Fe离子注入ZnO生成超顺磁纳米颗粒

过渡族元素掺杂ZnO生成稀磁半导体, 成为近期国际材料科学研究的热点. 在本文中, 研究Fe离子注入ZnO单晶的结构和磁性变化, 目标是建立磁性和结构的对应关系, 澄清铁磁性的来源. 采用卢瑟福背散射/沟道技术 (RBS/Channelling)、同步辐射X射线衍射 (SR-XRD)和超导量子干涉仪 (SQUID), 研究注入温度和退火对样品的晶格损伤、结构及磁性的影响. 研究表明: 样品注入区损伤随注入温度升高而降低; 低温253 K注入样品中, SR-XRD未检测到新相, Fe离子分布于Zn位, ZnO (0002) 峰右侧肩峰可能属于Zn_1-xFe_xO, 5 K下测试样品不具有铁磁性; 623 K注入和823 K真空退火 (253 K注入) 样品中形成α和γ相金属Fe, 5 K下样品具有明显的剩磁和矫顽力, 零场冷却和场冷却 (ZFC/FC) 曲线和300 K下的磁滞回线显示纳米Fe颗粒具有超顺磁性. Fe离子注入ZnO的磁性源于第二相α-Fe和γ-Fe. 关键词： 离子注入 ZnO 同步辐射X射线衍射 超顺磁性     

Determination of Al Composition in Strained AlGaN Layers

AlxGa1-xN/GaN heterostructures are grown on c-sapphire with the Al composition x from 0.2 to 0.4 and thicknesses from 20nm to 30nm. The lattice parameters a and c are determined from 2θ/ω scan. The AIGaN layers are found to be under tensile strain by using x-ray diffraction. Vegard＇s law induces a large deviation in Al composition determination by only considering the linear relationship between one lattice parameter （α or c） and Al composition. The accurate determination of Al composition is only possible with consideration of both the lattice parameters α and c, by assuming the tetragonal distortion in the AlGaN layer. Additionally, the results obtained from x-ray diffraction are verified by Rutherford backscattering.     

Comparative Characterization of InGaN/GaN Multiple Quantum Wells by Transmission Electron Microscopy, X-Ray Diffraction and Rutherford Backscattering

The composition, elastic strain and structural defects of InCaN/CaN multiple quantum wells （MQWs） are comparatively investigated by using x-ray diffraction （XRD）, transmission electron microscopy and Rutherford backscattering/channelling. The InGaN well layers are fully strained on CaN, i.e. the degree of relaxation is zero. The multilayered structure has a clear defined periodic thickness and abrupt interfaces. The In composition is deduced by XRD simulation. We show how the periodic structure, the In composition, the strain status and the crystalline quality of the InGaN/GaN MQ, Ws can be determined and cross-checked by various techniques.     

Charge Transport and Magnetotransport Properties of Polyimide Irradiated by 80keV Co Ions

Charge transport properties of polyimide films implanted with 80 keV Co ions at two different fluences （series I： 1.25 × 10^17 ions/cm^2, series Ⅱ： 1.75 × 10^17 ions/cm^2） are studied in detail. For series I, the temperature dependence of surface resistivity fits Mott＇s equation very well. It is on the insulating side of the insulator-metal transition （IMT）. However, for series Ⅱ, the temperature dependence of surface resistivity is not in agreement with Mott＇s equation. It is on the metallic side of lMT. The magnetotransport properties of these two series are also studied. No significant magnetoresistive effect is observed for series I at both 5 K and 300 K. For series Ⅱ, an obvious magnetoresistive effect is observed at 5 K, while there is no magnetoresistive effect at 300 K. Rutherford backscattering spectrometry （RBS） is applied to confirm the actual fluence for these two series.     

高能电子和正电子在晶体沟道中的辐射

介绍了高能电子和正电子在晶体中的沟道辐射,对超相对论电子和正电子在周期弯曲晶体中的相干辐射进行了分析,并提出了初步的实验设想. The channeling radiation of high energy electrons and positrons in crystals was introduced. According to the new idea proposed by A.V.Korol, the coherent radiation of ultra relativistic electrons and positrons channeled in periodically bent crystals was analyzed. The characteristics of the radiation were obtained by using classic electromagnetic theory and a tentative experimental plan for testing was suggested.     

A Practical Guide for X-Ray Diffraction Characterization of Ga（A1, In）N Alloys

Ca(In, Al)N alloys are used as an active layer or cladding layer in light emitting diodes and laser diodes, x-ray diffraction is extensively used to evaluate the crystalline quality, the chemical composition and the residual strain in Ca(Al,In)N thin films, which directly determine the emission wavelength and the device performance. Due to the minor mismatch in lattice parameters between Ca(Al, In)N alloy and a CaN virtual substrate, x-ray diffraction comes to a problem to separate the signal from Ca(Al,In)N alloy and CaN. We give a detailed comparison on different diffraction planes. In order to balance the intensity and peak separation between Ca(Al,In)N alloy and CaN, (0004) and (1015) planes make the best choice for symmetric scan and asymmetric scan, respectively.     

The coexistence of ferroelectricity and ferromagnetism in Mn-doped BaTiO3 thin films

Due to the fault of the first author, this article entitled “The coexistence of ferroelectricity and ferromagnetism in Mn-doped BaTiO3 thin films”, published in “Chinese Physics B”, 2011,Vol.20, Issue 12, Article No. 127701, has been found to copy from the article entitled“Decisive role of oxygen vacancy in ferroelectric versus ferromagnetic Mn-doped BaTiO3 thin films”, published in “Journal of Applied Physics”, 2011,Vol.109, Issue 8, article No. 084105. So the above article in “Chinese Physics B” has been withdrawn from the publication.<     

Structure and luminescence of a-plane GaN on r-plane sapphire substrate modified by Si implantation

We show the structural and optical properties of non-polar a-plane GaN epitaxial films modified by Si ion implantation. Upon gradually raising Si fluences from 5×10¹³ cm^-2 to 5×10¹⁵ cm^-2, the n-type dopant concentration gradually increases from 4.6×10¹⁸ cm^-2 to 4.5×10²⁰ cm^-2, while the generated vacancy density accordingly raises from 3.7×10¹³ cm^-2 to 3.8×10¹⁵ cm^-2. Moreover, despite that the implantation enhances structural disorder, the epitaxial structure of the implanted region is still well preserved which is confirmed by Rutherford backscattering channeling spectrometry measurements. The monotonical uniaxial lattice expansion along the a direction (out-of-plane direction) is observed as a function of fluences till 1×10¹⁵ cm^-2, which ceases at the overdose of 5×10¹⁵ cm^-2 due to the partial amorphization in the surface region. Upon raising irradiation dose, a yellow emission in the as-grown sample is gradually quenched, probably due to the irradiation-induced generation of non-radiative recombination centers.     

掺铒GaN薄膜的背散射/沟道分析和光致发光研究

采用背散射（RBS）/沟道（channeling）分析和傅里叶变换红外光谱（FT-IR）研究了掺铒G aN薄膜的晶体结构和光致发光（PL）特性.背散射/沟道分析结果表明：随退火温度的升高， 薄膜中辐照损伤减少；但当退火温度达到1000℃，薄膜中的缺陷又明显增加.Er浓度随注入 深度呈现高斯分布.通过沿GaN的<0001>轴方向的沟道分析，对于900℃，30min退火的GaN:Er 样品，Er在晶格中的替位率约76％.光谱研究表明：随退火温度的升高，室温下样品的红外P L峰强度增加；但是当退火温度达到100 关键词： GaN Er 离子束分析 光致发光     

p—Type Doping of GaN by Mg^＋ Implantation

Mg^ and Mg^ P^ were introduced into GaN by ion implantation.The structure and crystalline quality of the GaN samples were analysed by Rutherford backscattering and channelling spectormetry before(χmin=1.6%)and after implantation(χmin=4.1%),X-ray diffraction reveals the existence of implantation-induced damage in the case of post-implantation followed by rapid thermal annealing.The resistivtiy,average factor,carrier concentration and carrier mobility were measured by the Hall effect.The transformation from n-type to p-type for GaN was observed.