Mitigation of laser damage growth in fused silica by using a non-evaporative technique

A non-evaporative technique is used to mitigate damage sites with lateral sizes in a range from 50 μm to 400 μm and depths smaller than 100 μm.The influence of the pulse frequency of a CO 2 laser on the mitigation effect is studied.It is found that a more symmetrical and smooth mitigation crater can be obtained by increasing the laser pulse frequency form 0.1 to 20 kHz.Furthermore,the sizes of laser-affected and distorted zones decrease with the increase of the laser pulse frequency,leading to less degradation of the wave-front quality of the conditioned sample.The energy density of the CO 2 laser beam is introduced for selecting the mitigation parameters.The damage sites can be successfully mitigated by increasing the energy density in a ramped way.Finally,the laser-induced damage threshold(LIDT) of the mitigated site is tested using 355 nm laser beam with a small spot(0.23 mm 2) and a large spot(3.14 mm 2),separately.It is shown that the non-evaporative mitigation technique is a successful method to stop damage re-initiation since the average LIDTs of mitigated sites tested with small or large laser spots are higher than that of pristine material.     

Effects of high-dose Ge ion implantation and post-implantation annealing on ZnO thin films

This paper reports that ion implantation to a dose of 1×10¹⁷ ions/cm² was performed on c-axis-orientated ZnO thin films deposited on (0001) sapphire substrates by the sol-gel technique. After ion implantation, the as-implanted ZnO films were annealed in argon ambient at different temperatures from 600-900℃. The effects of ion implantation and post-implantation annealing on the structural and optical properties of the ZnO films were investigated by x-ray diffraction (XRD), photoluminescence (PL). It was found that the intensities of (002) peak and near band edge (NBE) exitonic ultraviolet emission increased with increasing annealing temperature from 600-900℃. The defect related deep level emission (DLE) firstly increased with increasing annealing temperature from 600- 750℃, and then decreased quickly with increasing annealing temperature. The recovery of the intensities of NBE and DLE occurs at \sim 850℃ and \sim 750℃ respectively. The relative PL intensity ratio of NBE to DLE showed that the quality of ZnO films increased continuously with increasing annealing temperature from 600 - 900℃.     

Laser-induced damage on large-aperture fused silica gratings

Two sets of laser-damage experiments on large-aperture fused silica optics have been carried out in a high-power laser facility. Severe damage has been found on the grating which presented dense craters on the front surface. This phenomenon is quite different from other fused silica optics, which are damaged on the rear surface. The damage possibility due to the redeposition layer was ruled out by acid-etching the grating’s front surface. The remarkable stimulated Brillouin scattering (SBS) effect was observed in grating and the reason for the front surface damage is thought to be the backward SBS.     

高功率固体激光驱动器污染控制及片状放大器洁净度改进

针对高功率固体激光驱动器的安全运行,提出了覆盖驱动器建设全过程的污染控制方法,详细介绍了洁净清洗、洁净检测、洁净保护等保障污染控制效果的技术手段,并介绍了神光-Ⅲ主机装置片状放大器洁净度提升所采取的技术途径,以及片状放大器光照清洗实验中气溶胶等级随闪光灯照射次数的变化情况。实验结果表明,神光-Ⅲ主机装置的洁净水平与美国国家点火装置(NIF)接近且优于其他同类装置,洁净度的大幅提升为装置的安全运行提供了有力保障。     

CO2激光局域辐照对熔石英损伤特性的影响

研究了CO₂激光局域辐照对熔石英损伤特性的影响, 发现当辐照中心温度较低时(1139 K), 辐照对损伤阈值没有明显影响, 但辐照中心温度较高时(1638 K), 辐照对损伤阈值有明显的影响, 损伤阈值随距离辐照中心间距的增大而减小, 在残余应力产生光程差最大处附近, 损伤阈值降到最小, 随着与辐照中心间距的进一步增加, 损伤阈值略有上升. 对导致此现象的原因做了分析. 由于残余应力的存在, 在辐照中心发生再损伤产生的裂纹后, 裂纹先沿径向扩展, 在残余应力产生光程差最大处附近, 裂纹转而向切向扩展, 这可能与径向和环向张应力随半径的变化有关. 在采用热处理炉退火消除残余应力时, 必须注意元件的洁净处理, 否则退火会出现析晶现象, 对损伤阈值和透射率造成不良影响. 关键词： 2激光局域辐照')" href="#">CO₂激光局域辐照 熔石英 损伤特性     

激光诱导光学材料后表面损伤的数值模拟

 采用3维时域有限差分方法和完全匹配吸收层,模拟了长方体缺陷在熔石英前后表面时对入射激光为TM波的调制作用,绘出了截面上的电场强度分布及最大电场强度随熔石英深度变化的曲线,并进行了比较和分析。结果表明：缺陷在前表面上时,后表面附近的最大电场强度2.522 41 V/m大于缺陷附近的1958 83 V/m;缺陷在后表面上时,材料中的最大电场强度为2.799 38 V/m,且出现在后表面附近。无论该缺陷在前表面还是在后表面,最大电场强度都是出现在后表面附近,表明光学材料的后表面在一定程度上更容易被损伤。     

高功率固体激光器光学元件面形评价参数

结合高功率固体激光器的发展,说明了高功率光学元件面形评价参数的产生原因、发展过程及其内在因素。介绍了面形评价参数的现状,并通过讨论各面形评价参数之间的内在联系,说明了现行评价参数的综合性能及发展趋势。     

激光诱导HF酸刻蚀后熔石英后表面划痕的损伤行为研究

用光学显微镜和原子力显微镜记录HF酸刻蚀后熔石英元件后表面划痕的形貌结构,并利用单脉冲激光对其进行辐照测试,以研究不同结构参数划痕的激光损伤特性.实验结果表明,由于HF酸的腐蚀钝化作用,划痕结构横向截面呈余弦形分布;其初始损伤阈值并非由单一的划痕宽度或深度参数决定,而是与其横向剖面结构的宽深比值密切相关;通过实验得到了二者之间的关系曲线,并采用时域有限差分算法对不同结构参数划痕附近光场分布进行理论模拟,理论场计算得到的增强结果与实验值符合得很好.     

CO_2激光预处理参数对石英基片表面粗糙度的影响

为研究CO2激光预处理参数对熔石英基片表面粗糙度的影响,采用频率为100 Hz,光斑面积为1 mm2的CO2激光对理想的熔石英基片进行辐照处理,根据处理后基片表面微观形貌特征将修复程度分别定义为轻度、中度和重度修复,并对3种修复程度下基片的表面粗糙度值进行了统计。研究了不同脉冲作用时间和不同占空比(激光功率)的激光束单点单次辐照基片后的表面粗糙度。结果表明:石英基片的表面粗糙度均方根值和处理造成的凹陷深度均随脉冲作用时间和功率的增加逐渐变大;均方根值的增幅逐渐增加,凹陷深度的增幅逐渐减小。     

High temperature thermal behaviour modeling of large-scale fused silica optics for laser facility

High temperature annealing is often used for the stress control of optical materials.However,weight and viscosity at high temperature may destroy the surface morphology,especially for the large-scale,thin and heavy optics used for large laser facilities.It is necessary to understand the thermal behaviour and design proper support systems for large-scale optics at high temperature.In this work,three support systems for fused silica optics are designed and simulated with the finite element method.After the analysis of the thermal behaviours of different support systems,some advantages and disadvantages can be revealed.The results show that the support with the optical surface vertical is optimal because both pollution and deformation of optics could be well controlled during annealing at high temperature.Annealing process of the optics irradiated by CO2 laser is also simulated.It can be concluded that high temperature annealing can effectively reduce the residual stress.However,the effects of annealing on surface morphology of the optics are complex.Annealing creep is closely related to the residual stress and strain distribution.In the region with large residual stress,the creep is too large and probably increases the deformation gradient which may affect the laser beam propagation.