主链掺杂氧原子聚硅烷的研究进展

介绍了一类新型有机硅聚合物主链掺杂氧原子聚硅烷的合成与性质.该类聚合物是通过氧原子有规律地插入聚硅烷主链,形成具有氧杂低聚硅烷的序列结构(-[(SiMe2)mO]n-).聚合物的主链呈现了聚硅烷以及聚硅氧烷的杂化体结构.通过对此类聚合物性质的研究,能够获得有关此类聚合物行为的知识,从而进一步促进人们对聚硅烷和聚硅氧烷化学性质的了解.总结了此类聚合物的两类有效合成方法:通过α,ω-二功能基封端的线性硅烷低聚体缩聚反应法以及氧杂环硅烷单体的开环聚合反应法,包括氧杂环硅烷单体的开环聚合平衡和反应机理.讨论了此类聚合物的表征、热稳定性及其结构形态.在结论部分展望了此类聚合物的预期应用前景.     

过氧化二苯甲酰为引发剂用于液态聚硅烷合成聚碳硅烷

以聚二甲基硅烷裂解制备的液态聚硅烷为原料,添加引发剂过氧化二苯甲酰合成聚碳硅烷,使液态聚硅烷合成聚碳硅烷的产率提高了20%~25%.利用FTIR和GPC对反应过程进行跟踪分析,利用元素分析,1H-NMR,13C-NMR,TG-DTA和XRD对产物的组成结构和性能进行了表征,提出了过氧化二苯甲酰对液态聚硅烷合成聚碳硅烷的促进反应机理.结果表明,过氧化二苯甲酰受热分解形成自由基,促进了液态聚硅烷中的Si—Si键断裂重排,同时也引发了小分子硅碳烷中的Si—H和Si—CH3键断裂生成Si—CH2—Si结构,使聚碳硅烷分子量长大,产率提高.同时过氧化二苯甲酰分解产生的苯基和苯甲酰氧基会作为端基或侧基引入到聚碳硅烷分子中,引起产物C、O含量的少许增加.但对聚碳硅烷高温烧结后的陶瓷收率没有显著影响.     

几种含苯乙炔基的硅-硅链高聚物的研究

采用含苯乙炔基的二氯硅烷和另外几种二氯硅烷,通过在甲苯中钠缩合的方法,合成了六种含苯乙炔基的聚硅烷。测试了聚合物的红外光谱,紫外光谱和核磁共振谱,测定了聚合物本体及掺杂后的电阻率。聚硅烷还可与某些电子受体形成复合物,形成的复合物在紫外尤谱上都有新的吸收峰出现。     

陶瓷先驱体含锆聚硅烷的电化学合成与表征

采用电化学合成法,以三氯甲基硅烷、氯丙烯、环戊二烯和四氯化锆为单体合成出含锆聚硅烷,通过FTIR,UV,NMR,XRD等表征了其结构.测定了产物的各元素含量和双键含量,以及分子量和分子量分布,并对产物进行了交联固化和高温裂解实验.结果表明,含锆聚硅烷双键保留率为10.8%,锆含量为4.11%.含锆聚硅烷能溶于常见的溶剂...     

Synthesis of Si—H Functional Poly(phenylsilane) and Organosilane Copolymers: Low-valent Titanium Induced Polymerization of Organodichlorosilanes

在低价钛促进下,苯基二氯硅烷进行还原聚合反应生成Si-H官能化的聚苯基硅烷。应用此方法,在温和、中性反应条件下制备出Si-H官能团化的有机聚硅烷共聚物。     

含三氟甲基聚硅烷的合成及其紫外光降解

用Wurtz法合成了聚甲基苯基硅烷、聚(对三氟甲基苯基)(甲基)-甲基苯基硅烷以及聚(对三氟甲基苯基)(苯基)-甲基苯基硅烷3种聚硅烷。用IR、GPC和荧光光谱对产物进行表征,并研究了其紫外光降解性能。从电子结构角度解释了不同聚硅烷在荧光以及紫外光降解行为方面的差异。结果表明,在苯环对位引入吸电子基团三氟甲基有利于紫外光降解的进行,而苯环的增多则会阻碍紫外光降解。     

磁性碳化硅陶瓷先驱体聚铁碳硅烷的研究

通过低分子量的聚硅烷与二茂铁反应合成了聚铁碳硅烷(PFCS).探索了反应温度、裂解温度、二茂铁含量等因素对合成PFCS的影响.元素分析、红外光谱、氢谱分析表明,铁被引入到PFCS中,PFCS与聚碳硅烷的结构相似.高温裂解聚铁碳硅烷所得碳化硅陶瓷具有一定的磁性.     

陶瓷先驱体聚合物的应用

概述了几种典型的陶瓷先驱体聚合物聚碳硅烷、聚硅氮烷、聚硅氧烷、聚硅烷等在陶瓷材料制备中的应用研究进展，重点阐述了在该领域所取得的研究成果，并针对目前存在的不足提出了今后的研究方向。     

高分子量的枝状聚硅烷的合成与表征

根据硅氢加成反应机理设计了“顺点滴式”工艺 ,高效、低耗地合成了甲基苯乙基二氯硅烷和甲基正己基二氯硅烷 .根据Wurtz还原偶联反应原理 ,采用“预聚”和“混聚”两种工艺分别合成枝状共聚硅烷 ,发现运用“预聚”工艺可以合成分子量很高的枝状聚硅烷 .     

饱和、不饱和(N-杂环化)低聚硅烷的结构和光谱性质

用密度泛函理论(DFT)和含时密度泛函理论(TD-DFT)对线型(饱和N-杂环化)和(苯并N-杂环化)低聚硅烷的电子结构和吸收光谱性质以及溶剂效应进行了比较研究.对各体系的基态电子结构在B3LYP/6-31G(d,p)水平上进行了全优化,讨论了电荷分布和前线分子轨道性质.在获得基态稳定构型的基础上,用B3LYP/6-311+G(d)方法计算了电子吸收光谱的性质,探讨了主链的线型增长和溶剂对电子吸收光谱的影响.结果表明,随着主链的增长,低聚硅烷的电子结构发生明显扭曲,在(苯并N-杂环化)聚硅烷中形成了邻近苯并N-杂环之间π-π堆积作用,有利于结构的稳定.两类低聚硅烷的吸收光谱都随着主链的增长而发生明显的红移,(苯并N-杂环化)聚硅烷最大吸收光谱红移幅度要比(饱和N-杂环化)聚硅烷大得多.溶剂效应使得光谱略向短波长移动,溶剂的极性改变对吸收波长的影响不明显.     

Block interrupt polysilane derivatives

High molecular weight block interrupt polysilane derivatives have been prepared by the condensation of a number of α,ω-dichloropolysilanes with some aromatic bis silanols. In this manner, polymers containing polysilane blocks of 2, 4, or 6 catenated silicon atoms have been prepared. The materials are thermally stable and the UV spectroscopic properties mimic those of the corresponding monomers. Although these materials bleach upon irradiation in the deep UV, surprisingly, the block interrupt polysilanes behave as negative resists upon exposure to 254 nm radiation. This behavior contrasts with that of standard polysilane homopolymers which usually function in a positive lithographic mode.     

Block interrupt polysilane derivatives

High molecular weight block interrupt polysilane derivatives have been prepared by the condensation of a number of α,ω-dichloropolysilanes with some aromatic bis silanols. In this manner, polymers containing polysilane blocks of 2, 4, or 6 catenated silicon atoms have been prepared. The materials are thermally stable and the UV spectroscopic properties mimic those of the corresponding monomers. Although these materials bleach upon irradiation in the deep UV, surprisingly, the block interrupt polysilanes behave as negative resists upon exposure to 254 nm radiation. This behavior contrasts with that of standard polysilane homopolymers which usually function in a positive lithographic mode.     

Vacuum-ultraviolet spectroscopy of poly(methylphenylsilylene)

The first vacuum-ultraviolet spectrum of a polysilylene (chain-type polysilane) with aromatic substituents is presented. Assignments of the absorption bands of the model compound poly(methylphenylsilylene) are based on previous experimental data and theoretical electronic band structure calculations for poly(alkylsilylenes) and on ultraviolet spectra of phenyl-containing monomers and polymers. Although aryl orbitals mix with the sigma-conjugated orbitals located along the catenated silicon backbone, some transitions are largely localized on the phenyl groups. These assignments elucidate the nature of the bonding in polysilylenes and should be useful in understanding photodegradation mechanisms and in the design of related new optical materials.     

一种超支化聚硅烷的合成和性能

近年来,光电高分子的研究由于其在发光二极管、太阳能电池、光信息材料、传感器等方面的潜在应用而得到了广泛重视[1].自从英国剑桥大学Cavendish实验室的Burroughes等首次发现聚对亚苯基亚乙烯基的电致发光现象以来[2],共轭聚合物作为发光材料的研究迅速引起了人们的注意[3~5]     

Dual‐emissive polydiphenylsilane nanocomposite: effect of N,N′‐bis(4‐hydroxysalicylidene)‐1,2‐phenylenediamine‐Zn complex

The fluorescence properties of polysilane can be strongly influenced by creating new excited states that involve electronic transitions and the relaxation to the ground state. This work presents the optical effects obtained by doping a specially designed polydiphenylsilane copolymer with Zn complex of N,N′‐bis(4‐hydroxysalicylidene)‐1,2‐phenylenediamine. The nanocomposites have been prepared in solution by mixing the polymer with low amounts of Zn–salophen and using tetrahydrofuran as solvent. The ultraviolet–visible spectrum has shown the occurrence of an intermolecular charge transfer between polysilane and the metal complex. Photoluminescence studies have revealed an interesting dual emission profile of nanocomposite. The origin of this phenomenon has been evidenced by molecular modeling and simulation of the electronic transitions. The modeling results have unveiled a new low‐lying excited state due to intermolecular interactions. The thin films of nanocomposites have been drop‐casted from solutions. The obtained films have been studied by Transmission Electron Microscopy (TEM)‐Scanning Transmission Electron Microscopy (STEM)‐Energy Dispersive X‐ray analysis (EDX) to gain information on the film‐forming capacity and surface morphology. The results have revealed a high potential of such materials for fluorescence sensing applications. Copyright © 2015 John Wiley & Sons, Ltd.     

Synthesis of poly(γ-methoxypropylmethylsilylene) and poly(γ-methoxypropylmethylsilylene-co-di-n-hexylsilylene)

The synthesis of γ;-methoxypropylmethyldichlorosilane, and its subsequent polymerization and copolymerization with di;-n;-hexyldichlorosilane through the reductive coupling with sodium has been accomplished. The resulting polymers contain methyl ether side groups that allow further synthetic transformations on the polysilane backbone. For poly (γ;-methoxypropylmethylsilylene) these groups impart solubility characteristics different than typical alkyl and aryl substituted polysilanes. These new polymers and copolymers have been characterized by GPC and ¹H-, ¹³C-, and ²⁹Si-NMR. © 1994 John Wiley & Sons, Inc.     

Photoinitiation of vinyl polymerization by polysilanes

Polysilanes were found to photoinitiate the polymerization of a variety of vinyl monomers including methyl methacrylate, styrene, ethyl acrylate and acrylic acid. Polymerization initiated by polysilane photolysis is rather insensitive to oxygen inhibition, which may make it especially suitable for polymerization of thin films. The initiation efficiency of poly(phenylmethylsilylene) in styrene was determined from dilatometry data to be 1 × 10^?3. This rather low efficiency is counterbalanced by the very high extinction coefficient of polysilane polymers, ca. 4–8 × 10³ per silicon atom. Possible reasons for the low initiation efficiency and reduced oxygen inhibition of polysilane photoinitiators are discussed.     

三甲基硅基取代聚硅烷的合成与性能研究

利用聚甲基硅烷(PMS)的高分子反应合成三甲基硅基取代聚硅烷(SPS),研究其分子组成与结构,热分解性能和导电性能等.FT-IR、1H-NMR、29Si-NMR、UV和GPC分析表明,SPS具有Si—Si相连的主链结构,侧链的部分取代基中含有三甲基硅侧基.SPS可溶于一般常见的有机溶剂,其热分解特性表明,陶瓷产率为44%,可用作SiC陶瓷先驱体.通过热交联反应可以有效提高其分子量,将其与碘掺杂,电导率为10-6S/cm量级,在半导体范围.