Cs^＋-K^＋ Exchange in Z-Cut KTiOPO4 Crystal Covered with Chromium Masking Layer

Cs^＋-K^＋ ion exchanges are performed on z-cut KTiOPO4 crystals with chromium coating covered. The temperature of ion exchange is 430℃, and the time range from 15min to 30min. The dark mode spectra of the samples are measured by the prism coupling method. The channel structures on the samples are observed by a microscope and the near field pattern of the channel waveguides are measured by the end-fire coupling method. The refractive index of the samples increases and the increments at surface are modulated due to the existence of Cr film. In the region covered by Cr film, the refractive index of the samples at the surface increases dramatically in a shallow layer. The results of energy dispersive x-ray spectra indicate that in the region covered with Cr film, Cr ions participate in the ion exchange process, and enhance the refractive index. The results may provide a possibility that achieves index enhancement and Cr doping synchronically.     

导电介质中电磁波相移常数与振幅衰减常数的方向关系的讨论

对文献上给出的非均匀电磁波在同一均匀导电介质中传播时,电磁波的相移常数和振幅衰减常数方向之间满足定量关系的结论,重新进行了分析和推导,利用电磁波在导电介质界面的边界条件,给出了两种情况下的相移常数和振幅衰减常数的表达式,以及它们与界面法线的夹角正弦的表达式.结果表明,在同一均匀导电介质中,非均匀电磁波的相移常数的方向和振幅衰减常数的方向之间一般不满足定量关系.     

椭圆偏振法研究B离子注入LiNbO_3光波导的光学特性

用椭圆偏振法研究了2.5 MeV B离子注入后的铌酸锂晶体,建立四层模型,对反射式椭圆偏振测量得出的数据进行反演拟合,得到了波导层厚度及0.3～0.8 μm波段波导层和损伤层的双折射色散曲线,发现低剂量B离子注入铌酸锂形成了折射率下降的位垒,在晶体表面下2.0 μm范围内得到了光波导结构.研究结果为以铌酸锂为基础的光波导器件研发提供了重要信息.     

水平极化光在单轴吸收晶体中的传播

根据光在各向同性吸收介质中传播的分析方法,引入了波法线矢量传播常量,讨论了水平极化光在单轴吸收晶体中的传播规律,得到了波法线折射率、光线折射率、吸收系数等描述吸收晶体性质和光传播性质的物理量的表达式,推导出透明晶体的相应公式.数值计算表明,由该法得到的晶体表面的反射和透射系数与用复折射率表示法得到的结论一致.     

离子注入结合离子交换技术制备KTiOPO4光波导特性研究

用离子注入结合离子交换技术形成了 KTiOPO₄ 平面光波导,研究了离子注入对离子交换波导结构的影响.使用棱镜耦合法测量了波导特性,结果显示形成了表面折射率升高的多模波导,通过背散射技术研究了离子交换后的 Rb 离子分布.实验表明,注入离子导致样品晶格损伤,在 2.8 μm处对离子交换形成了阻挡层,阻止了交换向KTP晶体的更深处进行.     

离子注入结合离子交换技术制备KTiOPO_4光波导特性研究

用离子注入结合离子交换技术形成了KTiOPO4平面光波导,研究了离子注入对离子交换波导结构的影响.使用棱镜耦合法测量了波导特性,结果显示形成了表面折射率升高的多模波导,通过背散射技术研究了离子交换后的Rb离子分布.实验表明,注入离子导致样品晶格损伤,在2.8μm处对离子交换形成了阻挡层,阻止了交换向KTP晶体的更深处进行.     

Analysis and Determination of Refractive Index Profiles of O^2＋ Ion-Implanted LiNbO3 Planar Waveguide Using Etching and Ellipsometry Techniques

The refractive index profiles of 3 MeV O^2＋ ion-implanted planar waveguides in lithium niobate are reconstructed based on etching and ellipsometry techniques. SRIM2003 code is used to simulate the damage distribution in waveguide. It is demonstrated that the index profile of this kind of waveguide, extending to several micrometres in depth, can be determined by etching in combination with following ellipsometric measurements. A good agreement is found between the simulated damage distributions in waveguide and the index profiles based on experimental data, and the width of refractive index barrier is wider than the result of SRIM2003.