铟镓锌氧薄膜晶体管的悬浮栅效应研究

为了避免光照对铟镓锌氧薄膜晶体管(InGaZnO thin film transistors,IGZO TFTs)电学特性的影响,IGZO TFT要增加遮光金属层.本文研究了遮光金属栅极悬浮时,IGZO TFT的输出特性.采用器件数值计算工具TCAD(technology computer-aided design)分析了IGZO层与栅介质层界面处电势分布,证实了悬浮栅(floating gate,FG)IGZO TFT输出曲线的不饱和现象是由悬浮栅与TFT漏端的电容耦合造成.基于等效电容的电压分配方法,提出了悬浮栅IGZO TFT电流的一阶模型.TCAD数值分析及一阶物理模型结果与测试具有较高程度的符合,较完整地解释了悬浮栅IGZO TFT的电学特性.     

Concise Modeling of Amorphous Dual-Gate In-Ga-Zn-O Thin-Film Transistors for Integrated Circuit Designs

An analytical model for current–voltage behavior of amorphous In-Ga-Zn-O thin-film transistors(a-IGZO TFTs)with dual-gate structures is developed.The unified expressions for synchronous and asynchronous operating modes are derived on the basis of channel charges,which are controlled by gate voltage.It is proven that the threshold voltage of asynchronous dual-gate IGZO TFTs is adjusted in proportion to the ratio of top insulating capacitance to the bottom insulating capacitance(C_(TI)/C_(BI)).Incorporating the proposed model with Verilog-A,a touch-sensing circuit using dual-gate structure is investigated by SPICE simulations.Comparison shows that the touch sensitivity is increased by the dual-gate IGZO TFT structure.     

InGaZnO薄膜晶体管泄漏电流模型

研究了非晶氧化锌镓铟薄膜晶体管(amorphous InGaZnO thin-film transistor,InGaZnO TFT)的泄漏电流模型.基于Poole-Frenkel热发射效应和热离子场致发射效应的泄漏电流产生机制,分别得到了高电场和低电场条件下的载流子产生-复合率.在此基础上推导得到了InGaZnO TFT的分段式泄漏电流-电压数学模型,并利用平滑函数得到了关断区和亚阈区连续统一的泄漏电流模型.所提出的泄漏电流模型的计算值和TCAD模拟值与实验结果较为吻合.利用所提出的InGaZnO TFT泄漏电流模型和TCAD模拟,讨论了InGaZnO TFT不同的沟道宽度、沟道长度和栅介质层厚度对泄漏电流值的影响.研究结果对InGaZnO TFT集成传感电路的设计具有一定参考价值.     

同步对称双栅InGaZnO薄膜晶体管电势模型研究

研究了同步对称双栅氧化铟镓锌薄膜晶体管(InGaZnO thin film transistors,IGZO TFTs)的沟道电势,利用表面电势边界方程联合Lambert函数推导得到了器件沟道电势的解析模型.该模型考虑了IGZO薄膜中存在深能态及带尾态等缺陷态密度,能够同时精确地描述器件在亚阈区(sub-threshold)与开启区(above threshold)的电势分布.基于所提出的双栅IGZO TFT模型,讨论了不同厚度的栅介质层和有源层时,栅-源电压对双栅IGZO TFT的表面势以及中心势的调制效应.对比分析了该模型的计算值与数值模拟值,结果表明二者具有较高的符合程度.     

Surface potential-based analytical model for InGaZnO thin-film transistors with independent dual-gates

An analytical drain current model on the basis of the surface potential is proposed for indium-gallium zinc oxide(InGaZnO)thin-film transistors(TFTs)with an independent dual-gate(IDG)structure.For a unified expression of carriers’distribution for the sub-threshold region and the conduction region,the concept of equivalent flat-band voltage and the Lambert W function are introduced to solve the Poisson equation,and to derive the potential distribution of the active layer.In addition,the regional integration approach is used to develop a compact analytical current-voltage model.Although only two fitting parameters are required,a good agreement is obtained between the calculated results by the proposed model and the simulation results by TCAD.The proposed current-voltage model is then implemented by using Verilog-A for SPICE simulations of a dual-gate InGaZnO TFT integrated inverter circuit.     

面向IGZO-TFT-AMOLED像素电路设计的V_(TH)检测方法研究

由于迁移率高、均匀性好、制备成本低等优势,铟镓锌氧化物薄膜晶体管(IGZO TFT)有望促成有源矩阵有机发光显示器件(AMOLED)的大规模量产。但是IGZO TFT存在阈值电压(VTH)漂移的问题,实用的AMOLED像素电路必须对VTH漂移进行补偿以实现较好的显示效果,而VTH的检测是AMOLED像素电路设计中的关键环节。本文系统研究了VTH检测方法,比较了放电法、充电法、偏置电流法补偿VTH的效果,研究了VTH检测时间和TFT寄生电容等参数的影响。研究结果表明:放电法不能精确地补偿负VTH漂移,充电法需要的VTH检测时间最长,偏置电流法能够达到的补偿精度最高。     

基于数据线控制发光的A-IGZO薄膜晶体管集成AMOLED像素电路

本文提出了一种采用铟镓锌氧化物（IGZO）薄膜晶体管（TFT）的有源矩阵有机发光二极管（AMOLED）显示器的新型补偿结构。它利用数据线关闭电源和驱动晶体管之间的控制晶体管,以抑制编程期间的泄漏电流。在所提出的电路和传统电路之间进行电路性能的比较,表明所提出的像素电路可以有效地补偿驱动晶体管的阈值电压偏移和迁移率变化。当V_TH飘移2 V和μ增加30%时,I_OLED误差率可以分别降低至小于5%和9%。此外,由于使用同时驱动方法,因此所需的最小编程时间可以被详细推导出来。所提出的像素电路的编程能力和机制已经通过FPGA平台和离散的场效应器件所证实。尽管所提出的像素电路具有非常简单的驱动结构,但它能够提高补偿精度。