Mo/Si multilayers used for the EUV normal incidence solar telescope

This paper first reviews an EUV normal incidence solar telescope that we have developed in our lab. The telescope is composed of four EUV telescopes and the operation wavelengths are 13.0 nm, 17.1 nm, 19.5 nm, and 30.4 nm. These four wavelengths, fundamental to the research of the solar activity and the atmosphere dynamics, are always chosen by the EUV normal incidence solar telescope. In the EUV region, almost all materials have strong absorption, so optics used in this region must be coated by the multila...     

一种复合型空间软X射线--极紫外波段望远镜设计

根据空间对日观测的需要,提出了一种复合型宽波段范围的软X射线———极紫外望远镜的设计方案。该望远镜是把小结构尺寸的卡塞格林型极紫外波段正入射望远镜放置在软X射线波段,并由常用的Wolter Ⅰ型掠入射望远镜的中心部分组成。在软X射线和极紫外波段具有相同的焦距和视场角,共同使用同一个探测器,外形尺寸与相同指标的掠入射型望远镜一致,且在极紫外波段具有较高的角分辨率和光谱分辨率,适合于在空间进行对日观测使用。     

Design and performance of two-channel EUV multilayer mirrors with enhanced spectral selectivity

In this paper, we present a study on two-channel multilayer mirrors which can operate at two wavelengths in Extreme Ultraviolet (EUV) spectral range. We propose a new method to design two-channel EUV multilayer mirrors with enhanced spectral selectivity. The mirror structure is a stack of two periodic multilayers separated by a buffer layer. We have defined the main parameters which allow adjustment of the distance between different order Bragg’s peak and of wavelength positions of reflectivity minima. Two mirrors have been designed and deposited for solar EUV telescope applications by using this method. The first mirror reflects Fe IX–X line (17.1 nm) and Fe XVI (33.5 nm) lines with attenuation of the He II line (30.4 nm). The second mirror reflects Fe IX–X and He II lines with attenuation of Fe XV (28.4 nm) and Fe XVI lines. Measurements with synchrotron radiation source confirm that, in both cases, for these mirrors, we are able to adjust reflectivity maxima (Bragg peak position) and minima. Such multilayers offer new possibilities for compact design of multi-wavelength EUV telescopes and/or for high spectral selectivity.     

一种空间超紫外望远镜在轨指向标定方法

介绍了一种不同波段的超紫外望远镜在轨指向的标定方法。此方法利用四个波段(13.0,17.1,19.5,30.4nm)的超紫外望远镜均有较高的光谱响应和能够对较强的太阳辐射光谱成像的特点,根据由不同的望远镜所获得的太阳的四个图像的变化,计算出了四个望远镜间的指向偏差。根据四个不同波段的超紫外望远镜的光学性能和太阳紫外辐射谱线的亮度优化出了具体的太阳辐射谱线,并对所选用的标定谱线的可行性进行了分析。该方法的在轨标定精度为0.1″。     

Soft X-ray microscopy in the spectral region of “carbon window” with the use of multilayer optics and a laser-plasma source

This paper reports on the fabrication and testing of multilayer mirrors for X-ray optical systems operating in the “carbon window” region (at wavelengths from 4.5 to 5.0 nm) and the results of their application in soft X-ray imaging of the internal structure of organic objects. The developed approaches to the fabrication and control of graded Co/C multilayer coatings have made it possible to create an X-ray multimirror system with a maximum known entrance aperture and throughput. The use of the developed high-spatial-resolution X-ray optics can significantly extend the field of practical application of soft X-ray absorption microscopy based on compact laser-plasma sources.     

X射线天文望远镜的进展

综述了近年来X射线天文望远镜(如准直型望远镜、编码孔径望远镜、正入射周期多层膜望远镜、掠入射单层膜望远镜和掠入射非周期多层膜望远镜以及新型的“龙虾眼”型望远镜)的发展；阐述了各种X射线天文望远镜工作的原理和成像特点，指出各种X射线天文望远镜之间的性能是相互补充的；简要说明了国内近年来在X射线天文望远镜研究方面取得的进展，并展望了下一步工作．     

Laser cavities and polarization optics for soft X-rays and the extreme ultraviolet

Addressed here are polarization optics for extreme-ultraviolet and soft X-ray wavelengths, especially as relevant to laser cavities. It is pointed out that the whisper-gallery mirrors studied by Vinogradov can serve as weak polarizers and, more importantly, as birefringent elements. The application of multilayer technology to polarizing mirrors and beamsplitters is also considered. It is shown that multilayer beamsplitters can function both as reflective and transmissive polarizers. Their behavior is surprising in some cases, with the same polarization being preferred in both reflection and transmission. Three polarizing cavity schemes are proposed, each incorporating a polarizing beamsplitter as its output coupler. Cavity optimization issues are discussed.     

大型光学天文望远镜风载作用分析

风载对光学天文望远镜结构和镜面的作用将直接影响望远镜的面形精度和跟踪指向控制,从而降低望远镜的像质。特别是未来大型望远镜越来越多地采用主动光学技术,风载的作用将是影响主动光学子镜的主动控制及望远镜整体性能的重要因素。回顾了大型望远镜风载作用的分析方法和随机风载的性质,详细介绍了采用风速功率谱密度方法进行随机风载分析的过程和采用有限元方法分析建模的方法;建立了一个拼接镜面主动光学望远镜的完整计算模型,研究了子镜及望远镜整体在风载作用下的静态和动态响应,并分析了风载对镜面面形和望远镜的跟踪指向精度的影响。     

Surface phenomena related to mirror degradation in extreme ultraviolet (EUV) lithography

One of the most promising methods for next generation device manufacturing is extreme ultraviolet (EUV) lithography, which uses 13.5 nm wavelength radiation generated from freestanding plasma-based sources. The short wavelength of the incident illumination allows for a considerable decrease in printed feature size, but also creates a range of technological challenges not present for traditional optical lithography. Contamination and oxidation form on multilayer reflecting optics surfaces that not only reduce system throughput because of the associated reduction in EUV reflectivity, but also introduce wavefront aberrations that compromise the ability to print uniform features. Capping layers of ruthenium, films ∼2 nm thick, are found to extend the lifetime of Mo/Si multilayer mirrors used in EUV lithography applications. However, reflectivities of even the Ru-coated mirrors degrade in time during exposure to EUV radiation. Ruthenium surfaces are chemically reactive and are very effective as heterogeneous catalysts. In the present paper we summarize the thermal and radiation-induced surface chemistry of bare Ru exposed to gases; the emphasis is on H₂O vapor, a dominant background gas in vacuum processing chambers. Our goal is to provide insights into the fundamental physical processes that affect the reflectivity of Ru-coated Mo/Si multilayer mirrors exposed to EUV radiation. Our ultimate goal is to identify and recommend practices or antidotes that may extend mirror lifetimes.     

Optimization of platinum-carbon multilayer mirrors for hard X-ray optics

The design of hard X-ray optics for astrophysical technology is one of the key technologies for investigating active galaxies and clusters of galaxies. In the present paper, we have optimized multilayer mirrors of platinum-carbon layer pairs for the hard X-ray region at different grazing angles. The Luus-Jaakola optimization procedure has been implemented for the global optimization of multialyer mirrors. With this algorithm it is not necessary to specify initially the number of layers present in a design.     

短波长软X射线多层膜高级次峰设计与制备

考虑了短波长软X射线多层膜的设计问题，比较了一、二、三级布喇格衍射峰设计的反射率结果，分析了反射率与周期厚度及金属层在周期中的比率的关系．本文认为，在存在不连续金属膜层的情况下，用布喇格衍射峰的二级次设计，有助于获得实测的反射率．给出了利用磁控溅射方法沉积的Mo/Si多层膜在4.47nm处同步辐射测量，在60°入射角下获得8.5%实测反射率的结果． 关键词：     

磁控溅射法制备极紫外6.8~11.0 nm波段Mo/B4C横向梯度多层膜

用直流磁控溅射法结合掩模板控制膜厚的方法在Si衬底上制备了工作于6.8~11.0 nm波段的[Mo/B₄C]₆₀横向梯度多层膜。利用X射线掠入射反射测试以及同步辐射反射率测试对梯度多层膜的结构及性能进行了测试。X射线掠入射反射测试结果表明,多层膜周期厚度沿着长轴方向从4.39 nm逐渐增加到7.82 nm,周期厚度平均梯度为0.054 nm/mm。对横向梯度多层膜沿长轴方向每隔5 mm进行了一次同步辐射反射率测试,结果显示,横向梯度多层膜在45°入射角下的反射率约为10%,反射峰的半高全宽介于0.13 nm到0.31 nm之间。     

空间太阳极紫外(EUV)成像望远镜

太阳极紫外和X射线成像观测是空间天气研究的重要内容,空间太阳极紫外(EUV)成像望远镜是为空间天气研究和预报研制的仪器。介绍了国内外太阳极紫外和X射线成像的发展状况,在此基础上引入19.5nm成像观测的科学目标。阐述了望远镜光学系统和成像相机传感器的设计。前者包括光学结构和基本参数、光学窗口的选择、多层膜设计、光学系统仿真结果;后者包括两种不同成像传感器的对比和选择、控制系统的设计。     

4.48 nm正入射软X射线激光用Cr/C多层膜高反射镜的研制

针对4.48nm类镍钽软X射线激光及其应用实验,设计制备了工作于这一波长的近正入射多层膜高反射镜。选择Cr/C为制备4.48nm高反射多层膜的材料对,通过优化设计,确定了多层膜的周期、周期数以及两种材料的厚度比。模拟了多层膜非理想界面对高反射多层膜性能的影响。采用直流磁控溅射方法在超光滑硅基片上实现了200周期Cr/C多层膜高反射镜的制备。利用X射线衍射仪测量了多层膜结构,在德国BessyⅡ同步辐射上测量了在工作波长处多层膜反射率,测量的峰值反射率达7.5%。对衍射仪测量的掠入射反射曲线和同步辐射测量的反射率曲线分别进行拟合,得到的粗糙度和厚度比的结果相近。测试结果表明,所制备的Cr/C多层膜样品结构良好,在指定工作波长处有较高的反射峰,达到了设计要求。     

Fabrication and characterization of EUV multilayer mirrors optimized for small spectral reflection bandwidth

Our aim was to produce EUV multilayer mirrors with a small spectral bandwidth ΔE≤3 eV at 70 eV peak energy using UHV electron beam evaporation by varying the thickness ratio (Γ=) between the absorber layer and the bilayer. The deposition process was controlled by in situ soft X-ray reflectometry, and ion-beam polishing as well as substrate-heating methods were applied to reduce the interface roughness. The reflection properties of the Mo–Si multilayer mirrors prepared were characterized by hard and soft X-ray reflectometry and details of the multilayer structure were revealed from cross-sectional transmission electron microscopy. Received: 22 September 2000 / Accepted: 4 October 2000 / Published online: 30 November 2000     

Metrologies for the phase characterization of attosecond extreme ultraviolet optics

Extreme ultraviolet (EUV) optics play a key role in attosecond science since only with higher photon energies is it possible to achieve the wide spectral bandwidth required for ultrashort pulses. Multilayer EUV mirrors have been proposed and are being developed to temporally shape (compress) attosecond pulses. To fully characterize a multilayer optic for pulse applications requires not only knowledge of the reflectivity, as a function of photon energy, but also the reflected phase of the mirror. We develop the metrologies to determine the reflected phase of an EUV multilayer mirror using the photoelectric effect. The proposed method allows one to determine the optic's impulse response and hence its pulse characteristics.     

The thermal stability of Al(1%wtSi)/Zr EUV mirrors

Six Al(1%wtSi)/Zr multilayers are deposited on Si substrates by using the direct-current magnetron sputtering system, and annealed from 100?°C to 500?°C temperature in a vacuum furnace for 1?h. To evaluate the thermal stability of Al(1%wtSi)/Zr multilayers, the multilayers were characterized by grazing incidence X-ray reflectance, X-ray diffraction, X-ray emission spectroscopy, and near-normal incident extreme ultraviolet (EUV) reflection. The symmetric and asymmetric interlayer models are used to present the interfacial structure before and after 300?°C. The Al(1%wtSi)/Zr multilayer annealed up to 200?°C maintains the initial symmetric multilayer structure, and keeps almost the similar EUV reflectivity as the nonannealed sample. From 300?°C, interdiffusion is much greater at the Zr/Al interface compared with the Al/Zr interface. And the interfacial phases of Al-Zr alloy transform from amorphous to polycrystalline, which induces the deterioration of multilayer structure and the decrease of EUV reflectivity. However, up to 500?°C, the polycrystalline Al-Zr compound does not destroy the multilayer completely.     

Current status and development prospects for multilayer X-ray optics at the Institute for Physics of Microstructures,Russian Academy of Sciences

A real opportunity for applying traditional optical methods to soft X-ray and extreme UV (ultraviolet) radiation bands has appeared thanks to recent successes in the area of multilayer-mirror deposition and procedures for fabricating supersmooth and highly precise substrates of mirrors. The implementation of this opportunity opens up fundamentally new prospectss in the nanodiagnostics of substances, micro- and nanoelectronics, microbiology, solar astronomy and other applications. The main directions in multilayer X-ray optics developed at the Institute for the Physics of Microstructures, Russian Academy of Sciences, are presented and the aspects of the use thereof in science and technology are considered. The main problems arising during the fabrication of multilayer interference structures for the soft X-ray and extreme UV bands are discussed. The main results obtained recently in the scope of each direction of investigation are presented. Plans for the future development of these directions are discussed.     

KBA X射线显微镜装调方法研究

 KBA X射线显微镜为非共轴、掠入射软X射线成像系统,集光立体角很小,像质又要求非常高,这使得四个反射镜的安装位置要求相当严格。通常的位置或角度计量工具,在激光聚变靶室内空间受限的条件下,很难达到这么高的精度。因此为了保证KBA的成像质量,采用精度4″的测角仪使双反射镜的夹角误差小于20″。掠入射角对成像质量影响很大,为了使掠入射角小于10″,用自己设计的光路系统保证了掠入射角的精度要求。KBA X射线显微镜系统的主镜的孔径角4×10^－6 sr,无法实现锐聚焦。因此设计了一个辅助物镜代替它的主镜以实现锐聚焦。在某大型激光装置上进行的惯性约束聚变诊断实验中,运用这些方法所装调的KBA X射线显微镜获得了靶标(周期20 μm,线宽6 μm的无金膜镍网格)的清晰图像。     

Photometry of solar EUV radiation by space-based telescopes with normal incidence multilayer-coated optics

Photometric methods of image analysis in the extreme ultraviolet (EUV) wavelength range are widely used in solving current scientific problems of solar physics. Types of solar EUV telescopes, their main parameters, effects of space flight and observation conditions on accuracy of the photometric analysis are considered.