Gradual variation method for thick GaN heteroepitaxy by hydride vapour phase epitaxy

Two strain-state samples of GaN, labelled the strain-relief sample and the quality-improved sample, were grown by hydride vapour phase epitaxy (HVPE), and then characterized by high-resolution X-ray diffraction, photoluminescence and optical microscopy. Two strain states of GaN in HVPE, like 3D and 2D growth modes in metal-organic chemical vapour deposition (MOCVD), provide an effective way to solve the heteroepitaxial problems of both strain relief and quality improvement. The gradual variation method (GVM), developed based on the two strain states, is characterized by growth parameters' gradual variation alternating between the strain-relief growth conditions and the quality-improved growth conditions. In GVM, the introduction of the strain-relief amplitude, which is defined by the range from the quality-improved growth conditions to the strain-relief growth conditions, makes the strain-relief control concise and effective. The 300-μm thick bright and crack-free GaN film grown on a two-inch sapphire proves the effectiveness of GVM.     

低温GaN插入层对AlGaN/GaN二维电子气特性的改善

利用低压MOCVD技术在蓝宝石衬底上生长了AlGaN/GaN二维电子气(2DEG)材料,在GaN生长中插入一层低温GaN,并研究了低温GaN插入层对二维电子气输运特性的影响.使用原子力显微镜(AFM)和非接触霍尔测试仪测量了材料的表面形貌和电学特性,发现低温GaN插入层可以改善材料表面平整度并使AlGaN/GaN 2DEG的电子迁移率有明显提高,GaN插入层温度为860℃的样品在室温下2DEG的电子迁移率达到2110 cm2/V·s.     

Invariable optical properties of phosphor-free white light-emitting diode under electrical stress

This paper reports that a dual-wavelength white light-emitting diode is fabricated by using a metal-organic chemical vapor deposition method. Through a 200-hours’ current stress, the reverse leakage current of this light-emitting diode increases with the aging time, but the optical properties remained unchanged despite the enhanced reverse leakage current. Transmission electron microscopy and cathodeluminescence images show that indium atoms were assembled in and around V-shape pits with various compositions, which can be ascribed to the emitted white light. Evolution of cathodeluminescence intensities under electron irradiation is also performed. Combining cathodeluminescence intensi- ties under electron irradiation and above results, the increase of leakage channels and crystalline quality degradation are realized. Although leakage channels increase with aging, potential fluctuation caused by indium aggregation can effectively avoid the impact of leakage channels. Indium aggregation can be attributed to the mechanism of preventing optical degradation in phosphor-free white light-emitting diode.     

In0.5(Ga1-xAlx)0.5P合金的掺杂生长特性

利用LP-MOCVD分别生长Zn和S掺杂的In0.5(Ga1-xAlx)0 5P外延层,研究生长温度、掺杂源流量、V/Ⅲ比、Al组分以及衬底晶向偏离等生长条件对外延层掺杂浓度的影响.实验结果表明:降低生长温度和Al含量、增加DEZn流量、选择由(100)向(111)A偏6～15的衬底都有利于增加IRGaAlP合金中Zn的掺杂浓度;提高生长温度和增加SIH4流量、减小Al含量和V/Ⅲ比,都有助于增加Si掺杂浓度,而衬底晶向对Si掺杂浓度无影响.     

AlGaN-Based Deep-Ultraviolet Light Emitting Diodes Fabricated on AlN/sapphire Template

We report on the growth and fabrication of deep ultraviolet （DUV） light emitting diodes （LEDs） on an AIN template which was grown on a pulsed atomic-layer epitaxial buffer layer. Threading dislocation densities in the AlN layer are greatly decreased with the introduction of this buffer layer. The crystalline quality of the AlGaN epilayer is further improved by using a low-temperature GaN interlayer between AlGaN and AlN. Electroluminescences of different DUV-LED devices at a wavelength of between 262 and 317nm are demonstrated. To improve the hole concentration of p-type AlGaN, Mg-doping with trimethylindium assistance approach is performed. It is found that the serial resistance of DUV-LED decreases and the performance of DUV-LED such as EL properties is improved.     

新型含硅聚芳醚酮的合成与表征

对FeBr3／Me6TREN催化的反向原子转移自由基聚合进行了研究。在不同的催化剂、引发剂的配比、聚合温度和配体用量等条件下，该催化体系催化的MMA聚合反应动力学为一级反应。聚合物分子量可控，分子量分布很窄，说明该体系催化的聚合反应为活性可控聚合，通过实验计算了反应的活化能，并利用UV光谱对催化剂进行了研究。     

Scattering behaviours to the two-dimensional electron gasinduced by the Al composition fluctuation in AlxGa1-xNbarrier in AlxGa1-xN/GaN heterostructures

<正>This paper reports that cathodoluminescence（CL） measurements have been done to study the alloy fluctuation of the Al_0.3Ga_0.7N layer in Al_0.3Ga_0.7N/GaN heterostructures.The CL images and linescanning results demonstrate the existence of compositional fluctuation of Al in the Al_0.3Ga_0.7N barrier.A model using aδ-shape perturbation Hamilton function has been proposed to simulate the scattering probability of the two dimensional electron gases （2DEG） induced by Al composition fluctuation.Two factors,including conduction band fluctuation and polarization electric field variation,induced by the Al composition fluctuation have been taken into account.The scattering relaxation time induced by both factors has been estimated to be 0.31 ns and 0.0078 ns,respectively,indicating that the variation of the piezoelectric field is dominant in the scattering of the 2DEG induced by Al fluctuation.     

用Mg离子注入提高p型GaN的空穴浓度

研究了离子注入对金属有机化学气相淀积法生长的Mg掺杂GaN性质的影响.样品在800℃退火1小时后,我们获得了空穴浓度达8.28×1017cm-3的p型GaN.这一结果可以用于GaN基器件的p型层的欧姆接触.     

中国东海及南海近海4采样点海水可培养细菌的多样性研究

采用不同的培养方法从中国东海和南海近海海水样品中分离得到105株细菌,探讨了不同海区可培养细菌的物种多样性和群落组成特点.16SrDNA序列分析结果表明,东海分离菌株分属于2个细菌门的14个种,南海分离菌株分属于3个细菌门的19个种.其中,东海分离菌株中α-变形菌占33.3%,γ-变形菌占57.2%,厚壁菌门细菌占9.5%.南海分离菌株中α-变形菌占41.9%,γ-变形菌占35.5%,拟杆菌门细菌占17.7%,厚壁菌门细菌占4.8%.东海和南海样品的分离菌株在种属水平上的多样性差异明显,后者的多样性指数高于前者.     

GaN发光二极管的负电容现象

采用串联等效电路分析了较大正向电压下半导体二极管的交流电学特性．由此可以同时测量结电容和串联电阻,并能判断二极管是否有界面层。首次发现了在较低的测试频率和较大的正向电压下,GaN二极管的结电容具有负值,并且测试频率越低,正向偏压越大,负电容现象越显著。这种负电容效应可能与大正向电压下强注入造成的电子-空穴复合发光有关。