Al0.6Ga0.4N/GaN/Al0.3Ga0.7N/Al0.6Ga0.4N量子阱中的Rashba自旋劈裂

正如人们所知, 可以通过电场或者设计非对称的半导体异质结构来调控体系的结构反演不对称性(SIA)和Rashba自旋劈裂. 本文研究了Al_0.6Ga_0.4N/GaN/Al_0.3Ga_0.7N/Al_0.6Ga_0.4N量子阱中第一子带的Rashba 系数和Rashba自旋劈裂随Al_0.3Ga_0.7N插入层(右阱)的厚度w_s以及外加电场的变化关系, 其中GaN层(左阱)的厚度为40-w_s Å. 发现随着w_s的增加, 第一子带的Rashba系数和Rashba自旋劈裂首先增加, 然后在w_s>20 Å 时它们迅速减小, 但是w_s>30 Å时Rashba自旋劈裂减小得更快, 因为此时k_f也迅速减小. 阱层对Rashba系数的贡献最大, 界面的贡献次之且随w_s变化不是太明显, 垒层的贡献相对比较小. 然后, 我们假w_s=20 Å, 发现外加电场可以很大程度上调制该体系的Rashba系数和Rashba自旋劈裂, 当外加电场的方向同极化电场方向相同(相反)时, 它们随着外加电场的增加而增加(减小). 当外加电场从-1.5×10⁸ V·m^-1到1.5×10⁸ V· m^-1变化时, Rashba系数随着外加电场的改变而近似线性变化, Rashba自旋劈裂先增加得很快, 然后近似线性增加, 最后缓慢增加. 研究结果表明可以通过改变GaN层和Al_0.3Ga_0.7N层的相对厚度以及外加电场来调节Al_0.6Ga_0.4N/GaN/Al_0.3Ga_0.7N/Al_0.6Ga_0.4N量子阱中的Rashba 系数和Rashba自旋劈裂, 这对于设计自旋电子学器件有些启示.     

双波泵浦非对称量子阱的光学整流效应

为了实现基于光整流方式的室温下宽调谐高效率太赫兹源,设计了一种适于双波长CO2激光器共振子带跃迁泵浦的双阱嵌套形非对称量子阱结构,结构组分为Al0.5Ga0.5As/Ga As/Al0.2Ga0.8As,采用密度矩阵及迭代方法计算了其二阶非线性光整流系数χo(2)表达式,在导带为抛物线形和非抛物线形两种条件下对χo(2)进行对比研究。计算结果表明,其偶极跃迁矩阵元随量子阱总阱宽的增大而逐渐减小。当固定量子阱总阱宽及其中一束泵浦光波长不变时,χo(2)随着另一束泵浦光波长的增加,呈现出先增大后减小的变化趋势。当深阱为7 nm、总阱宽为23 nm、两束泵浦光相等为10.64μm时,χo(2)达到最大值5.925×10-6m/V;随着总阱宽的增大,χo(2)曲线呈现"红移"现象,其原因为量子限制效应导致了不同阱宽条件下的量子阱能级值差不同,从而造成满足泵浦光光子能量与能级差共振条件的变化。导带为抛物线形和非抛物线形两种条件下的χo(2)的最大值对应泵浦光波长基本相同,χo(2)数值上的差异主要由跃迁矩阵元的不同导致。     

纤锌矿In_(0.19)Ga_(0.81)N/GaN量子阱中光学声子和内建电场对束缚极化子结合能的影响

用改进的Lee-Low-Pines变分方法研究纤锌矿In0.19Ga0.81N/GaN量子阱结构中束缚极化子能量和结合能等问题,给出基态结合能、不同支长波光学声子对能量和结合能的贡献随阱宽和杂质中心位置变化的数值结果.在数值计算中包括了该体系中声子频率的各向异性和内建电场对能量和结合能的影响、以及电子和杂质中心与长波光学声子的相互作用.研究结果表明,In0.19Ga0.81N/GaN量子阱材料中光学声子和内建电场对束缚极化子能量和结合能的贡献很大,它们都引起能量和结合能降低.结合能随着阱宽的增大而单调减小,窄阱中减小的速度快,而宽阱中减小的速度慢.不同支声子对能量和结合能的贡献随着阱宽的变化规律不同.没有内建电场时,窄阱中,定域声子贡献小于界面和半空间声子贡献,而宽阱中,定域声子贡献大于界面和半空间声子贡献.有内建电场时,定域声子贡献变小,而界面和半空间声子贡献变大,声子总贡献也有明显变化.在In0.19Ga0.81N/GaN量子阱中,光学声子对束缚极化子能量和结合能的贡献比GaAs/Al0.19Ga0.81As量子阱中的相应贡献(约3.2—1.8和1.6—0.3 meV)约大一个数量级.阱宽(d=8 nm)不变时,在In0.19Ga0.81N/GaN量子阱中结合能随着杂质中心位置Z0的变大而减小,并减小的速度变快.随着Z0的增大,界面和半空间光学声子对结合能的贡献缓慢减小,而定域光学声子的贡献缓慢增大.     

氮化物抛物量子阱中类氢杂质态能量

采用变分方法研究氮化物抛物量子阱(GaN/Al_xGa_1-xN)材料中类氢杂质态的能级,给出基态能量、第一激发态能量、结合能和跃迁能量等物理量随抛物量子阱宽度变化的函数关系.研究结果表明,基态能量、第一激发态能量、基态结合能和1s→2p±跃迁能量随着阱宽L的增大而减小,最后接近于GaN中3D值.GaN/Al_0.3Ga_0.7N抛物量子阱对杂质态的束缚程度比GaAs/Al_0.3Ga_0.7As抛物量子阱强,因此,在GaN/Al_0.3-Ga_0.7N抛物量子阱中束缚于杂质中心处的电子比在GaAs/Al_0.3Ga_0.7As抛物量子阱中束缚于杂质中心处的电子稳定.     

Observation of inversion domain boundaries in Mg-doped AlGaN layers grown by metalorganic chemical vapor deposition

We have investigated the formation of inversion domain boundaries in Al_0.13Ga_0.87N layers grown on sapphire substrates by metalorganic chemical vapor deposition using transmission electron microscopy (TEM). We found that the shape of inversion domain boundaries strongly depends on Mg source flow rate in the Mg-doped Al_0.13Ga_0.87N layers. By increasing the Mg source flow rate, the shape of inversion domain boundaries is changed from the vertical shape to the horizontal shape. In addition, the change of polarity by the horizontal shape inversion domain boundary (IDB) resulted in the inverted rotation of pyramidal shape IDB within the Mg-doped Al_0.13Ga_0.87N layers.     

GaN/In_xGa_(1-x)N型最后一个量子势垒对发光二极管内量子效率的影响

GaN/In_xGa_(1-x)N型最后一个量子势垒结构能有效提高发光二极管(LED)器件内量子效率,缓解LED效率随输入电流增大而衰减的问题.本文综述了该结构及其结构变化——In组分梯度递增以及渐变、GaN/In_xGa_(1-x)N界面极化率改变等对改善LED器件性能的影响及优势,归纳总结了不同结构的GaN/In_xGa_(1-x)N型最后一个量子垒的工作机理,阐明极化反转是该结构提高LED性能的根本原因.在综述该结构发展的基础之上,通过APSYS仿真计算,进一步探索和深入分析了该结构中In_xGa_(1-x)N层的In组分及其厚度变化对LED内量子效率的影响.结果表明:In组分的增加有助于在GaN/In_xGa_(1-x)N界面产生更多的极化负电荷,增加GaN以及电子阻挡层处导带势垒高度,减少电子泄漏,从而提高LED的内量子效率;但GaN/In_xGa_(1-x)N型最后一个量子势垒中In_xGa_(1-x)N及GaN层厚度的变化由于会同时引起势垒高度和隧穿效应的改变,因而In_xGa_(1-x)N和GaN层的厚度存在一个最佳比值以实现最大化的减小漏电子,提高内量子效率.     

Design of a Resonant-Cavity-Enhanced p-i-n GaN/AlxGa1-xN Photodetector

A resonant-cavity-enhanced p-i-n photodetector has been designed and analyzed to operate at a wavelength of 360 nm based on the Al_xGa_1-xN material system. The novel approach has been adopted of using epitaxial AlN/Al_xGa_1-xN quarter-wave stacks as the distributed Bragg reflector that serves as the front mirror. An Al_xGa_1-xN absorptive filter layer is incorporated to suppress all but one resonant mode to ensure single, narrow-band operation. This device structure is projected to achieve wavelength selective, high speed, and high quantum efficiency operation in the ultraviolet. MOCVD-grown 6 1/2-pair AlN/Al_xGa_1-x     

Lattice damage in InGaN induced by swift heavy ion irradiation

The microstructural responses of In_0.32Ga_0.68N and In_0.9Ga_0.1N films to 2.25 GeV Xe ion irradiation have been investigated using x-ray diffraction, Raman scattering, ion channeling and transmission electron microscopy. It was found that the In-rich In_0.9Ga_0.1N is more susceptible to irradiation than the Ga-rich In_0.32Ga_0.68N. Xe ion irradiation with a fluence of 7× 10¹¹ ions·cm^-2 leads to little damage in In_0.32Ga_0.68N but an obvious lattice expansion in In_0.9Ga_0.1N. The level of lattice disorder in In_0.9Ga_0.1N increases after irradiation, due to the huge electronic energy deposition of the incident Xe ions. However, no Xe ion tracks were observed to be formed, which is attributed to the very high velocity of 2.25 GeV Xe ions. Point defects and/or small defect clusters are probably the dominant defect type in Xe-irradiated In_0.9Ga_0.1N.     

AlN插入层对AlxGa1-xN/GaN界面电子散射的影响

本文研究AlN作为Al_xGa_1-xN/GaN插入层引起的电子输运性质的变化, 考虑了Al_xGa_1-xN和AlN势垒层的自发极化、压电极化对Al_xGa_1-xN/AlN/GaN双异质结高电子迁移率晶体管(HEMT)中极化电荷面密度、二维电子气(2DEG) 浓度的影响, 分析了AlN厚度与界面粗糙度散射和合金无序散射的关系; 结果表明, 2DEG 浓度、界面粗糙度散射和合金无序散射依赖于AlN层厚度, 插入一层1–3 nm薄的AlN层, 可以明显提高电子迁移率.     

Effect of surface plasmon coupling with radiating dipole on the polarization characteristics of AlGaN-based light-emitting diodes

The optical polarization characteristics of surface plasmon (SP) coupled AlGaN-based light emitting diodes (LEDs) are investigated theoretically by analyzing the radiation recombination process and scattering process respectively. For the Al_0.5Ga_0.5N/Al/Al₂O₃ slab structure, the relative intensity of TE-polarized and TM-polarized spontaneous emission (SE) rate into the SP mode obviously depends on the thickness of the Al layer. The calculation results show that TM dominated emission will be transformed into TE dominated emission with the decrease of the Al thickness, while the emission intensities of both TE/TM polarizations will decrease significantly. In addition, compared with TM polarized emission, TE polarized emission is easier to be extracted by SP coupling. For the Al_0.5Ga_0.5N/Al nano-particle structure, the ratio of transmittance for TE/TM polarized emission can reach ～3.06, while for the Al free structure, it is only 1.2. Thus, the degree of polarization of SP coupled LED can be improved by the reasonable structural design.     

Output light power of InGaN-based violet laser diodes improved by using a u-InGaN/GaN/AlGaN multiple upper waveguide

The upper waveguide(UWG) has direct influences on the optical and electrical characteristics of the violet laser diode(LD) by changing the optical field distribution or barrier of the electron blocking layer(EBL). In this study, a series of In GaN-based violet LDs with different UWGs are investigated systematically with LASTIP software. It is found that the output light power(OLP) under an injecting current of 120 mA or the threshold current(Ith) is deteriorated when the UWG is u-In_(0.02)Ga_(0.98)N/GaN or u-In_(0.02)Ga_(0.98)N/Al_xGa_(1-x)N(0 ≤ x ≤ 0.1), which should be attributed to small optical confinement factor(OCF) or severe electron leakage. Therefore, a new violet LD structure with u-In_(0.02)Ga_(0.98)N/GaN/Al_(0.05)Ga_(0.95)N multiple layer UWG is proposed to reduce the optical loss and increase the barrier of EBL. Finally,the output light power under an injecting current of 120 mA is improved to 176.4 mW.     

高质量InGaN的等离子体辅助分子束外延生长和In的反常并入行为

采用射频等离子体辅助分子束外延技术生长得到了In组分精确可控且高质量的In_xGa_1-xN (x ≤ 0.2) 外延薄膜. 生长温度为580 ℃的In_0.19Ga_0.81N薄膜(10.2) 面非对称衍射峰的半高宽只有587弧秒, 背景电子浓度为3.96× 10¹⁸/cm³. 在富金属生长区域, Ga束流超过N的等效束流时, In组分不为零, 即Ga并没有全部并入外延层; 另外, 稍微增加In束流会降低InGaN的晶体质量. 关键词： InGaN 外延薄膜 射频等离子体辅助分子束外延 In 并入 晶体质量     

阶梯AlGaN外延新型Al0.25Ga0.75N/GaNHEMTs器件实验研究

本文报道了作者提出的阶梯AlGaN外延层新型AlGaN/GaN HEMTs结构的实验结果. 实验利用感应耦合等离子体刻蚀(ICP)刻蚀栅边缘的AlGaN外延层, 形成阶梯的AlGaN 外延层结构, 获得浓度分区的沟道2DEG, 使得阶梯AlGaN外延层边缘出现新的电场峰, 有效降低栅边缘的高峰电场, 从而优化了AlGaN/GaN HEMTs器件的表面电场分布. 实验获得了阈值电压-1.5 V的新型AlGaN/GaN HEMTs器件. 经过测试, 同样面积的器件击穿电压从传统结构的67 V提高到新结构的106 V, 提高了58%左右; 脉冲测试下电流崩塌量也比传统结构减少了30%左右, 电流崩塌效应得到了一定的缓解.     

对称双势垒量子阱中自旋极化输运的时间特性

电子的隧穿时间是描述量子器件动态工作范围的重要指标. 本文考虑k³ Dresselhaus 自旋轨道耦合效应对系统哈密顿量的修正, 结合转移矩阵方法和龙格-库塔法来解含时薛定谔方程, 进而讨论了电子在非磁半导体对称双势垒结构中的透射系数及隧穿寿命等问题. 研究结果发现:由于k³ Dresselhaus 自旋轨道耦合效应使自旋简并消除, 并在时间域内得到了表达, 导致自旋向上和自旋向下电子的透射峰发生了自旋劈裂; 不同自旋取向的电子构建时间和隧穿寿命不同, 这是导致自旋极化的原因之一; 电子的自旋极化在时间上趋于稳定. 关键词： 自旋极化输运 透射系数 隧穿寿命 自旋极化率     

氢化杂质和厚度效应对高斯势量子点中二能级体系量子跃迁的影响

在计及氢化杂质和厚度效应下,分别选取抛物线型限定势阱和高斯函数型限定势阱描写盘型量子点中电子的横向限定势和纵向限定势,采用Lee-Low-Pines-Pekar变分法推导出量子点中电子的基态和第一激发态能量本征值和本征函数,以此为基础,构造了一个二能级结构,并基于二能级体系理论,讨论了电子在磁场作用下的量子跃迁.结果表明,高斯函数型限定势比抛物线型限定势更能精准反映量子点中真实的限定势;量子点的厚度对电子的跃迁概率的影响不凡;电声耦合强度、介电常数比、磁场的回旋频率、高斯函数型限定势阱的阱深和阱宽等对电子基态与第一激发态声子平均数、能量以及量子跃迁的影响显著.     

Propagating Optical Phonon Modes and Their Electron-Phonon Interaction Hamiltonians in Asymmetric Wurtzite Nitride Semiconductor Quantum Wells

Within the framework of the dielectric continuum model and Loudon's uniaxial crystal model, the properties of frequency dispersion of the propagating (PR) optical phonon modes and the coupling functions of electron-PR phonons interaction in an asymmetrical wurtzite quantum well (QW) are deduced and analyzed via the method of electrostatic potential expanding. Numerical calculation on an asymmetrical Al_0.25Ga_0.75 N/GaN/Al_0.15Ga_0.85N wurtzite QW were performed. The results reveal that there are infinite branches of PR phonon modes in the systems. The behaviors of frequency forbidden of PR modes in the asymmetric QWs have been clearly observed. The mathematical and physical origins for these features have been analyzed in depth. The PR optical phonon branches have been distinguished and labelled reasonably in terms of the oscillating properties of the PR modes in the well-layer material. Moreover, the amplitudes and frequency properties of the electron-PR modes coupling functions in the barrier and well materials have also been analyzed from both of the mathematical and physical viewpoints.     

内嵌InAs量子点的δ掺杂GaAs/AlxGa1-xAs二维电子气特性分析

采用分子束外延技术对δ掺杂GaAs/Al_xGa_1-xAs二维电子气(2DEG)样品进行了生长. 在样品生长过程中, 分别改变掺杂浓度(N_d)、空间隔离层厚度(W_d) 和Al_xGa_1-xAs中Al组分(x_Al)的大小, 并在双温(300 K, 78 K)条件下对生长的样品进行了霍尔测量; 结合测试结果, 分别对N_d, W_d及x_Al与GaAs/Al_xGa_1-xAs 2DEG的载流子浓度和迁移率之间的关系规律进行了细致的分析讨论. 生长了包含有低密度InAs量子点层的δ掺杂GaAs/Al_xGa_1-xAs 2DEG 样品, 采用梯度生长法得到了不同密度的InAs量子点. 霍尔测量结果表明, 随着InAs量子点密度的增加, GaAs/Al_xGa_1-xAs 2DEG的迁移率大幅度减小, 实验中获得了密度最低为16×10⁸/cm²的InAs量子点样品. 实验结果为内嵌InAs量子点的δ掺杂GaAs/Al_xGa_1-xAs 2DEG的研究和应用提供了依据和参考. 关键词： 二维电子气 InAs量子点 载流子浓度 迁移率     

Localized exciton dynamics in InGaN quantum well structures

InGaN multiple quantum well laser diode (LD) wafer that lased at 400 nm was shown to have the InN mole fraction, x, of only 6% in the wells. Nanometer-probe compositional analysis showed that the fluctuation of x was as small as 1% or less, which is the resolution limit. However, the wells exhibited a Stokes-like shift (SS) of 49 meV and an effective localization depth E₀ was estimated by time-resolved photoluminescence (TRPL) measurement to be 35 meV at 300 K. Since the effective electric field due to polarization in the wells is estimated to be as small as 286 kV/cm, SS is considered to originate from an effective bandgap inhomogeneity. Because the well thickness fluctuation was insufficient to produce SS or E₀, the exciton localization is considered to be an intrinsic phenomenon in InGaN material. Indeed, bulk cubic In_0.1Ga_0.9N, which does not suffer any polarization field or thickness fluctuation effect, exhibited an SS of 140 meV at 77 K and similar TRPL results. The origin of the localization is considered to be due to the large bandgap bowing and In clustering in InGaN material. Such shallow and low density localized states are leveled by injecting high density carriers under the lasing conditions for the 400 nm LDs.     

Dependence of Spin-orbit Parameters in AlxGa1-xN/GaN Quantum Wells on the Al Composition of the Barrier

In this paper, we obtain considerable spin-orbit (SO) parameters in Al_xGa_1-xN/GaN quantum wells (QWs) with sheet carrier concentration N_s =120×10 ¹¹/cm². With increasing Al content (x) of the barrier, the SO parameters increase as a whole, and the two major contributions are found to be the decrease of the expansion region of the envelope functions and the increase of the polarized electric field in the well. Compared with the Rashba parameters for the first two subbands, the intersubband SO parameter is a bit smaller and varies more slowly with x. The results indicate the SO parameters, especially the Rashba parameters can be engineered by the Al composition of the barrier, which may be helpful to the spin manipulation of III-nitride low-dimensional heterostructures.     

Characteristics of high responsivity 8.5 μm InGaAs/InP QWIPs grown by metalorganic vapour phase epitaxy

Higher responsivity of quantum well infrared photodetectors based on In_0.53Ga_0.47As–InP material system compared to the well established GaAs–AlGaAs material system is analyzed. It is shown that the higher responsivity of the former results mainly from its smaller capture probability, p_c, than that of the latter. Both transport as well as L valley occupancy appear important in determining the p_c.