InGaN/GaN多量子阱蓝色发光二极管的实验与模拟分析

分别采用量子阱模型和量子点模型对蓝色InGaN/GaN多量子阱发光二极管电学和光学特性进行模拟,并和实验测量结果进行了比对,结果发现,量子点模型的引入,很好地解决了I-V和电致发光二方面的实验与理论模型间符合程度不好的问题.同时,在I-V曲线特性模拟中发现,在量子点理论模型的基础上,只有考虑到载流子的非平衡量子传输效应,才能得到和实验相接近的I-V曲线,揭示着在InGaN/GaN 多量子阱发光二极管电输运特性中,载流子的非 关键词： InGaN/GaN 发光二极管 数值模拟 量子点模型     

Investigation of electron energy states in InGaN/GaN multiple quantum wells

Blue light emitting diodes (LED) consisting of InGaN/GaN multiple quantum wells (MQWs) have been grown by metal organic chemical vapor deposition (MOCVD) on sapphire. The width of the quantum wells (InGaN) was maintained in the range of 3–5 nm with a barrier of 10–15 nm of GaN. Various diagnostic techniques were employed for the characterization of the InGaN/GaN heterostructure. Carrier concentration depth profile from C–V measurements demonstrated the presence of MQWs. The higher value of built-in voltage (15 V) determined from C⁻²–V plot also supported the presence of MQWs as assumed to alter the space-charge region width and hence the intercept voltage. Arrhenius plots due to DLTS spectra from the device revealed at least four energy states (eV) 0.1, 0.12, 0.15 and 0.17, respectively in the quantum wells, with respect to the barrier. Further the photoluminescence spectrum showed an InGaN-based broad band centered at 2.9 eV and the GaN peak at 3.4 eV. A comparison of the PL spectrum with the literature helped to estimate the indium content in the QW (InGaN) and its width to be ∼13% and ∼3 nm, respectively. The results were consistent with the DLTS findings.     

InGaN/GaN多量子阱的组分确定和晶格常数计算

采用金属有机化学气相沉积(MOCVD)技术以蓝宝石为衬底在n型GaN单晶层上生长了InGaN/GaN多量子阱结构外延薄膜，利用高分辨X射线衍射(HRXRD)，卢瑟福背散射/沟道(RBS/channeling)，以及光致发光(PL)技术对InGaN/GaN多量子阱结构薄膜分别进行了平均晶格常数计算、In原子替位率计算和In组分的定量分析.研究表明：InGaN/GaN多量子阱的水平和垂直方向平均晶格常数分别为a_epi=0.3195nm，c_epi=0.5198nm，In原子的替位率为99.3%，利用HRXRD和RBS/channeling两种分析技术计算In的组分分别是0.023和0.026，并与样品生长时设定的预期目标相符合，验证了两种实验方法的准确性；而用室温条件下的光致发光谱(PL)来计算InGaN/GaN多量子阱中In的组分是与HRXRD和RBS/channeling的实验结果相差很大，说明用PL测试In组分的方法是不适宜的. 关键词： InGaN/GaN多量子阱 高分辨X射线衍射 卢瑟福背散射/沟道 光致发光     

垒掺In提高InGaN/GaN多量子阱发光特性

利用金属有机物化学气相淀积技术在蓝宝石衬底上生长InGaN/GaN多量子阱结构.对多量子阱垒层掺In和非掺In进行了比较研究，结果表明，垒掺In 的样品界面质量变差，但明显增加了光致发光谱的峰值强度和积分强度，带边峰与黄光峰强度之比增大，降低了表面粗糙度.利用这两种结构制备了相应的发光二极管(LED)样品.通过电荧光测量可知，垒掺In的LED比非掺In的LED有较高的发光强度和相对均匀的波长，这主要是由于垒掺In后降低了阱与垒之间晶格失配的应力，从而降低了极化电场，提高了辐射复合效率. 关键词： InGaN/GaN多量子阱 X射线双晶衍射 原子力显微镜 光致发光     

Advantages of InGaN/GaN multiple quantum well solar cells with stepped-thickness quantum wells

InGaN/GaN multiple quantum well (MQW) solar cells with stepped-thickness quantum wells (SQW) are designed and grown by metal-organic chemical vapor deposition. The stepped-thickness quantum wells structure, in which the well thickness becomes smaller and smaller along the growth direction, reveals better crystalline quality and better spectral overlap with the solar spectrum. Consequently, the short-circuit current density (Jsc) and conversion efficiency of the solar cell are enhanced by 27.12% and 56.41% compared with the conventional structure under illumination of AM1.5G (100 mW/cm2). In addition, approaches to further promote the performance of InGaN/GaN multiple quantum well solar cells are discussed and presented.     

Electro-optical characterization and analysis of CuPc-based solar cells with high photovoltage

Organic solar cells using the CuPc and PTCBI semiconductor layers were studied. A high open circuit voltage of 1.15 V was obtained in a device with ITO/PEDOT:PSS/CuPc (15 nm)/PTCBI (7 nm)/Al structure. Results were interpreted in terms of a modified CuPc-Al Schottky diode for the thin PTCBI case and a CuPc-PTCBI heterojunction for the thick PTCBI case. Also, the formation of a thin aluminum oxide layer under the aluminum electrode was postulated. This layer has a beneficial aspect wherein shunting losses are reduced and a high photovoltage is enabled. However, it adds greatly to the series resistance to a point where the short circuit current density is reduced. CuPc Schottky diodes with an ITO/PEDOT:PSS/CuPc/Al structure yielded a high V _oc of 900 mV for a CuPc layer of thickness 140 nm. The V _oc increased with increase in CuPc layer thickness.     

Contact passivation in silicon solar cells using atomic‐layer‐deposited aluminum oxide layers

Atomic‐layer‐deposited aluminum oxide (AlO_x) layers are implemented between the phosphorous‐diffused n⁺‐emitter and the Al contact of passivated emitter and rear silicon solar cells. The increase in open‐circuit voltage V_oc of 12 mV for solar cells with the Al/AlO_x/n⁺‐Si tunnel contact compared to contacts without AlO_x layer indicates contact passivation by the implemented AlO_x. For the optimal AlO_x layer thickness of 0.24 nm we achieve an independently confirmed energy conversion efficiency of 21.7% and a V_oc of 673 mV. For AlO_x thicknesses larger than 0.24 nm the tunnel probability decreases, resulting in a larger series resistance. (© 2011 WILEY‐VCH Verlag GmbH & Co. KGaA, Weinheim)     

Superstrate p-i-n a-Si:H solar cells on textured ZnO:Al front transparent conduction oxide

Superstrate p-i-n amorphous silicon thin-film (a-Si:H) solar cells are prepared on SnO₂:F and ZnO:Al transparent conducting oxides (TCOs) in order to see the effect of TCO/p-layers on a-Si:H solar cell operation. The solar cells prepared on textured ZnO:Al have higher open circuit voltage V_oc than cells prepared on SnO₂:F. The presence of a thin microcrystalline p-type silicon layer (μc-Si:H) between ZnO:Al and p a-SiC:H plays a major role by causing an improvement in the fill factor as well as in V_oc of a-Si:H solar cells prepared on ZnO:Al TCO. Without any treatment of the p-i interface, we could obtain a high V_oc of 994 mV while keeping the fill factor (72.7%) and short circuit current density J_sc at the same level as for the cells on SnO₂:F TCO. This high V_oc value can be attributed to modification in the current transport in this region due to creation of a potential barrier.     

Growth and characterization of InGaN nanodots hybrid with InGaN/GaN quantum wells

Uniform InGaN nanodots were successfully grown on SiO₂ pretreated GaN surface. It was found that the InGaN nanodots were 20?nm in diameter and 5?nm in height, approximately. After the growth of two periods of InGaN/GaN quantum wells on the surface of InGaN nanodots, nanodot structure still formed in the InGaN well layer caused by the enhanced phase separation phenomenon. Dual-color emissions with different behavior were observed from photoluminescence (PL) spectrum of InGaN nanodots hybrid with InGaN/GaN quantum wells. A significant blueshift and a linewidth broadening were measured for the low-energy peak as the increase of PL excitation power, while a slight blueshift and a linewidth narrowing occurred for the high-energy peak. Accordingly, these two peaks were assigned to be from the In-rich nanodots and quantized state transition from the InGaN/GaN quantum wells with indium content, respectively.     

The p recombination layer in tunnel junctions for micromorph tandem solar cells

A new tunnel recombination junction is fabricated for n–i–p type micromorph tandem solar cells. We insert a thin heavily doped hydrogenated amorphous silicon (a-Si:H) p + recombination layer between the n a-Si:H and the p hydrogenated nanocrystalline silicon (nc-Si:H) layers to improve the performance of the n–i–p tandem solar cells. The effects of the boron doping gas ratio and the deposition time of the p-a-Si:H recombination layer on the tunnel recombination junctions have been investigated. The current-voltage characteristic of the tunnel recombination junction shows a nearly ohmic characteristic, and the resistance of the tunnel recombination junction can be as low as 1.5 ·cm 2 by using the optimized p-a-Si:H recombination layer. We obtain tandem solar cells with open circuit voltage V oc = 1.4 V, which is nearly the sum of the V oc s of the two corresponding single cells, indicating no V oc losses at the tunnel recombination junction.     

Effects of electrode film modifications on the open-circuit photovoltage in enhanced dye-sensitized solar cells

In this study, the open-circuit photovoltage (V _oc) decay technique was used to investigate the relationship between the electrode film morphology and the open-circuit photovoltage. Results indicate that dye-sensitized solar cells (DSCs) based on ordered arrays of TiO₂ nanostructures (100 nm external diameters and 20–50 nm internal diameters) generally show higher open-circuit photovoltage (V _oc) values than those based on sintered TiO₂ nanoparticles (20–40 nm diameters). In particular, cells based on thick nanotubules (wall thickness ≥ 45 nm in our research) and on nanorods (100 nm diameters) show particularly high V _oc values, indicating slow recombination kinetics under open-circuit conditions. It can be argued that the nanorods and the thick nanotubules act like singles crystals and therefore the injected electrons in the inner TiO₂ molecules are shielded from holes in the electrolyte under open-circuit conditions. The open-circuit recombination time constant of electrons accumulated in the TiO₂ conduction band is therefore prolonged and resulting in high V _oc values.     

Effect of III‐nitride polarization on VOC in p–i–n and MQW solar cells

We performed detailed studies of the effect of polarization on III‐nitride solar cells. Spontaneous and piezoelectric polarizations were assessed to determine their impacts upon the open circuit voltages (V_OC) in p–i(InGaN)–n and multi‐quantum well (MQW) solar cells. We found that the spontaneous polarization in Ga‐polar p–i–n solar cells strongly modifies energy band structures and corresponding electric fields in a way that degrades V_OC compared to non‐polar p–i–n structures. In contrast, we found that piezoelectric polarization in Ga‐polar MQW structures does not have a large influence on V_OC compared to non‐polar MQW structures. (© 2011 WILEY‐VCH Verlag GmbH & Co. KGaA, Weinheim)     

Overcoming the thickness paradox: Systematical optimization of inverted polymer solar cells

Inverted structure comes out to be a promising alternative for making polymer solar cells (PSC) with high efficiency and long-term stability. Vertically stacked functional layers with planar shapes often suffer contradictions in holding high optical absorption and excellent charge transfer/hindrance capability to construct well performed inverted PSC devices. Here, we give an example of rational control of the thickness of electron transport layer (ETL), hole transport layer (HTL) and organic active layer (OAL) to achieve a synergistic effect on promoting the overall photovoltaic behaviors. With in-depth exploration of the interaction between device performance and layer thickness, we obtain the optimized device ITO/ZnO Ncs (45 nm)/P3HT:PCBM (70 nm)/MoO₃ (1 nm)/Ag (70 nm) exhibiting an V_oc of 0.63 V, J_sc of 12.52 mA/cm², FF of 54% and PCE of 4.26%.     

Nanocluster n-CdO thin film by sol-gel for solar cell applications

The nanocluster-CdO film was successfully synthesized by sol-gel method using cadmium acetate and 2-metoxyethanol as starting materials and monoethanolamine as a stabilizer. The structural properties of the CdO film were investigated by atomic force microscopy (AFM). AFM results indicate that the CdO film is consisted of nanoclusters with grain size of 75-85 nm. The optical band gap E_g of nanocluster-CdO film was found to be 2.27 eV. The heterostructure, formed from two semiconductor layers having different optical band gaps, p-Si/n-CdO is prepared as a solar cell device. The electrical properties of the device were characterized by current-voltage and capacitance-conductance-voltage methods. The photovoltaic properties of p-Si/n-CdO device have been investigated. The p-Si/n-CdO heterojunction solar cell shows the best values of V_oc = 0.41 and J_sc = 2.19 mA/cm² under AM1.5 illumination. It is evaluated that this work is useful as a basis for the search of nanomaterial CdO and more competitive p-Si/n-CdO based solar cells, despite the fact that V_oc and J_sc are lower than those reported in the literature.     

Dry etching characteristics of GaN for blue/green light-emitting diode fabrication

The etch rates, surface morphology and sidewall profiles of features formed in GaN/InGaN/AlGaN multiple quantum well light-emitting diodes by Cl₂-based dry etching are reported. The chlorine provides an enhancement in etch rate of over a factor of 40 relative to the physical etching provided by Ar and the etching is reactant-limited until chlorine gas flow rates of at least 50 standard cubic centimeters per minute. Mesa sidewall profile angle control is possible using a combination of Cl₂/Ar plasma chemistry and SiO₂ mask. N-face GaN is found to etch faster than Ga-face surfaces under the same conditions. Patterning of the sapphire substrate for improved light extraction is also possible using the same plasma chemistry.     

聚对苯乙炔MOPPV/ZnSe量子点复合材料太阳电池性能研究

基于量子点材料的特殊物理性能和量子点聚合物复合材料高的光电转换性能, 本文在MOPPV溶液中制备了粒度可控、 结晶性好、颗粒尺寸约为3.75 nm的ZnSe量子点材料, 最终获得不同质量比的MOPPV/ZnSe复合材料. 分别使用X射线衍射、透射电子显微镜、紫外可见吸收光谱等研究其特性结果表明MOPPV与ZnSe量子点可以有效地复合且发生光诱导电荷转移; 通过对MOPPV、ZnSe和MOPPV/ZnSe复合材料太阳电池性能的研究发现, 与MOPPV和ZnSe单体相比复合材料光伏特性呈现增加的趋势, 并且复合材料光电性能随着ZnSe量子点材料质量浓度的增加呈现先增大后减小的现象, 当MOPPV和ZnSe的质量比为1:1时, 其转换效率最大, 开路电压为0.516 V, 短路电流为2.018 mA, 填充因子为25.53%, 转换效率为0.167%. 关键词： 量子点 复合材料 伏安特性     

Efficient interdigitated back‐contacted silicon heterojunction solar cells

We present back‐contacted amorphous/crystalline silicon heterojunction solar cells (IBC‐SHJ) on n‐type substrates with fill factors exceeding 78% and high current densities, the latter enabled by a SiN_x /SiO₂ passivated phosphorus‐diffused front surface field. V_oc calculations based on carrier lifetime data of reference samples indicate that for the IBC architecture and the given amorphous silicon layer qualities an emitter buffer layer is crucial to reach a high V_oc, as known for both‐side contacted silicon heterojunction solar cells. A back surface field buffer layer has a minor influence. We observe a boost in solar cell V_oc of 40 mV and a simultaneous fill factor reduction introducing the buffer layer. The aperture‐area efficiency increases from 19.8 ± 0.4% to 20.2 ± 0.4%. Both, efficiencies and fill factors constitute a significant improvement over previously reported values. (© 2011 WILEY‐VCH Verlag GmbH & Co. KGaA, Weinheim)     

Anomalous disorder-related phenomena in InGaN/GaN multiple quantum well heterosystems

The influences of InGaN/GaN multiple quantum well (MQW) heterostructures with InGaN/GaN and GaN barriers on carrier confinement were investigated. The degree of disordering over a broad range of temperatures from 20 to 300 K was considered. The optical and electrical properties were strongly influenced by structural and compositional disordering of the InGaN/GaN MQW heterostructures. To compare the degree of disordering we examined the temperature dependence of the luminescence spectra and electrical conductance contingent on the Berthelot-type mechanisms in the InGaN/GaN MQW heterostructures. We further considered carrier transport in the InGaN/GaN disordered systems, probability of carrier tunneling, and activation energy of the transport mechanism for devices with InGaN/GaN and GaN barriers. The optical properties of InGaN/GaN disordered heterosystems can be interpreted from the features of the absorption spectra. The anomalous temperature-dependent characteristics of the disordered InGaN/GaN MQW structures were attributable to the enhancement of the exciton confinement.     

Fabrication and optical properties of InGaN/GaN multiple quantum well light emitting diodes with amorphous BaTiO3 ferroelectric film

BaTiO3 （BTO） ferroelectric thin films are prepared by the sol,el method. The fabrication and the optical properties of an InGaN/GaN multiple quantum well light emitting diode （LED） with amorphous BTO ferroelectric thin film are studied. The photolumineseence （PL） of the BTO ferroelectric film is attributed to the structure. The ferroeleetric film which annealed at 673 K for 8 h has the better PL property. The peak width is about 30 nm from 580 nm to 610 nm, towards the yellow region. The mixed electroluminescence （EL） spectrum of InGaN/GaN multiple quantum well LED with 150-nm thick amorphous BTO ferroelectric thin film displays the blue-white light. The Commission Internationale De L＇Eclairage （CIE） coordinate of EL is （0.2139, 0.1627）. EL wavelength and intensity depends on the composition, microstructure and thickness of the ferroelectric thin film. The transmittance of amorphous BTO thin film is about 93% at a wavelength of 450 nm-470 nm. This means the amorphous ferroelectrie thin films can output more blue-ray and emission lights. In addition, the amorphous ferroelectric thin films can be directly fabricated without a binder and used at higher temperatures （200 ℃-400 ℃）. It is very favourable to simplify the preparation process and reduce the heat dissipation requirements of an LED. This provides a new way to study LEDs.     

Performance characteristics of deep violet InGaN DQW laser diodes with InGaN/GaN superlattice waveguide layers

The effect of the indium (In) composition of In_xGa_1−xN (GaN) waveguide layers on the performance of deep violet In_0.082Ga_0.918N/GaN double quantum well (DQW) laser diodes (LDs) emitting at 390 nm output emission wavelength has been numerically investigated. Simulation results indicated that by increasing In composition of the In_xGa_1−xN waveguide layers, the threshold current decreases, the slope efficiency, and differential quantum efficiency (DQE) increase, whereas the output power decreases. The increase in the In composition of the InGaN waveguide layers increases the refractive index and consequently increases the optical confinement factor (OCF) which result in the increase in the slope efficiency and DQE and the decrease in the threshold current. The decreasing movement of electron and hole carriers from the bulk waveguide layers to the active regions also causes to decrease the output power. A new LD structure with InGaN/GaN superlattice (SL) waveguide layers has been proposed to exploit the increased OCF of InGaN waveguide structures, and the enhanced electron and hole mobilities and the tunneling effect of the periodic structure of the SL structures. The results also showed that the use of InGaN/GaN SL waveguide structures effectively improves the output power, slope efficiency and DQE and decreases the threshold current of the LD compared with (In)GaN bulk waveguide structure.