Harmonic beam splitter design and fabrication

Two problems of half-wave hole and high ripples in the transmittance region for a harmonic beam splitter had been pointed out and analyzed. Based on the application of a half-wavelength control and a new admittance matching methods, a harmonic beam splitter was designed and fabricated. The former method eliminated the half-wave hole fundamentally, and the latter smoothed high ripples in the transmittance region effectively. The matching stack consisted of a symmetrically periodic structure and provided a complete matching at the desired wavelength, i.e., both conditions for the equivalent admittance and phase thickness were fulfilled. Furthermore, both the theoretical and the tested curves had been given, and a good agreement between them was obtained.     

倍频波长分离膜半波孔的消除

指出了膜料色散、膜层折射率非均匀性以及膜厚控制误差积累等是导致半波孔产生的几个因素,其中膜层厚度周期性误差积累和敏感层厚度误差是导致半波孔的主要因素,还指出了半波孔的大小与膜系结构有关.借助计算机做了相应的数值计算,并从理论上进行了深入分析.针对这些因素采取相应的措施,设计和制备了倍频波长分离膜,有效地消除了半波孔.并给出了理论和实验光谱曲线,二者有很好的一致性.     

利用等效层的消偏振宽带减反膜设计

分析了倾斜入射条件下导致光学薄膜产生偏振的原因,针对不同偏振态的等效导纳与等效相位进行了分析,并计算了对称膜层在45°入射条件下不同偏振态的等效折射率与等效相位厚度,采用等效层方法设计了光学性能良好的600～900 nm波段消偏振宽带减反膜。最后利用电子束蒸发技术制备了薄膜样品,样品的光谱性能完全能够满足使用要求。其中在600～900 nm波段范围内,平均反射率均小于1．38%,反射率的偏振度均低于0．89%。另外,通过对其理论及实验光学性能、角度敏感性、膜层厚度误差敏感性等方面的分析结果可知,对称膜层组合法是设计消除倾斜入射下宽带减反膜偏振效应的一种行之有效的方法。     

Harmonic beam splitter design and fabrication

Two problems of half-wave hole and high ripples in the transmittance region for a harmonic beam splitter had been pointed out and analyzed. Based on the application of a half-wavelength control and a new admittance matching methods, a harmonic beam splitter was designed and fabricated. The former method eliminated the half-wave hole fundamentally, and the latter smoothed high ripples in the transmittance region effectively. The matching stack consisted of a symmetrically periodic structure and provided a complete matching at the desired wavelength, i.e., both conditions for the equivalent admittance and phase thickness were fulfilled. Furthermore, both the theoretical and the tested curves had been given, and a good agreement between them was obtained.     

a-Si ∶H/SiO2多量子阱材料制备及其光学性能和微结构研究

利用等离子体增强化学气相沉积技术制备了a-Si ∶H/SiO₂多量子阱结构材料.对a-Si ∶H/SiO₂多量子阱样品分别进行了3种不同的热处理,其中样品经1100 ℃高温退火可获得尺寸可控的nc-Si:H/SiO₂量子点超晶格结构,其尺寸与非晶硅子层厚度相当.比较了a-Si ∶H/SiO₂多量子阱材料与相同制备工艺条件下a-Si ∶H材料的吸收系数,在紫外/可见短波段前者的吸收系数明显增大,光学吸收边蓝移,说明该材料 关键词： 多量子阱 量子限制效应 光学吸收 能带结构     

利用总积分散射仪对光学薄膜表面散射特性的研究

利用总积分散射仪对不同条件下制备的金属银膜、Y₂O₃稳定ZrO₂（YSZ）薄膜、TiO₂薄膜和1064 nm与532 nm双波长增透膜的表面均方根（RMS）粗糙度和散射特性的变化规律进行了系统研究,并与样品的制备条件、生长过程、材料组成及光学特性等各方面相结合,对测量结果做出了合理解释,从而使总积分散射测量在其他领域的研究得以扩展和应用. 关键词： 光学薄膜 表面散射 总积分散射仪