������ϵ縺������������ļ����յ����°��뼼������о�

采用波长532nm的高能脉冲激光束照射40.68MHz激发的容性耦合氧等离子体,并给处于激光束中央的探针施加一定的正偏压,由此诊断氧等离子体的空间电位和电负度.实验结果表明,探针偏压从0V逐渐增加时,探针搜集的电流波形从V型向倒U型转变,转变电压点正是电负性等离子体的空间电位.尝试着给出了运用激光诱导光致剥离技术诊断电负性等离子体空间电位的经验方法.另外,探针上施加的正偏压高于等离子体空间电位时,等离子体的电负度基本保持不变.实验还表明,氧等离子体的电负度随着射频输入功率的增加而呈现下降的趋势.     

容性耦合电负性氧等离子体的激光诱导光致剥离技术诊断研究

采用波长532nm的高能脉冲激光束照射40.68MHz激发的容性耦合氧等离子体,并给处于激光束中央的探针施加一定的正偏压,由此诊断氧等离子体的空间电位和电负度。实验结果表明,探针偏压从0V逐渐增加时,探针搜集的电流波形从V型向倒U型转变,转变电压点正是电负性等离子体的空间电位。尝试着给出了运用激光诱导光致剥离技术诊断电负性等离子体空间电位的经验方法。另外,探针上施加的正偏压高于等离子体空间电位时,等离子体的电负度基本保持不变。实验还表明,氧等离子体的电负度随着射频输入功率的增加而呈现下降的趋势。     

射频容性耦合Ar/O_2等离子体的轴向诊断

实验通过朗缪尔探针辅助激光诱导解离技术对27.12 MHz驱动的不同含氧量条件下容性耦合Ar等离子体进行了诊断研究.通过质量流量计改变通入Ar与O_2的流量以得到不同含氧量的等离子体.结果表明,由于氧气的分解吸附反应需要消耗电子,致使朗缪尔探针测得的电子能量概率函数(EEPF)的中能部分随着含氧量的上升而下降.射频输入功率增加时电子密度的上升引起了电子-电子碰撞热化,从而使EEPF由Druyvesteyn分布向麦克斯韦分布转变.在功率电极附近,由于鞘层边界附近的电子氧气分子碰撞时的分解吸附反应使得鞘层区附近的负离子密度较高.另外,负离子密度沿着轴向呈现勺型分布的特征.这主要是由于负离子在双极电场作用下向等离子体放电中心扩散的过程中所存在的负离子产生与损失的反应过程导致.     

ICP等离子体鞘层附近区域发光光谱特性分析

为了独立控制鞘层附近区域离子密度和离子能最分布,采用光发射谱(OES)测量技术,对不同射频功率、放电气压和基底偏压下感应耦合等离子体鞘层附近区域辉光特性进行了研究.原子谱线和离子谱线特性分析表明,在鞘层附近区域感应耦合等离子体具有较高的离子密度和较低的电子温度.改变放电气压和射频功率,对得到的光谱特性分析表明,鞘层附近区域离子密度随射频功率的增大而线性增大,在低压下随气压的升高而增大.低激发电位原子谱线强度增加迅速,高激发电位原子谱线强度增加缓慢,而离子谱线强度增加很不明显.改变基底直流偏压,对得到的发射光谱强度变化分析表明,谱线强度随基底正偏压的增加而增大.随着基底负偏压的加入,谱线强度先减小而后增大;直流偏压为-30 V时,光谱强度最弱.快速离子和电子是引起Ar激发和电离过程的主要能量来源.     

60MHz电容耦合等离子体中电子能量分布函数特性研究

甚高频(频率大于30 MHz)耦合放电源由于能产生大面积高密度的等离子体而受到了人们的广泛关注. 采用电流、电压探针以及朗缪尔探针诊断技术对60MHz射频激发产生的容性耦合等离子体的放电特性及电子行为进行了研究. 实验结果表明,等离子体的等效电阻/电容随着射频输入功率的增加而减小/增加;等离子体中电子行为不仅依赖于射频输入功率,还与放电气压密切相关;放电气压的增加导致电子能量概率分布函数(EEPF)从双温Maxwellian分布向Druyvesteyn分布转变,而且转变气压远低于文献所报道的数值,这主要是由于在60MHz容性耦合等离子体中电子反弹共振加热效率大为降低. 关键词： 甚高频容性耦合等离子体 朗缪尔探针诊断 电子加热模式     

高功率脉冲非平衡磁控溅射放电特性和参数研究

用线圈电流控制非平衡磁场,用汤森放电击穿形成深度自触发放电,用磁阱捕获放电形成的二次电子和导致漂移电流,形成了高功率非平衡磁控溅射放电。采用偏压为-100V相对磁控靶放置的圆形平面电极收集饱和离子电流;在距离磁控靶14cm的位置由Langmuir探针测量浮置电位;示波器测量磁控靶的脉冲电压、电流、浮置电位和饱和离子电流信号。装置的放电脉冲功率达到0.9MW,脉冲频率最大值为40Hz左右,空间电荷限制条件是控制电子电流和离子电流的主要机制。     

�߹��������ƽ��ſؽ���ŵ����ԺͲ����о�

用线圈电流控制非平衡磁场,用汤森放电击穿形成深度自触发放电,用磁阱捕获放电形成的二次电子和导致漂移电流,形成了高功率非平衡磁控溅射放电。采用偏压为-100V相对磁控靶放置的圆形平面电极收集饱和离子电流;在距离磁控靶14cm的位置由Langmuir探针测量浮置电位;示波器测量磁控靶的脉冲电压、电流、浮置电位和饱和离子电流信号。装置的放电脉冲功率达到0.9MW,脉冲频率最大值为40Hz左右,空间电荷限制条件是控制电子电流和离子电流的主要机制。     

容性耦合射频氩等离子体放电诊断研究及仿真模拟

针对中等气压、中等功率下射频容性耦合(CCRF)等离子体的放电特性,采用基于流体模型的COMSOL软件仿真,建立一维等离子体放电模型,以Ar为工作气体,研究同一气压时不同射频输入功率下等离子体电子温度和电子密度的分布规律。同时依据仿真模型设计制作相同尺寸的密闭玻璃腔体和平板电极,实验测量了不同射频输入功率时放电等离子体的有效电流电压及发射光谱,进而计算等离子体的电子温度及电子密度;利用玻耳兹曼双线测温法,得到光谱法下等离子体的电子温度及电子密度。结果表明:当气体压强为250 Pa、输入功率为100~450 W时,等离子体电压电流呈线性关系,电子密度随功率的增大而增大,而电子温度并未随功率的变化而有明显变化,其与功率无关。运用仿真模拟验证了实验的准确性,通过比较,三种方法所得的结果相近。通过结合等效回路法、光谱法和数值模拟仿真法初步诊断出中等气压下等离子体的放电参数,提出了结合三种方法作为实验研究的方法,使实验结果更具说服力,证明其方法的可靠性,也为进一步的等离子体特性研究提供依据。     

射频容性耦合等离子体放电特性的光谱诊断

利用流体模型模拟和发射光谱实验诊断相结合的方法,研究了中等气压、中等功率下射频容性耦合等离子体的放电特性。理论上,采用基于流体模型的COMSOL软件仿真,建立一维等离子体放电模型,以Ar气为工作气体,研究了不同气压以及不同射频输入功率下等离子体电子温度和电子密度的分布规律。实验上,依据仿真模型设计制作了相同尺寸的密闭玻璃腔体和平板电极,采用13.56 MHz射频放电技术电离腔体内的工作气体Ar气,测量了不同气压、不同射频输入功率时放电等离子体的发射光谱。通过分析和选择适当的Ar Ⅰ和Ar Ⅱ的特征谱线,分别利用玻尔兹曼斜率法以及沙哈-玻尔兹曼方程计算了等离子体的电子温度与电子密度,并结合模拟仿真结果对光谱诊断结果进行了修正。结果表明：当气体压强为300~400 Pa、输入功率为600~800 W时,等离子体近似服从玻尔兹曼分布,此时利用光谱法得到的等离子体参数与仿真结果相符合。仿真模拟与光谱实验诊断相结合的方法可初步诊断出中等气压下等离子体的放电参数,增加了玻尔兹曼斜率法和沙哈-玻尔兹曼方程在等离子体放电中的使用范围,扩大了光谱法在低电子密度容性耦合等离子体参数诊断的应用场合,为中等气压容性耦合等离子体在工业与军事上的应用研究提供了重要物理状态的分析手段。     

射频电感性耦合等离子体调谐基片自偏压特性

采用调节射频电感性耦合等离子体中基片电极与地之间的外部电路阻抗的方法,控制基片电极的射频自偏压。研究了调谐基片自偏压随外部调谐电容值的变化特征,得到了调谐基片射频自偏压随射频放电功率、气压的变化曲线。在一定放电参数区域内,调谐基片射频自偏压随调谐电容的变化曲线呈现跳变、双稳、迟滞现象。     

电负性气体的掺入对容性耦合Ar等离子体的影响

本文利用朗缪尔静电探针对掺入了电负性气体O₂, Cl₂, SF₆的由4068 MHz激发的单射频容性耦合Ar等离子体进行了诊断测量. 测量结果表明: 随着电负性气体流量的增加, 电子能量概率分布函数出现了高能峰, 高能峰且有向高能侧漂移的现象; 电负性气体掺入Ar等离子体后显著降低了等离子体的电子密度; 电子温度随着电负性气体流量比的增加而升高. 另外, 本文还测量了掺入三种电负性气体后在不同流量比下的混合气体等离子体的电负度α . 对实验现象进行了初步的解释. 关键词： 电负性等离子体 电子密度 电子温度 电负度     

A study of methods for moving particles in RF processing plasmas

Methods for moving charged particles in RF processing plasmas are investigated. These methods include varying RF power, varying chamber pressure, attraction and repulsion by an electrostatic probe, and movement with magnetic fields. Varying RF power changes the depth of the potential wells where particles are trapped. The RF power affects shape and location of the traps and the bulk plasma potential. Increasing the chamber pressure moves the sheath edge closer to the wafer being processed. Since particle traps are found at the plasma sheath edge increasing the chamber pressure will move the particle traps (and any trapped particles) closer to the wafer being processed. The Langmuir probe can repel particles when under negative bias and attract them when positively biased. This probe can also distort the sheath edge when the tip resides within the sheath. Applying a magnetic field can change the characteristics of the particle traps and produce a force on the charged dust particles     

Positive ion speed at the plasma–sheath boundary of a negative ion-emitting electrode

One-dimensional fluid model for a planar sheath in front of a negative ion-emitting electrode surface immersed in a collision-less, non-magnetized, electronegative plasma is presented. It was found that the positive ion speed at the plasma–sheath boundary (PSB) increases linearly with negative ion emission from the electrode but attains a saturation value as soon as a virtual cathode is formed near the electrode surface. The effect of negative ion emission on the pre-sheath region shows that the potential drop increases across the pre-sheath in accordance with the rise in positive ion speed at the PSB. The sheath width obtained using the present model shows a similar trend as the Child-Langmuir law, but its magnitude is found to be consistently higher compared with a non-emitting electrode. A plausible explanation has been given to explain these effects.     

负离子对等离子体鞘层特性影响的数值研究

构造强电负性等离子体中平板电极处鞘层形成的模型,使用流体动力学方程组研究等离子体鞘层.得到空间电势、空间静电荷分布和鞘层宽度作为距离函数的数值结果.结果表明,强电负性鞘层中,在等离子体区和鞘层区之间几乎没有过渡的预鞘区,在靠近极板附近鞘层里的电子、负离子和正离子的分布形成一个纯正离子鞘区.在靠近鞘边附近,空间静电荷密度分布有一个很尖的峰.发现同电正性情形相比,强电负性鞘层的宽度要窄很多,空间电势下降得快得多.     

Measurement of electronegativity during the E to H mode transition in a radio frequency inductively coupled Ar/O_2 plasma

This paper presents the evolution of the electronegativity with the applied power during the E to H mode transition in a radio frequency(rf)inductively coupled plasma(ICP)in a mixture of Ar and O2.The densities of the negative ion and the electron,as well as their ratio,i.e.,the electronegativity,are measured as a function of the applied power by laser photo-detachment combined with a microwave resonance probe,under different pressures and O2 contents.Meanwhile,the optical emission intensities at Ar 750.4 nm and O 844.6 nm are monitored via a spectrograph.It was found that by increasing the applied power,the electron density and the optical emission intensity show a similar trench,i.e.,they increase abruptly at a threshold power,suggesting that the E to H mode transition occurs.With the increase of the pressure,the negative ion density presents opposite trends in the E-mode and the H-mode,which is related to the difference of the electron density and energy for the two modes.The emission intensities of Ar 750.4 nm and O 844.6 nm monotonously decrease with increasing the pressure or the O2 content,indicating that the density of high-energy electrons,which can excite atoms,is monotonically decreased.This leads to an increase of the negative ion density in the H-mode with increasing the pressure.Besides,as the applied power is increased,the electronegativity shows an abrupt drop during the E-to H-mode transition.     

Negative Ion Kinetics in RF Glow Discharges

Using temporally and spatially resolved laser spectroscopy, we have determined the identities, approximate concentrations, effects on the local field, and kinetics of formation and loss of negative ions in RF discharges. Cl- and BCl3- are the dominant negative ions found in low-frequency discharges through Cl2 and BCl3, respectively. The electron affinity for Cl is measured to be 3.6118 ± 0.0005 eV. Negative ion kinetics are strongly affected by application of the RF field. Formation of negative ions by attachment of slow electrons in RF discharges is governed by the extent and duration of electron energy relaxation. Similarly, destruction of negative ions by collisional detachment and field extraction is dependent upon ion energy modulation. Thus, at low frequency, the anion density peaks at the beginning of the anodic and cathodic half-cycles after electrons have attached but before detachment and extraction have had time to occur. At higher frequencies, electrons have insufficient time to attach before they are reheated and the instantaneous anion density in the sheath is greatly reduced. When the negative ion density is comparable to the positive ion density, the plasma potential is observed to lie below the anode potential, double layers form between sheath and plasma, and anions and electrons are accelerated by large sheath fields to electrode surfaces.     

ANALYSIS OF DUAL FREQUENCY CONFINED CAPACITIVELY COUPLED PLASMA AT LOW POWER

Confined dual frequency hydrogen plasma discharge has been investigated with microwave interferometer method and radial profiles are taken by Abel inversion technique. Dual radio-frequency sources, operating at 27.12MHz and 1.94MHz, are coupled to each other through the plasma. 27.12MHz RF power is used to enhance plasma density and 1.94MHz power is used to enhance ion acceleration energy to the electrode. Radial density profiles has been taken for comparing the effects of low frequency source that the secondary RF source causes reduction in plasma density due to the sheath expansion. Instead radial density profile is assumed as flat by most of the models, there is about 2.5eV of potential drop occurs from centre to boundary at 40W of primary source power. It has been observed that increasing sheath width (increasing the secondary source power to primary source power) reduces the bulk plasma volume and makes potential profile flattening in y direction. While the high frequency power is dissipated by electrons in the bulk plasma; low frequency power is mostly dissipated by ions in the sheath region. Using both high and low frequency power, we may control plasma density and ion acceleration energy to the electrode simultaneously.     

Feasibility study on high current ion beam extraction from anode spot plasma for large area ion implantation

In this paper, we have investigated the feasibility of the high current beam extraction from anode spot plasma as an ion source for large area ion implantation. Experiments have been carried out with the ambient plasma produced by inductive coupling with radio-frequency (RF) power of 200 W at the frequency of 13.56 MHz. Anode spot plasmas are generated near the extraction hole of 2 mm in diameter at the center of a bias electrode whose area exposed to the ambient plasma can be changed. It is found that the maximum ion beam current is extracted at the optimum operating pressure at which the area of bias electrode exposed to ambient plasma is fully covered with the anode spot plasma whose size is dominantly determined by the operating pressure for given gas species. It is also observed that the extracted ion beam current increases nonlinearly with the bias power due to the changes in size and shape of the anode spot plasma. With the well-established anode spot plasma operating at the optimum gas pressure, we have successfully extracted high current ion beam of 6.4 mA (204 mA/cm²) at the bias power of 22 W (∼10% of RF power), which is 43 times larger than that extracted from the plasma without anode spot. Based on the experimental results, criteria for electrode design and operating pressure for ion beam extraction from larger extraction aperture are suggested. In addition, the stability of anode spot plasma in the presence of ion beam extraction through an extraction hole is discussed in terms of the particle balance model.