高功率脉冲非平衡磁控溅射放电特性和参数研究

用线圈电流控制非平衡磁场,用汤森放电击穿形成深度自触发放电,用磁阱捕获放电形成的二次电子和导致漂移电流,形成了高功率非平衡磁控溅射放电。采用偏压为-100V相对磁控靶放置的圆形平面电极收集饱和离子电流;在距离磁控靶14cm的位置由Langmuir探针测量浮置电位;示波器测量磁控靶的脉冲电压、电流、浮置电位和饱和离子电流信号。装置的放电脉冲功率达到0.9MW,脉冲频率最大值为40Hz左右,空间电荷限制条件是控制电子电流和离子电流的主要机制。     

非平衡磁控溅射双势阱静电波动及其共振耦合

非平衡磁控靶表面电场和磁场相互正交构成磁阱结构,磁控靶和与之平行的偏压基片之间形成了另一种势阱结构,等离子体静电波动在这两种势阱结构中形成耦合共振.采用Langmuir探针研究等离子体中参数和浮置电位信号的功率谱密度.典型放电条件下两种势阱结构中的本征频率分别约为30—50 kHz和10—20 kHz,两种势阱条件下根据声驻波共振模式计算的电子温度数值与实验结果相符合.     

高功率脉冲磁控溅射的阶段性放电特征

本文从放电靶电流出发,采用一种新的研究方法,即将靶电流分解为多个代表具体放电特性的特征参数,全面而系统的研究了不同的工作气压条件下,靶电流各特征参数随靶电压的增加而进行的演化.结果发现高功率脉冲磁控溅射技术(HPPMS)放电靶电流在靶电压由低向高增加的过程中,出现靶电流峰值和平台值的交替变化,体现出明显的阶段性放电特征,且不同的放电阶段在不同气压下出现一定的移动,会在测量范围内出现某些放电阶段的缺失.本文还通过等离子体发射光谱对HPPMS放电靶前等离子体测量发现五个不同的放电阶段分别主要对应氩原子、铬原子、氩离子、铬离子和氩、铬高价离子的放电,但不同的放电条件下相邻的阶段会出现一定程度的交叠.     

直流电源耦合高功率脉冲非平衡磁控溅射电离特性

采用直流电源放电形成高功率脉冲非平衡磁控溅射(dc-high power impulse unbalanced magnetron sputtering,dc-HPPUMS 或dc-HiPiUMS),利用雪崩放电的击穿机理形成深度自触发放电,同轴线圈和空心阴极控制放电特性和提高功率密度.磁阱俘获雪崩放电形成的二次电子和形成漂移电流,形成了大电流脉冲放电,放电脉冲电流密度峰值超过100 A/cm²,脉冲频率小于40 Hz.由于放电等离子体远没有达到平衡状态,放电电流主要受到空间电荷效应 关键词： 放电 脉冲技术     

氮离子可见区新的激光跃迁

R.A.McFarlane[1]以空气放电获得六条氮离子激光谱线 ; Heard和 Peterson[2]用汞-氮放电在可见光蓝-绿区获得氮离子激光谱线; Cheo和Cooper[3]用脉冲放电方式获得氮离子激光谱线.本文以纯氮为工作物质,采用在脉冲放电回路中串入电感,拉长放电脉宽,适当降低放电峰值电流的技术,获得五条氮一次电离态的激光新谱线:其波长分别为 648.2,464.1,462.1,460.7,460.1毫微米.并对 NII 648.2毫微米谱线,研究了其激光强度与气压的关系,进行了电流及激光脉冲波形测量.激光脉宽比电流脉宽大得多,激光产生于放电余辉中,为复合激光. 本文用脉冲轴向放电…     

220 GHz回旋管脉冲磁场系统和电子枪的设计与实验研究

 根据220 GHz回旋管的工作要求,设计了其所需的脉冲磁场系统与电子枪。脉冲磁场系统采用哑铃状结构,具有均匀区长、电阻小与电感小等优点,可以在较低电容与电压下获得更高的脉冲峰值磁场,并分析了其脉冲放电特性。电子枪采用双阳极磁控注入枪,用EGUN对其进行了设计优化,电子注纵横速度比为1.53,速度零散为3.1%。实验研究表明,脉冲磁场峰值强度达到8 T,电子注电流达到2 A,电子电流基本传输到靶片,控制极与阳极没有截获到电子,脉冲磁场系统与电子枪工作正常,达到设计要求。     

非平衡磁控溅射系统的离子束流控制

在非平衡磁控溅射沉积非磁性金属薄膜过程中,离子,原子到达比、沉积速率等参数是影响薄膜结构和性能的重要因素。根据非平衡磁控溅射沉积过程中离子的分布特点,分别考虑离子和中性粒子的传输,导出了对圆形平面靶非平衡磁控溅射沉积薄膜的放电功率、气压和离子束流密度等参数之间的关系,阐明了放电参数对于沉积过程离子束流密度等参数的影响。在Ar放电条件下,测量了系统的伏安特性;采用偏压平面离子收集电极测量了溅射系统轴向离子束流密度随不同的气压、溅射电流和空间位置的变化规律。结果表明模型分析的结论和实验数据的变化趋势相符合。     

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利用朗缪尔探针和快速傅里叶变换研究了非平衡磁控溅射等离子体静电波动的驻波共振频谱特征。频带宽度为0~300kHz,典型放电条件下磁控靶前2cm和10cm两个位置的共振本征频率变化范围分别为10~50kHz和1~10kHz,研究了线圈电流、气压和放电功率等参数对共振本征频率的影响;指出了非平衡磁控溅射中能够导致等离子体静电驻波共振的两种势阱结构,提出驻波共振机制解释特征频率出现的原因,根据声驻波共振机制计算的电子温度数值符合实验的结果。     

非平衡磁控溅射等离子体频谱特征

利用朗缪尔探针和快速傅里叶变换研究了非平衡磁控溅射等离子体静电波动的驻波共振频谱特征。频带宽度为0~300kHz,典型放电条件下磁控靶前2cm和10cm两个位置的共振本征频率变化范围分别为10~50kHz和1~10kHz,研究了线圈电流、气压和放电功率等参数对共振本征频率的影响;指出了非平衡磁控溅射中能够导致等离子体静电驻波共振的两种势阱结构,提出驻波共振机制解释特征频率出现的原因,根据声驻波共振机制计算的电子温度数值符合实验的结果。     

非平衡磁控溅射系统离子束流磁镜效应模型

为了研究非平衡磁控溅射沉积系统的等离子体特性，采用常规磁控溅射靶和同轴约束磁场构成非平衡磁控溅射沉积系统.在放电空间不同的轴向位置，Ar放电，02Pa和150V偏压条件下，采用圆形平面离子收集电极，测量不同约束磁场条件下的饱和离子束流密度.研究结果表明，在同轴磁场作用下，收集电极的离子束流密度能达到饱和值9mA/cm2左右，有利于在沉积薄膜的过程中产生离子轰击效应.根据磁流体理论分析了同轴约束磁场形成的磁镜效应和对放电过程的影响机理.实验与模型计算结果的比较表明，模型从理论上表达了同轴磁场约束对非平衡磁控溅射等离子体特性的影响规律. 关键词： 等离子体 金属薄膜/非磁性 磁控溅射 磁镜     

甚高频激发的容性耦合Ar+O_2等离子体电负特性研究

利用探针辅助的脉冲激光诱导负离子剥离诊断技术对掺入5%O_2的容性耦合Ar等离子体电负特性进行了诊断研究.首先详细解析了脉冲激光剥离后探针的电信号,分析了探针偏压在低于或高于空间电位下的探针收集信号特征;根据探针偏压与探针收集信号之间的依赖关系,用来描述Ar+O_2等离子体电负特性的等离子体电负度被定义为脉冲激光剥离出的电子电流与偏压高于空间电位的探针收集到的背景电子电流的饱和比值,并对等离子体电负度随放电气压、射频功率以及轴向位置的变化进行了诊断测量.实验结果表明等离子体的电负度随着射频功率的增加而减小、随着放电气压的上升而变大;由于非对称电极的分布特性,在轴向方向上靠近功率电极时等离子体电负度有升高的趋势,这种趋势可能与鞘层边界附近二次电子的动力学行为以及负离子的产生与消失过程有关.     

COmparison of Some Basic Plasma Parameters and Discharge Characteristics of Planar Magnetron Sputtering Discharges in Argon and Neon

A comparative investigation is carried out of the discharge characteristics (current-voltage characteristic and dependence of the running voltage on the gas pressure at constant discharge current), as well as of some plasma parameters (electron temperature, floating potential and plasma potential) and densities of the ion current extracted to the substrate, for discharges in neon and argon in a planar magnetron system for sputtering with a graphite target.     

离子振荡对低压脉冲负电性放电条件的影响

为了研究该离子振荡及其对低气压负电性放电自持条件的影响，建立了一个整体模型描述低气压正负离子等离子体中离子振荡与少量电子的相互作用. 在模型中引入参数r描述电子流体与电极碰撞后的动量保存(或损失)的程度. 发现体系存在一个临界值r=r_c,它导致了两种不同性质的电子损失机理. 另一临界值r=4r_c决定了两种不同的电子密度随时间增长的阈值. 这使得该阈值随r非单调变化, 进而导致RF负电性脉冲放电主动放电阶段初期的自持放电条件参数空间中可以存在间隙. PIC-MCC 关键词： 负电性放电 脉冲放电 离子振荡     

Pulsed intense electron beams generated in transient hollow cathodedischarges: fundamentals and applications

For the commercial application of pulsed power, material processing with intense pulsed particle beams is a very interesting subject. Recently, high-voltage (1-70 kV), low-pressure (1-100 Pa) transient hollow-cathode discharges turned out to be sources for pulsed intense electron beam generation suitable for this application. The remarkable parameters of these electron beams-beam currents of 50-1000 A (10-30% of the maximum discharge current) with a high energy component (mean energy of about 0.25-0.75 of maximum applied voltage) of 20-70% of the maximum beam current, power density up to 10 W/cm², beam diameters of 0.1-3 mm, beam charge efficiency of 3-5%-captured the attention not only of the scientific community in the last decade. The electron beam is emitted during the early phases of the discharge, and only weak dependence of the high energetic peak of the beam current was found on the external capacity, which determine the development of the later high-current phases. However, the beam parameters depend on the breakdown voltage, gas pressure, and discharge geometry (including self-capacity). In this paper, the characteristics of the pulsed intense electron beams generated in two configurations-multigap pseudosparks and preionization-controlled open-ended hollow-cathode transient discharges (PCOHC)-are described. Such electron beams already were used successfully in a variety of pulsed power applications in material processing, deposition of superconducting (YBaCuO) and diamond-like thin films, microlithography, electron sources for accelerators, and intense point-like X-ray sources, and some preliminary experiments revealed new potential applications such as pumping of short-wavelength laser active media. These pulsed electron beams could be used further in any kind of pulsed power applications that require high-power density, small or high electron energy, and small-beam diameters     

Generation of a pulsed high-current low-energy beam in a plasma electron source with a self-heated cathode

The transition of a low-current discharge with a self-heated hollow cathode to a high-current discharge is studied, and stability conditions for the latter in the pulsed–periodic mode with a current of 0.1–1.0 kA, pulse width of 0.1–1.0 ms, and a pulse repetition rate of 0.1–1.0 kHz are determined. The thermal conditions of the hollow cathode are analyzed, and the conclusion is drawn that the emission current high density is due to pulsed self-heating of the cathode’s surface layer. Conditions for stable emission from a plasma cathode with a grid acting as a plasma boundary using such a discharge are found at low accelerating voltage (100–200 eV) and a gas pressure of 0.1–0.4 Pa. The density of the ion current from a plasma generated by a pulsed beam with a current of 100 A is found to reach 0.1 A/cm². Probe diagnostics data for the emitting and beam plasmas in the electron source are presented, and a mechanism behind the instability of electron emission from the plasma is suggested on their basis.     

Sättigungsverhalten und Verlauf der Elektronentemperatur beim Argon-Ionenlaser

Recently saturation of laser power ofCW ion lasers has been observed with large bored laser tubes made of metal segments. The saturation was observed in Argon, Krypton and Xenon in high current regions. In this case it was necessary to calculate the correlation between the electron temperature, electron- and ion-density and on the other hand the discharge quantities as current density and voltage drop. By measuring the discharge quantities at optimum laser power it is possible to determine the optimum electron temperature for any current density. The comparison of the run of these quantities leads to the assumption that the saturation mechanism causes a decrease of the optimum electron temperature.     

高压耦合高功率脉冲磁控溅射的增强放电效应

等离子体源离子注入与沉积技术作为一种可生产高结合力、高致密度涂层的真空镀膜技术,具有广阔的应用前景,尤其适用于高载荷工况下服役的功能涂层制备.该技术中金属等离子体源是关键,而现有的脉冲阴极弧源结构复杂,且由于伴随"金属液滴"而需要增加过滤装置.本文研究了另一种简单结构的金属等离子体源备选一高功率脉冲磁控溅射源(HPPMS)的放电特性,采用等离子体发射光谱仪探索了不同的耦合高压对HPPMS放电靶电流特性和等离子体特性的作用.发现耦合高压对HPPMS放电有明显的促进作用,相同靶电压下的放电强度大幅增加,相对于金属放电,耦合高压对气体放电的促进作用更加明显,但在自溅射为主的高压放电阶段对金属放电的促进作用明显增强.讨论了耦合高压对HPPMS放电的增强机制,发现耦合高压自辉光放电、耦合高压和HPPMS电压构成双向负压形成的空心阴极效应,以及耦合高压鞘层改善的双极扩散效应都对HPPMS放电的增强有明显作用.     

Power absorption corresponding to ion losses in parallel-plate RFdischarges

A simple model of a symmetric parallel-plate RF discharge is studied to illustrate how such discharges may absorb power from an RF power supply in order to sustain DC power losses corresponding to the steady acceleration of ions through the sheaths. The motions of the sheath boundaries over one period are derived assuming that the current density varies sinusoidally. One finds that the sheath thickness increases discontinuously at one sheath whenever the plasma contacts the opposing electrode. This implies that the external power supply delivers an electron pulse from the electrode at higher potential to the electrode at lower potential, so that some power is being absorbed in a pulsed fashion. The power absorbed by the discharge is also calculated for the portions of the RF cycle where the current varies sinusoidally. It is found that power is supplied by the discharge in this phase of the RF cycle, with the energy coming from the deflating sheaths. It is further shown that the sum of the pulsed power absorption and smooth power generation, averaged over one RF period, is equal to the DC ion power losses arising from ions falling through the time-averaged sheath potentials     

新型毫微秒强流脉冲电子束和离子束发生装置

本文讨论一种新的低气压放电型粒子源,用这种装置可以产生能量达70keV,电流密度超过10⁶A/cm²,电流为几百安培的脉冲电子流和安培级的脉冲离子流,作者建议用“电场递增效应”来解释这种多极板放电室的放电机制,由于它造价低、结构简单、重复频率高、寿命长,可以预期,这一装置将会得到广泛应用。 关键词：