氟硅烷自组装单分子膜的制备及其摩擦学性能

利用分子自组装技术制备了全氟辛酰胺丙基硅烷单分子膜,用X射线光电子能谱(XPS)对组装膜的表面元素进行了表征;接触角测试表明,该组装膜具有很好的疏水疏油性,其对水的接触角高达105°,对正十六烷的接触角为50°.摩擦磨损实验结果表明,全氟辛酰胺丙基硅烷自组装单分子膜可以大大降低基片的摩擦系数,使载玻片的摩擦系数从0.85左右降低到0.14左右,而且低负荷下具有很好的耐磨性.     

表面硅烷化铜箔的电化学腐蚀与防护研究

用γ-氨丙基三甲氧基硅烷(γ-APS)溶液对铜箔表面硅烷化处理,采用动电位极化和电化学交流阻抗研究不同pH的γ-氨丙基三甲氧基硅烷溶液自组装铜箔电极在0.1 mol.L^-1NaCl溶液的腐蚀防护效果,采用扫描电子显微镜观察γ-氨丙基三甲氧基硅烷自组装膜的表面形貌.结果表明,γ-氨丙基三甲氧基硅烷自组装铜箔有较好的腐蚀防护效果,其中pH=7的γ-氨丙基三甲氧基硅烷溶液自组装膜的抗腐蚀效果最佳.     

铜电极表面硅烷膜的自组装及其性能研究

应用自组装技术在铜电极表面上制备3巯基丙基三甲氧基硅烷自组装膜.红外光谱研究该自组装膜结构,电化学方法考察3-巯基丙基三甲氧基硅烷膜在5%NaCl溶液中对铜电极的缓蚀性能.结果表明,于不同浓度的3-巯基丙基三甲氧基硅烷乙醇溶液中自组装的硅烷膜表现出较好的抗腐蚀性.     

稀土复合薄膜的制备及其微摩擦学性能

在羟基化的单晶硅片上制备了3-巯丙基三甲氧基硅烷-稀土(MPTS-RE)复合薄膜。利用接触角测量仪、X射线光电子能谱仪(XPS)分析了MPTS-RE复合薄膜接触角及其表面典型化学元素的状态;运用原子力显微镜(AFM)观察了MPTS-RE复合薄膜的表面形貌并研究了其微摩擦学性能。结果表明:稀土成功组装到磺化后的MPTS薄膜表面;随着探针的滑动速率和载荷的增加,针尖与样品间摩擦力增加;硅基片和MPTS-RE复合薄膜表面的黏附力随着相对湿度的增加而增加;MPTS-RE复合薄膜具有较低的摩擦系数和黏附力。     

反应离子刻蚀和自组装分子膜构建硅基底疏水与超疏水表面

采用反应离子刻蚀技术在Si(100)表面加工微米级圆柱阵列, 采用自组装技术分别制备了3种硅烷自组装分子膜. 结果表明, 采用反应离子刻蚀构建出的4种微米级圆柱阵列结构规整, 其直径为5 μm, 高度为10 μm, 间距为15~45 μm. 沉积自组装分子膜后, 试样表面的水接触角显著增大, 其中沉积1H,1H,2H,2H-全氟癸基三氯硅烷(FDTS)自组装分子膜接触角最大, 1H,1H,2H,2H-全氟辛烷基三氯硅烷(FOTS)次之, 三氯十八硅烷(OTS)最小. 测得的接触角大于150°时接近Cassie方程计算的接触角, 而小于150°时接近Wenzel方程计算的接触角. 改变圆柱阵列的间距和选择不同的自组装分子膜, 可以控制表面接触角的大小. 原子力显微镜(AFM)观测结果显示, 沉积自组装分子膜可以产生纳米级的团簇. 由微米级圆柱阵列和纳米级自组装分子膜构成的表面结构使Si试样表面接触角最大可达156.0°.     

一种可溶性低表面自由能聚合物的制备及其表面性质

用全氟辛酸和甲基丙烯酸羟丙酯 (HPMA)为原料 ,合成了具有低表面自由能 ( 1 4 2mN m)的聚合物聚甲基丙烯酸全氟辛酰氧丙基酯 (PFPMA) ,接触角的测定表明聚合物具有较好双疏性 (疏水 疏油性 ) ,其对水的接触角高达 1 1 5°,对正十六烷的接触角为 75°.     

OTS自组装单分子膜在玻璃表面形成程的AFM研究

运用原子力显微镜研究了十八烷基三氯硅烷在玻璃表面自组装形成单分子膜的过程.通过对样品表面的显微图像、表面平均粗糙度及前进接触角的测量分析,揭示了自组装单分子膜在玻璃表面的生长规律,并探索反应初期玻璃表面的吸附特点.     

接触角法研究氨丙基硅烷化石英表面

利用接触角法研究了氨丙基硅烷化石英表面的基团浓度及单分子层中单个分子的截面积。提出了氨丙基硅烷化的模型。     

化学吸附自组装偶氮苯小分子单层膜及表面浸润性研究

通过化学吸附自组装的方法, 将小分子量的偶氮苯分子自组装到平滑硅基底表面, 其表面接触角为83.7°. 微结构化硅基底表面的偶氮苯单层膜上表现出超疏水的特性, 接触角达到了151.9°. 经过紫外光照射后, 该表面的接触角没有发生明显的降低.     

3—氯丙基三甲氧基硅烷的合成

采用氯铂酸／异丙醇和三苯基膦／环己酮为催化剂，在室温下能够使三氯硅烷与３－氯丙烯迅速发生硅氢加成反应，高产率地生成３－氯丙基三氯硅烷，继而将３－氯丙基三氯硅烷与无水甲醇同时中到沸腾的石油醚中进行醇解，合成了３－氯丙基三甲氧基硅烷。     

Interfacial friction of thin PDMS network films

This study focuses on developing dry, surface‐tethered polymeric lubricant coatings capable of significantly decreasing friction and wear of nano‐ and micrometer scale machines. Vinyl‐terminated polydimethylsiloxane chains are spin‐coated with a crosslinking agent and platinum catalyst onto silicon wafers functionalized with a self‐assembling monolayer containing reactive vinyl groups. Lateral force microscopy (LFM) measurements employing a bead probe are used to quantify the coefficient of friction (COF) and adhesion characteristics of the PDMS‐SAM surface tethered networks. The combined polymer network and SAM layer manifest extremely low friction coefficients, μ = 4 × 10^?3, which is nearly one order of magnitude lower than the friction coefficient of the bare silicon substrate. The lowest friction forces are measured using silicon substrates covered with nanometer thick, peroxide crosslinked PDMS networks; though poorly crosslinked, these networks display COFs as much as ten‐times lower than a solitary SAM coating layer. Micrometer thick end‐linked optimal networks also manifest attractive interfacial friction properties, with COFs approximately three times larger than the thinner, imperfect networks. These observations are discussed in terms of the structure of the polymer networks and the role of adhesion forces on interfacial friction. © 2008 Wiley Periodicals, Inc. J Polym Sci Part B: Polym Phys 46: 1773–1787, 2008     

Expanding the Chemistry of the Class C Radical SAM Methyltransferase NosN by Using an Allyl Analogue of SAM

The radical S‐adenosylmethionine (SAM) superfamily enzymes cleave SAM reductively to generate a highly reactive 5′‐deoxyadenosyl (dAdo) radical, which initiates remarkably diverse reactions. Unlike most radical SAM enzymes, the class C radical SAM methyltransferase NosN binds two SAMs in the active site, using one SAM to produce a dAdo radical and the second as a methyl donor. Here, we report a mechanistic investigation of NosN in which an allyl analogue of SAM (allyl‐SAM) was used. We show that NosN cleaves allyl‐SAM efficiently and the resulting dAdo radical can be captured by the olefin moieties of allyl‐SAM or 5′‐allylthioadenosine (ATA), the latter being a derivative of allyl‐SAM. Remarkably, we found that NosN produced two distinct sets of products in the presence and absence of the methyl acceptor substrate, thus suggesting substrate‐triggered production of ATA from allyl‐SAM. We also show that NosN produces S‐adenosylhomocysteine from 5′‐thioadenosine and homoserine lactone. These results support the idea that 5′‐methylthioadenosine is the direct methyl donor in NosN reactions, and demonstrate great potential to modulate radical SAM enzymes for novel catalytic activities.     

Molecular tilting and its impact on frictional properties of n-alkane self-assembled monolayers

Hydrophobic, methyl-terminated self-assembled monolayer (SAM) surfaces can be used to reduce friction. Among methyl-terminated SAMs, the frictional properties of alkanethiol SAMs and silane SAMs have been well-studied. In this research, we investigated friction of methyl-terminated n-hexatriacontane (C36) SAM and compared its friction properties with the alkanethiol and silane SAMs. Alkane SAM does not have an anchoring group. The alkane molecules stand on the surface by physical adsorption, which leads to a higher surface mobility of alkane molecules. We found that C36 SAM has a higher coefficient of friction than that of octadecyltrichlorosilane (OTS) silane. When an atomic force microscope (AFM) tip was swiped across the alkane SAM with a loading force, we found that the alkane SAM can withstand the tip loading pressure up to 0.48 GPa. Between 0.48 and 0.49Ga, the AFM tip partially penetrated the SAM. When the tip moved away, the deformed SAM healed and maintained the structural integrity. When the loading pressure was higher than 0.49 GPa, the alkane SAM was shaved into small pieces by the tip. In addition, we found that the molecular tilting of C36 molecules interacted with the tribological properties of the alkane SAM surface. On one hand, a higher loading force can push the rod-like alkane molecules to a higher tilting angle; on the other hand, a higher molecular tilting leads to a lower friction surface.     

Chemical stability of nonwetting, low adhesion self-assembled monolayer films formed by perfluoroalkylsilanization of copper

A self-assembled monolayer (SAM) has been produced by reaction of 1H,1H,2H,2H-perfluorodecyldimethylchlorosilane (PFMS) with an oxidized copper (Cu) substrate and investigated by x-ray photoelectron spectroscopy (XPS), atomic force microscopy (AFM), friction force microscopy (FFM), a derivative of AFM, and contact angle measurement. FFM showed a significant reduction in the adhesive force and friction coefficient of PFMS modified Cu (PFMS/Cu) compared to unmodified Cu. The perfluoroalkyl SAM on Cu is found to be extremely hydrophobic, yielding sessile drop static contact angles of more than 130 degrees for pure water and a "surface energy" (which is proportional to the Zisman critical surface tension for a Cu surface with 0 rms roughness) of 14.5 mJm2(nMm). Treatment by exposure to harsh conditions showed that PFMS/Cu SAM can withstand boiling nitric acid (pH=1.8), boiling water, and warm sodium hydroxide (pH=12, 60 degrees C) solutions for at least 30 min. Furthermore, no SAM degradation was observed when PFMS/Cu was exposed to warm nitric acid solution for up to 70 min at 60 degrees C or 50 min at 80 degrees C. Extremely hydrophobic (low surface energy) and stable PFMS/Cu SAMs could be useful as corrosion inhibitors in micro/nanoelectronic devices and/or as promoters for antiwetting, low adhesion surfaces or dropwise condensation on heat exchange surfaces.     

Hybridization of oligonucleotide by using DNA self-assembled monolayer

The interaction between DNA immobilized on surface and oligonucleotides at the interface is important in detection and diagnostic processes. However, it is difficult to immobilize DNA with maintaining its activity and to realize an efficient hybridization in previous methods. Here, to establish a novel DNA-functionalized surface, the DNA self-assembled monolayer (SAM) was constructed on a gold substrate using thiolated DNA composed of double-stranded (ds) and single-stranded (ss) portion. The DNA SAM was characterized by surface plasmon resonance (SPR), XPS. The hybridization of ss portion of DNA was attempted using the SAM, and in situ monitored by SPR. XPS measurement indicated that the thiolated DNA could form a stable monolayer on a gold substrate through sulfur–gold interaction. SPR measurement implied that the long axis of the DNA standing on the substrate. These results indicated formation of the DNA SAM on the substrate. Hybridization of target DNA containing a complementary sequence for the probe portion was observed by SPR. Moreover, one mismatch of oligonucleotide could be distinguished using the DNA SAM. The SPR result indicates that hybridization of target DNA and probe DNA on the DNA SAM occurs on the DNA SAM.     

Self-assembled monolayer compatible with metal surface acoustic wave devices on lithium niobate

The formation of a siloxane self-assembled monolayer (SAM) film on a lithium niobate substrate was investigated for surface acoustic wave (SAW) sensor devices for the detection of hydrogen. The most widely used SAM coupling reagent, octadecyltrichlorosilane, etches aluminum metal features that are integral to sensor devices, due to the formation of high local concentrations of hydrochloric acid. An alternative coupling reagent, octadecyltrimethoxysilane (OTMS), does not show any etching of metal parts. OTMS and related molecules are compatible with conventional SAW device manufacturing techniques and other devices that contain metal features susceptible to etching by acid released in the SAM formation process.     

Surface stress, kinetics, and structure of alkanethiol self-assembled monolayers

The surface stress induced during the formation of alkanethiol self-assembled monolayers (SAMs) on gold from the vapor phase was measured using a micromechanical cantilever-based chemical sensor. Simultaneous in situ thickness measurements were carried out using ellipsometry. Ex situ scanning tunneling microscopy was performed in air to ascertain the final monolayer structure. The evolution of the surface stress induced during coverage-dependent structural phase transitions reveals features not apparent in average ellipsometric thickness measurements. These results show that both the kinetics of SAM formation and the resulting SAM structure are strongly influenced both by the surface structure of the underlying gold substrate and by the impingement rate of the alkanethiol onto the gold surface. In particular, the adsorption onto gold surfaces having large, flat grains produces high-quality self-assembled monolayers. An induced compressive surface stress of 15.9 +/- 0.6 N/m results when a c(4x2) dodecanethiol SAM forms on gold. However, the SAMs formed on small-grained gold are incomplete and an induced surface stress of only 0.51 +/- 0.02 N/m results. The progression to a fully formed SAM whose alkyl chains adopt a vertical (standing-up) orientation is clearly inhibited in the case of a small-grained gold substrate and is promoted in the case of a large-grained gold substrate.     

Soft colloidal lithography by strong physical contact using swollen magnetic microspheres and magnetic force

Herein we report on pattern formation of a self-assembled monolayer (SAM) using soft colloidal lithography, based on strong physical contact between microspheres and substrate. In typical colloidal lithography, weak contact of microspheres with the substrate does not block the formation of a SAM. To establish conformal contact between microspheres and substrate to block the formation of a SAM, magnetic force was exerted on softened paramagnetic microspheres that had been swollen by a solvent. The soft colloidal lithography with controlled buoyance enables pattern formation through simple wet chemistry.     

DNA-modified electrodes; part 4: optimization of covalent immobilization of DNA on self-assembled monolayers

The covalent immobilization of DNA onto self-assembled monolayer (SAM) modified gold electrodes (SAM/Au) was studied by X-ray photoelectron spectrometry and electrochemical method so as to optimize its covalent immobilization on SAMs. Three types of SAMs with hydroxyl, amino, and carboxyl terminal groups, respectively, were examined. Results obtained by both X-ray photoelectron spectrometry and cyclic voltammetry show that the largest covalent immobilization amount of dsDNA could be gained on hydroxyl-terminated SAM/Au. The ratio of amount of dsDNA immobilized on hydroxyl-terminated SAMs to that on carboxyl-terminated SAMs and to that on amino-terminated SAMs is (3-3.5): (1-1.5): 1. The dsDNA immobilized covalently on hydroxyl-terminated SAMs accounts for 82.8-87.6% of its total surface amount (including small amount of dsDNA adsorbed). So the hydroxyl-terminated SAM is a good substrate for the covalent immobilization of dsDNA on gold surfaces.     

Effect of humidity and temperature on nano/microtribolgical properties of perfluorinated carboxylic acid and hydrogenated carboxylic acid self‐assembled monolayers deposited on aluminum‐coated silicon substrate

Two series of perfluorinated carboxylic acid (FC) and hydrogenated carboxylic acid (HC) self‐assembled monolayer (SAM) films were prepared on aluminum surfaces separately by chemical vapor deposition. The formation, structure and morphology of these films were characterized by measuring contact angle with ellipsometric method, x‐ray photoelectron spectrometry, and atomic force microscopy, respectively. FC and HC SAMs with long chains formed more densely packed films than those with short chains did. The comparative micro/nanoscale friction and adhesive properties of FC and HC SAMs, with various chain lengths on aluminum‐coated silicon substrate, were investigated. The influence of environmental conditions, such as relative humidity (RH) and temperature, on the friction and adhesion behavior was studied. Micro/nanotribological properties of the films were greatly influenced by their backbones and terminal groups. FC SAMs with long chain exhibited adhesion‐resistance, friction reduction, and environmental independence. Copyright © 2009 John Wiley & Sons, Ltd.