铜膜和铁膜污染物诱导熔石英表面损伤行为的对比研究

采用人工溅射的方式分别在熔石英基片上镀制了光学厚度相近的铜膜和铁膜污染物。研究了熔石英基底在355nm波长的激光损伤阈值。分别采用透射式光热透镜技术、椭偏仪、原子力显微镜和光学显微镜研究了两类薄膜的热吸收、膜层厚度、表面微观形貌以及激光辐照后薄膜的损伤形貌。实验结果表明：熔石英表面的金属膜状污染物均导致基片损伤阈值下降,位于前表面的污染物引起的损伤阈值下降更为严重,约为23％。两种污染物薄膜引起基底的损伤形貌、基底损伤阈值的下降幅度与薄膜的热吸收系数与微观结构有关。从热力学响应角度,结合损伤形貌对污染物诱导熔石英表面形貌的损伤机理进行了讨论。     

高重复频率水冷Nd:YAG激活镜放大器的温度特性

为解决高重复频率大能量激光放大器的热管理问题,采用数值模拟与实验分析的方法,对背面水冷Nd:YAG激活镜放大器的流体散热进行了研究.基于低雷诺数k-ε湍流模型,建立了流-固共轭传热多物理场藕合分析模型,对比分析了近壁面处理方法对流体流动、对流扩散和热传导过程及温度分布的影响,分析研究了不同冷却液流量和泵浦参数对流场特性、激光介质温度和波前分布的影响.数值模拟表明:激光介质的温度分布与固液边界层内的黏性作用密切相关,且冷却液的热扩散主要发生在100μm范围内;激光介质的热沉积分布中心对称,而温度分布沿水流方向不对称,最大温升位于出水口端且基本保持不变;增益介质前表面的温度分布与介质的波前分布随冷却液流量非线性变化,而随泵浦参数线性变化;实验结果与数值模拟符合较好.     

新型阵列式片状放大器全口径增益实验研究

 利用行波法对一台闪光灯泵浦、通光口径为29cm×29cm的新型高功率固体激光阵列式片状放大器的全口径平均增益进行了实验测试，在充电电压为23kV、泵浦能密度为10J/cm³的条件下，新型4×2×3阵列式片状放大器端部模块全口径平均增益为4.925%cm^-1，内部模块全口径平均增益为5.519%cm^-1。     

Numerical Investigation of Thermal Effect in Plasma Electrode Pockels Cell for High Average Power

The average power of a Pockels cell is limited by thermal effects arising from the optical absorption of the laser pulse. These thermal effects can be managed by configuring the switch as a plasma-electrode thin plate Pockels ceil, which works under heat-capacity operation. Simulation results show that, based on KD＊P （in thickness 0.5 cm） at an average power loading of 1 kW, the aperture integrated depolarization loss at 1.06 um is less than 10% in 5min working time.     

溶胶-凝胶双层三波长增透膜制备

通过理论模拟与实验相结合,研究了以双层膜的方式实现三波长增透的途径。以正硅酸乙酯为前驱体,采用酸催化与碱催化溶胶混合的方式调控了溶胶折射率,并配制了双层复合膜所用的两种溶胶,制备出了351nm处透过率大于99.5%,527nm透过率大于98%,1053nm透过率大于98%的三波长增透膜。用扫描电镜、原子力显微镜观测了膜层结构,用椭偏仪和分光光度计对膜层性能进行了表征。三波长增透膜对高功率激光装置的运行性能提升起到了积极的促进作用。     

高功率激光片状放大器中自发辐射放大研究

 采用理论模拟和实验研究相结合的方法，研究了高功率激光片状放大器中的自发辐射放大(ASE)效应。建立了一套较完整的包含空间和时间的3维ASE模型，分析了不同电压、不同储能分布和不同泵浦时刻、不同增益长度积条件下ASE效应对放大器储能效率和小信号增益系数的影响。对4×2×3组合式放大器的计算结果表明：随着泵浦电压升高，ASE效应明显加强；23kV泵浦电压下，ASE效应造成的平均储能下降210%，小信号增益系数损耗为16.62%，增益不均匀性为7.44%；增益长度积可以作为判断ASE效应的依据，其值越大，ASE效应越强。     

Explanation of Laser-Induced Damage Behavior of Fused Silica in a Large-Aperture Laser using a Small-Aperture Damage Test

Laser-induced damage is a key lifetime limiter for damage threshold on two different laser facilities optics in large laser facilities. Fused silica is tested to find the of different apertures. The damage threshold shows that the corners of the component are less damage resistant. The acid etch on a corner does not effectively increase the damage threshold. A statistics-based model is presented to extrapolate the threshold data in a small-aperture test to predict the damage threshold under functional conditions.     

Numerical simulation of modulation to incident laser by submicron to micron surface contaminants on fused silica

Modulation caused by surface/subsurface contaminants is one of the important factors for laser-induced damage of fused silica. In this work, a three-dimensional finite-difference time-domain(3D-FDTD) method is employed to simulate the electric field intensity distribution in the vicinity of particulate contaminants on fused silica surface. The simulated results reveal that the contaminant on both the input and output surfaces plays an important role in the electric field modulation of the incident laser. The influences of the shape, size, embedded depth, dielectric constant(εr), and the number of contaminant particles on the electric field distribution are discussed in detail. Meanwhile, the corresponding physical mechanism is analyzed theoretically.     

超短脉冲三倍频中特殊群速度组合的分析

基于非线性耦合波理论,对比分析了超短脉冲三倍频过程中不同的特殊群速度组合模式下的谐波转换特性(转换效率和带宽等).利用分步傅里叶变换和四阶Runge-Kutta积分算法,对脉宽150 fs左右的超短脉冲在KDP晶体中的I类混频过程进行数值模拟,结果表明:三波包"不等速匹配"模式下的综合谐波转换性能(转换效率达到50%和转换带宽达到2 nm)整体要优于其他特殊群速度匹配模式;"三波包不等速"模式更有利于三波包间能量之间的耦合及转换.这一结论为进一步提高超短脉冲三倍频的转换效率及带宽具有理论指导意义.     

Effects of Vacuum on Fused Silica UV Damage

Damage points induced by 355 nm laser irradiation increase more quickly on the surface of fused silica in vacuum of about 10^-3 Pa than in atmospheric air at the same fluence. The larger concentration of point defects in vacuum is confirmed by photoluminescence intensity. X-ray photoelectron spectroscopy and infrared absorption indicate the formation of sub-stoichiometric silica on the surface. The degradation mechanism of fused silica in vacuum is discussed.