Further comparisons between the conventional and the modified Schwarzschild objectives

The performance of the modified Schwarzschild objective configuration in comparison with the ordinary configuration is further investigated, completing the analysis presented in a previous work, which was concerned with the trend of the image-plane resolution against the numerical aperture. Here, we compare the third-order aberration coefficients in both configurations, illustrating the dependence of each coefficient on both the on-axis object position and the numerical aperture. This conveys the tolerances of the two configurations to lateral and mirrors’ axial misalignments. Also, the nonconcentric mirror configuration is considered and the relative performance confronted with that of the modified configuration. PACS 42.15.Eq; 42.82.Cr     

Imaging interferometric lithography: approaching the resolution limits of optics

The resolution limits of conventional optical lithography reflect the low-pass spatial-frequency [numerical aperture (NA) /lambda] filter characteristics of the imaging system. Imaging interferometric lithography extends the resolution of optical lithography to the spatial-frequency limits of optics (2/lambda) . Off-axis illumination downshifts the high-frequency components of the mask pattern. An interferometric beam at the wafer upshifts these frequency components back to their original spatial frequencies following the lens. 2x reduction imaging interferometric lithography experiments demonstrate a continuous frequency coverage up to ~3N.A./lambda with a consequent threefold resolution enhancement.     

光学稀疏孔径系统的成像及其评价方法

对典型阵列结构的光学稀疏孔径系统成像特性进行了数值仿真分析,并采用基于光学实验测量的调制传递函数（MTF）完成了光学稀疏孔径系统成像实验的图像复原处理.针对复杂目标成像,为了评价光学稀疏孔径系统最终成像的整体质量,不仅考虑系统的调制传递函数指标,还提出了一种基于相关系数的成像质量客观评价方法.数值仿真结果和光学实验结果均表明,基于相关系数的成像质量客观评价方法是可行的,实验说明光学稀疏孔径系统成像质量可以达到其等效单个大孔径成像系统的成像效果.     

等离子体诊断用Schwarzschild显微镜的光学设计

 基于三级像差理论设计了用于激光等离子体诊断的极紫外Schwarzschild显微镜光学系统。显微镜的工作波长为18.2 nm,数值孔径为0.1,放大倍数为10。光学设计得到中心视场空间分辨力达0.3 μm,±1 mm视场内分辨力约0.4 μm的结果。分析了Schwarzschild成像系统的物镜装配、系统装调及光学元件加工误差对像质的影响,结果显示光学元件局部面形误差是影响系统成像分辨力的主要因素。通过提高系统装调的精度,可以有效补偿像距误差、两镜间距误差及曲率半径误差对像质的影响。综合考虑实际加工和装调能力,制定了系统整体公差方案,考虑公差后光学系统能够在±1 mm视场内获得3 μm的空间分辨力,达到了等离子体诊断的要求。     

极紫外投影光刻原理装置的集成研究

论述了光刻技术发展的历程，趋势和极紫外投影光刻技术的特性，并介绍了极紫外投影光刻原理装置的研制工作，该装置由激光等离子体光源,掠入射椭球聚光镜，透射掩模，施瓦茨微缩投影物镜及相应的真空系统组成，其工作波长为13nm，在直径为0．1mm的像方视场内设计分辨率优于0．1um。     

超高数值孔径Schwarzschild投影光刻物镜的光学设计

针对45nm及以下节点光刻相关技术的研究需求,确定了实验型投影光刻物镜的结构型式及设计指标。依据像差理论在非同心小遮拦的Schwarzschild反射系统中添加折射补偿镜组来进一步减小系统的中心遮拦,扩大像方数值孔径。设计了一套小中心遮拦,数值孔径为1.20的Schwarzschild折反式投影光刻物镜。设计结果表明,该投影光刻物镜工作带宽为100pm,像方视场为50μm,线中心遮拦比为13%,光学分辨力为80nm时(6240lp/mm)的系统调制传递函数大于0.45,全视场最大畸变为6.5nm,满足了45nm深紫外(DUV)浸没光刻实验平台对投影光刻物镜的需求。     

Comprehensive modelling and optical analysis of single-lens telescopes

Classical refractors require at least two lenses, an objective and an eyepiece, to achieve image magnification and focusing. In this study, a minimalistic telescope design consisting of a single lens and a small aperture (the single-lens telescope) is examined. The design exploits the angular limiting properties of the aperture to achieve approximate image focusing, at the expense of image brightness. An analytical geometrical optics model is first presented to explore the fundamental optical properties of such a system, alongside a numerical ray-tracing framework; a more general Fourier optics theory unifying both diffractive and geometrical regimes is also developed. Extensive experimental validation of theoretical results across angular magnification, angular resolution, and image intensity profiles is demonstrated, and optimum aperture sizes for varying magnifications and irradiance wavelength are derived. The mechanical simplicity of such telescopes indicates good applicability as a simple and low-cost instrument for beginner astronomy or ad-hoc fieldwork.     

Synthetic aperture microscopy using off-axis illumination and polarization coding

A new method to improve the resolution of optical imaging systems beyond the classical Rayleigh resolution limit is presented. The technique relies on synthetic aperture generation in three stages. The first one (encoding stage) uses an illumination procedure that combines both on-axis and off-axis illumination beams with different polarization states onto the object. After the imaging system, a second stage (decoding stage) allows the recovering of the encoded spatial-frequency object information by means of an interferometric configuration based on the polarization coding carried out in the previous stage. Finally, a third stage (digital post-processing stage) is used to generate a synthetic aperture that is three times larger than the conventional aperture of the imaging system. The whole process allows us to obtain a superresolved image of the object. Experimental implementation of the approach for a commercial microscope objective is presented.     

Extended resolution wide-field optical imaging: objective-launched standing-wave total internal reflection fluorescence microscopy

Standing-wave total-internal-reflection fluorescence (SW-TIRF) microscopy uses a super-diffraction-limited standing evanescent wave to extract the high-spatial-frequency content of an object through a diffraction-limited optical imaging system. The effective point-spread function is better than a quarter of the emission wavelength. With a 1.45 numerical aperture objective and 532 nm excitation wavelength, a Rayleigh resolution of approximately 100 nm can be achieved, which is better than twice the resolution of conventional TIRF microscopy. This first experimental realization of SW-TIRF in an objective-launched geometry demonstrates the potential for extended resolution imaging at high speed by using wide-field microscopy.     

i线投影光刻曝光系统的光学设计

叙述具有同轴对准特性的光学投影物镜双远心结构和均匀照明光学系统原理。为了满足ｉ线光刻所需的光学传递函数要求，讨论了光刻分辨率和数值孔径的关系。设计了一种新的双远心投影物镜，其数值孔径ＮＡ＝０．４２，放大倍率Ｍ＝－１／５，像场尺寸１５ｍｍ×１５ｍｍ（直径２１·２ｍｍ），共轭距Ｌ＝６０２ｍｍ。用光学设计程序ＺＥＭＡＸ－ＸＥ计算此ｉ线物镜的像质。设计结果说明，整个视场内波差＜λ／４，ＭＴＦ＞０．５５，当空间频率为７１５ｐａｉｒｌｉｎｅｓ／ｍｍ，使用波长为３６５士３ｎｍ时。可以实现０．７μｍ光刻分辨率；照明均匀器，由８１个小方型透镜组成一方列阵。用本文模拟计算软件ＯＰＥＮＧ计算被照像平面上的光能分布，说明实际系统的照明不均匀性为土２％。     

数字灰度光刻成像物镜设计

为了研究数字灰度光刻成像系统中栅格效应对像质的影响.在成像系统优化参量已有的研究基础上,综合考虑工作效率、光刻准确度、加工制造成本等因素,设计了一种能够有效消除数字灰度光刻成像栅格效应的光刻物镜.此光刻物镜技术指标为,数值孔径NA＝0.3,工作波长λ＝442 nm,倍率10×,分辨率R≤1.2 μm,焦深4 μm,且镜片数量少,光学加工、光学校装公差要求低.结果表明,该镜头完全满足数字灰度光刻高质量成像的需要.     

反射式光纤共焦扫描成像的研究

建立了反射式光纤共焦扫描成像系统,分析了光纤－集光透镜参数Ａ及物透镜有效数值孔径等对系统成像分辨率的影响。并在此基础上选择了合适参数的透镜,获得了优化的反射式光纤共焦扫描成像系统,测试结果表明,该系统具有亚微米级横向成像能力,微米级向层析能力,成像稳定性那,它将应用于材料及生物组织三维成像检测中。     

光学综合孔径望远镜成像分析及计算机仿真

阐述了光学综合孔径(OSA)望远镜成像原理以及综合孔径望远镜的几种实现形式；采用快速傅里叶变换(FFT)算法得到了任意子孔径综合模式下的点扩展函数(PSF)和光学传递函数(OTF)分布；从子孔径结构排列、共相位、图像恢复几个方面论述了光学综合孔径的成像特征。初步分析了稀疏率、填充因子、“实际截止频率”等因素对光学综合孔径望远镜成像的影响。分析和仿真结果表明：光学综合孔径通过相干成像不但可以突破传统单孔径系统的口径局限获得极高的成像分辨率，而且对于实现空间光学遥感系统轻量化和模块化都具有重要意义。     

A method for uniform demagnification imaging beyond the diffraction limit: cascaded planar hyperlens

Metamaterial composed of multistacked metal and dielectric films provides the access to ray tracing in subwavelength regions and to form a variety of transformation optical devices for manipulating light beyond the diffraction limit, such as hyperlens and cloak. In this paper, this method is employed to design planar hyperlens for demagnification imaging lithography. Variant ray route configurations are considered and compared for the sake of imaging quality as well as device structure complexity. It is found that specifically designed trajectory route from the object plane to the image plane help to yield imaging devices with uniform demagnification ratio and improved image quality. Then multiple similar imaging devices could be cascaded for further demagnification and reduce of structure complexity from the viewpoint of application. The imaging results with about 1/23 wavelength (16 nm) half-pitch resolution in the measure of electric field intensity are demonstrated with numerical simulations. Also presented are the imaging characteristic analyses including light intensity, demagnification ratio and resolution.     

改进型高分辨率宽波段Schwarzschild成像光谱仪研究

针对Schwarzschild结构在成像光谱仪系统中的应用进行了研究。以Schwarzschild结构的像散分析为基础,获得了该结构的完善消像差条件;之后,对该结构进行了改进,由准直镜和凸面镜,以及凸面镜和聚焦镜分别组成了两个消像散的Schwarzschild结构,从而构成了Schwarzschild成像光谱系统。并给出了这种系统的各个光学参数的计算条件。以一工作波段为340~500 nm的紫外-可见成像光谱系统为例进行了设计,从而对设计理论进行了验证。根据优化理论计算了初始结构最优解并进行光线追迹模拟,成功设计了数值孔径0.125,全视场全波段调制传递函数值在奈奎斯特频率(20 lp·mm-1)下大于0.58的高分辨率成像光谱仪光学系统。这种结构的不同变形分别可以作为Czerny-Turner系统,Ebert-Fastie系统或者Offner系统应用,设计结果也表明这种改进的系统设计理论适用于小型宽波段高分辨率成像光谱仪。     

深紫外双层金属光栅偏振器的设计与分析

193 nm波长浸没式步进扫描投影光刻机是实现45 nm及以下技术节点集成电路制造的核心装备.增大数值孔径是提高光刻分辨率的有效途径,而大数值孔径曝光系统的偏振性能严重影响光刻成像质量.光刻机曝光系统偏振参数的高精度检测是对其进行有效调控的前提.基于光栅的偏振检测技术能实现浸没式光刻机偏振检测装置的小型化,满足其快速、高精度在线检测的需求,该技术中的关键部件是结构紧凑且偏振性能良好的光栅.本文基于反常偏振效应和双层金属光栅对TE偏振光的透射增强原理,采用严格耦合波理论和有限时域差分方法,设计了一种双层金属光栅偏振器.计算了该偏振器的初始结构参数,并通过数值仿真得到了其偏振性能关于各光栅参数的变化关系.仿真结果表明,中间层高度是影响TE偏振光透射增强的主要因素;垂直入射时TE偏振光的透过率可达到56.8%,消光比高达65.6 dB.与现有同波段金属光栅偏振器相比,所设计的光栅偏振器在保证高透过率的同时,消光比提升了四个数量级.     

用于数字光刻的非对称式投影物镜设计

针对DMD数字光刻,利用ZEMAX光学设计软件,设计出了一套适用于型号 0.7XGA DMD的10片式光刻投影物镜。该物镜采用非对称性结构,前组为改进的三分离物镜,后组为匹兹伐物镜加平像场镜,分辨率为2 m,近轴放大倍率为-0.15,像方数值孔径NA为0.158,全视场波像差小于/20 ,畸变小于0.014%,焦深为20 m,通过各项评价可知系统已经达到了衍射极限。在对该镜头进行公差分析后,利用Monte Carlo方法,模拟组装加工了100组镜头,得到90%的镜头MTF＞0.46,50%的镜头MTF＞0.51,证明了这种非对称性结构加工和校装的可能性。     

Analysis of a moderate resolution Fourier transform imaging spectrometer

A moderate resolution Fourier transform imaging spectrometer based on a modified Michelson interferometer is presented. The moving part of the interferometer is a moving wedged prism (MWP) instead of a moving mirror. The principle of the interferometer is described and the optical path difference as a function of the displacement of the MWP is calculated. Theoretical calculation and analysis are presented for the two moveable directions (hypotenuse and right angle side) of the MWP. The modified Michelson interferometer is not so sensitive to the non-uniform variation of moving speed and the environmental vibrations compared with the conventional Michelson interferometer. It is compact and has a large numerical aperture. The interferometer facilitated by CCD camera and the accompanying digital hardware and software are becoming the imaging spectrometer with moderate resolution is applicable in ultraviolet-infrared region.     

太阳极紫外成像光谱仪光学系统设计

在极紫外波段对太阳进行超光谱成像观测是研究太阳上层大气,日冕中等离子物理特性的重要手段。依据太阳极紫外成像光谱仪的应用,结合国内外极紫外成像光谱仪发展现状,制定了太阳极紫外成像光谱仪的性能指标。通过比较各种光学结构的优缺点,选择望远镜与光谱仪组合的结构。讨论并选择了可用的基本元器件,望远系统采用离轴抛物面反射镜,分光器件为高密度超环面等间距光栅。设计出符合指标的光学系统。最后给出了太阳极紫外成像光谱仪的设计过程、详细参数与结果。光学系统的工作波段为17.0～21.0nm,视场是1 228″×1 024″,空间分辨率达到0.8arcsec.pixel-1,光谱分辨率约为0.001 98nm.pixel-1,系统总长度约为2.8m。     

一种紧凑型光纤显微物镜的设计

针对光纤通信网络建设及运维任务对光纤接续机器提出的便携小巧、精准可靠的需求,开发了一种结构紧凑、成像清晰的光纤物镜。基于光学理论和实际使用要求对物镜的基本光学参数进行了分析,利用Zemax软件设计出一种紧凑型高分辨率的光纤显微物镜,该物镜包含5片常用牌号玻璃球面透镜,放大倍率为6×,数值孔径0.24,共轭距离47.3 mm。系统具有良好的成像质量,0.7视场内在奈奎斯特频率60 lp/mm处MTF大于0.36,在频率90 lp/mm处MTF大于0.15。对设计结果进行了蒙特卡罗公差分析,良品率超90%,装调较宽松,成本低廉,可进行批量生产。另外,针对设计好的物镜进行成像过程仿真,结果显示待接纤芯特征清晰锐利,有利于机器对准接续。