增强型Cascode结构氮化镓功率器件的高能质子辐射效应研究

针对增强型共栅共源(Cascode)级联结构和耗尽型AlGaN/GaN功率器件,利用60 MeV能量质子开展辐射效应研究.获得了经质子辐照后器件电学性能的退化规律,并与常规耗尽型HEMTs器件辐照后的电学性能进行了比较,发现增强型Cascode结构器件对质子辐照更加敏感,分析认为级联硅基MOS管的存在是其对质子辐照敏感的主要原因.质子辐照使硅基MOS管栅氧化层产生大量净的正电荷,诱导发生电离损伤效应,使其出现阈值电压负向漂移及栅泄漏电流增大等现象.利用等效(60 MeV能量质子,累积注量1×10¹² p/cm²)剂量的⁶⁰Co γ射线辐射器件得到电离损伤效应结果,发现器件的电学性能退化规律与60 MeV能量质子辐照后的退化规律一致.通过蒙特卡罗模拟得到质子入射在Cascode型器件内诱导产生的电离能损和非电离能损,模拟结果表明电离能损是导致器件性能退化的主要原因.     

不同能量质子辐照诱发CCD图像传感器性能退化实验与分析

为了评估电荷耦合器件(CCD)在空间科学探测以及航天卫星成像等空间辐射环境中应用的可靠性,揭示了CCD转换增益以及线性饱和输出等重要性能参数的退化机制及其实验规律。辐照实验在质子回旋加速器上进行,质子能量为60 MeV和100 MeV,质子注量分别为1×10¹⁰ cm^-2、5×10¹⁰ cm^-2和1×10¹¹ cm^-2。将CCD的主要性能参数在两个不同能量质子辐照后进行比较,实验结果表明,CCD的性能参数对质子辐照产生的电离损伤和位移损伤非常敏感,辐照后转换增益和线性饱和输出明显下降,且暗信号尖峰和暗电流明显增大。此外,分析了质子辐照CCD诱发的电离损伤和位移损伤,给出了CCD性能参数退化与质子辐照能量和注量的变化关系曲线。     

质子辐照CH3NH3PbI3基钙钛矿太阳能电池的损伤效应

针对钙钛矿太阳能电池(PSCs)的空间应用,研究了动能为0.1—20.0 MeV的质子在CH₃NH₃PbI₃(简称MAPbI₃)薄膜及其太阳能电池中引起的损伤效应.结果表明, PSCs具有良好质子辐照稳定性,当0.1 MeV(2.0 MeV)质子的注量超过1×10¹³ p/cm² (1×10¹⁴ p/cm²)时,才会引起电池光电性能的降低. PSCs载流子传输层的辐照退化可能是造成电池性能降低的主要原因. MAPbI₃中的有机成分MAI会在质子辐照作用下发生分解,分解产生的气态产物(NH₃和CH₃I)将最终导致PSCs表面金电极的剥落.对于具有更大离子射程的10 MeV和20 MeV质子,入射质子会在PSCs的玻璃基底中产生色心缺陷,造成玻璃对可见光透射率的降低.色心缺陷可以在室温或100℃条件下发生热退火,降低玻璃的透射损失.     

现代物理信息

 1.D_?⁺的新衰变道.第一次观测到D_?⁺→ηρ⁺,η¹ρ⁺,确定了D_?⁺→φρ⁺.这些衰变方式的分支比,比D_?⁺→φπ⁺要大.（CLEO collaboration,No.9）2.新的质子放射同位素.用300MeV的⁵³Ni离子轰击¹⁰⁶Cd靶,经质量分离而得最重的放射质子同位素¹⁶⁰Re与¹⁵⁶Ta.测到放出质子的能量、总寿命和质子分支比,对¹⁶⁰Re是1261±6KeV、790±160μs和（91±10）%,对¹⁵⁶Ta是1022±13KeV、165_-55⁺¹⁶⁵ms和～100%.（R.D.Page et al.,No.9）3.飞秒激光产生MeV级能量的X射线0.5TW、120fs Ti:兰宝石激光照射到固体靶上,当聚焦达10¹⁸W/cm²时,产生的等离子体会放出能量超过1MeV的X射线.产额随入射激光功率的3/2而上升.40mJ激光打靶,X射线能量在20Key以上的能量转换达0.3%,X射线的能谱符合1/E分布.     

975 nm量子阱激光二极管的质子位移损伤

针对典型卫星轨道辐射环境下激光二极管(LD)的可靠性评估问题，对自研的975 nm GaAs基量子阱(QW)LD开展了10 MeV质子、3×10⁸～3×10¹¹ cm^-2注量的地面模拟辐照实验。结合蒙特卡罗软件仿真模拟和数学分析方法，全面研究了器件位移损伤退化规律，以及不同注量、不同辐照缺陷对器件功率特性、电压特性和波长特性等关键参数的影响。结果显示，质子辐照会引入非辐射复合中心等缺陷并破坏界面结构，导致载流子浓度降低、光电限制能力下降，宏观上体现为器件阈值电流增加、输出功率下降、波长红移和单色性受损。同时，3×10¹⁰ cm^-2以上注量的10 MeV质子等效位移损伤剂量辐照会对975 nm QW LD性能产生较大影响。     

Ti/4H-SiC肖特基势垒二极管抗辐射特性的研究

本文采用γ射线、高能电子和中子对Ti/4H-SiC肖特基势垒二极管(SBD)的抗辐射特性进行了研究.研究发现对于γ射线和1 MeV电子辐照,-30 V辐照偏压对器件的辐照效应没有明显的影响.经过1 Mrad(Si)的γ射线或者1×l0¹³ n/cm²的中子辐照后,Ti/4H-SiC肖特基接触都没有明显退化;经过3.43×10¹⁴ e/cm²的1 MeV电子辐照后Ti/4H-SiC的势垒高度比辐照前轻微下降,这是由于高能 关键词： 碳化硅 肖特基 辐照 偏压     

近玻尔速度能区高电荷态离子与激光等离子体相互作用实验研究装置

近玻尔速度能区高电荷态离子在稠密等离子体中的能量损失是强流重离子束驱动的高能量密度物理等前沿研究中的核心物理问题之一.基于中国科学院近代物理研究所的320 kV实验平台,新建立了一套近玻尔速度能区离子束与激光等离子体相互作用的实验研究装置,用于开展高精度的离子能量损失和电荷态研究.本文将详细介绍该装置的特点,包括脉冲离子束(≥200 ns)的产生与调控、高密度(10¹⁷—10²¹ cm^–3)激光等离子体靶的制备、等离子体参数诊断与离子的高精度测量(<1%)等.基于该装置已开展了百keV的质子束和4 MeV的Xe¹⁵⁺离子束与激光Al等离子体靶相互作用的实验,并取得了相应的结果.本实验装置能够为中国在近玻尔速度能区高电荷离子与稠密激光等离子体相互作用研究提供高精度的实验数据,以促进理论工作的发展.     

用20—1020 keV单能质子刻度CR-39固体核径迹探测器

用北京师范大学2×1.7MV串列加速器和400 kV高压倍加器产生的20—1020 keV单能质子束对CR-39固体核径迹探测器进行了刻度.为了保证质子的单能性和固体核径迹探测器上径迹密度不能超过10⁶/cm²的要求,对两台加速器分别采用了不同方法控制质子辐照数量.在串列加速器上采用了狭缝加转盘的方法,在高压倍加器上采用了100 ns单次高压脉冲扫描束流的方法,既保持了质子的单色性,又达到了质子注量小于10⁶/cm²的 关键词： 单能质子 固体核径迹探测器 CR-39     

靶的厚度对激光产生的x射线输运到靶后能谱的影响

利用一维辐射流体动力学程序MULTI数值模拟研究了功率为10¹⁴W/cm²、脉冲宽度为1ns、波长为0.35μm的短脉冲强激光辐照不同厚度的平面Au靶时，靶厚度对靶背面x射线能谱结构和辐射强度的影响. 关键词： 激光等离子体 辐射流体力学 x射线转换     

CMOS器件60Co γ射线、电子和质子电离辐射损伤比较

利用TRIM95蒙特卡罗软件计算了质子在二氧化硅中的质量阻止本领和能量沉积，比较了质子在二氧化硅中的电离阻止本领与核阻止本领，分析了质子在材料的表面吸收剂量与灵敏区实际吸收剂量的关系.利用⁶⁰Co γ射线、1MeV电子和2—9 MeV质子对CC4007RH和CC4011器件进行辐照实验，比较⁶⁰Co γ射线和带电粒子的电离辐射损伤情况.实验结果表明，⁶⁰Co γ射线、1MeV 电子和2—7MeV质子辐照损伤效应中，在0V栅压下可以相互等效； 关键词： γ射线 电子 质子 辐射损伤     

Induced absorption in yttrium aluminium perovskite crystals irradiated by 12C and 235U ions

The present work is devoted to investigation of optical absorption in pure and neodymium-doped YAlO₃ (YAP) single crystals in the spectral range 0.2–1.1 μm induced by the influence of ¹²C ions irradiation with energy 4.50 MeV/u (MeV per nucleon) and a fluence 2 × 10⁹ cm^?2 or of ²³⁵U ion irradiation with energy 9.35 MeV/u and a fluence 5 × 10¹¹ cm^?2. The induced absorption in the case of ¹²C ions irradiation is caused by recharging of point growth defects and impurities under the radiation influence. After irradiation by ²³⁵U ions with fluence 5 × 10¹¹ cm^?2 the strong absorption rise is probably caused by contribution of the lattice destruction as a result of heavy ion bombardment.     

Carbon (70 MeV) and copper (120 MeV) ions irradiation effects in Makrofol-N

Makrofol-N polycarbonate was irradiated with carbon (70 MeV) and copper (120 MeV) ions to analyze the induced effects with respect to optical and structural properties. In the present investigation, the fluence for carbon and copper beams was kept in the range of 1×10¹¹– 1×10¹³ ions/cm² to study the swift heavy ion induced modifications. UV–VIS, FTIR and XRD techniques were utilized to study the induced changes. The analysis of UV–VIS absorption studies revealed that the optical energy gap was reduced by 17% on carbon irradiation, whereas the copper beam leads to a decrease of 52% at the highest fluence of 1×10¹³ ions/cm². The band gap can be correlated to the number of carbon atoms, N, in a cluster with a modified Robertson's equation. In copper (120 MeV) ions irradiated polycarbonate, the number of carbon atoms in a cluster was increased from 63 to 269 with the increase of ion fluence from 0 to 1×10¹³ ions/cm², whereas N is raised only up to 91 when the same polymer films were irradiated with carbon (70 MeV) ions under similar conditions. FTIR analysis showed a decrease in almost all characteristic absorption bands under irradiation. The formation of hydroxyl (? OH) and alkene (C?C) groups were observed in Makrofol-N at higher fluence on irradiation with both types of ions, while the formation alkyne end (R? C≡ CH) group was observed only after copper ions irradiation. The radii of the alkyne production of about 3.3 nm were deduced for copper (120 MeV) ions. XRD measurements show a decrease in intensity of the main peak and an increase of the average intermolecular spacing with the increase of ion fluence, which may be attributed to the structural degradation of Makrofol-N on swift ion irradiation.     

Spectroscopic studies of copper and carbon ion irradiated polypropylene

The samples of polypropylene (PP) have been irradiated with 120 MeV ⁶⁴Cu⁹⁺ and 70 MeV ¹²C⁵⁺ ion beams, with the fluence ranging from 1 × 10¹³ to 1 × 10¹¹ ions/-cm⁻². UV-VIS and FTIR techniques have been used to study the chemical and optical properties of these irradiated polymers. UV spectra revealed that the optical-gap energy decreases by 54 % with copper ion irradiation at the fluence of 1 × 10¹³ ions/cm², whereas at the same fluence, carbon beam decreases the optical-gap energy by 20%. FTIR analysis of ion irradiated samples revealed the presence of -OH, C = O and C = C bonds. Alkyne formation has been observed only in the case of copper ion irradiation.      

Probing charge carrier compensation in high energy ion irradiated III–V semiconductor by Raman spectroscopy and Hall measurements

Raman spectroscopy and Hall measurements have been carried out to investigate the differences in near‐surface charge carrier modulation in high energy (~100 MeV) silicon ion (Si⁸⁺) and oxygen ion (O⁷⁺) irradiated n‐GaAs. In the case of O ion irradiation, the observed decrease in carrier concentration with increase in ion fluence could be explained in the view of charge compensation by possible point defect trap centers, which can form because of elastic collisions of high energy ions with the target nuclei. In Si irradiated n‐GaAs one would expect the carrier compensation to occur at a fluence of 2.5 × 10¹³ ions/cm², if the same mechanism of acceptor state formation, as in case of O irradiation, is considered. However, we observe the charge compensation in this system at a fluence of 5 × 10¹² ions/cm². We discuss the role of the complex defect states, which are formed because of the interaction of the primary point defects, in determining carrier concentration in a Si irradiated n‐GaAs wafer. The above results are combined with the reported data from the literature for high energy silver ion irradiated n‐GaAs, in order to illustrate the effect of both electronic and nuclear energy loss on trap creation and charge compensation. Copyright © 2016 John Wiley & Sons, Ltd.     

Swift heavy ion irradiation induced modification of BiFeO3 thin films prepared by sol-gel method

We report the preparation of multiferroic BiFeO₃ thin films on ITO coated glass substrates through sol-gel spin coating method followed by thermal annealing and their modification by swift heavy ion (SHI) irradiation. X-ray diffraction and Raman spectroscopy studies revealed amorphous nature of the as deposited films. Rhombohedral crystalline phase of BiFeO₃ evolved on annealing the films at 550°C. Both XRD and Raman studies indicated that SHI irradiation by 200 MeV Au ions result in fragmentation of particles and progressive amorphization with increasing irradiation fluence. The average crystallite size estimated from the XRD line width decreased from 38 nm in pristine sample annealed at 550°C to 29 nm on irradiating these films by 200 MeV Au ions at 1 × 10¹¹ ions cm⁻². Complete amorphization of the rhombohedral BiFeO₃ phase occurs at a fluence of 1 × 10¹² ions.cm⁻². Irradiation by another ion (200 MeV Ag) had the similar effect. For both the ions, the electronic energy loss exceeds the threshold electronic energy loss for creation of amorphized latent tracks in BiFeO₃.     

Au5+ ion implantation induced structural phase transitions probed through structural,microstructural and phonon properties in BiFeO3 ceramics,using synergistic ion beam energy

Implanted Au⁵⁺-ion-induced modification in structural and phonon properties of phase pure BiFeO₃ (BFO) ceramics prepared by sol–gel method was investigated. These BFO samples were implanted by 15.8?MeV ions of Au⁵⁺ at various ion fluence ranging from 1?×?10¹⁴ to 5?×?10¹⁵?ions/cm². Effect of Au⁵⁺ ions’ implantation is explained in terms of structural phase transition coupled with amorphization/recrystallization due to ion implantation probed through XRD, SEM, EDX and Raman spectroscopy. XRD patterns show broad diffuse contributions due to amorphization in implanted samples. SEM images show grains collapsing and mounds’ formation over the surface due to mass transport. The peaks of the Raman spectra were broadened and also the peak intensities were decreased for the samples irradiated with 15.8?MeV Au⁵⁺ ions at a fluence of 5?×?10¹⁵?ion/cm². The percentage increase/decrease in amorphization and recrystallization has been estimated from Raman and XRD data, which support the synergistic effects being operative due to comparable nuclear and electronic energy losses at 15.8?MeV Au⁵⁺ ion implantation. Effect of thermal treatment on implanted samples is also probed and discussed.     

Investigations on the effect of argon ion bombardment on the structural and optical properties of crystalline gallium antimonide

The effects of bombardment of 250 keV argon ions in n-type GaSb at fluences 2×10¹⁵ and 5×10¹⁵ ions cm^?2 were investigated by high-resolution X-ray diffraction (HRXRD), Fourier transform infrared (FTIR) and scanning electron microscopy (SEM). HRXRD studies revealed the presence of radiation-damaged layer (strained) peak in addition to the substrate peak. The variation in the lattice constant indicates the strain in the bombarded region. The out-of-plane (?_⊥) and in-plane strains (?_|) determined from the profiles of several symmetric and asymmetric Bragg reflections, respectively, were found to change with the ion fluence. Simulations of XRD patterns using dynamical theory of X-ray scattering (single-layer model) for the damaged layer yielded good fits to the recorded profiles. FTIR transmission studies showed that the optical density (α·d) of GaSb bombarded with different fluences increases near the band edge with increase in ion fluence, indicating the increase in the defect concentration. The density of the defects in the samples bombarded with different fluences was in the range of 3.20×10²¹–3.80×10²¹ cm^?3. The tailing energy estimated from the transmission spectra was found to change from 12.0 to 58.0 meV with increasing ion fluences, indicating the decrease of crystallinity at higher fluences. SEM micrographs showed the swelling of the bombarded surface of about 0.33 μm for the fluence of 2×10¹⁵ ions cm^?2, which increased to 0.57 μm for the fluence of 5×10¹⁵ ions cm^?2.     

3 MeV质子辐照对AlGaN/GaN高电子迁移率晶体管的影响

研究了AlGaN/GaN 高电子迁移率晶体管(HEMT)的质子辐照效应. 在3 MeV质子辐照下, 当辐照剂量达到1× 10¹⁵ protons/cm²时, 漏极饱和电流下降了20%, 最大跨导降低了5%. 随着剂量增加, 阈值电压向正向漂移, 栅泄露电流增加. 在相同辐照剂量下, 1.8 MeV质子辐照要比3 MeV质子辐照退化严重. 从SRIM软件仿真中得到不同能量质子在AlGaN/GaN异质结中的辐射损伤区, 以及在一定深度形成的空位密度. 结合变频C-V测试结果进行分析, 表明了质子辐照引入空位缺陷可能是AlGaN/GaN HEMT器件电学特性退化的主要原因.     

50 MeV Li3+ ion irradiation effect on structural, electrical, and dielectric properties of PVA-based nanocomposite polymer electrolytes

Nanocomposite polymer electrolyte thin films of polyvinyl alcohol (PVA)-orthophosphoric acid (H₃PO₄)-Al₂O₃ have been prepared by solution cast technique. Films are irradiated with 50 MeV Li³⁺ ions having four different fluences viz. 5?×?10¹⁰, 1?×?10¹¹, 5?×?10¹¹, and 1?×?10¹² ions/cm². The effect of irradiation on polymeric samples has been studied and characterized. X-ray diffraction spectra reveal that percent degree of crystallinity of samples decrease with ion fluences. Glass transition and melting temperatures have been also decreased as observed in differential scanning calorimetry. A possible complexation/interaction has been shown by Fourier transform infrared spectroscopy. Temperature-dependent ionic conductivity shows an Arrhenius behavior before and after glass transition temperature. It is observed that ionic conductivity increases with ion fluences and after a critical fluence, it starts to decrease. Maximum ionic conductivity of ～2.3?×?10^?5 S/cm owing to minimum activation energy of ～0.012 eV has been observed for irradiated electrolyte sample at fluence of 5?×?10¹¹ ions/cm². The dielectric constant and dielectric loss also increase with ion fluences while they decrease with frequency. Transference number of ions shows that the samples are of purely ionic in nature before and after ion irradiation.     

Electrical and structural properties of the swift heavy ion irradiated Au/n-GaAs schottky barrier diodes

Abstract

Au/n-GaAs Schottky Barrier Diodes (SBDs) have been fabricated on LEC grown silicon doped (100) GaAs single crystals. The SBDs were irradiated using high energy (120 MeV) silicon ion with fluences of 1 × 10 ¹¹ and 1 × 10¹² ions/cm². Current-Voltage (I-V) characteristics of unirradiated and irradiated diodes were analyzed. The change in the reverse leakage current increases with increasing ion fluence. This is due to the irradiation induced defects at the interface and its increase with the fluence. The diodes were annealed at 573 and 673 K. to study the effect of annealing. The rectifying behavior of the irradiated (fluence of 1 × 10¹² ions/cm¹²) SBDs improves upon as the annealing temperature increases and is attributed to the in situ self-annealing during irradiation. Scanning Electron Microscopic analysis was carried out on the irradiated samples to delineate the projected range and to observe defects.