离子束溅射法薄膜生长中结瘤微缺陷的生长机理

用离子束溅射法制备了锆单层薄膜.用设计新型夹具和预置种子方法，对薄膜中结瘤微缺陷的生长过程进行了研究.在高分辨率光学显微镜和扫描电子显微镜下观察发现，结瘤在其生长初期呈现出分形的特征.用分子动力学和薄膜生长的扩散限制聚集模型，薄膜中结瘤微缺陷成核时的分形现象得到了很好的解释. 关键词： 结瘤微缺陷 锆薄膜 扩散限制聚集模型     

沉积温度对LaF3薄膜性能的影响

 在189，255，277和321 ℃的沉积温度下用热舟蒸发方法制备了LaF₃薄膜。通过X射线衍射(XRD)测试了薄膜的晶体结构;采用分光光度计测量了薄膜的透射光谱，并计算得到样品的折射率、消光系数和截止波长;利用光学干涉仪测试得到了薄膜的残余应力;采用三倍频Nd:YAG脉冲激光测试了薄膜的激光损伤阈值。结果表明：随沉积温度的提高，LaF₃薄膜的结晶状况明显变好，晶粒尺寸逐渐变大；膜层变得更加致密，折射率变大，然而薄膜吸收变得严重，截止波段向长波漂移，同时薄膜的残余应力也增加，内应力在薄膜的残余应力中起着决定作用；薄膜的激光损伤阈值在高温制备时相对较高。     

掺钛蓝宝石晶体热学性质研究

本文系统分析了掺钛蓝宝石晶体的热学性质.在303.15～ 764.15 K的温度范围内,晶体的主热膨胀系数分别为α1=3.8 ×10-6K-1和α3=6.4×10-6 K-1.298.15 K时,晶体的比热为0.766 J·g-1·K-1.采用激光脉冲法测试了晶体在303 ～570 K温度范围内的热扩散率.掺钛蓝宝石晶体的主热导率分量k与热力学温度T的函数关系通过拟合获得,为k1=-626.60772/(-2.52108T+706.53622)+5.96781和k3=-1347.76226/(-2.37632T+616.40571) +5.88351.     

Damage threshold influenced by polishing imperfection distribution under 355-nm laser irradiation

A systematic interpretation of laser-induced damage in the nanosecond regime is realized with a defect distribution buried inside the redeposited layer arising from a polishing process. Under the 355-nm laser irradiation, the size dependence of the defect embedded in the fused silica can be illustrated through the thermal conduction model. Considering CeO_2 as the major initiator, the size distribution with the power law model is determined from the damage probability statistics. To verify the accuracy of the size distribution, the ion output scaling with depth for the inclusion element is obtained with the secondary ion mass spectrometer. For CeO_2 particulates in size of the depth interval with ion output satisfied in the negative exponential form, the corresponding density is consistent with that of the identical size in the calculated size distribution. This coincidence implies an alternative method for the density analysis of photoactive imperfections within optical components at the semi-quantitative level based on the laser damage tests.     

人类首次实现聚变“点火”,激光聚变取得历史性突破

2022年12月13日，美国能源部(DOE)及其下属的国家核安全管理局(NNSA)宣布，劳伦斯利弗莫尔国家实验室(LLNL)利用其建立的国家“点火”装置(NIF),在人类历史上首次实现了聚变产能大于驱动聚变发生的激光能量这一“点火”里程碑，将为美国核武器物理规律和效应研究、核武器库存管理等提供重要支撑，为未来清洁能源的发展铺平新的道路，并为高能量密度物理研究提供新的手段和平台。本文专访了中国工程物理研究院激光聚变研究中心郑万国研究员，就发布会传递信息、惯性约束聚变(ICF)实现途径及存在难点、激光聚变“点火”历程、未来ICF和惯性聚变能(IFE)发展前景，以及激光晶体在ICF和IFE中重要作用等业界广泛关心的几个问题进行解读，以期为读者提供专业的信息，使大家进一步了解ICF发展趋势和IFE发展前景，并针对相关晶体材料开展基础研究及关键技术攻关，牵引和支撑未来激光聚变驱动装置建设。     

Dependence of wavDependence of wavefront errors on nonuniformity of thin films

In contrast to uncoated substrate, a nonlinear relationship of phase shift with the thicknesses of the thin film makes the calculation of wavefront aberration complicated. A program is compiled to calculate the wavefront aberration of multilayer thin film produced by thickness nonuniformity. The physical thickness and the optical phase change on reflection are considered. As an example, the wavefront aberration of the all-dielectric mirror is presented in ArF excimer lithography system with a typical thickness distribution. In addition, the wavefront errors of the thin film at wavelengths of 193 and 633 nm are compared in the one-piece and two-piece arrangements. Results show that the phase shift upon reflection of the thin film produced by thickness nonuniformity is very sensitive to the incident angle, wavelength, and polarization.     

Stress mechanism of pulsed laser-driven damage in thin film under nanosecond ultraviolet laser irradiation

An analytical model is derived to describe the stress mechanism in a thin film against the laser-induced damage threshold (LIDT) based on the thermal transfer equation. Different structures of high-reflection films at 355 nm are prepared to validate this model. LIDTs are found to have a linear relationship with stress. Furthermore, predictions from the simple model agree with the experiments.     

Optical properties and microstructure of Ta_2O_5 thin films prepared by oblique angle deposition

Tantalum pentoxide thin films are prepared by oblique angle electron beam evaporation. The influence of flux angle on the surface morphology and microstructure is investigated by scanning electron microscopy （SEM）. The Ta2O5 thin films are anisotropic with highly orientated nanostructure of slanted columns. The porous microstructure of the as-deposited films results in the decrease of effective refractive index and packing density with increasing deposition angle. The anisotropic structure results in optical birefringence. The in-plane birefringence increases with the increase of deposition angle and reaches the maximum of 0.055 at the deposition angle of 70°. Anisotropic microstructure and critical packing density are the two key factors to influence the in-plane birefringence.     

纳秒脉冲激光诱导的区域缺陷破坏模型

完善了由缺陷吸收引起温升导致材料破坏的激光损伤模型.从热传导方程人手,该模型在单杂质缺陷模型基础上,利用米氏散射理论计算杂质缺陷的吸收截面,根据材料基质和杂质缺陷的热物性能参数,计算了杂质相互之间的有效作用距离,即材料的热扩散长度范围.结果表明,考虑周围杂质的影响,基质材料损伤阈值更接近实际情况,同时基质表面的损伤阈值...     

沉积工艺对二氧化锆薄膜生长特性影响的研究

利用反应离子束溅射、反应磁控溅射和电子束蒸发在K9基底上沉积ZrO2薄膜，并用原子力显微镜对薄膜表面形貌进行测量。通过数值相关运算，对不同工艺条件下薄膜生长界面进行定量描述，得到了薄膜表面的粗糙度指数、横向相关长度、标准偏差粗糙度等参量。由于沉积条件的不同，薄膜生长具有不同的动力学过程。在反应离子束溅射和反应磁控溅射沉积薄膜过程中，薄膜生长动力学行为均可用Kuramoto-Sivashinsky方程来描述，电子束蒸发制备薄膜的过程可以用Mullins扩散模型来描述，并发现在沉积薄膜过程中基底温度和沉积过程的稳定性对薄膜表面特征影响很大。