超强磁场下非掺杂ZnSe/BeTe Ⅱ型量子阱中激子和带电激子的光学特性

报道了液态氦温度(4.2 K)下非掺杂ZnSe/BeTe Ⅱ型量子结构中ZnSe势阱层内空间直接光致发光(PL)光谱的磁场依赖性(磁场高达53 T).实验结果显示,随着磁场的增加,激子和带电激子的PL强度呈现出相反的振动行为.当激子的PL强度增加时带电激子的PL强度减小,反之,当激子的强度减小时带电激子的强度却增加.并且在整个磁场范围内,这些振动呈现近似等间隔的周期性变化.这个行为被解释为费米能级与朗道能级的周期性共振,这个共振导致了处于费米能级上的二维电子气态密度的周期性调制. 关键词： 光致发光 二维电子气 带电激子 Ⅱ型量子阱     

Electron tunneling effects on radiative recombination in modulation n-doped ZnSe/BeTe type-II quantum wells

We have studied the cyclotron-resonance absorption and photoluminescence properties of the modulation n-doped ZnSe/BeTe/ZnSe type-II quantum wells.It is shown that only the doped sample shows electron cyclotron-resonance absorption.Also,the undoped sample shows two distinctive peaks in the spatially indirect photoluminescence spectra,and the doped one shows only one peak.The results reveal that the high concentration electrons accumulated in ZnSe quantum well layers from n-doped layers can tunnel through BeTe barrier from one well layer to the other.The electron concentration difference between these two well layers originating from the tunneling results in a new additional electric field,and can cancel out a built-in electric field as observed in the undoped structures.     

掺杂ZnSe/BeTe Ⅱ型量子阱结构中带电激子的磁场效应

报道了n型掺杂ZnSe/BeTe/ZnSe Ⅱ型量子阱(type-Ⅱ QW)在极低温 (5—10 K)条件下的各种光学性质. 磁场中(Farada配置)ZnSe层的反射光谱展示了一个典型的负的带电激子(X^-)的跃迁特征. 对于空间间接光致发光(spacially indirect PL)光谱,它的主发光峰显示了一个反玻尔兹曼分布的非对称性,并且在磁场中(Voigt配置)它的峰值能量随磁场的增加而降低. 这些实验结果显示了该掺杂样品的空间间接PL是来自Ⅱ型QW结构所特有的带电激子的跃迁. 关键词： 光致发光 二维电子气 带电激子 Ⅱ型量子阱     

Photoluminescence of Nanoporous GaN Films Prepared by Electrochemical Etching

Nanoporous （NP） CaN is prepared by electrochemical etching on a CaN epilayer grown on a sapphire substrate by metal-organic chemical vapor deposition. Scanning electron microscopy reveals that the average pore diameter and inter-pore spacing are approximately 25 and 45 nm, respectively. The photoluminescence （PL） spectra show that in contrast to the initial as-grown CaN epilayer, the NP CaN exhibits a high near-band-edge UV intensity, significant relaxation of compressive strain, and a lower yellow luminescence intensity. Both the line shape and line width of the PL spectra are almost the same for these two samples. The high quality of the NP CaN can be explained by the enhancement of the PL extraction efficiency and the decrease of impurity and defect density after etching.     

ZnSe/BeTe Ⅱ型量子阱中界面结构对发光特性的影响

报道了具有特殊界面结构(界面包含三个Zn—Te或Te—Zn化学键)的非掺杂ZnSe/BeTe II 型量子阱在低温(5—10 K)条件下的空间间接光致发光(PL)光谱的实验结果. PL光谱显示了一个较弱的双峰结构和较低的线性偏振度,并且这两个峰的线性偏振度相反. 此外,这个PL光谱也强烈地依赖于一个外加电场的变化. 这些结果表明样品的两个发光峰是分别来自两个界面的发光跃迁,并且特殊界面结构降低了空间间接PL的发光效率和线性偏振性,以及界面附近的内秉电场. 随着激发强度的增加,PL谱的高能端发光峰显示了一个 关键词： Ⅱ型量子阱 光致发光 界面结构     

Growth and photoluminescence properties of inclined ZnO and ZnCoO thin films on SrTiO_3（110） substrates

ZnO thin film growth prefers different orientations on the etched and unetched SrTiO 3（STO）（110） substrates.Inclined ZnO and cobalt-doped ZnO（ZnCoO） thin films are grown on unetched STO（110） substrates using oxygen plasma assisted molecular beam epitaxy,with the c-axis 42 inclined from the normal STO（110） surface.The growth geometries are ZnCoO[100]//STO[110] and ZnCoO[111]//STO[001].The low temperature photoluminescence spectra of the inclined ZnO and ZnCoO films are dominated by D 0 X emissions associated with A 0 X emissions,and the characteristic emissions for the 2 E（2G）→ 4A2（4F） transition of Co 2＋ dopants and the relevant phonon-participated emissions are observed in the ZnCoO film,indicating the incorporation of Co 2＋ ions at the lattice positions of the Zn 2＋ ions.The c-axis inclined ZnCoO film shows ferromagnetic properties at room temperature.     

调制n型掺杂ZnSe/BeTe Ⅱ型量子阱结构的发光特性

报道了调制n型掺杂ZnSe/BeTe/ZnSe Ⅱ型量子阱(type-II QW)在极低温至室温(14—296K)条件下的各种光学性质. 反射光谱显示了对于非掺杂样品,激子(X)的跃迁起着支配作用,而只有在掺杂样品的光谱里展示了一个典型的负的带电激子(X^-)的跃迁特征. PL光谱及其直线偏振度P_l都显著地依赖于n型掺杂量和平行于QW生长方向的外加电场. 这个特征被认为是由n型掺杂导致了内秉电场(built 关键词： 光致发光 二维电子气 带电激子 Ⅱ型量子阱     

Investigation of the inhibiting outdiffusion of erbium atoms to a silicon-on-insulator surface after annealing at high temperature

The annealing behaviour of 400 keV Er ions at a fluence of 2×1015 cm-2 implanted into silicon-on-insulator(SOI) samples is investigated by Rutherford backscattering spectrometry of 2.1 MeV He2+ ions with a multiple scattering model.It is found that the damage close to the SOI surface is almost removed after being annealed in O2 and N2 atmospheres,successively,at ℃,and that only a small number of the Er atoms segregated to the surface of the SOI sample,whereas a large number of Er atoms diffused to a deeper position because of the affinity of Er for oxygen.For the SOI sample co-implanted with Er and O ions,there is no evident outdiffusion of Er atoms to the SOI surface after being annealed in N2 atmosphere at ℃.     

Intrinsic relationship between photoluminescence and electrical characteristics in modulation Fe-doped AlGaN/GaN HEMTs

The photoluminescence(PL) and electrical properties of Al GaN/GaN high electron mobility transistors(HEMTs) with different Fe doping concentrations in the GaN buffer layers were studied. It was found that, at low Fe doping concentrations,the introduction of Fe atoms can result in a downward shift of the Fermi level in the GaN buffer layer, since the Fe atoms substitute Ga and introduce an Fe_(Ga)~(3+/2+) acceptor level. This results in a decrease in the yellow luminescence(YL) emission intensity accompanied by the appearance of an infrared(IR) emission, and a decrease in the off-state buffer leakage current(BLC). However, a further increase in the Fe doping concentration will conversely result in the upward shift of the Fermi level due to the incorporation of O donors under the large flow rate of the Fe source. This results in an increased YL emission intensity accompanied by a decrease in the IR emission intensity, and an increase in the BLC. The intrinsic relationship between the PL and BLC characteristics is expected to provide a simple and effective method to understand the variation of the electrical characteristic in the modulation Fe-doped HEMTs by optical measurements.     

荧光法测定半导体禁带宽度

光学带隙或禁带宽度是半导体材料的一个重要特征参数.本文以3个具有代表性的InGaN/GaN多量子阱结构作为研究对象,深入探讨了荧光法测定某个目标温度下InGaN阱层的光学带隙所需要满足的测试条件.由于InGaN阱层是一种多元合金且受到来自GaN垒层的应力作用,所以该阱层中不仅存在着杂质/缺陷相关的非辐射中心,也存在着组分起伏诱发的局域势起伏以及极化场诱发的量子限制斯塔克效应.因此,为了获得目标温度下InGaN阱层的较为精确的光学带隙,提出了荧光测量至少应满足的测试条件,即必须消除该目标温度下非辐射中心、局域中心以及量子限制斯塔克效应对辐射过程的影响.