SDBS/HCl化学刻蚀法制备具有纳米-微米混合结构的铝基超疏水表面

采用阴离子表面活性剂十二烷基苯磺酸钠(SDBS)作为辅助刻蚀剂, 利用盐酸刻蚀, 在铝基质的表面形成了纳米-微米混合的粗糙结构; 化学刻蚀后的粗糙表面经过1H,1H,2H,2H-全氟癸烷基三乙氧基硅烷(FDTES)的修饰, 形成了接触角大于160°的超疏水表面. 扫描电镜表征结果显示, 所得到的超疏水表面具有纳米-微米混合结构; 基于此, 利用气泡辅助刻蚀机理初步解释了二级混合结构产生的原因, 认为是坑刻蚀和位错刻蚀的共同作用导致了混合结构的产生. 此外, 不同pH和长时间暴露实验证明所制备的铝基超疏水表面具有良好的稳定性.     

微米/纳米结构对氟硅烷修饰氧化铝表面疏水性能的影响

以多孔氧化铝膜为基板,用NaOH溶液进行化学腐蚀,控制适当的条件,得到氧化铝微米/纳米表面结构.用氟硅烷分别修饰光滑氧化铝膜、多孔氧化铝膜及其微米/纳米结构表面,进行接触角测试、XPS成分分析和SEM结构表征.结果表明,氟硅烷修饰的微米/纳米结构表面对水的接触角(149°±2°)比光滑表面(101°±1°)和纳米孔洞结构表面(141°±2°)都高.     

铝合金表面原位自组装超疏水膜层的制备及耐蚀性能

采用阳极氧化法在铝合金表面原位构造粗糙结构, 经表面自组装硅氧烷后得到超疏水自清洁表面, 与水滴的接触角最大可达157.5°±2.0°, 接触角滞后小于3°. 通过傅立叶变换红外(FT-IR)光谱分析仪、场发射扫描电子显微镜(FE-SEM)、能谱仪(EDS)、原子力显微镜(AFM)和接触角测试对阳极氧化电流密度、硅氧烷溶液中水的含量和自组装时间等参数进行了分析, 并得到制备超疏水自清洁表面的最优工艺参数. FE-SEM及AFM的测试结果表明, 由自组装硅氧烷膜层的无序性形成的纳米结构和阳极氧化构造的微米级粗糙结构与硅氧烷膜层的低表面能的协同作用构成了稳定的超疏水表面. 电化学测试(动电位极化)的结果表明, 原位自组装超疏水膜层极大地提高了铝合金的耐蚀性.     

氟硅烷自组装单分子膜的制备及其摩擦学性能

利用分子自组装技术制备了全氟辛酰胺丙基硅烷单分子膜,用X射线光电子能谱(XPS)对组装膜的表面元素进行了表征;接触角测试表明,该组装膜具有很好的疏水疏油性,其对水的接触角高达105°,对正十六烷的接触角为50°.摩擦磨损实验结果表明,全氟辛酰胺丙基硅烷自组装单分子膜可以大大降低基片的摩擦系数,使载玻片的摩擦系数从0.85左右降低到0.14左右,而且低负荷下具有很好的耐磨性.     

氟硅烷自组装单分子膜的制备及其摩擦学性能

利用分子自组装技术制备了全氟辛酰胺丙基硅烷单分子膜,用X射线光电子能谱(XPS)对组装膜的表面元素进行了表征;接触角测试表明,该组装膜具有很好的疏水-疏油性,其对水的接触角高达105°,对正十六烷的接触角为50°.摩擦磨损实验结果表明,全氟辛酰胺丙基硅烷自组装单分子膜可以大大降低基片的摩擦系数,使载玻片的摩擦系数从0.85左右降低到0.14左右,而且低负荷下具有很好的耐磨性.     

溶剂散逸自组装制备超疏水针垫阵列膜

利用溶剂散逸自组装方法,以聚苯乙烯、聚十二烷基丙烯酰胺-6-丙烯酰胺基己酸（CAP）和三氯甲烷为原料,在平滑的固体基质上制备了有序多孔膜,该膜上下表面可在外力作用下发生分离,得到具有微米级超疏水针垫阵列膜。 结果表明,制得的聚苯乙烯膜具备超疏水性质,与水接触角达158°。     

OTS自组装单分子膜在玻璃表面形成程的AFM研究

运用原子力显微镜研究了十八烷基三氯硅烷在玻璃表面自组装形成单分子膜的过程.通过对样品表面的显微图像、表面平均粗糙度及前进接触角的测量分析,揭示了自组装单分子膜在玻璃表面的生长规律,并探索反应初期玻璃表面的吸附特点.     

三氯锗丙酸及其衍生物自组装单分子膜的制备与表征

首次制备了三氯锗丙酸及其酯类衍生物(Cl₃GeCH₂CH₂COOC_nH_2n+1,n=0,2,4,6)在羟基化的单晶硅片上的自组装单分子膜,并利用接触角测量、椭圆偏振和光电子能谱法进行结构表征.结果表明,这类分子的自组装行为与三氯硅烷相似,组装后在基底表面形成准二维锗烷网状排布;分子链轴有一定倾斜角;膜表面润湿性随表征液体和三氯锗丙酸尾链取代基不同而不同.     

硅烷表面修饰引发的ZnO微米棒膜的超疏水性

采用简单的低温水热法制备出ZnO微米棒薄膜,其经辛基三甲氧基硅烷和十二氟庚基丙基三甲氧基硅烷修饰后显示出超疏水性,静态接触角分别为(150±1.3)°和(155±1.5)°,滚动角依次为5°和3°。 ZnO微米棒的微结构和低表面能材料辛基三甲氧基硅烷、十二氟庚基丙基三甲氧基硅烷的表面修饰是其显示超疏水性的原因,用Cassie理论对膜的润湿性进行了分析。     

应用纳米球刻蚀法在自组装膜修饰的硅表面生成中尺度的网状蛋白层（英文）

在自组装膜修饰的硅表面制备有序的蛋白阵列是研发生物传感器的先决条件之一,因此如何产生有序的表面蛋白阵列一直是生物医药研究方向的前沿。本研究通过应用纳米球刻蚀法在氧化的10-烯基十一烷基三氯硅烷自组装膜修饰的硅表面生成了网状结构溶菌酶蛋白层。网孔的大小(从纳米到微米级别)由表面沉积的纳米球的尺寸来调控。我们利用原子力显微镜和荧光显微镜对样品表面进行了详细表征。结果表明:这种新方法比传统的通过扫描探针在固体表面修饰而聚集溶菌酶蛋白的方法更快捷简便,而且它能够在相对大的硅表面形成网状蛋白层。此外,网孔表面附着具有强吸附活性的羧酸基团层,它可以通过静电吸引或者共价结合来吸附液相中的第二种蛋白分子。     

In situ determination of the thermodynamic surface properties of chemically modified surfaces on a local scale: an attempt with the atomic force microscope

We have monitored deflection-distance curves with an atomic force microscope (AFM) in contact mode, with a silicon nitride tip, on chemically modified silicon wafers, in the air. The wafers were modified on their surface by grafting self-assembled monolayers (SAMs) of different functional groups such as methyl, ester, amine, or methyl fluoride. A chemically modified surface with a functionalized hydroxyl group was also considered. Qualitative analysis allowed us to compare adhesive forces versus chemical features and surface energy. The systematic calibration procedure of the AFM measurements was performed to produce quantitative data. Our results show that the experimentally determined adhesive force or thermodynamic work of adhesion increases linearly with the total surface energy determined with contact angles measured with different liquids. The influence of capillary condensation of atmospheric water vapor at the tip-sample interface on the measured forces is discussed. Quantitative assessment values were used to determine in situ the SAM-tip thermodynamic work of adhesion on a local scale, which have been found to be in good agreement with quoted values. Finally, the determination of the surface energy of the silicon wafer deduced from the thermodynamic work of adhesion is also proposed and compared with the theoretical value.     

Fabrication, surface properties, and origin of superoleophobicity for a model textured surface

Inspired by the superhydrophobic effect displayed in nature, we set out to mimic the interplay between the chemistry and physics in the lotus leaf to see if the same design principle can be applied to control wetting and adhesion between toners and inks on various printing surfaces. Since toners and inks are organic materials, superoleophobicity has become our design target. In this work, we report the design and fabrication of a model superoleophobic surface on silicon wafer. The model surface was created by photolithography, consisting of texture made of arrays of ～3 μm diameter pillars, ～7 μm in height with a center-to-center spacing of 6 μm. The surface was then made oleophobic with a fluorosilane coating, FOTS, synthesized by the molecular vapor deposition technique with tridecafluoro-1,1,2,2-tetrahydrooctyltrichlorosilane. Contact angle measurement shows that the surface exhibits super repellency toward water and oil (hexadecane) with a water and hexadecane contact angles at 156° and 158°, respectively. Since the sliding angles for both liquids are also very small (～10°), we conclude that the model surface is both superhydrophobic and superoleophobic. By comparing with the contact angle data of the bare silicon surfaces (both smooth and textured), we also conclude that the superoleophobicity is a result of both surface texturing and fluorination. Results from investigations of the effects of surface modification and pillar geometry indicate that both surface oleophobicity and pillar geometry are contributors to the superoleophobicity. More specifically, we found that superoleophobicity can only be attained on our model textured surface when the flat surface coating has a relatively high oleophobicity (i.e., with a hexadecane contact angle of >73°). SEM examination of the pillars with higher magnification reveals that the side wall in each pillar is not smooth; rather it consists of a ～300 nm wavy structure (due to the Bosch etching process) from top to bottom. Comparable textured surfaces with (a) smooth straight side wall pillars and (b) straight side wall pillars with a 500 nm re-entrant structure made of SiO(2) were fabricated and the surfaces were made oleophobic with FOTS analogously. Contact angle data indicate that only the textured surfaces with the re-entrant pillar structure are both superoleophobic and superhydrophobic. The result suggests that the wavy structure at the top of each pillar is the main geometrical contributor to the superoleophobic property observed in the model surface.     

Eccentricity effect of micropatterned surface on contact angle

This article experimentally shows that the wetting property of a micropatterned surface is a function of the center-to-center offset distance between successive pillars in a column, referred to here as eccentricity. Studies were conducted on square micropatterns which were fabricated on a silicon wafer with pillar eccentricity ranging from 0 to 6 μm for two different pillar diameters and spacing. Measurement results of the static as well as the dynamic contact angles on these surfaces revealed that the contact angle decreases with increasing eccentricity and increasing relative spacing between the pillars. Furthermore, quantification of the contact angle hysteresis (CAH) shows that, for the case of lower pillar spacing, CAH could increase up to 41%, whereas for the case of higher pillar spacing, this increment was up to 35%, both corresponding to the maximum eccentricity of 6 μm. In general, the maximum obtainable hydrophobicity corresponds to micropillars with zero eccentricity. As the pillar relative spacing decreases, the effect of eccentricity on hydrophobicity becomes more pronounced. The dependence of the wettability conditions of the micropatterned surface on the pillar eccentricity is attributed to the contact line deformation resulting from the changed orientation of the pillars. This finding provides additional insights in design and fabrication of efficient micropatterned surfaces with controlled wetting properties.     

Contact angle hysteresis on regular pillar-like hydrophobic surfaces

A series of pillar-like patterned silicon wafers with different pillar sizes and spacing are fabricated by photolithography and further modified by a self-assembled fluorosilanated monolayer. The dynamic contact angles of water on these surfaces are carefully measured and found to be consistent with the theoretical predictions of the Cassie model and the Wenzel model. When a water drop is at the Wenzel state, its contact angle hysteresis increases along with an increase in the surface roughness. While the surface roughness is further raised beyond its transition roughness (from the Wenzel state to the Cassie state), the contact angle hysteresis (or receding contact angle) discontinuously drops (or jumps) to a lower (or higher) value. When a water drop is at the Cassie state, its contact angle hysteresis strongly depends on the solid fraction and has nothing to do with the surface roughness. Even for a superhydrophobic surface, the contact angle hysteresis may still exhibit a value as high as 41 degrees for the solid fraction of 0.563.     

Reversible wettability of optothermal responsively perfluoroalkyl azobenzene self-assembled monolayers

In this study, two perfluoroalkyl azobenzene trichlorosilanes were synthesized and then characterized by Fourier transform infrared spectroscopy (FT-IR), ¹H NMR, and ¹⁹F NMR. Subsequently, these fluorine containing trichlorosilanes were applied to form self-assembled monolayers (SAMs) on silicon substrates by the method of chemical deposition in liquid phase. The optothermal responsively isomerization of the azobenzene was achieved via UV irradiation and heat treatment. The surface structures of the SAMs were investigated by X-ray photoelectron spectroscopy (XPS), energy dispersive X-ray spectroscopy (EDS), and atomic force microscopy (AFM). The results showed that the thermal migration of the terminal fluoroalkyl groups promoted the isomerization of the azo-groups. Moreover, the reversible contact angles of the SAMs demonstrated a good reversibility of surface wettability, which was consistent with the optothermal responsive isomerization of the azo-groups.     

Water microdroplets on molecularly tailored surfaces: correlation between wetting hysteresis and evaporation mode switching

The evaporation of water microdroplets from solid surfaces was studied using digital contact angle analysis techniques. An inclusive trend for the evaporation process, that is, a switch from the initial constant contact area to the subsequent constant contact angle mode was observed for all surfaces examined, including mixed self-assembled monolayers (SAMs) on gold and "conventional" surfaces such as silicon wafers, polycarbonate, and Teflon. More importantly, it has been shown that the change in contact angle during the evaporation process (i.e., evaporation hysteresis, delta theta(evap), the difference between the initial and "equilibrated" contact angle) correlates well with the wetting hysteresis determined directly (i.e., measuring the advancing and receding contact angles on these surfaces by changing the drop volume). The comparison between mixed SAM surfaces and conventional solids revealed that the evaporation/wetting hysteresis is dominated by the roughness (from nanometer to micrometer scale) rather than the chemical heterogeneity of the surface. The evaporation rates of water microdroplets on these surfaces were also monitored and modeled.     

Area-selective formation of macropore array by anisotropic electrochemical etching on an n-Si(100) surface in aqueous HF solution

A photoassisted anodization process to fabricate arrays of uniform and straight macropores at selected areas of a Si wafer surface was developed. The front- and backside surfaces of n-type Si(100) wafers were coated with a thin Si(3)N(4) layer, and the frontside layer was micro-patterned using photolithography and reactive ion etching to form an array of microscopic openings at selected areas. The inverted pyramid-shape micropits were formed at these openings by anisotropic etching using aqueous KOH solution; these pits act as the initiation sites for the anodization to form macropores. The electrochemical etching was carried out in aqueous HF solution under illumination from the backside of the wafer, on which Au/Cr electric contact was formed following removal of the Si(3)N(4) layer. To improve the uniformity of the formation condition of the macropores at the selected area, holes were area-selectively generated by controlling the illumination condition during the anodization. For this, micropatterns were formed on the Au/Cr layer at the backside surface, which were aligned to those at the frontside surface. The parameters, such as HF concentration, current density, and wafer thickness, i.e., hole diffusion length, were optimized, and the arrays of uniform and high-aspect-ratio macropores were formed at the selected area of the domain at the silicon surface.     

Dip-coating crystallization on a superhydrophobic surface: a million mounted crystals in a 1 cm2 array

Silicon wafers (silicon dioxide surfaces) were patterned by photolithograpy to contain 3 μm (width) × 6 μm (length) × 40 μm (height) staggered rhombus posts in a square array (20 μm center-to-center spacing). These surfaces were hydrophobized using a vapor phase reaction with tridecafluorooctyldimethylchlorosilane and exhibit "superhydrophobicity" (water contact angles of θ(A)/θ(R) = 169°/156°). When a section of a wafer is submerged in and withdrawn from water, the superhydrophobic surface emerges, apparently completely dry. If the same procedure is performed using aqueous sodium chloride as the liquid bath, individual crystals of the salt can be observed on the top of each of the posts. "Dip-coating crystallization" using an aqueous sodium chloride solution of 4.3 M produces crystals with ～1 μm dimensions. A less concentrated solution, 1 M NaCl, renders crystals with ～500 nm dimensions. These experiments suggest that superhydrophobic surfaces that emerge from water and are "apparently completely dry" are, in fact, decorated with micrometer-size (several femtoliters) sessile water drops that rapidly evaporate. This simple technique is useful for preparation of very small liquid drops or puddles (of controlled composition) and for preparation of arrays of controlled size, crystalline substances (dip-coating crystallization).     

Template-assisted patterning of nanoscale self-assembled monolayer arrays on surfaces

We report a general, simple, and inexpensive approach to pattern features of self-assembled monolayers (SAMs) on silicon and gold surfaces using porous anodic alumina films as templates. The SAM patterns, with feature sizes down to 30 nm and densities higher than 10(10)/cm(2), can be prepared over large areas (>5 cm(2)). The feature dimensions can be tuned by controlling the alumina template structure. These SAM patterns have been successfully used as resists for fabricating gold and silicon nanoparticle arrays on substrates by wet-chemical etching. In addition, we show that arrays of gold features can be patterned with 10-nm gaps between the dots.     

Formation of aromatic siloxane self-assembled monolayers

We describe reproducible protocols for the chemisorption of self-assembled monolayers (SAMs), useful as imaging layers for nanolithography applications, from p-chloromethylphenyltrichlorosilane (CMPS) and 1-(dimethylchlorosilyl)-2-(p,m-chloromethylphenyl)ethane on native oxide Si wafers. Film chemisorption was monitored and characterized using water contact angle, X-ray photoelectron spectroscopy, and ellipsometry measurements. Atomic force microscopy was used to monitor the onset of multilayer deposition for CMPS films, ultimately allowing film macroscopic properties to be correlated with their surface coverage and nanoscale morphologies. Although our results indicate the deposition of moderate coverage, disordered SAMs under our conditions, their quality is sufficient for the fabrication of sub-100-nm-resolution metal features. The significance of our observations on the design of future imaging layers capable of molecular scale resolution in nanolithography applications is briefly discussed.