计意义上成正比,即V=HL,其中沉积刚结束时常量H≈29×10-4s-1,然后随扩散时间t而逐渐趋于零.分析表明:由于带电银原子团簇的扩散运动,使基底表面的电荷重新分布,基底表面的电场随时间逐渐趋向于处处均匀 关键词： 薄膜 扩散 凝聚     

无序杂质区域对沉积在胶体基底表面的金原子凝聚体分形结构的影响

由于受基底表面无规分布杂质的影响,沉积在熔融玻璃基底表面的金原子凝聚形成了具有特殊结构的分形凝聚体.根据这一实验结果,建立了各向异性的团簇团簇凝聚模型,对此类胶体基底表面的金原子分枝状凝聚体的生长过程进行了计算机模拟,研究了无规分布的杂质区域对凝聚体各种参数的影响,其结果与实验相符合 关键词： 薄膜生长 MonteCarlo模拟 分形     

银原子在液体基底上的凝聚特性

研究了沉积在液体基底表面上的银原子的扩散和凝聚特性．实验结果表明：银原子在液体表面先形成准圆形的团族，然后通过无规扩散而逐渐凝聚成具有分枝状的凝聚体．准圆形团簇的平均半径以及凝聚速率均随沉积速率的变化而变化．还提出了一个凝聚速率概率模型，计算结果与凝聚速率的实验曲线相符合． 关键词：     

无格点基底表面的杂质分布对分枝状凝聚体的影响

根据含杂质熔融玻璃表面金原子凝聚的实验规律，在原子团簇具有随机的线扩散步长和刚性转动角的特征条件下，建立了含杂质无格点基底表面上改进的杂质限制团簇-团簇(IRCCA)凝聚模型.对团簇的扩散、刚性转动以及凝聚全过程进行了计算机模拟，系统地研究了杂质区域分布情况对分枝状凝聚体诸多特性的影响.结果表明规则分布的杂质对凝聚体生长的影响比随机分布的杂质大，导致杂质规则分布的基底表面上的分枝状凝聚体的数密度更大，分枝状凝聚体的回旋半径，凝聚体平均大小及分形维数更小. 关键词： 薄膜生长 Monte Carlo模拟 分形 杂质     

具有排斥相互作用的原子团簇非平衡系统研究

在无格点基底表面建立了存在排斥相互作用的原子团簇凝聚及扩散模型，对沉积在均匀带电硅油基底表面的银原子凝聚过程进行了研究.结果表明：当沉积原子凝聚成稳定的原子团簇后，由于带同种电荷，团簇之间存在库仑排斥作用，团簇数密度随时间呈指数形式衰减，衰减时间常数为Oa_a；两团簇相互离散的相对平均速率V与它们之间的相对距离L在 统计意义上成正比，即V=HL.停止沉积后初期,H≈Oa_a，然后随着扩散时间的增 加，H逐渐趋于零；随着液体基底黏滞系数增加，摩擦力增大，H逐渐减小，摩 关键词： 排斥相互作用 团簇 扩散     

含杂质无格点基底表面分枝状凝聚体的计算机模拟

根据含杂质熔融玻璃表面金原子凝聚的实验规律，在原子团簇具有随机的线扩散步长和刚性 转动角度的特征条件下，建立了含杂质无格点基底表面的各向异性团簇-团簇凝聚模型，对 团簇的无规扩散、刚性转动以及凝聚全过程进行了计算机模拟，系统地研究了基底表面无规 分布的杂质区域对分枝状凝聚体诸多特性的影响，所得结果与实验事实相符合. 关键词： 薄膜生长 Monte Carlo模拟 分形     

金原子在熔融玻璃表面的凝聚特性

研究了沉积在熔融玻璃表面的金原子的扩散、凝聚以及结晶行为.实验结果表明:金原子在胶状的玻璃表面先形成具有特征结构的网状薄膜,其中金原子晶粒直径约为20nm;然后网孔逐渐增大直至薄膜破裂,金原子凝聚成准圆形的团族,其饱和直径约为1.2μm,扩散系数为10^-7—10^-8cm²/s数量级;通过快速且准无规地扩散,准圆形团簇最终凝聚成直径约为50μm的大型分枝状凝聚体 关键词： 薄膜 凝聚 扩散     

动力学晶格蒙特卡洛方法模拟Cu薄膜生长

利用动力学晶格蒙特卡洛方法模拟了Cu薄膜在Cu(100)面上的三维生长过程。模型中考虑了四个动力学过程:原子沉积、增原子迁移、双原子迁移和台阶边缘原子迁移,各动力学过程发生的概率由多体势函数确定。讨论了基底温度、沉积速率及原子覆盖率对Cu原子迁移、成核和表面岛生长等微观生长机制的影响;获得了Cu薄膜的表面形貌图并计算了表面粗糙度。模拟结果表明,随基底温度升高或沉积速率下降,岛的平均尺寸增大,数目减少,形状更加规则。低温时,Cu薄膜表现为分形的离散生长,高温时,Cu原子迁移能力增强形成密集的岛。Cu薄膜表面粗糙度随着基底温度的升高而迅速减小;当基底温度低于某一临界温度时,表面粗糙度随原子覆盖率或沉积速率的增大而增大;当基底温度超过临界温度时,表面粗糙度随原子覆盖率或沉积速率的变化很小,基本趋于稳定。     

硅油基底表面铁薄膜的生长机理及表面有序结构

利用直流溅射方法在液体基底(硅油)表面成功制备出金属铁薄膜系统，研究了其生长机理及特征的表面有序结构.实验发现铁薄膜的生长过程与液相基底表面非磁性金属薄膜的情况类似，基本服从二阶段生长模型.连续铁薄膜中可观测到尺寸巨大的圆盘形有序结构，其生长演化与溅射功率、沉积时间和真空环境中的生长时间等实验条件密切相关.实验证明，此类有序结构是在薄膜内应力作用下，铁原子及原子团簇在液体表面自由扩散迁移，并最终在硅油基底表面某些区域成核凝聚所致.在较大溅射功率和沉积时间条件下，圆盘外部区域的铁薄膜中形成周期分布的波纹褶皱，其波长约为10 μm，波峰基本与圆盘的边界平行.进一步研究表明：在沉积过程中，由于沉积铁原子的局域能量作用，导致硅油的表面层结构发生改变而形成一聚合物层；在随后的冷却过程中，聚合物层的强烈收缩使铁薄膜处于很大的压应力场中，促使薄膜起皱形成波纹结构. 关键词： 液体基底 铁薄膜 生长机理 有序结构     

准自由支撑铝薄膜中有序表面结构的自组织生长

利用真空热蒸发方法在液体基底表面成功制备出具有自由支撑边界条件的金属铝薄膜系统，研究了薄膜中自发形成的自边界向内部区域逐渐生长而呈带状分布的有序表面结构.该有序结构的形成与薄膜厚度、沉积速率和真空环境中的生长时间等实验参数密切相关，其形成过程可用一个三阶段生长模型来描述.实验证明此类有序结构是在薄膜内应力作用下，铝原子及原子团簇在液体表面自由扩散凝聚所致.进一步的理论研究表明：基于特征的边界条件和固液相互作用，该自由支撑铝薄膜系统中包含了丰富的正弦形内应力分布，各种具有不同振幅和频率的正弦形内应力的合成可形成矩形状畴块和带状有序结构. 关键词： 液体基底 铝薄膜 自组织生长 有序结构     

Influence of the metal substrate on the adsorption properties of thin oxide layers: Au atoms on a thin alumina film on NiAl(110)

Thin oxide films grown on metal substrates are widely used in surface science to model bulk oxides, assuming their chemical and electronic properties to be similar. In some cases, however, this might not be justified as the present scanning tunneling microscopy studies demonstrate for Au atoms on a thin alumina film on NiAl(110). Au atoms were evaporated onto the oxide film at a sample temperature of approximately 10 K. At low coverage, this leads to the formation of one-dimensional clusters with unusually large Au-Au distances of 5.6-6.0 A. A direct interaction between the Au atoms can be excluded, and a substrate-mediated mechanism is supposed instead. This assumption is strengthened by the finding that the Au chains exhibit a preferential orientation: They are almost aligned with the [001] direction of the NiAl(110) substrate, clearly indicating that the metal substrate participates in the binding of the Au atoms.     

金属薄膜在云母与富勒烯衬底上的电阻弛豫现象

超高真空环境中，在云母和富勒烯衬底上蒸镀半连续的Nb和Ag膜，同时对其进行了原位电阻测量．在人为地突然中断蒸镀之后的10min内，仔细研究了样品电阻随时间的自动缓变过程（弛豫）．实验发现，Nb/云母和Ag/C₆₀样品的电阻随时间缓慢增加，Ag/云母样品的电阻随时间逐渐减小．样品弛豫的强度与衬底温度和金属膜厚度密切相关．分析表明，衬底上的金属原子徙动会引起金属岛的边际形变以及岛间融合，这是薄膜电阻弛豫的主要原因．电阻弛豫的方向与强度反映了金属膜/衬底系统的界面活性．衬底表面的缺陷也会影响这一弛豫过程．从微观的原子运动和宏观的热力学平衡这两方面描述了弛豫过程 关键词：     

AFM Study on the Formation Mechanism and Microstructure of Ni Atomic Aggregates on Liquid Substrates

We study the formation mechanism and microstructure of nickel （Ni） atomic aggregates on the silicone oil surfaces by atomic force microscopy （AFM）. Initially, the deposited atoms nucleate and form the compact clusters on the liquid surfaces. Then they perform Brownian motion and adhere upon impact. Finally the branched aggregates are formed. The Ni aggregates exhibit granular structure. The mean size of the granularities in the aggregates is of the order of 10 nm and it decreases with the nominal film thickness. The experiment shows that the Ni aggregates perform a directional diffusion towards the sample edge. The interpretation for this phenomenon is presented.     

Ag(111)和Au(111)上铋的初始生长行为

半金属铋(Bi)的表面合金具有的Rashba效应,和其具体结构性质有重要关联.本文结合扫描隧道显微镜(STM)和密度泛函理论(DFT),系统地研究了Bi原子在Ag(111)和Au(111)上的不同初始生长行为.在室温Ag(111)上,连续的Ag₂Bi合金薄膜会优先在Ag台阶边缘形成;在570 K Ag(111)上,随着覆盖度增加到0.33分子层(ML),Bi优先取代配位数低的台阶边原子并从单原子随机分布转变为长程有序的Ag₂Bi合金相;随着覆盖度增加,Ag₂Bi通过退合金过程转变成p×3^1/2结构的Bi膜.Bi在室温和570 K的Au(111)上的生长行为一致:在覆盖度低于0.40 ML时,Bi会优先吸附在配位为5的Au原子上,并以单原子和团簇的形式分别分散在Au(111)的密堆积区域和鱼骨纹重构的拐角处;随着覆盖度增加到0.60 ML,无序的Bi会逐渐转变成长程有序的((37)^1/2×(37)^1/2)相;Bi的吸附会导致Au(111)表面应力逐步释放.Bi在Ag(111)和Au(111)上的不同生长行为表明,Bi原子与衬底之间的相互作用起着关键作用.     

Photoinduced formation and aggregation of silver nanoparticles at the surface of carboxymethylcellulose films

Formation and aggregation of photolytic silver nanoparticles at the surface of silver salt of carboxymethylcellulose films (CMCAg films) have been investigated. Detailed X-ray photoelectron spectroscopy (XPS) study and field emission type scanning electron microscopy (FE-SEM) observation have been carried out to characterize silver nanoparticles at the film surface. When the CMCAg films were irradiated with UV light in wet air at room temperature for 30–60 min, silver nanoparticles of ca. 10 nm size were formed at the irradiated surface. According to the FE-SEM observation, the growth of the particle diameter and aggregation of nanoparticles took place after prolonged irradiation, and finally, the irradiated side of the film surface was densely covered with the silver nanoparticles of ca. 35 nm size. Chemical composition analysis by the XPS measurements has confirmed the increase in the atomic concentration of silver with irradiation time. It is suggested that silver atoms and clusters can move in the film and precipitate at the irradiated surface.     

Interaction of silver atoms with iridium and with a two-dimensional graphite film on iridium: Adsorption,desorption, and dissolution

The initial stages in the interaction of silver with the (111)Ir surface and with a two-dimensional graphite film (2D GF) on (111)Ir were studied by high-resolution electron Auger spectroscopy in ultrahigh vacuum. The growth mechanisms of silver films and the desorption fluxes of Ag atoms were determined, and their desorption energies estimated. It was found that the Ag desorption fluxes from a 2D GF on Ir and from a thick silver film on the pure metal are similar and considerably (an order of magnitude) smaller than the sublimation fluxes from bulk silver at the same temperatures. The activation energy for desorption from a submonolayer film varies from 3.2 eV for coverage θ=1 to 3.7 eV at θ ～ 0. It was shown that silver atoms do not penetrate into the substrate bulk throughout the temperature range covered (300–1800 K).     

X-ray study of growing wetting films

X-ray scattering experiments of liquid films on top of solid substrates were performed. With a short pulse disturbance, caused by a temperature difference between the substrate and the vapour in the X-ray cell, the wetting film thickness is reduced. Afterwards the time dependence of the growing film is monitored by X-ray reflectivity measurements in the region of total external reflection. We have examined CCl₄- and CCl₃Br-films on top of silicon wafers and CCl₃Br on glass/gold and glass/silver substrates. The film thickness as function of time is explained by the Kolmogorov growth model. From the data we obtain rather long time constants and the dimensiond=2 of the growing process     

Preferred structures of the atomic Ag islands on silicone oil surfaces

Varying the substrate temperature T(s) from 285 to 353 K, both the aggregation behavior of Ag atoms and the preferred structures of the atomic Ag islands on silicone oil surfaces are investigated. After deposition, the deposited Ag atoms form isolated islands with a preferred height. Our observations reveal that, as T(s) increases, the preferred island height increases from 20.0 to 33.0 nm, which results in the decrease of the Ag apparent coverage, from 9.6 ± 0.1% to 6.5 ± 0.3%. Further, the crystal structure of the Ag islands changes from amorphous to polycrystalline as the substrate temperature T(s) goes up. Subsequently a 3D aggregation mechanism of the Ag atoms on the liquid substrates is proposed.