Modified porous silica antireflective coatings with laser damage resistance for Ti:sapphire

Porous SiO2 antireflective (AR) coatings are prepared from the colloidal silica solution modified with methyltriethoxysilane (MTES) based on the sol-gel route. The viscosity of modified silica suspensions changes but their stability keeps when MTES is introduced. The refractive indices of modified coatings vary little after bake treatment from 100 to 150℃. The modified silica coatings on Ti:sapphire crystal, owning good homogeneity, display prominent antireflective effect within the laser output waveband (750-850 nm) of Ti:sapphire lasers, with average transmission above 98.6%, and own laser induced damage thresholds (LIDTs) of more than 2.2 J/cm2 at 800 nm with the pulse duration of 300 ps.     

溶胶-凝胶法制备耐磨宽带SiO2/TiO2增透膜

以钛酸正丁酯[Ti(OBu)4]、正硅酸乙酯(TEOS)为原料，采用溶胶—凝胶(sol—gel)提拉方法在K9光学玻璃基片上镀制得高透过的λ／4～λ／2型宽带增透膜。该增透膜的表面均匀性良好，均方根粗糙度(RMS)为1.201，平均粗糙度(RA)为0．934，具有一定的耐擦除性。经200℃热处理，膜层中的OH吸收峰已基本消失，在400～700nm光谱范围的透过率比基片的平均透过率提高6．6％。为实现大面积涂覆“神光”装置主放大器的防爆隔板玻璃，大幅度提高主放大器的抽运效率奠定基础。     

晶须及其在高分子材料中的应用

简要介绍了目前高分子材料改性中常用的晶须，如钛酸钾晶须、硼酸铝晶须、氧化锌晶须等，主要对其在橡胶、热塑性弹性体、热塑性树脂以及热固性树脂中的应用作了详尽论述。