La,V共掺杂的Bi_4Ti_3O_(12)铁电薄膜的溶胶-凝胶法制备及性能测试

采用溶胶-凝胶(sol-gel)工艺在Pt/TiO2/SiO2/p-Si(100)衬底上制备出Bi4Ti3O12(BIT)和Bi3.25La0.75Ti2.97V0.03O12(BLTV)铁电薄膜,研究了La,V共掺杂对BIT薄膜的晶体结构和电学性能的影响.BIT薄膜为c轴择优取向,BLTV薄膜为随机取向,拉曼光谱分析表明V掺杂降低了TiO6(或VO6)八面体的对称性,也增强了Ti—O键(或V—O键)杂化.BLTV薄膜的剩余极化Pr为25.4μC/cm2,远大于BIT薄膜的9.2μC/cm2,表现出良好的铁电性能.疲劳、漏电流测试显示BLTV薄膜具有优良的抗疲劳特性和漏电流特性,表明La,V共掺杂能有效地降低薄膜中的氧空位.     

Nd-Cr共掺BiFeO_3纳米粒子对多铁性能的影响

采用溶胶-凝胶技术合成了纯BiFeO_3(BFO),A/B位钕锌共掺杂Bi_(0.9)Nd_(0.1)Fe_(0.95)Cr_(0.05)O_3(BNFCO)纳米颗粒。并系统地研究了样品的结构、形貌和多铁性能。测试表明A/B位钕铬共掺极大地提高了BiFeO_3的铁电和铁磁性能。BNFCO样品的漏电流密度比纯BFO样品降低了约两个数量级,剩余极化强度(Pr)和矫顽场(Ec)分别高达13.508μC/cm~2和6.702 kV/cm。同时由磁滞回线发现矫顽力(Hc)和剩磁(Mr)也都有了很大的提高。证明了采用Nd-Cr共掺杂BNFCO纳米颗粒可以高效地提高BFO多铁性能。     

杂质分布设计对钛酸锶钡薄膜结构和性能的影响

用溶胶-凝胶方法在Pt/Ti/SiO₂/Si衬底上制备了Na⁺的不同浓度均匀掺杂和成分梯度掺杂(上梯度)钛酸锶钡(Ba_0.25Sr_0.75TiO₃)薄膜.电性能测试表明随着均匀掺杂浓度的增加，薄膜介电常数和损耗都减小，而漏电流先减小(掺杂浓度小于2.5mol%时)后又逐渐增加.场发射扫描电镜分析表明，均匀掺杂浓度增加到2.5mol%后薄膜表面呈疏松多孔状结构，这可能是导致漏电流又逐渐增大的原因.Na⁺的上梯度掺杂避免了掺杂浓度增加到2.5mol%后薄膜生长过程中出现的孔洞现象，于是薄膜的综合电性能得到了进一步提高.深入、系统地分析了杂质不同分布方式对薄膜结构和性能有不同影响的原因.     

InAs/GaSb超晶格中波红外二极管的阳极硫化

采用分子束外延技术,在GaSb衬底上生长了pin结构的InAs(8ML)/GaSb(8ML)超晶格中波红外光电二极管.用阳极硫化和ZnS薄膜对二极管表面进行钝化处理后,二极管漏电流密度降低了三个数量级,零偏阻抗R0达到106Ω,R0A达到103Ωcm2.通过测量电流密度与光敏元周长面积比的关系可知表面漏电不是主要漏电成分;电容电压特性曲线表明吸收层i层背景掺杂浓度约4~5×1014cm-3.在空气中放置一个月后再次测试,发现响应率和探测率几乎没有变化.与化学硫化和SiO2薄膜钝化方法相比,阳极硫化方法是一种更简单和有效的钝化方法.     

Mn掺杂对热蒸发制备Mg_(2-x)Mn_xSi薄膜结构和电学特性的影响

采用热蒸发镀膜方法制备Mg_(2-x)Mn_xSi(原子比x=0.00,0.02,0.04,0.06,0.08)半导体薄膜.用X射线衍射仪(XRD)、原子力显微(AFM)对Mg_(2-xMn_xSi薄膜样品的晶体结构和表面形貌进行表征,用四探针仪测试样品的电阻率,研究Mn掺杂量对Mg2Si薄膜结构和电阻率的影响.结果表明,在Si(111)衬底上制备Mg_(2-xMn_xSi多晶薄膜,其衍射峰(220)、(200)和(111)随Mn含量的增加逐渐增强.当x=0.02-0.06时,制备的Mg_(2-xMn_xSi薄膜具有较低的平均粗糙度和RMS(Root Mean Square)粗糙度.Mn掺杂降低了Mg2Si薄膜的电阻率,且电阻率随着掺杂量的增加呈现下降趋势.     

退火对Mn和N共掺杂的Zn0.88Mn0.12O:N薄膜特性的影响

以NH₃为掺N源,采用电子束反应蒸发技术生长了Mn和N共掺杂的Zn_1-xMn_xO:N薄膜,生长温度为300℃,然后在O₂气氛中400℃退火0.5 h.X射线衍射测量表明,Zn_0.88Mn_0.12O(Mn掺杂)薄膜或Zn_0.88Mn_0.12O:N(Mn和N共掺杂)薄膜仍具有单一晶相纤锌矿结构,未检测到杂质相 关键词： ZnO薄膜 Mn和N共掺杂 电学特性 磁特性     

退火对Mn和N共掺杂的Zno0.88Mn0.12O:N薄膜特性的影响

以NH3为掺N源,采用电子柬反应蒸发技术生长了Mn和N共掺杂的Zno0.88Mn0.12O:N薄膜,生长温度为300℃,然后在02气氛中400℃退火0.5 h.X射线衍射测量表明,Zno0.88Mn0.12O(Mn掺杂)薄膜或Zno0.88Mn0.12O:N(Mn和N共掺杂)薄膜仍具有单一晶相纤锌矿结构,未检测到杂质相.与不掺N的Zno0.88Mn0.12O薄膜相比,Zno0.88Mn0.12O:N薄膜的(002)晶面衍射峰向小角度方向偏移且半高宽变宽.Hall效应测量结果显示,Zno0.88Mn0.12O:N薄膜由退火前的n型导电转变为退火后的P型导电.室温磁特性测量结果表明,虽然原生Zno0.88Mn0.12O:N薄膜呈铁磁性,但其饱和磁化强度M.折算到每个Mn2 仅为约0.20μB,且稳定性不理想,在大气中放置30 d后M.降低到原来的3%左右.退火处理不仅使Zno0.88Mn0.12O:N薄膜的室温M.增大到每个Mn2 约为0.70μB,且在大气中放置30 d后其M.几乎不变.分析了Zno0.88Mn0.12O:N薄膜的铁磁性起源及退火导致其铁磁性增强并稳定的机理.     

基于XPS与XAS的稀磁半导体GaMnN电子结构研究

采用基于同步辐射技术的X射线光电子能谱(XPS)与X射线吸收谱(XAS)测试由金属有机化学气相沉积(MOCVD)技术制备的不同Mn掺杂浓度的稀磁半导体GaMnN薄膜的电子结构,探究Mn掺杂浓度对磁性原子Mn周围的局域环境和电子态等方面的影响,并阐述材料铁磁性变化的机理. XPS和XAS图谱分析表明：Mn²⁺和Mn³⁺共存于薄膜样品内,样品D中Mn²⁺占比高达70%-80%,N空位随Mn掺杂浓度增加而增多且N空位能够使空穴浓度降低,导致Mn 3d和N 2p轨道间的相互交换作用减小,从而减弱体系铁磁性.此外,Mn不同的掺杂浓度会影响GaMnN薄膜p-d耦合杂化能力的强弱,当掺Mn 1.8%时具有较强的p-d耦合杂化能力.     

Mn掺杂ZnO薄膜的结构及光学性能研究

通过脉冲激光沉积(PLD)法在SiO₂基片上制备了不同含量的Mn掺杂ZnO薄膜.X射线衍射、X射线能谱、原子力显微镜与紫外-可见分光光度计测试结果表明：少量的Mn离子的掺杂并没有改变薄膜的结构，薄膜具有(103)面的择优取向；PLD法制备的ZnO薄膜的成分与靶材基本一致，实现了薄膜的同组分沉积；薄膜表面比较平坦，起伏度小于80nm，颗粒尺寸主要集中在25nm附近；但是Mn离子的掺杂改变了ZnO薄膜的禁带宽度，随Mn掺杂含量的增加，ZnO薄膜的禁带宽度增加；当薄膜中Mn含量从6%增加到 关键词： PLD ZnO薄膜 Mn掺杂 吸收谱     

溶液旋涂法制备BixY3-xFe5O12薄膜的自旋输运特性

钇铁石榴石(yttrium iron garnet,YIG)的自旋输运特性一直是自旋电子学的研究重点之一.Bi作为YIG最常见的掺杂元素,其薄膜Bi_xY_3-xFe₅O₁₂的磁光特性已经被广泛研究.但Bi³⁺取代Y³⁺对YIG自旋输运的影响规律还没有被系统地研究过.本文利用溶液旋涂法制备了不同掺杂比的Bi_xY_3-xFe₅O₁₂薄膜,并研究Bi掺杂对YIG薄膜形貌结构和自旋输运性能的影响.结果表明Bi掺杂没有改变YIG的晶体结构,掺杂比上升令薄膜的吸收强度增大,带隙减小.XPS表明了Bi³⁺和Bi²⁺的存在.Bi掺杂在自旋输运上的调控体现在Bi_xY_3-xFe₅O₁₂薄膜的磁振子扩散长度相比纯YIG薄膜有所减小.同时研究发现Pt/Bi_x...     

Thickness dependent magnetic and ferroelectric properties of LaNiO3 buffered BiFeO3 thin films

BiFeO₃ (BFO) thin films with thickness increasing from 40 to 480 nm were successfully grown on LaNiO₃ (LNO) buffered Pt/Ti/SiO₂/Si(100) substrate and the effects of thickness evolution on magnetic and ferroelectric properties are investigated. The LNO buffer layer promotes the growth and crystallization of BFO thin films. Highly (100) orientation is induced for all BFO films regardless of the film thickness together with the dense microstructure. All BFO films exhibited weak ferromagnetic response at room temperature and saturation magnetization is found to decrease with increase in film thickness. Well saturated ferroelectric hysteresis loops were obtained for thicker films; however, the leakage current dominated the ferroelectric properties in thinner films. The leakage current density decreased by three orders of magnitude for 335 nm film compared to 40 nm film, giving rise to enhanced ferroelectric properties for thicker films. The mechanisms for the evolution of ferromagnetic and ferroelectric characteristics are discussed.     

Room-Temperature Ferromagnetic ZnMnO Thin Films Synthesized by Plasma Enhanced Chemical Vapour Deposition Method

Room-temperature ferromagnetic Mn-doped ZnO films are grown on Si （001） substrates by plasma enhanced chemical vapour deposition （PECVD）. X-ray diffraction measurements reveal that the Znl-xMn.O films have the single-phase wurtzite structure. X-ray photoelectron spectroscopy indicates the existence of Mn^2＋ ions in Mndoped ZnO films. Furthermore, the decreasing additional Raman peak with increasing Mn-doping is considered to relate to the substitution of Mn ions for the Zn ions in ZnO lattice. Superconducting quantum interference device （SQUID） measurements demonstrate that Mn-doped ZnO films have ferromagnetic behaviour at room temperature.     

Effects of BaTiO<Subscript>3</Subscript> and SrTiO<Subscript>3</Subscript> as the buffer layers of epitaxial BiFeO<Subscript>3</Subscript> thin films

BiFeO₃ (BFO) thin films with BaTiO₃ (BTO) or SrTiO₃ (STO) as buffer layer were epitaxially grown on SrRuO₃-covered SrTiO₃ substrates. X-ray diffraction measurements show that the BTO buffer causes tensile strain in the BFO films, whereas the STO buffer causes compressive strain. Different ferroelectric domain structures caused by these two strain statuses are revealed by piezoelectric force microscopy. Electrical and magnetical measurements show that the tensile-strained BFO/BTO samples have reduced leakage current and large ferroelectric polarization and magnetization, compared with compressively strained BFO/STO. These results demonstrate that the electrical and magnetical properties of BFO thin films can be artificially modified by using a buffer layer.     

Growth and characteristics of Mn-doped PMN–PT single crystals

Large sized 0.71PMN–0.29PT single crystals with different Mn-doping content (pure, 1 at.%, 3 at.%) have been grown by a modified Bridgman method. The piezoelectric and dielectric properties of the as-grown crystals are measured. The phase transitions of the poled 0.71PMN–0.29PT with the orientation along 〈001〉 and 〈110〉 directions take place during the heating process. The phase transition of the pure crystals is more complicated than that of the Mn-doped crystals. Both the pure 〈001〉- and 〈110〉-oriented crystals have two dielectric abnormal peaks besides the Curie peak. With Mn-doping, the temperature for the first dielectric abnormal peak shifts to a higher value. The Mn-doping content affects the piezoelectric and dielectric properties of the crystal greatly. 1 at.% Mn-doped crystals possesses a larger coercive field and mechanical quality factor at the expense of a little lower piezoelectric response. The growth and characteristics of pure and Mn-doped 0.71PMN–0.29PT single crystals are reported and discussed in this paper.     

Effect of Mn-doping on the growth mechanism and electromagnetic properties of chrysanthemum-like ZnO nanowire clusters

Chrysanthemum-like ZnO nanowire clusters with different Mn-doping concentrations are prepared by a hydrothermal process. The microstructure, morphology and electromagnetic properties are characterized by x-ray diffractometer high-resolution transmission electron microscopy (HRTEM), a field emission environment scanning electron microscope (FEESEM) and a microwave vector network analyser respectively. The experimental results indicate that the as-prepared products are Mn-doped ZnO single crystalline with a hexagonal wurtzite structure, that the growth habit changes due to Mn-doping and that a good magnetic loss property is found in the Mn-doped ZnO products, and the average magnetic loss tangent tanδ_m is up to 0.170099 for 3% Mn-doping, while the dielectric loss tangent tanδ_e is weakened, owing to the fact that ions Mn^{2 +} enter the crystal lattice of ZnO.     

The coexistence of ferroelectricity and ferromagnetism in Mn-doped BaTiO3 thin films

Due to the fault of the first author, this article entitled “The coexistence of ferroelectricity and ferromagnetism in Mn-doped BaTiO3 thin films”, published in “Chinese Physics B”, 2011,Vol.20, Issue 12, Article No. 127701, has been found to copy from the article entitled“Decisive role of oxygen vacancy in ferroelectric versus ferromagnetic Mn-doped BaTiO3 thin films”, published in “Journal of Applied Physics”, 2011,Vol.109, Issue 8, article No. 084105. So the above article in “Chinese Physics B” has been withdrawn from the publication.<     

Off-stoichiometry effects on BiFeO3 thin films

The effects of Bi and Fe-excess on the structure, ferroelectric, leakage current and magnetic properties of BiFeO₃ (BFO) thin films are reported. BFO with 5% excess exhibits no change in the structure with an improvement in leakage current properties in comparison to stoichiometric BFO. Raman spectroscopy of 10% Bi excess suggests a structural change from monoclinic to rhombohedral accompanied with an improvement of resistivity and ferroelectric polarization switching. A higher Fe-excess leads to the formation of pyrochlore Bi₂Fe₄O₉ and gamma-Fe₂O₃ that cause an increase in conductivity at the macroscopic scale. The results are discussed in terms of Fe and Bi-excess effects on the defect structure of BFO.     

Photoluminescence of ZnO and Mn-Doped ZnO Polycrystalline Films Prepared by Plasma Enhanced Chemical Vapour Deposition

ZnO and Mn-doped ZnO polycrystalline films are prepared by plasma enhanced chemical vapour deposition at low temperature （220℃）, and room-temperature photoluminescence of the films is systematically investigated. Analysis from x-ray diffraction reveals that a11 the prepared films exhibit the wurtzite structure of ZnO, and Mndoping does not induce the second phase in the films. X-ray photoelectron spectroscopy confirms the existence of Mn^2＋ ions in the films rather than metalic Mn or Mn^4＋ ions. The emission efficiency of the ZnO film is found to be dependent strongly on the post-treatment and to degrade with increasing temperature either in air or in nitrogen ambient. However, the enhancement of near band edge （NBE） emission is observed after hydrogenation in ammonia plasma, companied with more defect-related emission. Furthermore, the position of NBE shifts towards to high-energy legion with increasing Mn-doped concentration due to Mn incorporation into ZnO lattice.     

Effect of non-magnetic doping on leakage and magnetic properties of BiFeO3 thin films

In this paper, we show that the leakage current properties of BiFeO₃ (BFO) thin films have been greatly improved by Zr-doping. In contrast, the magnetic properties of Zr-doped BFO films are affected as a weak ferromagnetism. Beyond the double-exchange interactions arising from the creation of Fe²⁺, we propose another simple model considering the replacement of the magnetically active Fe³⁺, time to time, by a non-active Zr⁴⁺, which is expected to induce a local ferromagnetic coupling rather than an antiferromagnetic one.