Investigations on ionic processes and dynamics in the sheath region of helium and hydrogen discharges by laser spectroscopic electric field measurements

Temporally and spatially resolved measurements of the electric field distribution in the sheath region of RF and dc discharges provide a detailed insight into the sheath and ion dynamics. The electric field is directly related to the sheath ion and electron densities, the sheath voltage, and the displacement current density. Under certain assumptions also the electron and ion conduction current densities at the electrode, the ion current density into the sheath from the plasma bulk, the ion energy distribution function, and the power dissipated in the discharge can be inferred. Furthermore, the electric field distribution can give an indication of the collision-induced conversion between different ion species in the sheath. Laser spectroscopic techniques allow the noninvasive in situ measurement of the electric field with high spatial and temporal resolution. These techniques are based on the spectroscopic measurement of the Stark splitting of Rydberg states of helium and hydrogen atoms. Two alternative techniques are applied to RF discharges at 13.56 MHz in helium and hydrogen and a pulsed dc discharge in hydrogen. The measured electric field profiles are analyzed, and the results discussed with respect to the ion densities, currents, energies, temporal dynamics and species composition. Received: 26 July 2000 / Accepted: 12 December 2000 / Published online: 3 April 2001     

N_2-H_2容性耦合等离子体电非对称效应的particle-in-cell/Monte Carlo模拟

H_2-N_2混合气体电容性耦合射频放电在有机低介电系数材料刻蚀中具潜在研究意义.采用paxticle-incell/Monte Carlo模型模拟了双频(13.56 MHz/27.12 MHz)电压源分别接在结构对称的两个电极上的H_2-N_2容性耦合等离子体特征,研究了其电非对称效应.模拟结果表明,通过调节两谐波间的相位角θ,可以改变其电场、等离子体密度、离子流密度的轴向分布及离子轰击电极的能量分布.当相位角θ为0°时,低频电极(晶片)附近主要离子(H_3~+)的密度最小,离子(H_3~+,H_2~+,H~+)轰击低频电极的流密度及平均能量最高;当θ从0°变化90°时,低频电极的自偏压从-103V到106V近似线性增加,轰击电极的离子流密度变化约±18%,H~+离子轰击低频电极的最大能量约减小2.5倍,轰击电极的平均能量约变化2倍,表明氢离子能量和离子流几乎能独立控制.     

Power absorption corresponding to ion losses in parallel-plate RFdischarges

A simple model of a symmetric parallel-plate RF discharge is studied to illustrate how such discharges may absorb power from an RF power supply in order to sustain DC power losses corresponding to the steady acceleration of ions through the sheaths. The motions of the sheath boundaries over one period are derived assuming that the current density varies sinusoidally. One finds that the sheath thickness increases discontinuously at one sheath whenever the plasma contacts the opposing electrode. This implies that the external power supply delivers an electron pulse from the electrode at higher potential to the electrode at lower potential, so that some power is being absorbed in a pulsed fashion. The power absorbed by the discharge is also calculated for the portions of the RF cycle where the current varies sinusoidally. It is found that power is supplied by the discharge in this phase of the RF cycle, with the energy coming from the deflating sheaths. It is further shown that the sum of the pulsed power absorption and smooth power generation, averaged over one RF period, is equal to the DC ion power losses arising from ions falling through the time-averaged sheath potentials     

Effect of driving frequency on electron heating in capacitively coupled RF argon glow discharges at low pressure

A one-dimensional(1D) fluid model on capacitively coupled radio frequency(RF) argon glow discharge between parallel-plates electrodes at low pressure is established to test the effect of the driving frequency on electron heating. The model is solved numerically by a finite difference method. The numerical results show that the discharge process may be divided into three stages: the growing rapidly stage, the growing slowly stage, and the steady stage. In the steady stage,the maximal electron density increases as the driving frequency increases. The results show that the discharge region has three parts: the powered electrode sheath region, the bulk plasma region and the grounded electrode sheath region. In the growing rapidly stage(at 18 μs), the results of the cycle-averaged electric field, electron temperature, electron density, and electric potentials for the driving frequencies of 3.39, 6.78, 13.56, and 27.12 MHz are compared, respectively. Furthermore,the results of cycle-averaged electron pressure cooling, electron ohmic heating, electron heating, and electron energy loss for the driving frequencies of 3.39, 6.78, 13.56, and 27.12 MHz are discussed, respectively. It is also found that the effect of the cycle-averaged electron pressure cooling on the electrons is to "cool" the electrons; the effect of the electron ohmic heating on the electrons is always to "heat" the electrons; the effect of the cycle-averaged electron ohmic heating on the electrons is stronger than the effect of the cycle-averaged electron pressure cooling on the electrons in the discharge region except in the regions near the electrodes. Therefore, the effect of the cycle-averaged electron heating on the electrons is to "heat" the electrons in the discharge region except in the regions near the electrodes. However, in the regions near the electrodes, the effect of the cycle-averaged electron heating on the electron is to "cool" the electrons. Finally, the space distributions of the electron pressure cooling the electron ohmic heating and the electron heating at 1/4 T, 2/4 T, 3/4 T, and 4/4 T in one RF-cycle are presented and compared.     

射频等离子体鞘层动力学模型

在流体力学方程的基础上建立了一种自洽的无碰撞射频等离子体鞘层动力学模型.这种自洽性包含两个方面:一方面,由于考虑了瞬时鞘层电场对离子运动的影响,因此该模型适用于描述任意频率段的射频鞘层演化过程;另一方面,在模型中采用等效电路方法来自洽地确定极板上的瞬时电位与瞬时鞘层厚度之间的关系.采用数值方法模拟出鞘层的瞬时厚度及极板的瞬时电位变化、鞘层内离子密度和电场强度等物理量的时空变化.结果表明,当射频场的频率小于或等于离子等离子体频率时,离子流密度明显地随时间变化 关键词： 射频 离子 鞘层 流体力学     

Reactor modeling of magnetically enhanced capacitive RF discharge

Magnetic and collisional effects on capacitive radio frequency (RF) discharges for magnetically enhanced reactive ion etching (MERIE) are investigated. Using simplified plasma and sheath models, a collisional magnetic-sheath equation that governs the sheath dynamics under a de magnetic field crossed with a sinusoidal RF electric field is obtained. The sheath equation includes global effects of the bulk plasma. Together with the power-balance equation and the particle-conservation equation, the sheath equation is used to extract a circuit model and predict the electrical behavior of MERIE reactors. Numerical results on the plasma density and the power in MERIE reactors agree well with reported experimental results and the circuit model describes the repeated discharge properties well     

Two-dimensional, self-consistent, three-moment simulation of RFglow discharge

A two-dimensional self-consistent nonequilibrium fluid model is used to simulate radio frequency (RF) glow discharges to evaluate the quantitative effects of the radial and axial flow dynamics inside a cylindrically symmetric parallel-plate geometry. This model is based on the three moments of the Boltzmann equation and on Poisson's equation. Radial/axial flow dynamics of plasma in low-pressure parallel plate RF glow discharges are investigated. Instead of uniform profiles along the radial direction, which are assumed in one-dimensional models, nonplate profiles are obtained from the two-dimensional simulations. Ionization rate and three moment distributions of plasma density, average velocity, and mean energy are presented in a two-dimensional configuration. The maximum ionization rate occurs in the radial sheath region and agrees with experimental results. Variations in ion density distributions at different positions, various gas pressures frequencies, and applied fields are discussed     

用于中性束注入的大功率射频离子源激励器研制

建立了一个等离子体射频激励器,工作气体为氢气,工作气压为0.3Pa,激励器陶瓷桶直径300mm,工作频率1MHz。实现了RF等离子体激发放电,在输入射频功率16kW条件下,采用朗缪尔探针测得的等离子体密度>10¹⁸m^-3,初步建立了一个RF等离子体源实验平台。     

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A radio frequency (RF) driven negative ion source for NBI purpose was established at HUST. The main parameters include: pressure of 0.3Pa, frequency of 1MHz, ceramic cylinder diameter of 300mm. With 16kW RF power input the plasma density is greater than 10¹⁸m^-3.     

Nonlinear dynamics of radio frequency plasma processing reactorspowered by multifrequency sources

The source frequency has a strong influence on plasma characteristics in RF discharges. Multiple sources at widely different frequencies are often simultaneously used to separately optimize the magnitude and energy of ion fluxes to the substrate. In doing so, the sources are relatively independent of each other. These sources can, however, nonlinearly interact if the frequencies are sufficiently close. The resulting plasma and electrical characteristics can then be significantly different from those due to the sum of the individual sources. In this paper, a plasma equipment model is used to investigate the interaction of multiple frequency sources in capacitively and inductively coupled RF excited plasmas. In capacitively coupled systems, we confirmed that the plasma density increases with increasing frequency but also found that the magnitude of the DC bias and DC sheath voltage decreases. To produce a capacitively coupled discharge having a high plasma density with a large DC bias, we combined low and high frequency sources. The plasma density did increase using the dual frequency system as compared to the single low frequency source. The sources, however, nonlinearly interacted at the grounded wall sheath, thereby shifting both the plasma potential and DC bias. In inductively coupled plasmas (ICP), the frequency of the capacitive substrate bias does not have a significant effect on electron temperature and density. The DC bias and DC sheath voltage at the substrate were, however, found to strongly depend on source frequency. By using additional RF sources at alternate locations in ICP reactors, it was found that the DC bias at the substrate was varied without significantly changing other plasma parameters, such as the substrate sheath potential     

Results of vacuum cleaning techniques on the performance of LiFfield-threshold ion sources on extraction applied-B ion diodes at 1-10TW

Uncontrolled plasma formation on electrode surfaces limits performance in a wide variety of pulsed power devices such as electron and ion diodes, transmission lines, radio frequency (RF) cavities, and microwave devices. Surface and bulk contaminants on the electrodes in vacuum dominate the composition of these plasmas, formed through processes such as stimulated and thermal desorption followed by ionization. We are applying RF discharge cleaning, anode heating, cathode cooling, and substrate surface coatings to the control of the effects of these plasmas in the particular case of applied-B ion diodes on the SABRE (1 TW) and PBFA-X (30 TW) accelerators. Evidence shows that our LiF ion source provides a 200-700 A/cm² lithium beam for 10-20 ns which is then replaced by a contaminant beam of protons and carbon. Other ion sources show similar behavior. Our electrode surface and substrate cleaning techniques reduce beam contamination, anode and cathode plasma formation, delay impedance collapse, and increase lithium energy, power, and production efficiency. Theoretical and simulation models of electron-stimulated and thermal-contaminant desorption leading to anode plasma formation show agreement with many features from experiment. Decrease of the diode electron loss by changing the shape and magnitude of the insulating magnetic field profiles increases the lithium output and changes the diode response to cleaning. We also show that the LiF films are permeable, allowing substrate contaminants to affect diode behavior. Substrate coatings of Ta and Au underneath the LiF film allow some measure of control of substrate contaminants, and provide direct evidence for thermal desorption. We have increased lithium current density by a factor of four and lithium energy by a factor of five through a combination of in situ surface and substrate cleaning, substrate coatings, and field profile modifications     

The space-time-averaging procedure and modeling of the RF discharge

An approach to modeling RF discharges and the ensuing analysis of fast electron and ion motions for the case of electrode sheaths in the high-pressure RF discharge is discussed. Time-averaging over fast electron motions with the applied voltage frequency gives analytic expressions for the average electric field and average ionization density. The resulting relatively simple equations for the ion density profile describe drift, diffusion, ionization, and recombination processes. The simple scaling rules, the approximate expressions for the density profile in various regions, the sheath length, the ion density at the plasma-sheath boundary, and the dimensionless criteria for various discharge regimes can be deduced. For the non-self-sustained discharge, it is demonstrated that the ion drag towards the electrode and the diffusion results in significant lowering of the ion density in the sheath compared with the positive column at not too high a pressure. The analytic transition criterion from α to γ forms of the self-sustained discharge is obtained. The numerical solution of the averaged ion equations yields the results which nearly coincide with the results of full-scale modeling     

PLASMA DENSITY MEASUREMENTS OF CONFINED CAPACITIVELY COUPLED PLASMA BY MICROWAVE INTERFEROMETER AND ION ENERGY DISTRIBUTION FUNCTION METHODS

Measurements of hydrogen plasma density are made in a symmetric single frequency confined capacitively coupled plasma (C-CCP) RF system. Comparison is made between density measured by microwave interferometer (MWI) and electrode wall ion density gathered from Ion Energy Distribution Function (IEDF) responses. Ion number density at electrode wall is obtained by two methods as IEDF integration method and IEDF splitting method. Both methods were compared with MWI and a linear relation is obtained between both methods and MWI. It is demonstrated that electrode wall surface density obtained by IEDF splitting and IEDF integral methods are about 50,000 times less than the bulk plasma density, and integral method reads more data than splitting method. The three different measurement results are compared and they are in good qualitative agreement; the deviation in ratio of bulk plasma density measured by MWI to number density at the electrode wall resolved from ion energy distribution function is greatest at highest pressure or electrode voltages/powers. The reasons for deviations are explained by analysis of the potential drop across the presheath decreases with respect to increased applied power.     

Electrical characteristics of parallel-plate RF discharges in argon

Electrical characteristics were measured in a parallel-plate, capacitively coupled (E-type), low-pressure, symmetrical RF discharge driven at 13.56 MHz. The discharge voltage, current, and phase shift between them were measured over a very wide range of discharge parameters (gas pressures between 3 mtorr and 3 torr with discharge power between 20 mW and 100 W). From these measurements the discharge impedance components, the power dissipated in the plasma and in the sheaths, the sheath width, and the ion current to the RF electrodes were found over a wide range of discharge conditions. Some of the general relationships between the various measured and determined parameters are discussed. The experimental results can be used as a database for straightforward comparison with existing RF discharge models and numerical simulations     

Numerical modeling of low-pressure RF plasmas

A particle-in-cell simulation is used to model the plasma generated in a parallel plate RF reactor at low pressure. Nonperiodic boundary conditions are used, and the electric field and particle motion are obtained by finite-difference methods leading to the self-consistent creation of sheaths on the boundaries. Model cross sections are used to describe collisions between particles. Ionization is included, and the plasma is maintained by fast electrons generated in the RF sheaths. Most of the power dissipation is due to the acceleration of ions in the time-average sheath fields. At high applied voltage, the power dissipation is described well by the power law P∝V^5/2. Simple scaling laws for the density and plasma potential are obtained. The effect of ion mass and charge-exchange colisions on the ion energy spectrum collected by the electrodes is examined. The ion loss rate drops in the presence of charge-exchange collisions, and this leads to an increase in the density. The collisions also markedly alter the ion energy distribution function     

Negative Ion Kinetics in RF Glow Discharges

Using temporally and spatially resolved laser spectroscopy, we have determined the identities, approximate concentrations, effects on the local field, and kinetics of formation and loss of negative ions in RF discharges. Cl- and BCl3- are the dominant negative ions found in low-frequency discharges through Cl2 and BCl3, respectively. The electron affinity for Cl is measured to be 3.6118 ± 0.0005 eV. Negative ion kinetics are strongly affected by application of the RF field. Formation of negative ions by attachment of slow electrons in RF discharges is governed by the extent and duration of electron energy relaxation. Similarly, destruction of negative ions by collisional detachment and field extraction is dependent upon ion energy modulation. Thus, at low frequency, the anion density peaks at the beginning of the anodic and cathodic half-cycles after electrons have attached but before detachment and extraction have had time to occur. At higher frequencies, electrons have insufficient time to attach before they are reheated and the instantaneous anion density in the sheath is greatly reduced. When the negative ion density is comparable to the positive ion density, the plasma potential is observed to lie below the anode potential, double layers form between sheath and plasma, and anions and electrons are accelerated by large sheath fields to electrode surfaces.     

13.56 MHz/2 MHz柱状感性耦合等离子体参数的对比研究

通过Langmuir双探针和发射光谱诊断方法,对比研究了驱动频率为13.56 MHz和2 MHz柱状感性耦合等离子体中电子密度和电子温度的径向分布规律.结果表明:在高频和低频放电中,输入功率的增加对等离子体参数产生了不同的影响,高频放电中主要提升了电子密度,低频放电中则主要提升了电子温度.固定气压为10 Pa,分别由高频和低频驱动时,电子密度的径向分布均为"凸型".而电子温度的分布差异比较明显,高频驱动时,电子温度在腔室中心较为平坦,在边缘略有上升;低频驱动时,电子温度随径向距离的增加而逐渐下降.为了进一步分析造成这种差异的原因,在相同放电条件下采集了氩等离子体的发射光谱图,利用分支比法计算了亚稳态粒子的数密度,发现电子温度的径向分布始终与亚稳态粒子的径向分布相反.继续升高气压到100 Pa,发现不论高频还是低频放电,电子密度的径向分布均从"凸型"转变为"马鞍形",较低气压时电子密度的均匀性有了一定的提升,但低频的均匀性更好.     

Properties of inductively coupled plasma source with helical coil

This paper presents modeling and experimental results of the voltage, current, and density profiles of a helical resonator plasma source. The source has a 5/4-wavelength (λ) helical resonator structure with the helical coil short-circuited at one end and open circuited at the other end. When the radio frequency (RF) tap for power feeding was located at an odd multiple of λ/4 from the short-circuited end, the observed voltage, current, and plasma density were higher in the short-circuited section than those in the open-circuited section. The opposite property was observed with the RF tap at an even multiple of λ/4. A microstrip transmission line model was used to explain the experimental results. The model accurately predicted the RF voltage and current profiles. After calculation of RF voltage and current, the plasma density was solved numerically. The difference between the calculated and measured plasma density was within a factor of two. The changes on the density profile indicate that the transport properties of plasma can be adjusted with the RF tap position     

Laser capabilities of CuBr mixture excited by RF discharge

Our investigations demonstrated that utilizing copper bromide (CuBr) mixture as a source of Cu atoms in a RF-excited discharge can be a promising alternative to the Cu sputtered system, when the development of Cu ion gas laser is considered. Both spectroscopic and laser investigations showed that the threshold input power for lasing was reduced about 5 times using the CuBr-based system instead of the Cu-sputtered system. Pulsed and CW laser oscillation on Cu⁺ transitions in the near IR spectral region was obtained in RF-excited He-CuBr discharge operated at 13.56 MHz and 27.12 MHz. At input RF power of 800 W, a laser output power of 10 mW at the 780.8 nm Cu ion laser line was achieved. An increase of laser output power by a factor of two, as well as better Cu vapour axial distribution and better discharge stability, was attained when DC discharge was superimposed on the RF discharge. Laser gain on 11 UV Cu ion lines was observed in RF-excited Ne-CuBr discharge. basing on the obtained results, we consider the CuBr laser system excited by RF discharge capable of generating UV laser radiation at relatively low input power. Received 4 January 1999     

Modeling the pressure dependence of DC bias voltage in asymmetric,capacitive RF sheaths

A semianalytical model for capacitively coupled radio frequency (RF) sheaths of asymmetric (unequal electrode area) systems has been developed. It can be applied in the high-frequency (ω > ω _pi) regime at different pressures. An analytical approximation to the pressure-dependent ion density profile is used. The time-varying electric field and potential within the sheath are obtained by solving Poisson's equation. The current balance and zero net DC current conditions are applied to solve for the RF sheath parameters and DC bias voltage. The DC voltage ratio between the powered and grounded electrode sheaths increases as the pressure decreases, which results in a larger DC bias voltage at lower pressures