金属互连电迁移噪声的非高斯性模型研究

根据电子散射理论,多晶互连中,电阻主要起源于晶界处空位与空洞对电子的散射作用.通过引入自由体积的概念,模拟了晶界处电子的散射过程,建立了基于自由体积的噪声非高斯性表征模型.该模型表明,电迁移前期的噪声信号以高斯噪声为主,随电迁移过程将发生噪声信号从高斯性向非高斯性的突变,表明噪声产生机制发生了转变,并通过双相干系数对信号的非高斯性进行了定量表征.最终,通过实验初步证明了理论结果的正确性.     

倒装芯片上金属布线/凸点互连结构中原子的定向扩散

采用倒装芯片互连凸点串联回路研究了高温、高电流密度条件下倒装芯片上金属布线/凸点互连结构中原子的定向扩散现象,分析了互连结构中受电应力和化学势梯度作用的各相金属原子的扩散行为.在电迁移主导作用下,Ni(V)镀层中的Ni原子的快速扩散导致原本较为稳定的Ni(V)扩散阻挡层发生快速的界面反应,造成Al互连金属与焊料的直接接触.Al原子在电子风力作用下沿电子流方向向下迁移造成窗口附近焊料中Al原子含量逐步上升,同时,空位的反向迁移、聚集形成过饱和,导致Al互连中形成大面积空洞.焊料中的Sn,Pb原子在化学势梯度 关键词： 倒装芯片 凸点 电迁移 扩散     

金属薄膜电迁移1/f噪声与1/f2噪声统一模型

应用晶粒边界自由体积的概念建立了能够统一描述金属薄膜1f噪声与1f2噪声的模型.该模型表明,结构完整的多晶金属薄膜产生的电噪声为1f噪声,当金属薄膜受到电迁移损伤而形成空洞时就会引入1f2噪声的成分.在电迁移应力实验中,观察到金属薄膜1fγ噪声在空洞成核前γ约为10,一旦发生空洞成核,即突增至16以上,这一规律与本模型的预测相符合 关键词： 金属薄膜 1fγ噪声 电迁移 自由体积     

金属互连电迁移噪声的相关维数研究

针对金属铝互连中噪声信号随电迁移过程变化规律及其所反映的内部失效机理问题，提出将相关维数用于对电迁移噪声时间序列的分析.通过对互连电迁移噪声实验数据的相关维数计算，发现随着电迁移的进行，金属铝互连噪声由随机性成分占主导变为确定性成分占主导，反映出噪声由随机信号转变为混沌动力学信号.应用散射理论解释上述现象，在金属互连电迁移中，空位扩散阶段噪声主要产生机制是空位随机散射；在空位聚集到空洞成核这一过程中，噪声产生机制逐渐从随机散射转变到弹道混沌腔输运机制为主.通过与传统表征参量的对比，证明相关维数可用于预测金 关键词： 电迁移 噪声 相关维数 混沌     

通孔尺寸对铜互连应力迁移失效的影响

在200℃温度下进行了700h双层铜互连(M1/M2)的应力迁移加速老化试验, 结合有限元分析和聚焦离子束(focused-ion-beam,简称FIB)技术研究了通孔直径分别为500和350nm的铜互连应力诱生空洞失效现象, 探讨了应力诱生空洞的形成机理, 并分析了通孔尺寸对铜互连应力迁移的影响. 结果表明,M1互连应力和应力梯度在通孔底部边缘处达到极大值. 应力梯度在应力诱生空洞成核过程中起主导作用, 由张应力产生的过剩空位在应力梯度作用下沿Cu M1/SiN界面作扩散运动并在应力梯度极大值处成核生长成空洞. 由于M1互连应力沿横向方向变化较快, 因此应力诱生空洞的横向生长速率较大. 当通孔直径增大时,互连应力和应力梯度值增大, 并导致应力诱生空洞的生长速率上升. 关键词： 铜互连 应力迁移 应力诱生空洞 失效     

金属互连电迁移噪声的分形特征

为了研究金属互连电迁移失效机理并寻找新的电迁移表征参量，应用分形理论，通过电子扩散轨迹分形维数，将电迁移噪声时间序列分形维数与晶粒间界分形维数相联系，确定了噪声时间序列分形维数在电迁移演变中的变化趋势.研究结果表明，在金属互连电迁移前期，晶粒间界形貌越来越复杂，致使噪声时间序列的分形维数逐渐增大；成核后，由于空位凝聚成空洞，晶粒间界形貌变得较成核前规则，致使噪声时间序列的分形维数减小；成核时刻是其折点.实验结果证明理论分析的正确性，噪声时间序列的分形维数可望作为金属互连电迁演变的表征参量.     

基于微观结构的Cu互连电迁移失效研究

提出了一种基于微观晶粒尺寸分布的Cu互连电迁移失效寿命模型. 结合透射电子显微镜和统计失效分析技术, 研究了Cu互连电迁移失效尺寸缩小和临界长度效应及其物理机制. 研究表明, 当互连线宽度减小, 其平均晶粒尺寸下降并导致互连电迁移寿命降低. 小于临界长度的互连线无法提供足够的空位使得铜晶粒耗尽而发生失效. 当互连长度大于该临界长度时, 在整个电迁移测试时间内, 部分体积较小的阴极端铜晶粒出现耗尽情况. 随着互连长度的增加该失效比例迅速增大, 电迁移失效寿命减小. 当互连长度远大于扩散长度时, 失效时间主要取决于铜晶粒的尺寸, 且失效寿命和比例随晶粒尺寸变化呈现饱和的波动状态. 关键词： Cu 互连 电迁移 微观结构     

Cu互连应力迁移温度特性研究

提出了一种基于扩散-蠕变机制的空洞生长模型, 结合应力模拟计算和聚焦离子束分析技术研究了Cu互连应力诱生空洞失效现象, 探讨了应力诱生空洞的形成机制并分析了空洞生长速率与温度、应力梯度和扩散路径的关系. 研究结果表明, 在Cu M1互连顶端通孔拐角底部处应力和应力梯度达到极大值并观察到空洞出现. 应力梯度是决定空洞成核位置及空洞生长速率的关键因素. 应力迁移是空位在应力梯度作用下沿主导扩散路径进行的空位积聚与成核现象, 应力梯度的作用与扩散作用随温度变化方向相反, 并存在一个中值温度使得应力诱生空洞速率达到极大值. 关键词： Cu互连 应力迁移 应力诱生空洞 失效     

铜互连电迁移失效阻变特性研究

基于铜互连电迁移失效微观机理分析建立一种Cu／SiCN互连电迁移失效阻变模型，并提出一种由互连阻变曲线特征参数即跳变台阶高度与斜率来获取失效物理参数的提取方法．研究结果表明，铜互连电迁移失效时间由一定电应力条件下互连阴极末端晶粒耗尽时间决定．铜互连电迁移失效一般分为沟槽型和狭缝型两种失效模式．沟槽型空洞失效模式对应的阻变曲线一般包括跳变台阶区和线性区两个特征区域．晶粒尺寸分布与临界空洞长度均符合正态对数分布且分布参数基本一致．阻变曲线线性区斜率与温度呈指数函数关系．利用阻变模型提取获得的电迁移扩散激活能约为0．9eV,与Black方法基本一致．     

有丢失物缺陷的铜互连线中位寿命的定量研究

本文研究了六层互连线上的丢失物缺陷对互连电迁移中位寿命的影响,提出了各层互连线缺陷处的温度模型和缺陷在不同互连层的中位寿命模型,能够定量地计算缺陷对互连电迁移中位寿命的影响,给出了提高互连线中位寿命的方法.研究结果表明：互连线宽度与缺陷处互连线有效宽度的比值越大,互连线寿命越短;缺陷处的温度越高,互连线寿命越短.在互连线参数变化明显的层与层之间,互连线寿命受比值和温度的双重影响,寿命急剧下降.根据该物理模型可以准确计算出互连线具体的温度和寿命数据,可以直接指导集成电路的设计和工艺制造. 关键词： 丢失物缺陷 中位寿命 可靠性 铜互连     

A new model for electromigration grain boundary noise based on free volume

Grain boundary plays a key role in electromigration process of polycrystal interconnection. We take a free volume to represent a 'vacancy--ion complex' as a function of grain boundary specific resistivity, and develop a new characterisation model for grain boundary noise. This model reveals the internal relation between the boundary scattering section and electromigration noise. Comparing the simulation result with our experimental result, we find the source as well as the form of noise change in the electromigration process. In order to describe the noise enhancement at grain boundary quantitatively, we propose a new parameter-grain boundary noise enhancement factor, which reflects that the grain boundary noise can characterise the electromigration damage sensitively.     

Discrete resistance fluctuations in pressure-type point contacts

In high ohmic pressure-type metallic point contacts (resistance range 50 Ω to 3 k Ω) the point-contact resistance is observed to switch randomly between two or more discrete levels. This effect can be explained by the motion or reorientation of single defects, thereby changing their cross section for electron scattering. From the temperature- and voltage-dependence of the characteristic times of the fluctuations, electromigration parameters for a defect in silver are extracted.     

一种考虑几何屏蔽效应的计算“电子-分子”散射总截面的可加性规则修正方法

在考虑分子内原子间的几何屏蔽效应随电子入射能量变化的基础上, 提出了一种能够在中、高能区准确计算“电子-分子”散射总截面的可加性规则修正方法. 利用这一修正后的可加性规则并使用“电子-C, H, O, N原子”散射总截面的实验数据, 在50—5000 eV内计算了电子被NO, N₂O, NO₂和C₂H₆分子散射的总截面, 且将计算结果与实验结果及其他理论结果进行了比较. 结果表明, 利用这一方法修正过的可加性规则进行计 关键词： 电子散射 可加性规则 总截面 几何屏蔽效应     

Calculation of the Scattering Cross Section of Auroral Irregularities

Calculation of the scattering cross section per unit volume of auroral irregularities requires comprehensive knowledge of the law describing the formation of irregularities at both linear and nonlinear stages. In this paper, we calculate the scattering cross section using a simple idealized nonlinear model proposed by St.-Maurice and Schlegel. It is shown that the theoretical dependence of the scattering cross section per unit volume on the radar frequency calculated in terms of this model is in good agreement with the experimental curve.     

Experimental study of the spatial distributions of relativistic electron beams reflected and refracted by a thin foil

The ratio of the cross section for inelastic scattering to the total cross section for scattering of a fast electron by a cluster, depending on the number of atoms in the cluster, is shown to be not a monotonic function. This nonmonotonicity is not related to the well-known nonmonotonic dependences determined, for example, by the magic numbers in the shell model of clusters but is of purely quantum origin: the coherence of elastic electron scattering and the incoherence of inelastic one by a multipartice target.     

AL L CORE EDGE FINE STRUCTURE IN Al,AlN AND α-Al2O3：A COMPARISON OF MICROELECTRON ENERGY LOSS SPECTRA WITH THEORY

The Al L near-edge fine structures of aluminum and its compounds with nitrogen and oxygen are studied using electron energy loss microspectroscopy in a transmission electron microscope. These edges are normalized to the same scattering cross section per Al atom per electronvolt. The cross section is calculated by using the Born approximation. The contributions to the cross section are from the valence shell crystal states obtained by using the extended Hückel band calculation and the ionization states obtained by using the electron gas model. The chemical effects in the ionization region are taken into account by in cluding the contributions from the elastic backscattering of outgoing plane waves by the atoms that neighbor the excited atoms. The results by theoretical calculation agree semiquantitatively with experimental results.     

AL L CORE EDGE FINE STRUCTURE IN Al, AlN AND α-Al2O3：A COMPARISON OF MICROELECTRON ENERGY LOSS SPECTRA WITH THEORY

The Al L near-edge fine structures of aluminum and its compounds with nitrogen and oxygen are studied using electron energy loss microspectroscopy in a transmission electron microscope. These edges are normalized to the same scattering cross section per Al atom per electronvolt. The cross section is calculated by using the Born approximation. The contributions to the cross section are from the valence shell crystal states obtained by using the extended Hückel band calculation and the ionization states obtained by using the electron gas model. The chemical effects in the ionization region are taken into account by in cluding the contributions from the elastic backscattering of outgoing plane waves by the atoms that neighbor the excited atoms. The results by theoretical calculation agree semiquantitatively with experimental results.     

Cross sections of electron capture and electron capture ionization versus the impact parameter in collisions of a proton with multielectron atoms

The absolute differential cross sections of scattering of hydrogen atoms resulting from an electron capture and an electron capture ionization are measured for collisions of 4.5- and 11-keV protons with argon and xenon atoms. The range of scattering angles is 0°–2°. From the scattering differential cross section found experimentally, the probabilities of single-electron capture and electron capture ionization as a function of the impact parameter are calculated. The dependences of the incident particle scattering angle on the impact parameter (deviation function) for interactions with Ar and Xe atoms are calculated in terms of classical mechanics using the Moliére—Yukawa potential to describe the interaction of atomic particles. Analysis is given to the probabilities of electron capture and electron capture ionization versus the impact parameter and to the distribution of the electron density on different electron shells in a target atom versus a distance to the core. It is concluded that only electrons from the outer shell of the target atom are involved in the process of electron capture ionization. The cross section of electron capture ionization is calculated in the proton energy range 5–20 keV.     

1KeV电子入射单电离氦原子三重微分散射截面的理论研究

用3C模型、DS3C模型对1KeV电子入射氦原子(e,2e)反应中的三重微分散射截面进行了计算,并将理论计算结果与实验数据进行了比较,研究了各种屏蔽效应对散射平面内以及垂直平面内三重微分散射截面的影响,并对三重微分散射截面变化规律进行了探讨.结果表明:各种屏蔽效应对散射平面内三重微分散射截面的贡献可以忽略;而在垂直平面内,这些效应对三重微分散射截面结构存在较强影响;另外,末态出射电子与靶核的相互作用直接影响散射平面内和垂直平面内截面的结构及其变化规律.     

一种计算中、高能电子被分子散射总截面的修正势方法

在考虑分子内成键原子间的电子云重叠效应的基础上，提出了一种能够在中、高能区准确计算“电子-分子”散射总截面的修正势方法.利用可加性规则及Hartree-Fock波函数，使用这一修正过的复光学势，在30—5000eV内对电子被4个等电子(Z=18)分子(HCl，H₂S，PH₃和SiH₄)散射的总截面进行了计算，并将理论计算值与实验结果及其他理论值进行了比较.结果表明，利用这一修正过的复光学势及可加性规则进行计算，所得理论值与实验结果更为接近. 关键词： 电子散射 总截面 可加性规则 束缚原子