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Theoretical study on the improvement of the doping efficiency of Al in 4H-SiC by co-doping group-IVB elements 下载免费PDF全文
Yuanchao Huang 《中国物理 B》2022,31(4):46104-046104
The p-type doping efficiency of 4H silicon carbide (4H-SiC) is rather low due to the large ionization energies of p-type dopants. Such an issue impedes the exploration of the full advantage of 4H-SiC for semiconductor devices. In this study, we show that co-doping group-IVB elements effectively decreases the ionization energy of the most widely used p-type dopant, i.e., aluminum (Al), through the defect-level repulsion between the energy levels of group-IVB elements and that of Al in 4H-SiC. Among group-IVB elements Ti has the most prominent effectiveness. Ti decreases the ionization energy of Al by nearly 50%, leading to a value as low as ~0.13 eV. As a result, the ionization rate of Al with Ti co-doping is up to ~5 times larger than that without co-doping at room temperature when the doping concentration is up to 1018 cm-3. This work may encourage the experimental co-doping of group-IVB elements such as Ti and Al to significantly improve the p-type doping efficiency of 4H-SiC. 相似文献
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宽禁带半导体具备禁带宽度大、电子饱和飘移速度高、击穿场强大等优势,是制备高功率密度、高频率、低损耗电子器件的理想材料。碳化硅(SiC)材料具有热导率高、化学稳定性好、耐高温等优点,在SiC衬底上外延宽禁带半导体材料,对充分发挥宽禁带半导体材料的优势,并提升宽禁带半导体电子器件的性能具有重要意义。得益于SiC衬底质量持续提升及成本不断降低,基于SiC衬底的宽禁带半导体电子市场占比呈现逐年增加的态势。在SiC衬底上外延生长高质量的宽禁带半导体材料是提高宽禁带半导体电子器件性能及可靠性的关键瓶颈。本文综述了近年来国内外研究者们在SiC衬底上外延SiC、氮化镓(GaN)、氧化镓(Ga2O3)所取得的研究进展,并展望了SiC衬底上宽禁带半导体外延的发展及应用前景。 相似文献
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研磨作为4H碳化硅(4H-SiC)晶片加工的重要工序之一,对4H-SiC衬底晶圆的质量具有重要影响。本文研究了金刚石磨料形貌和分散介质对4H-SiC晶片研磨过程中材料去除速率和面型参数的影响,基于研磨过程中金刚石磨料与4H-SiC晶片表面的接触情况,推导出简易的晶片材料去除速率模型。研究结果表明,磨料形貌显著影响4H-SiC晶片的材料去除速率,材料去除速率越高,晶片的总厚度变化(TTV)越小。由于4H-SiC中C面和Si面的各向异性,4H-SiC晶片研磨过程中C面的材料去除速率高于Si面。在分散介质的影响方面:水基体系研磨液的Zeta电位绝对值较高,磨料分散均匀,水的高导热系数有利于控制研磨过程中的盘面温度;乙二醇体系研磨液的Zeta电位绝对值小,磨料易发生团聚,增大研磨过程的磨料切入深度,晶片的材料去除速率提高,晶片最大划痕深度随之增大。 相似文献
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由拉曼光谱仪测试巨晶普通辉石及包体中的顽火辉石、透辉石拉曼光谱,描述了谱图的位置、形态和相对强度,分析了振动模式,同时对相应的离子基团如非桥氧Si—O—,桥氧Si—O0,O—Si—O,M—O做了谱带归属。通过不同切片方向的谱带强度相对大小及某些谱带的缺失,初步研究了辉石族矿物晶体结晶学定向问题。 相似文献
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We present the temperature-dependent susceptibility and specific heat measurement of spinel ZnV_2O_4.The structural transition with orbital ordering and the antiferromagnetic transition with spin ordering were observed at 50 K and 37 K,respectively.By analysis of the hysteresis behavior between the specific heat curves obtained in warming and cooling processes,the structural transition was confirmed to be the first-order transition,while the antiferromagnetic transition was found to be of the second-order type.At the structural transition,the latent heat and entropy change were calculated from the excess specific heat,and the derivative of pressure with respect to temperature was obtained using the Clausius-Clapayron equation.At the magnetic transition,the width of the critical fluctuation region was obtained to be about 0.5 K by comparing with Gaussian fluctuations.In the critical region,the critical behavior was analyzed by using renormalization-group theory.The critical amplitude ratio A~+/A~- = 1.46,which deviates from the 3D Heisenburg model;while the critical exponent α is-0.011,which is close to the 3D XY model.We proposed that these abnormal critical behaviors can be attributed to strong spin-orbital coupling accompanied with the antiferromagnetic transition.Moreover,in the low temperature range(2-5 K),the Fermi energy,the density of states near the Fermi surface,and the low limit of Debye temperature were estimated to be2.42 eV,2.48 eV~(-1),and 240 K,respectively. 相似文献
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Quantum confinement and surface chemistry of 0.8–1.6 nm hydrosilylated silicon nanocrystals 下载免费PDF全文
In the framework of density functional theory(DFT), we have studied the electronic properties of alkene/alkynehydrosilylated silicon nanocrystals(Si NCs) in the size range from 0.8 nm to 1.6 nm. Among the alkenes with all kinds of functional groups considered in this work, only those containing –NH2and –C4H3S lead to significant hydrosilylationinduced changes in the gap between the highest occupied molecular orbital(HOMO) and the lowest unoccupied molecular orbital(LUMO) of an Si NC at the ground state. The quantum confinement effect is dominant for all of the alkenehydrosilylated Si NCs at the ground state. At the excited state, the prevailing effect of surface chemistry only occurs at the smallest(0.8 nm) Si NCs hydrosilylated with alkenes containing –NH2and –C4H3S. Although the alkyne hydrosilylation gives rise to a more significant surface chemistry effect than alkene hydrosilylation, the quantum confinement effect remains dominant for alkyne-hydrosilylated Si NCs at the ground state. However, at the excited state, the effect of surface chemistry induced by the hydrosilylation with conjugated alkynes is strong enough to prevail over that of quantum confinement. 相似文献
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在众多二维材料中,过渡金属硫族化合物由于其具有独特的光电特性深受广大研究者喜爱.近年来,由二维过渡金属硫族化合物材料与有机半导体结合构建的范德瓦耳斯异质结受到极大的关注.这种异质结可以利用两者的优势对光电特性等性能进行调控,为许多基础物理和功能器件的构建提供了研究思路.本文构建了酞菁铜/二硫化钼(CuPc/MoS2)范德瓦耳斯异质结,并对其荧光特性进行了表征和分析.与单层MoS2相比较发现,引入有机半导体CuPc后,异质结当中发生了明显的荧光淬灭现象.通过荧光分析,该现象可以用引入CuPc后异质结中负三激子与中性激子之比增加来解释.此外,通过第一性原理计算分析发现,引入CuPc会在MoS2的禁带中引入中间带隙态,使得CuPc与MoS2之间产生非辐射复合,这同样会导致荧光淬灭的发生.CuPc/MoS2异质结的荧光淬灭现象可以为同类型范德瓦耳斯异质结的光电特性调控研究提供参考和思路. 相似文献
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采用聚硅氮烷前驱体在高温常压下热裂解的方法制备了3C-SiC纳米棒,在室温下观察到来自纳米棒的378 nm(33?eV) 强紫外发射. 利用扫描电子显微镜、透射电子显微镜、高分辨透射电子显微镜和X射线衍射对样品的形貌和结构进行表征,观察到在该结构中存在类似6H-SiC结构的三层堆垛层错. 利用室温荧光光谱和室温荧光衰减曲线研究了强紫外发射的产生机理,紫外发射来源于3C-SiC纳米棒中的三层堆垛层错的发光.
关键词:
碳化硅
纳米棒
光致发光 相似文献