A Reflective Inorganic All-Thin-Film Flexible Electrochromic Device with a Seven-Layer Structure

A reflective electrochromic device is fabricated on a 10 cm×10 cm flexible PI/Al substrate using magnetron sputtering. The device has a complementary all-thin-film structure and consists of seven layers. Indium tin oxide(ITO) acts as a transparent electrode deposited on the top, meanwhile, an aluminum(Al) film is adopted as an inter-counter bottom electrode and provides high reflectance. Tungsten oxide(WO_3) is used as the main electrochromic layer and nickel oxide(NiO) acts as the complementary electrochromic layer. Lithium niobate(LiNbO_3) is applied as a Li~+ion conductor layer. Especially, in the seven-layer structure, two tantalum oxides(Ta_2O_5) are added as transition layers to prevent Li+escaping from LiNbO_3 when the potential is not applied on the device. When the device is in an electrochromic process, both Ta_2O_5 provide excellent conductivity for Li~+ions and act as the dielectric of electrons. The complementary device with structure Al/NiO/Ta_2O_5/LiNbO_3/Ta_2O_5/WO_3/ITO exhibits good optical properties, and the reflectance modulation reaches up to 55% measured by a spectrophotometer in the range of 400–1600 nm. The cyclic stability of the electrochromic device is investigated. The results indicate that the charge density involved in the electrochromic process decreases and the electrochromic response time increases with the cycle number because of the Li~+ insertion in WO_3.     

V2O3纳米粉末的固相反应合成(英)

Vanadium sesquioxide (V₂O₃) nanopowder was successfully prepared by the solid phase reaction of the mixture of vanadyl hydroxide (VO(OH)₂) and ammonium chloride (NH₄Cl) at 500 ℃. The as-obtained samples were characterized by X-ray diffraction (XRD), X-ray photoelectron spectroscopy (XPS) and transmission electron microscopy (TEM). V₂O₃ nanoparticles were well dispersed and displayed sphere-like particles with diameters in the range of 30～50 nm.     

超塑成形/扩散连接过程的三维有限元模拟

采用Mindlin壳元,对SPF/DB工艺进行了模拟。利用罚函数方法,对板材自身接触问题进行分析,给出了接触板材间的接触力,并提出一种接触搜索判断方法,同时给出了算例。     

原子氧对非平衡磁控溅射MoS2-Ti复合薄膜真空摩擦学性能的影响

对采用非平衡磁控溅射方法制备的柱状晶MoS₂-Ti复合薄膜开展了原子氧(AO)辐照试验. 原子氧的平均动能是5 eV,累计辐照通量6.0×1022 atoms/cm2. 原子氧造成薄膜表面出现“绒毯”状形貌,表层的MoS₂和内部的低价钛氧化物分别被氧化成硬质的MoO₃和TiO₂,但原子氧对距表层30 nm以下Mo的化学态没有影响. 薄膜的初始真空摩擦系数和磨损率分别由辐照前的大约0.018和4.49 × 10?17 m3/(N·m)升高至0.03 和5.5×10?17 m3/(N·m),磨损机制也发生了由黏着磨损向磨粒磨损的转变.      

非平衡磁控溅射沉积MoS2-Ti 复合薄膜的结构与真空摩擦磨损性能研究

采用非平衡磁控溅射法制备MoS2-Ti复合薄膜,采用SEM、XRD和XRF对薄膜的结构进行表征,在真空球-盘摩擦试验机上评价试验载荷、转速以及基底材料种类对薄膜真空摩擦磨损性能的影响.结果表明:MoS2-Ti复合薄膜表面致密均匀,断面为细柱状结构,呈MoS2(002)基面择优取向,薄膜中Ti含量为8 wt.%,S∶Mo原子比为1.8.在真空度优于5×10-3Pa、室温环境中,当试验载荷从5 N增加至20 N时,薄膜的摩擦系数和耐磨寿命都呈减小趋势,摩擦系数变化符合赫兹接触理论模型;当试验速度从250 r/min提高至1 000 r/min时,薄膜的摩擦系数逐渐减小,耐磨寿命变化量较小;不同基体材料上薄膜的摩擦系数平均值均为0.02,9Cr18、45#钢和40Cr基材上薄膜耐磨寿命区别不大,在20~25 km之间,磨损形式为磨粒磨损,30CrMnSi上薄膜耐磨寿命明显下降,只有10.3 km,磨损形式为黏着磨损,研究结果表明如果基底材料与摩擦对偶间发生黏着磨损,会明显降低其表面沉积薄膜的耐磨寿命.     

CoCrFeNiWx高熵合金在室温及900℃下的摩擦磨损性能

采用真空电弧熔炼技术制备了CoCrFeNiW_x(x=0.25、0.5、0.75及1.0)系列高熵合金,研究了W元素含量对合金晶体结构、显微组织、力学性能以及室温与900℃摩擦学性能的影响.结果表明：合金中W含量较低时形成单相面心立方(FCC)固溶体,W含量较高时会促进金属间化合物μ相的形成,随着W含量提升,合金显微组织由FCC胞状树枝晶(x=0.25)转变为FCC树枝晶及晶间层片状(FCC+μ)共晶组织(x=0.5、0.75),最后转变为FCC基体上分布的粗大树枝状μ相(x=1.0).由于W元素的固溶强化及原位生成金属间化合物μ相的第二相强化作用,使合金的强度和硬度等力学性能显著增加的同时塑性降低.在试验载荷为10 N,滑动速度0.3 m/s的测试条件下,CoCrFeNiW_x系列高熵合金与Si₃N₄陶瓷球配副时的球-盘摩擦试验结果表明：W元素的添加显著改善了合金的室温耐磨性,但对摩擦系数的影响较小;而900℃摩擦时,摩擦表面形成的多元复合氧化物摩擦釉质层具有良好的减摩抗磨作用,特别是W元素氧化产生的...     

钛合金表面MAO/粘接PTFE涂层的真空摩擦学性能

采用真空球盘摩擦试验机,分别在低载、中载和重载工况下测试了一种MAO/粘接PTFE复合涂层的摩擦学性能.结果表明:微弧氧化层提升了基底抵抗变形的能力,确保了摩擦过程中粘接PTFE涂层与基底结合状态的稳定,并且在原位生长过程中继承了金属表面原有的机械加工形貌,形成了特殊的"波峰"与"波谷"交替并存的"波状"多孔地形."波峰"与孔壁作为与摩擦对偶接触的硬质区域起承载和耐磨损作用,"波谷"和微孔作为与摩擦对偶接触的软质区域起贮存润滑剂与提供转移膜的作用.在两者的耐磨-减摩协同作用下,MAO/粘接PTFE复合涂层在不同接触应力条件下的摩擦学寿命较传统的喷砂/粘接PTFE的摩擦学寿命有了极大提升.