拟线性波动方程耦合组Cauchy问题的整体解存在定理

对于相对场相互作用系统〔‘l口切=F(切,吵,刀p,D必口砂=G(切,劝,刀甲,D妇t二0:(甲,叻)“(蜜:,舀2),(沪‘,功.)二(叮:,斤2)声..t‘苦.t 、产 ︸l 了、其中场变量伽,初为(t,x)任R+xR”的未知函数,F、G、古:、条、粉:、刀:为已知函数,口=a‘一△,D=(J.,a二:,…,a二。),有 定理若存在常数v。>o,使当1入】(v。时,)F{二o(囚’‘,),【Gl=o(囚.”),入==(入。,入:,…,入。,#。,拼,,…,拼,),F、G〔C’(R,,+舍),且八>2(a+1)la,a》z,对于任何正整数50>。/2(a+i)+i及s》〔an/(a+1)〕+s。+1,存在d>o,E>o,使当君:、么〔H,+’(R”)门研.+’,,“+”…     

Ar?NO团簇的同步辐射光电离研究

利用国家同步辐射实验室合肥光源的真空紫外同步辐射，使NO分子和Ar原子混合物的超声分子束发生光电离，测量了Ar，NO和异类团簇Ar·NO的光电离效率谱. 在谱中，在与Ar原子的共振线对应的能量区域(11.5—12.0 eV)观察到一个强的类共振结构. 这个结果表明，在异类团簇Ar·NO的内部，稀有气体Ar原子的激发能转移到与它接触的分子NO上，使分子NO发生电离. 关键词： Ar·NO团簇 同步辐射 光电离 能量转移     

周期性梯度折射率多层膜的软X射线反射率

由于界面互扩散的存在，实际的超薄多层膜很难具有清晰的界面结构.假设超薄多层膜为具有周期性梯度折射率的多层膜结构，用直线模型和余弦模型模拟了周期性梯度折射率多层膜的软X射线反射率.结果证明，折射率余弦渐变的多层膜虽然不具有清晰的界面，但它同样具有很高的反射率.     

Harmonic beam splitter design and fabrication

Two problems of half-wave hole and high ripples in the transmittance region for a harmonic beam splitter had been pointed out and analyzed. Based on the application of a half-wavelength control and a new admittance matching methods, a harmonic beam splitter was designed and fabricated. The former method eliminated the half-wave hole fundamentally, and the latter smoothed high ripples in the transmittance region effectively. The matching stack consisted of a symmetrically periodic structure and provided a complete matching at the desired wavelength, i.e., both conditions for the equivalent admittance and phase thickness were fulfilled. Furthermore, both the theoretical and the tested curves had been given, and a good agreement between them was obtained.     

Cu~+、Ag~+、Au~+与乙硫醇的气相化学反应

利用激光溅射 分子束的技术 ,结合反射飞行时间质谱计 ,研究了Cu+、Ag+、Au+与乙硫醇的气相化学反应。结果显示这三种金属离子与 (CH3 CH2 SH) n 反应形成一系列团簇离子M+(CH3 CH2 SH) n,且团簇离子尺寸不一样。Ag+、Au+与乙硫醇的反应还生成了 (CH3 CH2 SH) +n ,由此推测Cu+、Ag+、Au+与乙硫醇团簇的反应存在两种通道 ,一种通道是生成M+(CH3 CH2 SH) n,另一种是生成 (CH3 CH2 SH) +n 。Cu+、Au+与乙硫醇的反应还生成了M+(H2 S) (M =Cu、Au) ,但是实验中没有观察到Ag+(H2 S) ,理论计算表明Ag+(H2 S)很不稳定。另外 ,分析产物离子M+(CH3 CH2 SH) n 的强度发现 ,n =1～ 2之间存在明显的强度突变现象     

光纤探头式分光光度计在丙酮碘化反应动力学研究中的应用

丙酮的碘化反应——作为复杂反应的一个例子,是研究化学反应动力学时常被选用的一个物理化学实验。在该实验中,常用72型分光光度计通过间歇取样的方法,测出不同反应时刻反应物碘的浓度,经作图计算求得反应的速度常数。显然这种方法既费时又麻烦,且误差也较大。近几年来,光纤传感器的出现为我们提供了一种快速简便,可连续进行测量的分析     

Interface roughness, surface roughness and soft X-ray reflectivity of Mo/Si multilayers with different layer number

A series of Mo/Si multilayers with the same periodic length and different periodic number were prepared by magnetron sputtering, whose top layers were respectively Mo layer and Si layer. Periodic length and interface roughness of Mo/Si multilayers were determined by small angle X-ray diffraction (SAXRD). Surface roughness change curve of Mo/Si multilayer with increasing layer number was studied by atomic force microscope (AFM). Soft X-ray reflectivity of Mo/Si multilayers was measured in National Synchrotron Radiation Laboratory (NSRL). Theoretical and experimental results show that the soft X-ray reflectivity of Mo/Si multilayer is mainly determined by periodic number and interface roughness, surface roughness has little effect on reflectivity.     

Lp[0,1]空间Müntz有理逼近的Jackson型估计

设Λ={λn}n∞=1为正的实数数列,且当n→∞时,有λn↘0.本文给出了当λn≤Mn-1/2,n=1,2,…,(其中M＞0为一正常数)时Müntz系统{xλn}的有理函数在Lp[0,1]空间的逼近速度,主要结论为Rn(f,Λ) Lp≤CMω(f,n-1/2)Lp,1≤p≤∞.     

Effect of Alumina and Chromium Interlayers on Microstructures and Optical Properties of Thin Ag Films on Glass Substrates

Effects of alumina and chromium interlayers on the microstructure and optical properties of thin Ag films are investigated by using spectrophotometry, x-ray diffraction and AFM. The characteristics of Ag films in Ag/glass, Ag/l2O3/glass and Ag/Cr/glass stacks are analysed. The results indicate that the insertion of an Al2O3 or Cr layer decreases the grains and influences the reflectance of Ag films. The reflectance of the Ag film can be increased by controlling the thickness of alumina interlayer. The stability of Ag films is improved and the adhesion of Ag films on glass substrates is enhanced by alumina as an interlayer.     

单脉冲和多脉冲飞秒激光对单层光学薄膜的损伤

 利用掺钛的蓝宝石飞秒激光系统输出的单脉冲和多脉冲飞秒激光(中心波长800 nm，脉宽50 fs，靶面聚焦直径Ф 40 μm)，分别对BK7玻璃基底上厚约500 nm的单层HfO₂和单层ZrO₂薄膜进行辐照，得到了这两种薄膜在1-on-1和1 000-on-1测试方法下的激光损伤阈值。实验发现，两种方法下HfO₂单层膜的阈值均比ZrO₂单层膜的阈值高。从简化的Keldysh多光子离化理论出发，认为HfO₂薄膜材料的带比ZrO₂的宽是导致上述结果的主要原因。同时，同一种薄膜的多脉冲下的阈值比单脉冲下的低，原因是多脉冲下，飞秒激光对光学薄膜的损伤存在累积效应。