22 MeV/u的Fe离子在PET 膜中引起的辐照效应研究

用能量为22 MeV/u的 Fe离子在室温和真空条件下辐照了多层堆叠的半晶质聚酯膜, 采用傅里叶转换红外吸收光谱、 紫外/可见吸收光谱 和X射线衍射技术分析测量了辐照后聚酯膜的微观结构所发生的变化, 详细研究了分子结构的变化和非晶化转变与离子剂量、 离子在样品中的平均电子能损以及吸收剂量的依赖关系． 分析结果表明: 辐照导致化学键的断裂、 新化学键的形成和非晶化转变． 非晶化效应和化学键的断裂随离子剂量和电子能损的增加而增大, 但变化的总量仅依赖于总的吸收剂量, 表明在所涉及的能损范围里, 辐照产生的变化与辐照离子的种类和能量没有直接的关系, 而只决定于材料对辐照离子能量的吸收程度． Semicrystalline polyethylene terephthalate (PET) film stacks were irradiated with 22 MeV/u Fe ions at room temperature under vacuum. Ion beam induced microscopic structural modifications and amorphous transformation were investigated by means of Fourier transform infrared spectrosocopy (FTIR), ultraviolet visible absorption spectrosocopy (UV/Vis) and X ray diffractometer (XRD). It was found that irradiation induces bond breaking, formation of new free radiculs and amorphous transformation. These effects were found to depend on ion fluence , the electronic energy loss and aborbed dose. The creation of alkyne groups was found only at the aborbed dose higher than 5.0 MGy.     

高剂量Ar离子辐照Si缺陷产生及其退火行为EPR研究

112MeVAr离子在50K以下的低温辐照Si到8×10¹⁴/cm²剂量,室温下采用电子顺磁共振技术分析了由辐照引起的缺陷产生及其退火行为,结果表明:Ar离子辐照在Si中引起了中性四空位(Si-P3心)､带正电荷的〈100〉劈裂的双间隙子(Si-P6心)以及连续的非晶层3种缺陷的形成. 在200℃的退火温度,Si-P3心和Si-P6心消失,这时带负电荷的五空位(Si-P1心)开始生长,Si-P1心可以保持到550℃左右的退火温度. 在350℃时,可以明显地观测到另一个含有更多空位的顺磁缺陷心(Si-A11心).连续非晶层的再结晶需要600℃以上的温度,并且在整个退火过程中,非晶顺磁共振线的线型和线宽保持不变. 定性地讨论了结果.     

高能Xe离子辐照引起的注碳a:SiO2中新结构的形成

先用120keV的碳离子注入非晶二氧化硅a:SiO2薄膜，再用能量为1754MeV的Xe离子辐照。注碳量为5．0×10^16—8．6×10^17ion／cm^2，Xe离子辐照剂量为1．0×10^11和5．0×10^11ion／cm^2。辐照后的样品中形成的新结构用显微傅立叶变换红外光谱仪进行测试分析。结果表明，Xe离子辐照引起了注碳a:SiO2中Si—C，C—C，Si—O—C键以及CO和CO2分子的形成与演化。在注碳量较高时，Xe离子辐照在样品中产生了大量的Si—C键。与注入未辐照和辐照的低注碳量样品比较，增强的Si—C键的形成，预示着辐照可引起注碳a:SiO2样品中的SiC结构相变。Amorphous silicon-dioxide （a:SiO2） films were firstly implanted at room temperature （RT） with 120 keV C-ions to doses ranging from 5.0 × 10^16 to 8.6 × 10^17 ion/cm^2, and then the C-doped a:SiO2 films were irradiated at RT with 1 754 MeV Xe ions to 1.0 × 10^11 and 5.0 × 10^11 ion/cm^2, respectively. The information of new tex- ture formation in the C-doped SiO2 films after high-energy Xe ion irradiation was investigated using micro-FTIR measurements. The obtained results showed that Si--C, C--C, Si--O--C bonds as well as CO and CO2 molecules were formed in the C-doped a-SiO2 films after Xe ion irradiation. Furthermore, Xe-ion irradiation induced a plenteous formation of Si--C bonds in the high dose C-ion implanted a:SiO2 films. Compared with the C-implanted sampies without Xe-ion irradiation and the low dose C-implanted samples with Xe-ion irraddiation, the enhanced and plenty of Si--C bond formation implied that the phase of SiC structures may be produced by Xe-ion irradiation in the high dose C-ion implanted a:SiO2 films.     

金属材料中高能重离子辐照效应的理论描述

简要介绍了高能重离子在金属材料中引起辐照效应的主要理论,特别是与电子能损引起的缺陷产生与演化、离子潜径迹形成、辐照相变以及各向异性塑性形变等效应相应的理论描述.     

重离子辐照SiO2的光致发光

基于荷能离子与固体相互作用特点,提出了一种新的制备光致发光材料的方法-- 高能重离子辐照. 用这种方法研究了SiO2薄膜的光致发光特性,发现高能84K r和40Ar离子辐照可在注碳SiO2薄膜样品中产生强的蓝-紫光发射带,掺杂碳增强了辐照样品的发光特性.     

快重离子辐照引起Ni/SiO2界面原子混合及相变研究

在室温下用308 MeV的Xe离子和853 MeV的Pb离子辐照Ni/SiO2样品, 用卢瑟福背散射和X射线衍射技术对样品进行了分析。 通过分析Ni/SiO2样品中元素成分分布和结构随离子辐照剂量和电子能损的变化, 探索了离子辐照在Ni/SiO2样品中引起的界面原子混合与结构相变现象。 实验结果显示, Xe和Pb离子辐照均能引起明显的Ni原子向SiO2基体的扩散并导致界面附近Ni, Si和O原子的混合。 实验观测到低剂量Xe离子辐照可产生NiSi2相, 而高剂量Xe离子辐照则导致了Ni3Si和NiO相的形成。 根据热峰模型, Ni原子的扩散和新相的形成可能由沿离子入射路径强电子激发引起的瞬间热峰过程驱动。Ni/SiO2 interface were irradiated at room temperature with 308 MeV Xe ions to 1×1012, 5×1012 Xe/cm2 and 853 MeV Pb ions to 5×1011 Pb/cm2, respectively. These samples were analyzed using Rutherford Backscattering Spectrometry (RBS) and X ray diffraction spectroscopy (XRD), from which the intermixing and phase change were investigated. The obtained results show that both Xe and Pb ions could induce diffusion of Ni atoms to SiO2 substrates and result in intermixing of Ni with SiO2. Furthermore, 1.0×1012 Xe/cm2 irradiation induced the formation of NiSi2 and 5.0×1012 Xe/cm2 irradiation created Ni3Si and NiO phases. The diffusion of Ni atoms and the formation of new phase may be driven by a transient thermal spike process induced by the intense electronic energy loss along the incident ion path.     

一种低活化铁素体/马氏体钢的高能重离子辐照效应研究

低活化的铁素体/马氏体钢是先进核能装置（如聚变堆）的重要候选结构材料。 在聚变堆实际工作环境下, 由于高温和高氦产生率引起的材料失效是这类材料面临的一个重要问题。 本项研究以兰州重离子加速器（HIRFL）提供的中能惰性气体离子束（20Ne, 122 MeV）作为模拟辐照条件, 借助透射电子显微镜, 研究了一种低活化的9Cr铁素体/马氏体钢（T92B）组织结构的变化和辐照肿胀。 实验结果表明, 高温下当材料中晶格原子的撞出损伤和惰性气体原子沉积浓度超过一定限值时, 材料内部形成高浓度的空洞, 并且空洞肿胀率显著依赖于辐照温度和剂量; 在马氏体板条界面及其它晶界处空洞趋于优先形成, 并且在晶界交汇处呈加速生长。 基于氦泡的形核生长与空洞肿胀的经典模型探讨了在不同辐照条件（He离子、 Ne离子、 Fe/He离子双束、 快中子、 Ni离子）下铁素体/马氏体钢中肿胀率数据的关联。Low activation Ferritic/Martensitic steels are a kind of important structural materials candidate to the application in advanced nuclear energy systems. Possible degradation of properties and even failure in the condition of high temperature and high helium production due to energetic neutron irradiation in a fusion reactor is a major concern with the application of this kind of materials. In the present work microstructural evolution in a 9Cr Ferritic/Martensitic steel (T92B) irradiated with 122 MeV 20Ne ions at temperatures between 0.3—0.5 Tm (Tm is the melting point of the material) was investigated with transmission electron microscopy. High concentration voids were observed in the specimens irradiated at high temperatures when the displacement damage dose and Ne concentration exceed a certain level. Preferential formation of voids at lath boundaries and other grain boundaries was found. The data of void swellings in 9Cr ferritic/martensitic steels irradiated in different conditions (such as with He ions, Ne ions, Fe/He dual beams, fast neutrons, Ni ions etc.) were compiled and analyzed based on a classic model of helium bubble formation, and bubble to void transition.     

35MeV/uAr离子辐照聚酯膜引起的效应研究

采用多种手段研究了 35Me V/u的 Ar离子辐照聚酯 (PET)膜产生的微观结构变化 .结果表明 ,辐照使聚酯的化学键断裂并产生了炔端不饱和基团和自由基 .断键主要发生在乙二醇残留物、苯环的对位和酯的 C— O键上 .随着吸收剂量的增加 ,材料的结晶度逐渐降低 ,由原始的41 .7%减至最高辐照量时的 1 5.0 % .研究发现 ,聚脂的非晶化转变截面与电子能损呈线性关系 ;断键和非晶化效应主要取决于样品的吸收剂量 ,并存在一个约 4.0 MGy的阈值.Stacked polyethylene terephthalate films were irradiated with 35 MeV/u Ar ions at room temperature. The ion induced effects were studied by ultraviolet visible spectrometer, Fourier transform infrared spectroscopy, X ray diffractometer, X ray photoelectron spectroscopy, electron spin resonance spectroscopy and differential scanning calorimetry. Bond breaking and the formation of alkyne end groups and free radicals were observed. The bond breaking processes occurred mainly...     

快重离子引起的辐照效应

用PAT、CEMS、SEM和TEM分析观测了HIRFL提供的能量为几十MeV到几百MeV的碳离子在Ni、马氏体时效不锈钢、HT—9铁素体钢和316L不锈钢中引起的辐照效应,包括辐照引起的偏析、脱溶、相变和肿胀,以及辐照肿胀随辐照温度的变化关系,研究了510MeV的碳离子在高纯Ni中的损伤分布,并给出了95MeV的Ar离子模拟宇宙射线在宇宙飞行器中引起数字半导体器件“软故障”的最近结果。 The radiation effects were studied by means of PAT, CEMS, SEM and TEM in nickel,martensitic ageing stainless steel, ferrite steel HT-9 and stainless steel 316L induced by carbon ionswith energy of tens of MeV to hundreds of MeV delivered by HIRFL. It includes segregate,preciptale, phase change and void swelling, as well as temperature-relativity of the irradiationswelling. The damage distribution was also studied in nickel irradiated by 510MeV C~(6+). And the recentresults of Ar ions ...     

高能氩离子在聚苯乙烯中的电子能损效应研究

用1.4GeV氢离子对多层堆叠的厚约53m的聚苯乙烯薄膜在室温和真空条件下进行了辐照;对辐照后的样品进行了从红外到紫外的光吸收测量.测量结果显示,材料经高能红离子辐照后发生化学降解,降解过程强烈依赖于电子能损;在能量沉积密度很高的径迹芯中,分子主链和苯环均遭到破坏;在电子能损高于0.77keV/nm时有炔基产生.