Pulsed Nd:YAG laser depositions of ITO and DLC films for OLED applications

Indium-tin oxide (ITO) films deposited on heated and non-heated glass substrates by a pulsed Nd:YAG laser at 355 nm and ∼2.5 J/cm² were used in the fabrication of simple organic light-emitting diodes (OLEDs), ITO/(PVK + Alq₃ + TPD)/Al. The ITO was deposited on heated glass substrates which possessed resistivity as low as ∼3 × 10⁻⁴ Ω cm, optical transmission as high as ∼92% and carrier concentration of about ∼5 × 10²⁰ cm⁻³, were comparable to the commercial ITO. Substrate heating transformed the ITO microstructure from amorphous to polycrystalline, as revealed by the XRD spectrum. While the polycrystalline ITO produced higher OLED brightness, it was still lower than that on the commercial ITO due to surface roughness. A DLC layer of ∼1.5 nm deposited on this ITO at laser fluence of >12.5 J/cm² improved its device brightness by suppressing the surface roughness effect.     

Ni thin films vacuum-evaporated on polyethylene naphthalate substrates with and without the application of magnetic field

We study the structural properties of the surface roughness, the surface mound size and the interfacial structure in Ni thin films vacuum-deposited on polyethylene naphthalate (PEN) organic substrates with and without the application of magnetic field and discuss its feasibility of fabricating quantum cross (QC) devices. For Ni/PEN evaporated without the magnetic field, the surface roughness decreases from 1.3 nm to 0.69 nm and the surface mound size increases from 32 nm to 80 nm with the thickness increased to 41 nm. In contrast, for Ni/PEN evaporated in the magnetic field of 360 Oe, the surface roughness tends to slightly decrease from 1.3 nm to 1.1 nm and the surface mound size shows the almost constant value of 28-30 nm with the thickness increased to 35 nm. It can be also confirmed for each sample that there is no diffusion of Ni into the PEN layer, resulting in clear Ni/PEN interface and smooth Ni surface. Therefore, these experimental results indicate that Ni/PEN films can be expected as metal/insulator hybrid materials in QC devices, leading to novel high-density memory devices.     

ITO/Au/ITO multilayer thin films for transparent conducting electrode applications

Transparent and conducting ITO/Au/ITO multilayered films were deposited without intentional substrate heating on polycarbonate (PC) substrate using a magnetron sputtering process. The thickness of ITO, Au and ITO metal films in the multilayered structure was constant at 50, 10 and 40 nm, respectively.Although the substrate temperature was kept constant at 70 °C, ITO/Au/ITO films were polycrystalline with an (1 1 0) X-ray diffraction peak, while single ITO films were amorphous. Surface roughness analysis indicated ITO films had a higher average roughness of 1.76 nm, than the ITO/Au/ITO film roughness of 0.51 nm. The optoelectrical properties of the ITO/Au/ITO films were dependent on the Au thin film, which affected the ITO film crystallinity. ITO/Au/ITO films on PC substrates were developed with a resistivity as low as 5.6 × 10⁻⁵ Ω cm and a high optical transmittance of 71.7%.     

Blue organic light-emitting diodes with low driving voltage and maximum enhanced power efficiency based on buffer layer MoO3

Blue organic light-emitting devices based on wide bandgap host material, 2-(t-butyl)-9, 10-di-(2-naphthyl) anthracene (TBADN), blue fluorescent styrylamine dopant, p-bis(p-N,N-diphenyl-amino-styryl)benzene (DSA-Ph) have been realized by using molybdenum oxide (MoO₃) as a buffer layer and 4,7-diphenyl-1,10-phenanthroline (BPhen) as the ETL. The typical device structure used was glass substrate/ITO/MoO₃ (5 nm)/NPB (30 nm)/[TBADN: DSA-Ph (3 wt%)](35 nm)/BPhen (12 nm)/LiF (0.8 nm)/Al (100 nm). It was found that the MoO₃∥BPhen-based device shows the lowest driving voltage and highest power efficiency among the referenced devices. At the current density of 20 mA/cm², its driving voltage and power efficiency are 5.4 V and 4.7 Lm/W, respectively, which is independently reduced 46%, and improved 74% compared with those the m-MTDATA∥Alq₃ is based on, respectively. The J-V curves of ‘hole-only’ devices reveal that a small hole injection barrier between MoO₃∥NPB leads to a strong hole injection, resulting low driving voltage and high power efficiency. The results strongly indicate that carrier injection ability and balance shows a key significance in OLED performance.     

Preparation and characterization of indium tin oxide films formed by oxygen ion beam assisted deposition

Indium tin oxide (ITO) films were produced by low-energy oxygen ion beam assisted electron-beam evaporation. The dependence of surface morphology, electrical and optical properties on evaporation rate, oxygen ion beam energy and density, as well as substrate temperatures was characterized by atomic force microscopy, X-ray photoelectron spectroscopy, Hall-effect and optical transmittance measurements. The results show that high-quality ITO films (resistivity of 7.0×10⁻⁴ Ω cm, optical transmittance above 85% at wavelength 550 nm, surface roughness of 0.6 nm in root mean square) can be obtained at room temperature.     

Low temperature deposition of transparent conducting ITO/Au/ITO films by reactive magnetron sputtering

Transparent conducting indium tin oxide/Au/indium tin oxide (ITO) multilayered films were deposited on unheated polycarbonate substrates by magnetron sputtering. The thickness of the Au intermediated film varied from 5 to 20 nm. Changes in the microstructure, surface roughness and optoelectrical properties of the ITO/Au/ITO films were investigated with respect to the thickness of the Au intermediated layer. X-ray diffraction measurements of ITO single layer films did not show characteristic diffraction peaks, while ITO/Au/ITO films showed an In₂O₃ (2 2 2) characteristic diffraction peak. The optoelectrical properties of the films were also dependent on the presence and thickness of the Au thin film. The ITO 50 nm/Au 10 nm/ITO 40 nm films had a sheet resistance of 5.6 Ω/□ and an average optical transmittance of 72% in the visible wavelength range of 400-700 nm. Consequently, the crystallinity, which affects the optoelectrical properties of ITO films, can be enhanced with Au intermediated films.     

Effect of change in pulsed DC frequency on indium-tin oxide anode on J-V-L performance of built-up organic light emitting diode during facing-target sputtering

Investigations were carried out on the changes in the electrical and optical properties and surface roughness of the indium-tin oxide (ITO) anode as a function of DC pulse frequency during facing-target sputtering. The current density-voltage-luminescence (J-V-L) characteristics of organic light emitting diodes (OLEDs) developed on the anodes were measured and analyzed in relation to the properties of ITO. When the pulsed DC frequency was less than 120 kHz, the resistivity of ITO was maintained well below 4.3 × 10⁻⁴ Ω cm and the optical energy band gap was greater than 4.1 eV, but these properties changed abruptly at 150 kHz with the morphological transition from columnar to equi-axed. Meanwhile, the surface roughness decreased continuously with increasing pulsed DC frequency up to 150 kHz. The J-V characteristics of the built-up OLED deteriorated slightly as the pulsed DC frequency increased to 120 kHz and then deteriorated rapidly at 150 kHz. The L-V curves, however, showed an improvement of luminescence as the frequency increased up to 120 kHz. These J-V-L characteristics imply that ITO which is more conductive and with a higher band gap can be obtained at the lower pulsed DC frequencies, which is desirable for higher current flow; however, better luminescence is closely related to smoother surfaces. Therefore, for the optimized J-V-L performance of OLEDs, a moderate pulse DC frequency, below the morphological transition of ITO, is desirable.     

Improvement of the outcoupling efficiency of an organic light-emitting device by attaching microstructured films

In this paper, we present and analyse the optical characteristics, such as spectral shift, CIE coordinates, viewing angle dependence, luminous current efficiency and luminous power efficiency, of an organic light-emitting device (OLED) with a commercial diffuser film or a brightness-enhancement film (BEF) attached. Compared to a planar green OLED, the luminous current efficiencies of the OLED with an attached diffuser film or BEF increase by 29% and 23%, respectively. The overall luminous power efficiencies are enhanced by 28% and 7%. Compared to the planar green device, we observe blue shifts at different viewing angles when microstructured films are attached, which is the evidence that the waveguiding modes are being extracted. In our planar OLED, the peak wavelength blue shifts and the full width at the half maximum (FWHM) decrease with increasing viewing angles due to the microcavity effect. When the diffuser is attached, the spectral peak has a constant blue shift (6 nm) compared to that of the planar OLED. On the other hand, in the BEF case, the spectral shift depends on the viewing angle (2-12 nm blue shifts from 0 to 80°). This is due to the different operating principles (scattering and redirected light) of the diffuser and BEF. Since the transmittance spectra of both the diffuser film and the BEF are flat over the visible range, it is suitable for lighting applications by using white OLED. When attaching the films on a commercial white OLED, the luminous current efficiencies of the OLED with an attached diffuser film or BEF increase by 34% and 31%, respectively. The overall luminous power efficiencies are enhanced by 42% and 8%.     

Efficient white organic light-emitting devices using 4,7-diphenyl-1,10-phenanthroline as block layer

A white light-emitting device has been fabricated with a structure of ITO/m-MTDATA (45 nm)/NPB (10 nm)/DPVBi (8 nm)/DPVBi:DCJTB 0.5% (15 nm)/BPhen (x nm)/Alq₃ [(55−x) nm]/LiF (1 nm)/Al, with x=0, 4, and 7. BPhen was used as the hole-blocking layer. This results in a mixture of lights from DPVBi molecules (blue-light) and DCJTB (yellow-light) molecules, producing white light emission. The chromaticity can be readily adjusted by only varying the thickness of the BPhen layer. The CIE coordinates of the device are largely insensitive to the driving voltages. When the thickness of BPhen is 7 nm, the device exhibits peak efficiency of 6.87 cd/A (3.59 lm/W) at the applied voltage of 6 V, the maximum external quantum efficiency η_ext=2.07% corresponding to 6.18 cd/A, and the maximum brightness is 18494 cd/m² at 15 V.     

Fabrication and characterization of Pt intermediate transparent and conducting ITO/Pt/ITO multilayer films

Platinum intermediate transparent and conducting ITO/metal/ITO (IMI) multilayered films were deposited by RF and DC magnetron sputtering on polycarbonate substrates without intentional substrate heating. Changes in the microstructure and optoelectrical properties of the films were investigated with respect to the thickness of the intermediate Pt layer in the IMI films. The thickness of Pt film was varied from 5 to 20 nm.In XRD measurements, neither ITO single-layer films nor IMI multilayer films showed any characteristic diffraction peaks for In₂O₃ or SnO₂. Only a weak diffraction peak for Pt (1 1 1) was obtained in the XRD spectra. Thus, it can be concluded that the Pt-intermediated films in the IMI films did not affect the crystallinity of the ITO films. However, equivalent resistivity was dependent on the presence and thickness of the Pt-intermediated layer. It decreased as low as 3.3×10⁻⁴ Ω cm for ITO 50 nm/Pt 20 nm/ITO 30 nm films. Optical transmittance was also strongly influenced by the Pt-intermediated layer. As Pt thickness in the IMI films increased, optical transmittance decreased to as low as 30% for ITO 50 nm/Pt 20 nm/ITO 30 nm films.     

Ca/Ag bilayer cathode for transparent white organic light-emitting devices

We have demonstrated that the compositional modification of the Ca/Ag films is principally responsible for a high transmittance (over 70% in the visible range) and low sheet resistance (10-12 Ω/sq). X-ray photoelectron spectroscopy (XPS) sputter depth profiling of Ca/Ag structure reveals the presence of Ca(OH)₂ and Ca metal. A chemical model of the Ca/Ag cathode is proposed. Using transparent ITO anode and Ca (10 nm)/Ag (10 nm) cathode, efficient white organic light-emitting devices (WOLEDs) emitting from both sides have been fabricated. Brightness of 3813 cd/m² and Commission Internationale de l’Eclairage (CIE) coordinates (0.36, 0.34) at 10 V through ITO anode and values of 1216 cd/m² and (0.33, 0.30) through Ca/Ag cathode are reported. A low turn-on voltage of 5.5 V is measured.     

纳米硅薄膜复合阳极的绿色微腔式OLED的研究

采用甚高频增强型等离子体化学气相沉积技术,通过优化薄膜的沉积条件制备出高性能的P nc Si∶H薄膜材料(σ=5.86 S/cm、Eopt>2.0 eV).通过XRD测量计算出薄膜<111>、<220>和<311>三个晶向上的晶粒大小分别为15 nm、17 nm和21 nm;通过Raman测量,计算出其晶化率为35％左右.实验中,将P型纳米硅薄膜与氧化铟锡一起构成有机电致发光器件的复合阳极,研究了他们的发光特性,结果表明：由于P nc Si∶H薄膜材料具有近似半反半透的光学特性,它与高反射率的阴极Al使有机电致发光器件产生了微腔效应,使其发光光谱窄化,半宽高由126 nm窄化到33 nm;发光光亮明显增强,最大亮度为47 130 cd/m2,最大发光效率为9.543 83 cd/A,与以ITO为阴极的无腔器件相比,提高了约127%.     

Efficient and stable single-dopant white OLEDs based on 9,10-bis (2-naphthyl) anthracene

Efficient white organic light-emitting diodes (WOLEDs) are fabricated with a thin layer of 9,10-bis (2-naphthyl) anthracene (ADN) doped with Rubrene as the source of white emission. A device with the structure of ITO/NPB (70 nm)/ADN: 0.5% Rubrene (30 nm)/Alq₃ (50 nm)/MgAg shows a maximum current efficiency of 3.7 cd/A, with the CIE coordinates of x=0.33, y=0.43. The EL spectrum of the devices and the CIE coordinates remains almost the same when the voltage is increased from 10 to 15 V and the current efficiency remains quite stable with the current density increased from 20 to 250 mA/cm².     

Electroluminescence performance of organic light-emitting devices with KCl inside hole transport layer

A new multilayer organic light-emitting device (OLED) is fabricated by inserting kalium chloride (KCl) thin layer (1 nm) into hole transport layer (HTL). It has the configuration of ITO/NPB(15 nm)/KCl(1 nm)/NPB(25 nm)/Alq₃(60 nm)/KCl(1 nm)/Al. The electroluminescence (EL) result shows that the performance of the novel device has obviously improvement compared with the normal structure (ITO/NPB(40 nm)/Alq₃(60 nm)/KCl(1 nm)/Al). The EL and efficiency are about 1.4 and 1.3 times than that of conventional device. The suggested mechanism is that the KCl layer in N,N′-diphenyl-N,N′-bis(1-napthyl–phenyl)-1,1′-biphenyl-4,4′-diamine (NPB) can block the holes of NPB and then balance the holes and electrons. The better recombination of holes and electrons is beneficial to the enhancing properties of OLED.     

GaN-based light-emitting diode with ZnO nanotexture layer prepared using hydrogen gas

ZnO films were deposited on indium tin oxide (ITO), which formed the transparent conductive layer (TCL) of a GaN-based light-emitting diode (LED), by ultrasonic spraying pyrolysis to increase the light output power. The ZnO nanotexture was formed by treating the as-deposited ZnO films with hydrogen. The root mean square (RMS) roughness increased from 4.47 to 7.89 nm before hydrogen treatment to 10.82-15.81 nm after hydrogen treatment for 20 min. Typical current-voltage (I-V) characteristics of the GaN-based LEDs with a ZnO nanotexture layer have a forward-bias voltage of 3.25 V at an injection current of 20 mA. The light output power of a GaN-based LED with a ZnO nanotexture layer improved to as much as about 27.5% at a forward current of 20 mA.     

Improved performance of organic light-emitting devices with plasma treated ITO surface and plasma polymerized methyl methacrylate buffer layer

Transparent indium-tin-oxide (ITO) anode surface was modified using O₃ plasma and organic ultra-thin buffer layers were deposited on the ITO surface using 13.56 MHz rf plasma polymerization technique. A plasma polymerized methyl methacrylate (ppMMA) ultra-thin buffer layer was deposited between the ITO anode and hole transporting layer (HTL). The plasma polymerization of the buffer layer was carried out at a homemade capacitively coupled plasma (CCP) equipment. N,N′-Diphenyl-N,N′-bis(3-methylphenyl)-1,1′-diphenyl-4,4′-diamine (TPD) as HTL, Tris(8-hydroxy-quinolinato)aluminum (Alq₃) as both emitting layer (EML)/electron transporting layer (ETL), and aluminum layer as cathode were deposited using thermal evaporation technique. Electroluminescence (EL) efficiency, operating voltage and stability of the organic light-emitting devices (OLEDs) were investigated in order to study the effect of the plasma surface treatment of the ITO anode and role of plasma polymerized methyl methacrylate as an organic ultra-thin buffer layer.     

A new laser direct etching method of indium tin oxide electrode for application to alternative current plasma display panel

For cost effective fabrication and time of alternative current plasma display panels (AC PDPs), an indium tin oxide (ITO) layer was patterned directly with a Q-switched diode pumped Nd:YVO₄ laser (λ = 1064 nm). As experimental results, 500 mm/s scan speed with 40 kHz repetition rate was suitable for the application to AC PDP ITO electrode. In comparison with the chemically wet-etched ITO patterns by photolithography method, laser-ablated ITO patterns showed the formation of shoulders at the edge of the ITO lines and a ripple-like structure of the etched bottom. By dipping the laser-ablated ITO films in the chemical etching solution for 30 s at 50 °C, the shoulders were effectively removed without affecting the discharging properties of AC PDP.     

PrF3阳极缓冲层对OLED器件性能的影响

使用真空热蒸镀法制备的OLED器件,利用不同厚度的PrF3作阳极缓冲层,并和未加缓冲层的器件进行了对比.实验结果表明:0.5nm厚的PrF3阳极缓冲层可以有效增强OLED器件的空穴注入能力,增强电子和空穴的浓度平衡,优化器件的电致发光特性.器件的最大电流效率为4.9 cd/A,最大亮度为33 600 cd/m2,分别是...     

Early stages of vanadium deposition on Si(1 1 1)-7 × 7

We investigate the low-coverage regime of vanadium deposition on the Si(1 1 1)-7 × 7 surface using a combination of scanning tunnelling microscopy (STM) and density-functional theory (DFT) adsorption energy calculations. We theoretically identify the most stable structures in this system: (i) substitutional vanadium atoms at silicon adatom positions; (ii) interstitial vanadium atoms between silicon adatoms and rest atoms; and (iii) interstitial vanadium - silicon adatom vacancy complexes. STM images reveal two simple vanadium-related features near the Si adatom positions: bright spots at both polarities (BB) and dark spots for empty and bright spots for filled states (DB). We relate the BB spots to the interstitial structures and the DB spots to substitutional structures.     

Patterning of indium-tin oxide on glass with picosecond lasers

The results of patterning of the indium-tin oxide (ITO) film on the glass substrate with high repetition rate picosecond lasers at various wavelengths are presented. Laser radiation initiated the ablation of the material, forming grooves in ITO. Profile of the grooves was analyzed with a phase contrast optical microscope, a stylus type profiler, scanning electron microscope (SEM) and atomic force microscope (AFM). Clean removal of the ITO film was achieved with the 266 nm radiation when laser fluence was above the threshold at 0.20 J/cm², while for the 355 nm radiation, the threshold was higher, above 0.46 J/cm². The glass substrate was damaged in the area where the fluence was higher than 1.55 J/cm². The 532 nm radiation allowed getting well defined grooves, but a lot of residues in the form of dust were generated on the surface. UV radiation with the 266 nm wavelength provided the widest working window for ITO ablation without damage of the substrate. Use of UV laser radiation with fluences close to the ablation threshold made it possible to minimize surface contamination and the recast ridge formation during the process.