快速退火后重掺硼的分子束外延层的电学特性

对快速退火后用共蒸发Ｂ_２Ｏ₃方法实现重掺杂硼的硅分子束外延层的电学特性进行了研究．１１００℃退火可以使得外延层中载流子浓度提高４倍，空穴的霍耳迁移率与相同浓度下硅体材料的水平相当；外延层与衬底之间载流子浓度转变陡峭，获得了晶体质量良好的外延层． 关键词：     

LaTiO3(110)薄膜分子束外延生长的精确控制和表面截止层的研究

LaTiO₃ 是一种典型的强关联电子材料, 其(110) 薄膜为通过晶格对称性、应变等的设计调控外延结构的物理性质提供了新的机会. 本文研究了SrTiO₃(110) 衬底表面金属La 和Ti 沉积所引起的微观结构变化, 进而利用电子衍射信号对分子束外延薄膜生长表面阳离子浓度的灵敏响应, 发展了原位、实时、精确控制金属蒸发源沉积速率的方法, 实现了高质量LaTiO₃(110) 薄膜的生长和对阳离子化学配比的精确控制. 由于LaTiO₃中Ti³⁺ 3d 电子的库仑排斥作用, 氧原子层截止的(110) 表面更容易实现极性补偿, 因此生长得到的薄膜表面暴露出单一类型的氧截止面.     

稀掺杂GaNxAs1－x(x≤0.03)薄膜的调制光谱研究

利用室温下压电调制反射光(PzR)谱技术系统测量了N掺杂浓度为0.0%—3%的分子束外延生长GaN_xAs_1-x薄膜，并对图谱中所观察的光学跃迁进行了指认.在GaN_0.005As_0.995和GaN_0.01As_0.99薄膜的PzR谱中观察到此前只在椭圆偏振谱中才看到的N掺杂相关能态E₁+Δ₁+Δ_N.当N掺杂浓度达到 关键词： 压电调制反射光谱(PzR) xAs_1-x薄膜')" href="#">GaN_xAs_1-x薄膜 分子束外延(MBE)     

SrRuO3超薄膜制备条件和拓扑霍尔效应的关联

使用激光分子束外延在SrTiO₃(001)衬底上生长SrRuO₃薄膜,并研究激光能量密度、生长温度和靶材表面烧蚀度等生长参数对于SrRuO₃表面形貌、基本磁电性质以及拓扑霍尔效应的影响.当在最优条件下生长SrRuO₃薄膜时,样品表面平整、台阶清晰,具有最低的金属-绝缘体转变温度,电阻率最低,且具有最显著的拓扑霍尔效应;而改变生长参数生长的SrRuO₃薄膜由于存在更多的缺陷,其表面较粗糙,金属-绝缘体转变温度增大,或表现出绝缘体行为,而拓扑霍尔效应会变弱甚至消失.     

激光分子束外延BaTiO3薄膜最顶层表面原子平面与薄膜生长机理

用激光分子束外延技术在SrTiO₃(001)衬底上外延生长了高质量的BaTiO_{3< /sub>薄膜,薄膜的生长过程由反射式高能电子衍射仪(RHEED)原位实时监测,表明薄膜具有 二维层状生长模式.薄膜的晶体结构和表面形貌分别由X射线衍射和原子力显微镜表征,显示 该薄膜为完全c轴取向四方相晶体结构,其表面具有原子尺度光滑性.采用角分辨X射线光电 子谱技术(ARXPS),研究了BaTiO3薄膜表面最顶层原子种类和排列状况.结果表 明,BaTiO3 关键词： 激光分子束外延 3薄膜')" href="#">氧化物BaTiO3薄膜 最顶层表面 角分辨X射线光电子谱}     

MnTe单晶薄膜的外延制备、本征点缺陷结构及电输运优化

砷化镍型MnTe化合物是一类重要的环境友好p型中温热电材料.低空穴浓度是制约MnTe热电材料性能优化的关键因素,目前对于MnTe热电材料的性能优化缺乏系统的实验研究.本文采用分子束外延技术制备MnTe薄膜,并用扫描隧道显微镜表征其本征点缺陷,最终通过本征点缺陷的调控实现了MnTe的电输运性能大幅优化.结果表明, Mn空位(V_Mn)和Te空位(V_Te)是MnTe薄膜的主要本征点缺陷结构.随着薄膜生长温度(T_sub)的提高或Mn∶Te束流比的降低, MnTe薄膜的空穴浓度得到了大幅提升,最高空穴浓度可达21.5×1019 cm–3,比本征MnTe块体获得的数值高一个数量级.这归因于MnTe薄膜中p型V_Mn浓度的显著增加,并引起电导率和功率因子的显著提升.最后,在T_sub=280℃以及Mn∶Te=1∶12条件下生长的MnTe薄膜获得了所有样品中最高的热电功率因子,在483 K达到1.3μW·cm^–1·K^–2.本研究阐明了MnTe中存在的本征...     

反射式高能电子衍射实时监控的分子束外延生长GaAs晶体衬底温度校准及表面相变的研究

以反射式高能电子衍射(RHEED)作为实时监测工具,根据GaAs(100)表面重构相与衬底温度、As₄等效束流压强之间的关系,对分子束外延(MBE)系统中衬底测温系统进行了校准,这种方法也适用于其他的MBE系统.为生长高质量的外延薄膜材料、研究InGaAs表面粗糙化及相变等过程提供了实验依据. 关键词： 分子束外延 反射式高能电子衍射 表面重构 温度校准     

富锌条件下生长氮掺杂氧化锌薄膜的光学和电学性质

报道了采用等离子体辅助分子束外延方法(P-MBE),利用NO作为N源和O源,在c-面蓝宝石(c-Al₂O₃)衬底上外延生长了N掺杂ZnO薄膜。X射线衍射谱(XRD)和吸收谱中都出现了不同于未掺杂样品的特性,X射线光电子谱(XPS)中也发现了N的受主信号。但是在霍尔效应(Hall-effect)测量中,发现该样品并没有出现预期的p型导电特性,而是出现载流子浓度很高(2.15×10²⁰cm^-3)的n型导电特性。结合XPS结果和理论分析,认为在富Zn条件下生长会导致过量的填隙Zn原子,补偿了全部的受主后,又促使其出现了从半导体-金属的Mott转变。     

GaxN2:Zn3-x薄膜的分子束外延生长及其光学和电子输运性能表征

本文采用分子束外延技术,通过对金属分子束的精确控制,在MgO(002)基底上成功生长了Ga_xN₂∶Zn_3-x合金薄膜.高分辨率单晶X光衍射仪表征结果表明Ga_xN₂∶Zn_3-x合金薄膜仍是以(400)Zn₃N₂为主导的复合晶体结构,对衍射数据的分析得到该薄膜晶粒尺寸小.用扫描电子显微镜和能谱射线分析仪对其表面和成分做了深入的分析和讨论,在固定的金属流量比的生长环境下,不同厚度的样品在成膜后x均为0.65,化学通式Zn_2.35Ga_0.65N₂.该结果表明Ga元素属于重度掺杂,同时也体现了分子束外延技术在共掺杂技术中的优越性.本文也测量并讨论了Zn_2.35Ga_0.65N₂薄膜的光学性能,实验得到的1.85 eV的光学带隙与理论推算基本吻合,说明Ga的掺入有Ga-N结构...     

分子束外延生长AlGaAs/GaAs GRIN-SCH SQW激光器中高温陷阱的研究

应用深能级瞬态谱(DLTS)技术研究分子束外延(MBE)生长的AlGaAs/GaAs graded index separate confinement heterostructure single well(GRIN-SCH SQW)激光器的高温陷阱。样品的DLTS表明,在激光器的n-AlGaAs层里存在着高温(空穴、电子)陷阱,它直接影响着激光器的性能。高温空穴陷阱可能分布在x_Al =0.2→0.43和x_Al=0.43的n-AlGaAs层界面附近,而高温电子陷阱则可能分布在x_Al=0.43的n-AlGaAs层里x_Al值不连续的界面附近。高温电子陷阱的产生可能与AlGaAs层里的O有关。 关键词：     

Thermal,transport, and magnetotransport properties of free charge carriers in Mn-doped structures with a GaAs/InGaAs/GaAs quantum well

The results of investigation of the magnetic and transport properties of a GaAs/InGaAs/GaAs quantum well delta-doped with carbon and manganese from different sides and containing a ferromagnetic phase are analyzed. A thermodynamic model is formulated and the composition of a system consisting of neutral Mn atoms, Mn ions, and holes in the quantum well is calculated for determining the concentration of free charge carriers. The contributions to the resistance from different mechanisms of hole scattering are calculated, and good agreement with the experimental temperature dependences of the resistance is attained. The calculated and experimental values of the negative magnetoresistance associated with variation in the contribution of scattering from magnetic ions of the spin-polarized system of charge carriers are found to be in quantitative agreement.     

Growth mode and effect of carrier gas on In0.53Ga0.47As/InP surface morphology grown with trimethylarsine and arsine

Different growth mode have been observed for InGaAs/InP grown with trimethylarsine and arsine by Metalorganic Vapor Phase Epitaxy (MOVPE) when changing the carrier gas. The surface has been investigated by Atomic Force Microscope (AFM) for epilayers grown at 600°C under pure hydrogen or a mixture of hydrogen and nitrogen as carrier gas. The step/terrace surface morphology was observed for InP/InP and InGaAs/InP (001) using 0.2° off substrates. InP epilayers grown under nitrogen flow show step-bunched terraces as large as 170 nm. The effect of the group V source for InGaAs/InP has been studied. It is shown that the step edge characteristic of step flow growth appears for lattice-matched InGaAs/InP grown with arsine. When using TMAs and hydrogen as a carrier gas, the growth mode and surface roughness depends greatly on V/III ratio and growth temperature. Under nitrogen flow with the combination of TMI+TMG+TMAs, pit-like defects (5–8 nm deep) are visible at high surface concentration (10⁹–10¹⁰/cm²). When increasing V/III ratio, 3D growth occurs simultaneously with pit-like defects, recovering the whole surface of the sample. Various surface morphology characteristics of InGaAs epilayers assessed by AFM characterisation will be presented and discussed.     

Solid source MBE growth of quantum cascade lasers

High material quality is the basis of quantum cascade lasers (QCLs). Here we report the solid source molecular beam epitaxy (MBE) growth details of realizing high quality of InGaAs/InAlAs QCL structures. Accurate control of material compositions, layer thickness, doping profile, and interface smoothness can be realized by optimizing the growth conditions. Double crystal x-ray diffraction discloses that our grown QCL structures possess excellent periodicity and sharp interfaces. High quality laser wafers are grown in a single epitaxial run. Room temperature continuous-wave (cw) operation of QCLs is demonstrated.     

赝配InGaAs/InAlAs调制掺杂异质结构的Shubnikov-de Haas振荡

赝配InGaAs/InAlAs调制掺杂异质结构可以获得很高的电子气面密度和电子迁移率，从而可以制成具有优越高频和低噪声特性的高电子迁移率晶体管(HEMT).文中报道InGaAs/InAlAs调制掺杂异质结构低温下纵向和横向磁阻随磁场强度变化的Shubnikov-de Haas(SdH)振荡和量子Hall效应.对SdH振荡曲线作了快速傅里叶变换，获得了二维电子气的能带结构和各能带上的电子气面密度.分析比较了顶层InGaAs不同掺杂情况对SdH振荡的影响，结果发现顶层InGaAs重掺杂，会对表面态起屏蔽作用， 关键词：     

Laser reflectometry in situ monitoring of InGaAs grown by atmospheric pressure metalorganic vapour phase epitaxy

InGaAs layers on undoped GaAs (0 0 1) substrates were grown by atmospheric pressure metalorganic vapour phase epitaxy (AP-MOVPE). In order to obtain films with different indium composition (x_In), the growth temperature as a growth parameter, was varied from 420 to 680 °C. Furthermore, high-resolution X-ray diffraction (HRXRD) measurements were used to quantify the change of x_In. Crystal quality has been also studied as a function of growth conditions. On the other hand, laser reflectometry (LR) at 632.8 nm wavelength, was employed to in situ monitor epitaxy. Reflectivity-time signal was enabled to evaluate structural and optical properties of samples. We have fitted experimental data to determine optical constants and growth rate of InGaAs at 632.8 nm. In addition, the fitting provided InGaAs thickness as a function of growth time. Based on ex situ characterization by scanning electronic microscopy (SEM) and HRXRD, we propose a practical method, relating the contrast of first reflectivity maximum with the X-ray diffraction peak angular difference between the substrate and epitaxial layer, to determine in situ the In solid composition in InGaAs alloys.     

低温InGaAs/InAlAs多量子阱的分子束外延生长与表征

采用气源分子束外延(GSMBE)生长了低温InGaAs材料,研究了生长温度及As压对InGaAs材料性质的影响,得到优化的生长条件为:生长温度为300 ℃、As压为77.3 kPa。通过Be掺杂,并采用In0.52Al0.48As/In0.53Ga0.47As多量子阱结构,将材料的方块电阻提高到1.632106 /Sq,载流子数密度降低至1.0581014 cm-3。X射线衍射结果表明:InGaAs多量子阱材料具有较高的晶体质量。这种Be掺杂InGaAs多量子阱材料缺陷密度大且电阻率高,是制作太赫兹光电导天线较理想的基质材料。收稿日期:; 修订日期:     

Lateral and vertical ordered one-dimensional InGaAs/GaAs quantum structures

Lateral and vertical ordered one-dimensional quantum structures, i.e. InGaAs/GaAs(001) quantum dot chains and quantum wires, have been obtained using molecular beam epitaxy. It was found that the InGaAs wires or dot chains sit on two-dimensional wetting layers and run along the [-110] direction, as the result of anisotropic strain and in-plane adatom diffusion. This anisotropic nature produces a model system for studying the electronic properties of one-, two-, and three-dimensional quantum confinements and related optical responses. The strain anisotropy is of importance in determining the electronic states of the quantum structures and the surrounding strained barrier. The strain-induced effects, such as change of band-gap and splitting of heavy–light hole states, were studied experimentally and theoretically. Optical anisotropy of these quantum structures is also discussed.     

插入生长AlGaAs薄膜对InAs量子点探测器性能的影响

利用分子束外延生长获得的两个InAs量子点样品制备了n型的量子点红外探测器.对于其中一个器件，在InAs量子点有源区的底部和顶部分别插入生长了AlGaAs势垒层.利用透射电阻显微技术研究了两个样品的结构特性；利用光致发光光谱和光电流谱研究了两个器件的光电性质.实验结果表明，AlGaAs层的插入对器件的探测性质有显著的影响.利用有三维效质量近似模型的计算结果，指认了带内光电流谱中峰结构的起源.     

插入生长AlGaAs薄膜对InAs量子点探测器性能的影响

利用分子束外延生长获得的两个InAs量子点样品制备了n型的量子点红外探测器.对于其中一个器件,在InAs量子点有源区的底部和顶部分别插入生长了AlGaAs势垒层.利用透射电阻显微技术研究了两个样品的结构特性;利用光致发光光谱和光电流谱研究了两个器件的光电性质.实验结果表明,AlGaAs层的插入对器件的探测性质有显著的影响.利用有三维效质量近似模型的计算结果,指认了带内光电流谱中峰结构的起源. 关键词： InAs 量子点 AlGaAs薄膜 光致发光光谱 有效质量近似模型     

Optimization of Metamorphic InGaAs Quantum Wells on GaAs Grown by Molecular Beam Epitaxy

We investigate the molecular beam epitaxy growth of metamorphic InxGal-xAs materials （x up to 0.5） on GaAs substrates systematically. Optimization of structure design and growth parameters is aimed at obtaining smooth surface and high optical qualdty. The optimized structures have an average surface roughness of 0.9-1.8 nm. It is also proven by PL measurements that the optical properties of high indium content （55%） InGaAs quantum wells are improved apparently by defect reduction technique and by introducing Sb as a surfactant. These provide us new ways for growing device quality metamorphic structures on GaAs substrates with long-wavelength emissions.