微型电子回旋共振离子推力器离子源结构优化实验研究

微型电子回旋共振(ECR)离子推力器可满足微小航天器空间探测的推进需求. 为此, 本文开展直径20 mm的微型ECR离子源结构优化实验研究. 根据放电室内静磁场和ECR谐振区的分布特点, 研究不同微波耦合输入位置对离子源性能的影响, 结果表明环形天线处在高于ECR谐振强度的强磁场区域时, 微波与等离子体实现无损耦合, 电子共振加热效果显著, 引出离子束流较大. 根据放电室电磁截止特性, 结合微波电场计算, 研究放电容积对离子源性能的影响, 实验表明过长或过短的腔体长度会导致引出离子束流下降甚至等离子体熄灭. 经优化后离子源性能测试表明, 在入射微波功率2.1 W、氩气流量14.9 μg/s下, 可引出离子束流5.4 mA, 气体放电损耗和利用率分别为389 W/A和15%.     

2 cm电子回旋共振离子推力器离子源中磁场对等离子体特性与壁面电流影响的数值模拟

电子回旋共振离子推力器(electron cyclotron resonance ion thruster,ECRIT)离子源内等离子体分布会影响束流引出,而磁场结构决定的ECR区与天线的相对位置共同影响了等离子体分布.在鞘层作用下,等离子体中的离子或电子被加速对壁面产生溅射,形成壁面离子或电子电流,造成壁面磨损和等离子体损失,因此研究壁面电流与等离子体特征十分重要.为此本文建立2 cm ECRIT的粒子PIC/MCC(particle-in-cell with Monte Carlo collision)仿真模型,数值模拟研究磁场结构对离子源内等离子体与壁面电流特性的影响.计算表明,当ECR区位于天线上游时,等离子体集中在天线上游和内外磁环间,栅极前离子密度最低,故离子源引出束流、磁环端面电流和天线壁面电流较低.ECR区位于天线下游时,天线和栅极上游附近的等离子体密度较高,故离子源引出束流、天线壁面电流和磁环端面电流较高.腔体壁面等离子体分布与电流受磁场影响最小.     

微波离子推力器中磁场发散区电子加热模式研究

在微波离子推力器的磁场结构设计中,一般认为增大磁镜区的面积能够约束更多电子,有利于提高能量利用率;减小发散区面积能够减少电子在壁面的损失,有利于降低放电损耗.随着一体化仿真研究深入,发现利用Child-Langmuir鞘层的特性可约束电子,使其在鞘层与磁镜间往复运动获能.对此,本文设计了适用于1 cm磁阵列微波离子推力器的磁场结构,并对其初始放电和束流引出过程进行了一体化仿真,对比阐明了电子在磁场发散区受Child-Langmuir鞘层、天线表面鞘层和磁镜共同约束下的获能模式.该获能模式可提升磁场发散区的电子温度,促进电离,提升栅极前等离子体密度,进而提升束流密度.仿真结果表明,在氙气流量0.3 sccm (1 sccm=1 mL/min),微波功率为1 W,栅极电压φ_sc/φ_ac=300 V/-50 V条件下,磁阵列微波离子推力器的电流密度较2 cm微波离子推力器提升57.9%.本文从理论上对磁场发散区电子加热模式进行了验证,研究结果将为微波离子推力器优化设计提供理论依据,促进微波离子推力器性能提升.     

电子回旋共振等离子体密度均匀性的数值研究

基于漂移扩散近似,在轴对称假设下,对电子回旋共振等离子体源腔室内的等离子体建立了二维流体模型.采用有限差分法对所建立的模型进行了自洽数值模拟,得到了等离子体密度均匀性随时间演化的数值结果.通过对数值结果的分析,研究了背景气体压强、微波功率和磁场线圈电流对等离子体密度均匀性的影响.研究表明,在电离初期,电子密度的均匀性好于离子密度的均匀性.在电离后期,离子密度的均匀性好于电子密度的均匀性.随着背景气体压强的增大,电子密度和离子密度的均匀性都在增加,且离子密度的均匀性增加的更快.随着微波功率的增大,电子密度和 关键词： 等离子体密度均匀性 背景气体压强 微波功率 磁场线圈电流     

磁场调控型离子源的设计与实验

磁场调控型离子源在离子源等离子体扩散空间中引入轴向强脉冲磁场,磁场起两方面的作用,一是形成潘宁放电效应,使原子、气体分子碰撞电离效率增加;二是在脉冲强磁场的作用下,强轴向磁场将质量较轻的离子约束在轴线上,对质量较重的金属离子约束能力较弱,导致其在等离子体膨胀引出通道中碰壁损失,能够提升引出轻离子的比例。开展了磁场调控的离子源放电结构、强脉冲螺线管磁场以及引出束流光学结构的设计;测量分析了引出离子流强和离子打靶束斑形貌。研究结果表明,强轴向磁场通过等离子体对混合离子成分的筛选作用,可有效提高引出离子流强中的轻离子成分比例。     

微型电子回旋共振离子源的全局模型

微型电子回旋共振(electron cyclotron resonance, ECR)离子源在紧凑型离子注入机、小型中子管、微型离子推进器等领域有着十分广泛的应用.为了深入认识微型ECR离子源的工作机理,本文以北京大学自主研制的一款微型氘离子源作为研究对象,以氢气和氘气放电形成的等离子体为例,发展了一种基于粒子平衡方程的全局模型.研究结果表明,该离子源束流成分与离子源的运行气压和微波功率有着很强的依赖关系.对于氢气放电等离子体,微波功率低于100 W时,离子源可以分别在低气压和高气压情况下获得离子比超过50%的H~+₂离子束和H~+₃离子束;当微波功率高于100 W时,可以在很宽的运行气压范围内,获得质子比超过50%的束流.因此,提高微波功率是提高微型离子源质子比的关键.对于氘气放电等离子体, 3种离子比例对运行气压和微波功率的依赖关系与氢气放电等离子体的规律基本一致.但是在相同的运行条件下, D~+比例比H~+比例高10%—25%.也就是说,在微型氘离子源的测试和优化过程中,可以利用氢气代替氘气进行实验,并将质子比测量结果作为相同条件下氘离...     

基于气体放电等离子体射流源的模拟离子引出实验平台物理特性

离子引出过程是原子蒸气激光同位素分离中非常重要的物理过程之一,而其中关键的等离子体参数(等离子体初始密度和电子温度等)均会对离子引出特性产生影响.基于千赫兹电源驱动的氩气高压交流放电等离子体射流源,建立了离子引出模拟实验平台-2015 (IEX-2015),开发了用于诊断氩等离子体参数的"碰撞-辐射"模型,对等离子体射流区的电子温度和电子数密度等关键参数进行了测量.结果表明,电源输入功率和驱动频率以及工作气体流量均会对等离子体射流区的电子温度和数密度产生影响;在真空腔压强为10~(-2)Pa量级下,射流区电子数密度和电子温度的可调参数范围分别为10~9—10~(11)cm~(-3)和1.7—2.8 e V,这与实际离子引出过程中的等离子体参数范围相近.在此基础上,开展了不同引出电压、极板间距和电子数密度条件下初步的离子引出实验,所得到的离子引出电流变化规律亦与实际原子蒸气激光同位素分离中的离子引出特性定性一致.上述研究结果验证了在IEX-2015上开展离子引出模拟实验的可行性,为后续深入开展离子引出特性的实验研究准备了良好的条件.     

会切磁场多极离子源中磁场对等离子体特性的影响

本文提出了会切磁场多极离子源中,磁场对等离子体参数以及可引出离子束流和放电室阳极收集的离子电流影响的实验研究结果,并对该结果进行了分析讨论。     

ECR离子源中的微波功率在线测量

 在中子发生器中采用ECR离子源是一种新技术。由于受结构的限制,ECR离子源不能像高频源离子源那样通过观察气体放电的颜色判断其工作状态,所以在运行中调节状态非常困难。解决这个问题的方法是：用定向耦合器加微波小功率计的方法在线测量ECR离子源的微波入射功率,通过微波入射功率可以直接得到ECR离子源引出离子束流的大小,从而推断微波信号源的放电过程是否正常,然后调整ECR离子源,最终使中子发生器工作在最佳状态。从ECR离子源后面的引出电极测得的最大束流为20 mA,且工作长时间稳定,当微波功率在160 W~500 W之间时,放电效果较好,离子束流随微波功率的增加而增加。     

同轴磁场对非平衡磁控溅射系统放电特性的影响

采用激励电流可以调整的电磁线圈来激发非平衡磁场,调整约束磁场和放电空间等离子体状态。实验结果表明调整非平衡磁场显著影响系统的放电特性,使放电特性偏离常规的磁控溅射系统放电特性,增强了等离子体的引出效果。在Ar放电的条件下,详细研究了溅射系统的工作伏安特性随不同的工作气体、气压和溅射功率的变化规律。根据蔡尔得公式,讨论了非平衡磁场对于磁控溅射系统中放电特性的影响规律。     

ECR离子源束流发射度的实验研究

利用最新自行研制的电扫描发射度探测系统, 在ECR离子源上进行了一系列关于ECR离子源引出束流发射度的研究. 这套电扫描发射度探测系统安装在中国科学院近代物理研究所(兰州)的LECR3试验平台的束运线上. 试验中, 通过测量相关参数, 研究了磁场、微波、掺气效应及负偏压效应等对引出束流发射度的影响. 利用实验所得的结果与关于ECR等离子体和离子源束流发射度的半经验理论, 分析推导了离子源各可调参数与ECR等离子体的直接关系, 这为分析探索ECR离子源的工作机制提供了一定的参考依据.     

Interaction between plasma and electromagnetic field in ion source of 10 cm ECR ion thruster

Through diagnosing the plasma density and calculating the intensity of microwave electric field, four 10 cm electron cyclotron resonance (ECR) ion sources with different magnetic field structures are studied to reveal the inside interaction between the plasma, magnetic field and microwave electric field. From the diagnosing result it can be found that the plasma density distribution is controlled by the plasma generation and electron loss volumes associated with the magnetic field and microwave power level. Based on the cold plasma hypothesis and diagnosing result, the microwave electric field intensity distribution in the plasma is calculated. The result shows that the plasma will significantly change the distribution of the microwave electric field intensity to form a bow shape. From the boundary region of the shape to the center, the electric field intensity varies from higher to lower and the diagnosed density inversely changes. If the bow and its inside lower electric field intensity region are close to the screen grid, the performance of ion beam extracting will be better. The study can provide useful information for the creating of 10 cm ECR ion source and understanding its mechanism.     

微波电子回旋共振等离子体阴极电子束的实验研究

介绍了实验室研制的微波电子回旋共振(ECR)等离子体阴极电子束系统及初步研究结果，该系统包括微波ECR 等离子体源、电子束引出极、聚焦线圈等。通过测量水冷靶电流和靶上的束斑尺寸，实验研究了微波ECR 等离子体阴极电子束的流强、聚束性能等随电子束系统工作条件的变化。结果表明：微波输入功率越高、引出电压越高，引出电子束流强越大；工作气压对电子束流强的影响较复杂，随气压增加呈现出先降低后升高的特点；在7×10⁻⁴Pa 的极低气压下电子束流强可达75mA，引出电压9kV；能量利用率可达0.6；调整聚焦线圈的驱动电流，电子束的束斑直径从20mm 减小到13mm，电子束流强未有明显变化。     

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The generation and control of microwave electron cyclotron resonance (ECR) plasma cathode electron beam is studied experimentally. A complete set of discharge, electron beam extraction, focusing and measuring system was set up. The characteristics and performance of microwave ECR plasmas as electron beam extraction source were studied by measuring the current of water cooling target and the beam spot size on the target. Experimental results indicated that both microwave input power and accelerating voltage are conducive to improving electron beam current. The influence of gas pressure on the electron beam current was complex. With the increase of gas pressure, the electron beam current is characterized by decreasing first and then increasing. The extracted electron current of microwave ECR plasma cathode can reach 75mA at gas pressure of 7×10⁻⁴Pa, and the energy of the electron beam can reach 9keV. The energy utilization can reach 0.6. By adjusting the current of the focusing coil, the diameter of electron beam spot is reduced from 20mm to 13mm and the electron beam current keeps the value unchanged.     

Technical issues related to the design of third generation ECR ion sources

The design of third generation electron cyclotron resonance ion sources (ECRIS) had to take into account some technical issues that are usually not relevant for conventional ECRIS, either in terms of microwave power management or in terms of stray magnetic field. In fact, strong magnets originate high stray fields that are detrimental for beam optics, for the pumping system lifetime and mainly for the gyrotron normally used for power generation. Additionally, the presence of intense X-ray fluxes generated by the ECRIS plasma, observed in many experiments, can generate an unexpected heat load upon the thermal balance of the superconducting ECRIS cryostat, which can trigger a warm-up in the case of closed-loop cryostat connected to a cryocooler setup. These and other issues are presented by the authors along with a study of possible solutions.     

14.5GHz紧凑型、低成本、全永磁ECR离子源

A compact 14.5GHz electron cyclotron resonance (ECR) ion source for the production of slow, multiply charged ions has been constructed,with the plasma-confining magnetic field produced exclusively by permanent magnets.Microwave power of up to 175W in the frequency range from 12.75 to 14.SGHz is transmitted from ground potential via a PTFE window into the water-cooled plasma chamber which can be equipped with an aluminum liner.The waveguide coupling system serves also as biased electrode,and two remotely-controlled gas inlet valves connected via an insulating break permit plasma operation in the gas- mixing mode.A triode extraction system sustains ion acceleration voltages between 1kV and 10kV.The ECR ion source is fully computer-controlled and can be remotely operated from any desired location via Ethernet.     

微波技术对ECR离子源性能的影响

The coupling between microwave generators and ECR ion sources(ECRIS)is a key point for the design of the new generation ECRIS as well as for the optimization of the existing ones.The electromagnetic characterization of the plasma chamber where the ionization phenomena take place is a fundamental starting point to understand and model such process.In such effort the complex structures of the injection and extraction flanges together with the large dimensions of the chamber and the high frequencies that are typically used make impossible an analytical solution and also create great difficulties in the modelling even with state-of- art electromagnetic simulators(CST,HFSS),In the following paper the results of some numerical calculations for the optimum plasma chamber excitation will be presented along with the experimental measurements carried out with the SERSE ion source at INFN-LNS.A campaign of measurements is also planned to further investigate the microwave coupling and the mode excitation,which determines the efficiency of the ECR plasma heating.