| 基于摩擦磨损的KDP晶体固结磨料抛光垫优化 |
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| 引用本文： | 熊光辉,李军,李凯旋,吴成,于宁斌,高秀娟.基于摩擦磨损的KDP晶体固结磨料抛光垫优化[J].人工晶体学报,2022,51(2):271-281. |
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| 作者姓名： | 熊光辉 李军 李凯旋 吴成 于宁斌 高秀娟 |
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| 作者单位： | 南京航空航天大学机电学院,南京 210016 |
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| 基金项目： | 国家自然科学基金联合基金(U20A20293);国家自然科学基金面上项目(52075318)； |
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| 摘 要： | 本文通过固结磨料球与KDP晶体对磨的单因素试验探究固结磨料球中反应物种类、磨粒浓度、反应物浓度、基体硬度对摩擦系数、磨痕截面积和磨痕处粗糙度的影响,试验结果表明:KHCO3固结磨料球对磨后磨痕对称性好,磨痕处的粗糙度值低;磨痕截面积随磨粒和反应物浓度的增加而增大,随基体硬度的增大而降低;磨痕处粗糙度随磨粒和反应物浓度的增加先降低后上升,随基体硬度的增大先上升后降低;摩擦系数受磨粒和反应物浓度影响不明显,随基体硬度的增大而降低。选择KHCO3作为反应物,Ⅰ基体,磨粒浓度为基体质量的100%,反应物浓度为15%制备固结磨料球与KDP晶体对磨后的磨痕轮廓对称度好且磨痕处粗糙度值低,以该组分制备固结磨料垫干式抛光KDP晶体,可实现晶体表面粗糙度Sa值为18.50 nm,材料去除率为130 nm/min的高效精密加工。
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| 关 键 词： | KDP晶体 固结磨料垫 晶体加工 干式抛光 摩擦磨损 反应物 |
| 收稿时间： | 2021-11-09 |
Optimization of Fixed Abrasive Polishing Pad for KDP Crystal Based on Friction and Wear |
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| XIONG Guanghui,LI Jun,LI Kaixuan,WU Cheng,YU Ningbin,GAO Xiujuan.Optimization of Fixed Abrasive Polishing Pad for KDP Crystal Based on Friction and Wear[J].Journal of Synthetic Crystals,2022,51(2):271-281. |
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| Authors: | XIONG Guanghui LI Jun LI Kaixuan WU Cheng YU Ningbin GAO Xiujuan |
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| Affiliation: | College of Mechanical and Electrical Engineering, Nanjing University of Aeronautics and Astronautics, Nanjing 210016, China |
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| Abstract: | In this paper, the effects of reactant type, abrasive concentration, reactant concentration and matrix hardness on friction coefficient, cross-sectional area of wear mark and roughness at wear mark were studied by single factor experiments of fixed abrasive ball grinding with KDP crystal. The test results show that: KHCO3 fixed abrasive ball has good symmetry of the wear scar, small roughness value at the wear scar, and small damage depth of KDP crystal. The cross-sectional area of wear scar increases with the increase of the concentration of abrasive and reactants, and decreases with the increase of the hardness of the matrix. The roughness at the wear scar decreases and then increases with the increase of the concentration of abrasive and reactant, and first increases and then decreases with the increase of the hardness of the matrix. The friction coefficient is not significantly influenced by the concentration of abrasive and reactants, but decreases with the increase of the hardness of the matrix. The abrasive scar contour symmetry is good and the roughness value at the wear scar is low when the composition of fixed abrasive ball is KHCO3 as the reactant, Ⅰ matrix, the abrasive concentration is 100% of the matrix mass, and the reactant concentration is 15%. The fixed abrasive pad was prepared from the components above, and the KDP crystal was polished by the pad. High efficiency and high precision machining can be achieved with surface roughness Sa of 18.5 nm and material removal rate of 130 nm/min. |
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| Keywords: | KDP crystal fixed abrasive pad crystal machining dry polishing friction and wear reactant |
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