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91.
An analytical model for subthreshold current and subthreshold swing of short-channel triple-material double-gate (TM-DG) MOSFETs is presented in this paper. Both the drift and diffusion components of current densities are considered for the modeling of subthreshold current. Virtual cathode concept of DG MOSFETs is utilized to model the subthreshold swing of TM-DG MOSFETs. The effect of different length ratios of the three channel regions under three different gate materials of device on the subthreshold current and subthreshold swing of the short-channel TM-DG MOSFETs have been discussed. The dependencies of subthreshold current and subthreshold swing on various device parameters have been studied. The simulation data obtained by using the commercially available 2D device simulation software ATLAS™ has been used to validate the present model.  相似文献   
92.
MHz重复频率脉冲功率技术   总被引:5,自引:4,他引:1       下载免费PDF全文
采用串联单传输线、并联Blumlein脉冲形成线和高重复频率固体开关等技术路线开展了MHz重复频率脉冲功率技术研究。利用串联单传输线获得了幅度约200 kV,时间间隔约500 ns的双脉冲。利用并联使用的Blumlein系统和特殊设计的汇流/隔离网络获得了幅度约275 kV,时间间隔约500 ns的三脉冲。利用并联MOSFET和感应叠加原理研制了6 kV/2.5 MHz固体调制器。结果表明:3种方式均可以猝发MHz的方式输出高品质的高压脉冲串,可根据实际的需求选择合适技术路线。  相似文献   
93.
94.
To overcome the limitation of the sputtered Cu seed layer in electroplating of Cu interconnects imposed by the shadow effect, a new method for depositing a Cu seed layer on a 41 nm trench pattern based on combination of electroless plating (ELP) and electron-beam (E-Beam) evaporation was developed. A Cu seed layer formed by ELP alone was too thin to be used for electroplating due to its high resistivity. To solve this problem, an additional Cu layer was deposited on top of the trench by E-Beam evaporator to enhance the electrical conductivity of the Cu seed layer. The electrical resistivity of the resulting Cu layer was reduced to 4.8 μΩ cm, which was sufficient for the conductive seed layer for electroplating the 41 nm trench pattern. The gap-filling capability also improved and there were no voids or seams in the 41 nm trench pattern. The proposed method can be an effective solution for fabrication of a conductive seed layer to fill a 41 nm trench pattern by electroplating.  相似文献   
95.
A model for the simulation of the electron energy distribution in nanoscale metal–oxide–semiconductor field-effect transistor (MOSFET) devices, using a kinetic simulation technique, is implemented. The convective scheme (CS), a method of characteristics, is an accurate method of solving the Boltzmann transport equation, a nonlinear integrodifferential equation, for the distribution of electrons in a MOSFET device. The method is used to find probabilities for use in an iterative scheme which iterates to find collision rates in cells. The CS is also a novel approach to 2D semiconductor device simulation. The CS has been extended to handle boundary conditions in 2D as well as to calculation of polygon overlap for polygons of more than three sides. Electron energy distributions in the channel of a MOSFET are presented.  相似文献   
96.
6H-SiC肖特基源漏MOSFET的模拟仿真研究   总被引:1,自引:1,他引:0       下载免费PDF全文
王源  张义门  张玉明  汤晓燕 《物理学报》2003,52(10):2553-2557
给出了一种新型SiC MOSFET——6H-SiC肖特基源漏MOSFET.这种器件结构制备工艺简单,避 免了长期困扰常规SiC MOSFET的离子注入工艺难度大、退火温度高、晶格损伤大,注入激活 率低等问题.分析了该器件的电流输运机理,并通过MEDICI模拟,给出了SiC肖特基源漏MOSF ET伏安特性以及其和金属功函数、栅氧化层厚度和栅长关系. 关键词: 碳化硅 肖特基接触 MOSFET 势垒高度  相似文献   
97.
Hard switching of semiconductors is the main source of conducted electromagnetic emissions (EME) in pulse-width modulation (PWM) driven power inverters. The requirements on the electromagnetic compatibility grow with the increasing number of installed electric motor drives and inductive power converters. An accurate prediction of the conducted EME requires a model which considers the switching transition of the power semiconductors and the parasitic elements. This typically leads to complex SPICE models, which are hardly suitable for fast dynamic simulations and model-based controller design. This paper presents a compact mathematical model of a low voltage half-bridge inverter, which is based on large-signal models for the individual components and allows for the fast simulation of the conducted EME and switching losses. The high accuracy of the proposed mathematical model is demonstrated by measurement results. In particular, it is shown that the model is able to accurately predict the conducted electromagnetic emissions up to 100 MHz.  相似文献   
98.
利用简化的半导体电学方程,数值模拟获得了各种电学参数的分布,并结合简化电阻模型,模拟了体硅、SOI及DSOI的MOSFET器件的温度场。结果表明MOSFET器件的沟道,特别是靠近漏的区域电场强度及电流密度等各项电、热特性参数在该区域变化剧烈,是最主要的热源区。  相似文献   
99.
Under‐relaxation factors are significant parameters affecting the convergence of a numerical scheme. Some earlier work has been done to optimize these parameters, but this was restricted to special flow domains, and the range of changes for under‐relaxation factors and convective algorithms are limited. In this paper, the effects of changing under‐relaxation factors for different variables, different convective schemes and grid sizes on the convergence of the numerical solution of three 2D turbulent flow situations are studied. These three flows are duct flow, trench flow and inclined free falling jet flow. Copyright © 2003 John Wiley & Sons, Ltd.  相似文献   
100.
According to the requirements of high repetition frequency, fast edge speed and small pulse width for cathode gating signal by range-gated technology, a cathode high repetition frequency gating circuit using period and multi-stage acceleration was proposed. By combining the RC circuit and the high-speed gate circuit, the time bias circuit unit was cascaded to generate logic pulses with different time sequences, which could respectively control the intermediate stage drive MOSFET to generate three phased drive signals, and the output of the intermediate stage drive was used as input of the output-stage MOSFET to control the acceleration and retention of its on-off process. It was verified by software simulation and board-level test. The test results show that the proposed gating circuit can increase the edge time of output pulse from μs level to 2 ns, and can provide +50 V/−200 V cathode off/on voltage, so as to achieve a repetition frequency ranging from 0~350 kHZ, a duty ratio of 0~100%, a minimum pulse width of 3.7 ns, and a pulse output delay time jitter of about 0.1 ns. It has important guiding significance for improving the minimum pulse width performance of high-speed and high-voltage gating power, the highest working repetition frequency and reducing the power loss of the device. © 2022 Editorial office of Journal of Applied Optics. All rights reserved.  相似文献   
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