A Free Boundary Problem for Some Modified Predator-Prey Model in a Higher Dimensional Environment

Applications of Mathematics - We focus on the free boundary problems for a Leslie-Gower predator-prey model with radial symmetry in a higher dimensional environment that is initially well populated...     

金属衬底在石墨烯化学气相沉积生长中的作用

以过渡金属为催化衬底的化学气相沉积法(Chemical Vapor Deposition，CVD)已经可以制备与机械剥离样品相媲美的石墨烯，是实现石墨烯工业应用的关键技术之一。原子尺度理论研究能够帮助我们深刻理解石墨烯生长机理，为实验现象提供合理的解释，并有可能成为将来实验设计的理论指导。本文从理论计算的角度，总结了各种金属衬底在石墨烯CVD生长过程中的各种作用与相应的机理，包括在催化碳源裂解、降低石墨烯成核密度等，催化加快石墨烯快速生长，修复石墨烯生长过程中产生的缺陷，控制外延生长石墨烯的晶格取向，以及在降温过程中石墨烯褶皱与金属表面台阶束的形成过程等。在本文最后，我们对当前石墨烯生长领域中亟需解决的理论问题进行了深入探讨与展望。     

High-performance nonfused ring electron acceptor with a steric hindrance induced planar molecular backbone

Three nonfused ring electron acceptors (NFREAs) TTC6,TT-C8T and TT-TC8 were purposefully designed and synthesized.The molecular geometry can be adjusted by the steric hindrance of lateral substituents.According to the DFT calculations,from TTC6 to TT-C8T and TT-TC8,planarity of the molecular backbone is gradually improved,accompanying with the enhancing of intramolecular charge transfer effect.As for TT-TC8,the two phenyl substituents are almost perpendicular to the molecular backbone,which endues the acceptor with good solubility and suppresses it to form over-aggregation.Multidirectional regular molecular orientation and closer molecular stacking are formed in TT-TC8 film.As a result,TT-TC8 based devices afford the highest PCE of 13.13%,which is much higher than that of TTC6 (4.41%) and TT-C8T (10.42%) and among the highest PCE values based on NFREAs.     

Examples of compactλ-hypersurfaces in Euclidean spaces

In this paper,we first construct compact embeddedλ-hypersurfaces with the topology of torus which are calledλ-torus in Euclidean spaces?n^+1.Then,we give many compact immersedλ-hypersurfaces in Euclidean spaces?n^+1.     

电机驱动微装配在双光子制备微结构中的应用

对微结构的制作、微装配系统进行了研究. 采用飞秒激光双光子聚合微加工技术制作有底座、精细的三维立体“拱形”微结构, 其高250μm、长300μm、厚50μm. 将此微结构与实验室自主搭建的二维微装配平台相结合, 利用自主编程的人机交互界面驱动步进电机, 远程操控微装配设备; 将荧光闪烁陶瓷粉末装配到微结构中, 对装配后的微结构进行荧光光谱表征发现, 纯荧光粉末和微结构中的荧光粉末的发射光谱在测量误差范围内基本一致, 表明荧光粉末的光学性质未发生改变. 利用该装置可以将各类微纳米级材料和微结构进行装配, 形成含有不同材料的微结构系统.     

On the $$\bar\partial$$ -problem and dressing method for the complex vector modified KdV equation

Theoretical and Mathematical Physics - Starting from a $$5\times 5$$ local matrix $$\bar\partial$$ -problem, we successfully use the $$\bar\partial$$ -dressing method to derive a hierarchy of...     

On Minimal Asymptotic Bases

Mathematical Notes - Let $$\mathbb N$$ denote the set of all nonnegative integers, and let $$A\subseteq\mathbb N$$ . Let $$h,n\in\mathbb N$$ , $$h\ge 2$$ and $$r_h(A,n)=\#\{(a_1,\dots,a_h)\in...     

LWE from non-commutative group rings

Designs, Codes and Cryptography - The Learning-With-Errors (LWE) problem (and its variants including Ring-LWE and Module-LWE), whose security are based on hard ideal lattice problems, has proven to...     

基于摩擦磨损的KDP晶体固结磨料抛光垫优化

本文通过固结磨料球与KDP晶体对磨的单因素试验探究固结磨料球中反应物种类、磨粒浓度、反应物浓度、基体硬度对摩擦系数、磨痕截面积和磨痕处粗糙度的影响,试验结果表明:KHCO₃固结磨料球对磨后磨痕对称性好,磨痕处的粗糙度值低;磨痕截面积随磨粒和反应物浓度的增加而增大,随基体硬度的增大而降低;磨痕处粗糙度随磨粒和反应物浓度的增加先降低后上升,随基体硬度的增大先上升后降低;摩擦系数受磨粒和反应物浓度影响不明显,随基体硬度的增大而降低。选择KHCO₃作为反应物,Ⅰ基体,磨粒浓度为基体质量的100%,反应物浓度为15%制备固结磨料球与KDP晶体对磨后的磨痕轮廓对称度好且磨痕处粗糙度值低,以该组分制备固结磨料垫干式抛光KDP晶体,可实现晶体表面粗糙度Sa值为18.50 nm,材料去除率为130 nm/min的高效精密加工。