脉宽压缩光栅用多层膜制备和性能测试

给出了以413 nm作为写入波长,1053 nm作为使用波长的多层介质光栅膜的设计,计算表明膜系H3L(H2L)^9H0.5L2.03H满足光栅膜的要求.最后给出了制备得到的样品光学特性测试,结果表明在使用波长和曝光波长处满足设计要求,其抗激光损伤阈值在光正入射和51.2°入射时分别为14.14 J/cm2和9.32 J/cm2,膜系的应力表现为压应力.     

飞秒激光用多层介质膜脉宽压缩光栅的设计

以薄膜光学的干涉理论和衍射光学的傅里叶模式理论为基础，给出了0.8μm飞秒激光器用多层介质膜脉宽压缩光栅的理论设计；设计采用H3L(HL)^9H0.5L2.4H的多层介质膜为基底，当刻蚀后表面浮雕结构的占宽比为0.35，线密度为1480线/mm，槽深为0.2μm，顶层HfO₂的剩余厚度为0.15μm时，对于Littrow角度(36.7°)和TE波模式入射的衍射光栅其-1级衍射效率达到95％以上. 关键词： 飞秒激光 脉宽压缩光栅 多层介质膜     

多层介质膜脉宽压缩光栅的严格矢量分析

用于展宽和压缩激光脉冲的多层膜脉宽压缩光栅是由多层介质高反膜和位于其顶层的浮雕光栅构成。以设计的高反射多层膜为基础,利用傅里叶模式理论分析了其衍射场分布,给出了TE波自准直角入射的使用条件下,多层介质膜脉宽压缩光栅衍射效率的表达式。以-1级衍射效率为评价函数,分别讨论了HfO2和SiO2为顶层材料时,多层膜脉宽压缩光栅-1级衍射效率高于0.95的光栅结构参量范围。结果表明,在该条件下,选择HfO2为顶层材料时,光栅结构参量有较大的取值范围。给出了优化的光栅结构参量,并分析了光栅制作误差及其使用条件的宽容度,对光栅制作工艺和使用具有一定的指导意义。     

1 064, 532和680 nm波长的反射-吸收复合型防护膜的研制

 针对1 064, 532 和 680 nm波长激光， 以聚碳酸酯 （PC） 为镀膜基底， 钕玻璃激光中心波长为1 064 nm, 采用六分之一加三分之一膜系的反射膜系设计，以氧化锆为高折射率膜层材料，氯化酞菁铝掺杂的氧化硅为低折射率膜层材料，通过溶胶-凝胶法镀21层膜，并在多层反射膜与PC基底之间插入张力匹配层，实现了钕玻璃激光器1 064 nm主频和532 nm二倍频波长激光的反射，以及680 nm波长红宝石激光的同时吸收，1 064,532和680 nm波长处的透射率分别为1.67％，18.24％和2.4％。     

石英基底上可见光区减反射涂层的双层膜系设计

针对石英光学基底合理设计多层膜系是提高光学器件透射率的关键方法。设计了两种不同的膜系结构，运用导纳轨迹法分析这两种膜系的设计原理。利用光学薄膜设计软件Filmstar分别得到两种膜系的最优解，以使在可见光区膜系的平均透射率尽可能接近于100%。     

高损伤阈值三倍频分离膜

 设计了Nd：YAG激光用三倍频分离膜,膜层材料为SiO₂和HfO₂。经过优化,膜系在355 nm处的反射率在99%以上,在532 nm和1 064 nm处透射率也在99%以上。采用电子束蒸发技术,在熔融石英基底上制备了样品,经测量,制备的分离膜光学性能与设计值接近。分离膜在355 nm激光辐照下的损伤阈值为5.1 J/cm²,并用微分干涉显微镜表征了薄膜损伤形貌。     

HfO2顶层多层介质膜脉宽压缩光栅的离子束刻蚀

多层介质膜光栅是高功率激光系统的关键光学元件. 为了满足国内强激光系统的迫切需求,首先利用考夫曼型离子束刻蚀机开展了HfO₂顶层多层介质膜脉宽压缩光栅的离子束刻蚀实验研究. 采用纯Ar及Ar和CHF₃混合气体作为工作气体进行离子束刻蚀实验,获得了优化的离子源工作参数. 结果表明,与纯Ar离子束刻蚀相比,Ar和CHF₃混合气体离子束刻蚀时的HfO₂/光刻胶的选择比大. HfO₂的离子束刻蚀过程中再沉积效应明显,导致刻蚀光栅占宽比变大. 根据刻蚀速率分布制作的掩模遮挡板可以提高刻蚀速率均匀性,及时清洗离子源和更换灯丝,可保证刻蚀工艺的重复性. 利用上述技术已成功研制出多块最大尺寸为80 mm×150 mm、线密度1480线/mm、平均衍射效率大于95%的HfO₂顶层多层介质膜脉宽压缩光栅. 实验结果与理论设计一致,为大口径多层介质膜脉宽压缩光栅的离子束刻蚀提供了有益参考. 关键词： 光栅 多层介质膜 离子束刻蚀     

双波段激光防护多层反射膜的设计

利用TFCalc膜系设计软件,从理论上对激光防护多层反射膜的光学性能进行了分析。计算了各个膜系的理论投射率曲线。分析了各个因素(如膜系结构、膜层奇偶性、起膜材料)对膜层光学性质的影响。并设计了以ZrO2和SiO2为膜层材料,聚碳酸酯(PC)为基体材料,可以同时防护532nm和1064nm波长激光的1∶2型多层反射薄膜。在532nm和1064nm处的理论透过率都达到了0.01%(光学密度D=4)。并在PC镜片表面镀上23层1∶5型激光反射膜,对理论设计进行验证。对其在400nm~1200nm波长范围内的光学性能进行了测试,测试结果与理论计算值基本吻合。     

可见光波段及1 064 nm波长处用于Glan-Taylor棱镜减反射膜

为了提高Glan-Taylor棱镜的透射率,研究了Glan-Taylor棱镜在可见光波段及1 064 nm波长处减反射膜膜的设计和制备.为提高薄膜和冰洲石晶体的附着力,采用沉积Al2O3为过渡层,ZrO2作缓冲层的方法,用单纯形优化的方法进行膜系优化设计.用电子束沉积和离子束辅助沉积的方法制备了多层减反射膜,并采用石英晶体振荡法监控膜厚和沉积速率.测量结果表明,在可见光波段及1 064 nm波长处的剩余反射率均小于0.5%经测试薄膜与冰洲石晶体的附着力性能良好.     

宽光谱高衍射效率脉宽压缩光栅设计和性能分析

基于飞秒激光对脉宽压缩光栅宽光谱和高衍射效率的要求,提出了一种金属介质膜结构的宽光谱高衍射效率脉宽压缩光栅,该光栅由基底、金属介质膜和表面浮雕结构组成.为获得宽光谱高衍射效率的脉宽压缩光栅,采用严格耦合波理论对金属介质膜光栅的结构参数进行优化设计.数值分析表明当金属介质光栅的槽深、剩余厚度、占空比和入射角分别为272 ...     

Design and properties analysis of multi-layer dielectric used in pulse compressor gratings

Used in chirped-pulse amplification system and based on multi-layer thin film stack, pulse compressor gratings (PCG) are etched by ion-beam and holographic techniques. Diffraction efficiency and laser-induced damage threshold rely on the structural parameters of gratings. On the other hand, they depend greatly on the design of multi-layer. A theoretic design is given for dielectric multi-layer, which is exposed at 413.1 nm and used at 1053 nm. The influences of coating design on optical characters are described in detail. The analysis shows that a coating stack of H3L (H2L)9H0.5L2.01H meets the specifications of PCG well. And there is good agreement of transmission between experimental and the theoretic design.     

Design of High-Efficiency Diffraction Gratings Based on Rigorous Coupled-Wave Analysis for 800nm Wavelength

We report on the design of a high diffraction efficiency multi-layer dielectric grating with wide incident angle and broad bandwidth for 80Ohm. The optimized grating can achieve 〉 95% diffraction efficiency in the first order at an incident angle of 5° from Littrow and a wavelength from 77Ohm to 83Ohm, with peak diffraction efieieney of 〉 99.5% at 80Ohm. The electric field distribution of the optimized multi-layer dielectric grating within the gratings ridge is 1.3 times enhancement of the incidence light, which presents potential high laser resistance ability. Because of its high-effieieney, wide incident, broad bandwidth and potential high resistance ability, the multi-layer dielectric grating should have practical application in Ti：sapphire laser systems.     

Optimization of thin-film design for multi-layer dielectric grating

Thin-film design used to fabricate multi-layer dielectric (MLD) gratings should provide high transmittance during holography exposure, high reflectance at use wavelength and sufficient manufacturing latitude of the grating design making the MLD grating achieve both high diffraction efficiency and low electric field enhancement. Based on a (HLL)⁹H design comprising of quarter-waves of high-index material and half-waves of low-index material, we obtain an optimum MLD coating meeting these requirements by inserting a matching layer being half a quarter-wave of Al₂O₃ between the initial design and an optimized HfO₂ top layer. The optimized MLD coatings exhibits a low reflectance of 0.017% under photoresist at the exposure angle of 17.8° for 413 nm light and a high reflectance of 99.61% under air at the use angle of 51.2° for 1053 nm light. Numerical calculation of intensity distribution in the photoresist coated on the MLD film during exposure shows that standing-wave patterns are greatly minimized and thus simulation profile of photoresist gratings after development demonstrates smoother shapes with lower roughness. Furthermore, a MLD gratings with grooves etched into the top layer of this MLD coating provides a high diffraction efficiency of 99.5% and a low electric field enhancement ratio of 1.53. This thin-film design shows perfect performances and can be easily fabricated by e-beam evaporation.     

梯形介质膜光栅衍射特性分析

基于严格耦合波理论建立了梯形介质膜光栅的衍射机理模型,利用该模型讨论了底角为70°的梯形介质膜光栅-1级的衍射行为.通过对梯形介质膜光栅的占空比、槽深和剩余厚度的优化,设计了应用于1053 nm和51.2°角度入射的梯形介质膜光栅.对于顶层为HfO2的介质膜光栅,当槽深为200 nm,剩余厚度为100 nm,占空比为0.35时.其衍射效率优于99.5%,而对于顶层为SiO2的梯形光栅,为获得99.5%的衍射效率.其槽深为800 nm,剩余厚度为320 nm.而且,获得同样的衍射效率,顶层为HfO2的梯形光栅具有更宽的光谱特性.数值计算表明,严格耦合波理论模型对梯形介质膜光栅衍射效率的计算具有很好的收敛性和稳定性.     

Enhanced laser induced damage threshold of dielectric antireflection coatings by the introduction of one interfacial layer

A new method for increasing laser induced damage threshold (LIDT) of dielectric antireflection (AR) coating is proposed. Compared with AR film stack of H2.5L (H:HfO2, L:SiO2) on BK7 substrate, SiO2 interfacial layer with four quarter wavelength optical thickness (QWOT) is deposited on the substrate before the preparation of H2.5L film. It is found that the introduction of SiO2 interfacial layer with a certain thickness is effective and flexible to increase the LIDT of dielectric AR coatings. The measured LIDT is enhanced by about 50%, while remaining the low reflectivity with less than 0.09% at the center wavelength of 1064 nm. Detailed mechanisms of the LIDT enhancement are discussed.     

亚波长光栅偏振片的纳秒脉冲激光损伤特性

偏振片在诸多光学系统中有着重要的应用。亚波长介质光栅可用作正入射偏振片，在高能激光系统中有着广泛的应用前景。为了探究波长为1 064 nm的纳秒脉冲激光对于亚波长全介质光栅的诱导损伤特性，使用了粒子群优化算法结合严格耦合波分析设计了光栅的几何参数，计算表明亚波长光栅偏振片在入射光波长1 064 nm附近带宽0.5 nm内，平均消光比为1 500。使用了紫外曝光配合离子束刻蚀的工艺制备了HfO₂光栅，并对其纳秒脉冲激光损伤阈值进行了测试。测试结果表明S光损伤阈值约为P光损伤阈值的5倍，且都大于5 J/cm2。结果表明亚波长全介质光栅偏振片可广泛用于正入射激光系统中。     

The Effect of Radiation on Transmission of Quasi-Periodic Multi-Layer Planar Dielectric Gratings

The transmission characteristics of quasi-periodic multi-layer planar dielectric gratings are systematically investigated by a method that combines the multimode network theory with rigorous mode matching method. The effect of radiation on the transmission characteristics of the multi-layer dielectric gratings is discussed in details, and some guidelines are given for accurate design of the gratings.