聚苯乙烯薄膜对自支撑锆薄膜的性能改善

 利用直流磁控溅射方法和提拉法制备了自支撑Zr/C₈H₈复合滤光膜和C₈H₈滤光膜。用同步辐射光源测量了滤光膜对软X射线的透射率，用俄歇电子能谱分析了膜中的元素含量。结果表明，虽然C8H8薄膜的加入在一定程度上降低了Zr滤光膜在软X射线波段的透射率，但较好地阻止了存储和使用过程中氧、氮等杂质对Zr金属膜的入侵，有效地改善了滤光膜的环境稳定性；同时很好地改善了Zr滤光膜的力学性能和表面面形，使制备的成品率提高了20%。     

薄膜光学 制膜技术与装置

O484．1 2006065249软X射线激光用自支撑Zr滤光膜的制备及测量=Prepa- ration and research of free-standing Zr filters for soft X-ray laser[刊,中]/张莉(同济大学精密光学工程技术研究所．上海(200092)),吴永刚…//强激光与粒子束．—2006,18 (6)．—953-956利用直流磁控溅射方法制备了质量厚度为200μg/cm~2、直径为20 mm的自支撑金属Zr滤光膜。用同步辐射光源和紫外可见分光光度计分别测量了滤光膜在软X射线和     

自支撑Zr膜制备及软X射线透过性能研究

软X射线波段滤光膜材料大都为自支撑金属薄膜,实验室环境下自支撑薄膜长期与空气接触表面易氧化,空气中的杂质原子进入自支撑薄膜内部,致使自支撑膜光学性能大幅下降.5 nm至20 nm软X射线波段Zr具有较低的质量吸收系数和较小的密度,在该波段Zr滤光膜透过率较高.采用脱模剂法制备自支撑Zr膜,在洁净的浮法玻璃上蒸镀一层Na...     

自支撑Zr膜制备及软X射线透过性能研究

软X射线波段滤光膜材料大都为自支撑金属薄膜,实验室环境下自支撑薄膜长期与空气接触表面易氧化,空气中的杂质原子进入自支撑薄膜内部,致使自支撑膜光学性能大幅下降.5 nm至20 nm软X射线波段Zr具有较低的质量吸收系数和较小的密度,在该波段Zr滤光膜透过率较高.采用脱模剂法制备自支撑Zr膜,在洁净的浮法玻璃上蒸镀一层NaCl做为脱膜剂,直流磁控溅射沉积Zr膜,脱膜后的到自支撑Zr膜.为防止薄膜表面氧化及空气中杂质原子进入薄膜内部,在Zr膜两面各直流磁控溅射沉积一层10 nm厚的C或Si膜作为保护膜,得到C/Zr/C、Si/Zr/Si复合膜,测试结果显示C或Si膜的引入对于自支撑Zr膜光学性能基本无影响.     

13.9nm软X射线激光用大面积多层膜分束镜研制

 基于分束镜反射率和透射率的乘积为衡量标准的原则,设计了13.9nm软X射线激光干涉测量所需的多层膜分束镜，用磁控溅射法在有效面积达10mm×10mm，厚100nm的氮化硅窗口上镀制Mo/Si多层膜,实现了分束镜制作。用表面轮廓仪实测分束镜面形精度达到nm量级，同步辐射反射率计测试表明,分束镜的反射率和透射率乘积约4%。     

TiN_x/Ag/TiN_x复合膜的光学性能

用磁控溅法在载波片上制备了TiNx/Ag/TiNx复合膜。采用X射线衍射、X射线光电子能谱(XPS)研究了复合膜的晶体结构和TiNx薄膜的化学成分;用紫外-可见分光光度计分析了氮气流量、各层膜膜厚对复合膜可见光透射率的影响。研究表明,TiNx薄膜为非晶态,Ag膜为晶态;TiNx薄膜提高了复合膜的远红外反射率,且其表面存在大量Ti-O键;复合膜的可见光透射率随着氮气流量的增加而变大,随着Ag膜厚度的增加先增后减。当氮气流量为55cm3/s,膜层构造为TiNx(16nm)/Ag(16nm)/TiNx(32nm)时,复合膜在550nm处的可见光透射率达到85%,远红外反射率达到92%,辐射率为0.0925,具有优异的低辐射玻璃光学性能。     

13.9 nm马赫贞德干涉仪用软X射线分束镜研究

 介绍了13.9 nm马赫贞德干涉仪用软X射线分束镜的设计、制备与性能检测。基于分束镜反射率和透过率乘积最大的评价标准，设计了13.9 nm软X射线激光干涉实验用多层膜分束镜。采用磁控溅射方法在有效面积为10 mm×10 mm、厚度为100 nm的Si3N4基底上镀制了Mo/Si多层膜，制成了多层膜分束镜。利用X射线掠入射衍射的方法测量了Mo/Si多层膜的周期。用扩束He-Ne激光束进行的投影成像方法定性分析了分束镜的面形精度，利用光学轮廓仪完成了分束镜面形精确测量。利用北京同步辐射装置测量了分束镜反射率和透射率，在13.9 nm处，分束镜反射率和透过率乘积达4%。使用多层膜分束镜构建了软X射线马赫贞德干涉仪，并应用于13.9 nm软X射线激光干涉实验中，获得了清晰的含有C8H8等离子体电子密度信息的动态干涉条纹。     

Al和MgF2多层滤光膜光谱及其环境稳定性

 采用真空热蒸发和电子束蒸发方法,制备了Al和MgF₂ 多层滤光膜,并在100,150,200, 300 ℃的真空环境中进行了热处理,考察了真空热处理温度对多层滤光膜光谱、形貌和环境稳定特性的影响。结果表明,经过真空热处理后,滤光膜表面粗糙度降低,峰值透射率升高,半宽度增大。随着在实验室干燥环境中放置时间的增加,未热处理以及300 ℃热处理样品的透射率峰位向长波方向有较大的移动,峰值透射率降低,可见光抑制特性减弱。而150, 200 ℃热处理样品的透射率峰位移动很小,峰值透射率及可见光抑制特性基本保持不变,具有很好的环境稳定性。     

软X射线多层膜与衰减膜研究

 本文采用随机数的方法，发展了一种普适的多层膜设计方法，这种方法除可设计一般的周期多层膜，更重要的是它可以根据选定的评价因子，设计不同要求的非周期多层膜。用磁控溅射方法完成软X射线多层膜制备，X射线衍射、卢瑟福背散射、俄歇电子谱和反射率的相对测试用来表征多层膜结构和特性，所得结果说明多层膜的结构完整，周期参数正确。用离子束溅射方法成功地制备了有一定反射率和透过率的软X射线半反半透分束镜；分析了Ag和Zr衰减膜中的杂质含量与分布及其对衰减膜特性的影响，并对衰减系数进行了修正，为实验提供优质的衰减膜。     

M′型LuTaO_4∶Eu~(3+)透明闪烁厚膜的制备及性能研究

X射线成像在生命科学和物质微结构分析等许多方面有着非常重要的应用,X射线成像仪器核心部件之一为X射线-可见光转换屏。透明闪烁薄膜是实现高空间分辨率X射线成像的一条有效途径。铕掺杂M′型LuTaO_4是一种性能优越的闪烁材料,其密度高达9.75g·cm~(-3),化学性质稳定,辐照硬度大,有望制备成透明薄膜型高空间分辨率X射线转换屏。以2-甲氧基乙醇为溶剂、PVP为胶粘剂,采用溶胶-凝胶法成功制备出M′型LuTaO_4∶Eu~(3+)透明闪烁厚膜,并对透射率、光致发光、X射线激发发射光谱和空间分辨率等一系列的薄膜性能进行表征。经过8次旋涂之后,膜层均匀、无裂纹,厚度为2.1μm,发光波段的透射率为70%以上,成像空间分辨率达到1.5μm。将厚膜作为X射线-可见光转换屏,成功对果蝇进行了X射线成像,其复眼结构清晰可见。此外,紫外和X射线激发下闪烁膜的发光特性研究表明,该厚膜具有优良的发光性能,已基本满足高分辨率X射线成像的要求,有望在显微X射线成像方面获得很好应用。     

Spectral calibration of filters and detectors of solar telescope at a wavelength of 13.2 nm for the TESIS project

The telescope at a wavelength of 13.2 nm of the TESIS device of the CORONAS-PHOTON satellite is intended for imaging hot plasma (T ～ 10 MK) of the solar corona. In this paper, calibration of optical elements of the telescope is described. The transmittance of multilayer Zr/Si filters and the sensitivity and radiation resistance of the CCD-array-based detector were measured. The transmittance of filters in the operating wavelength range was 40–50% (for filters of various thicknesses); the spectral dependence of the transmittance was close to the calculated one. The transmittance of filters in the visible region was (1–2) × 10^?6. The detector sensitivity was 0.01–0.1 analog-to-digital units per photon (adu/photon), the radiation resistance was better than 10⁹ rad.     

自支撑聚酰亚胺/锆膜的制备及性能改善

 采用直流磁控溅射法制备自支撑锆(Zr)膜,采用二步法制备聚酰亚胺(PI)膜,在Zr膜表面沉积PI膜得到自支撑PI/Zr复合膜。均苯四甲酸酐(PMDA)和二甲基二苯醚(ODA)在二甲基乙酰胺(DMAC)中反应得到聚酰胺酸(PAA),然后PAA高温亚胺化得到PI;PI成膜时采用提拉法成膜。经国家同步辐射实验室计量线站测定,实际测量结果与理论分析一致,PI膜的引入虽然会导致自支撑薄膜透过率有所下降,但在类镍-银软X射线13.9 nm波段PI(200 nm)/Zr(300 nm)和PI(200 nm)/Zr(400 nm)自支撑薄膜的透过率仍然分别达到14.9%和7.5%。     

Characterization of a Transformation Function of a Photochromic Adaptive Filter

Simple, fast and accurate procedure is developed for measuring a Transformation Function (TF) of a Photochromic Adaptive Filter (PAF). Photochromic filters, whose spectral transmittance depends on previous and immediate radiant exposure and other environmental conditions, require special methods of spectro-photometry to determine their properties. This article describes methodology of characterizing the luminous transmittance as a function of light intensity using easy to implement method. Transformation functions of sample filters for different sources of radiation and varied light intensity are evaluated. The measuring system can also be used for fast determination of spatially and spectrally uniform light sources with UV spectral component.     

近红外光上转换发光显示器中干涉过滤膜的设计

介绍了近红外光上转换发光显示器的结构及其原理，为了进一步提高该显示器的亮度等性能并避免近红外光从屏上泄露，根据多层干涉过滤膜设计原理设计了该显示器所需的两个多层干涉过滤膜：一个为在可见光420~800 nm短波段高反射，近红外光800~1000 nm长波段高透射特性的LP膜；另一个为特性与之对应相反的SP膜.采用对称膜的设计并用MATLAB语言进行了仿真优化，得到了总层数为21，厚度分别为1586.8 nm和2157.8 nm的LP膜和SP膜，该膜系在整个波段和较大角度范围内都具有很好的透反特性考虑多层薄膜制备中存在材料折射率和膜层厚度偏差，该设计膜系具有较大的制造容差.     

Study of the physical properties of amorphous Zr doped Al2O3 powders

Alumina (Al₂O₃) powders doped with different amounts of zirconium (Zr) ions were synthesized by the sol-gel process. The Zr concentration was changed from 0 to 3%. Here we attempted to fabricate Zr doped Al₂O₃ samples and characterized them for their optical and structural properties. Ultraviolet-Visible analysis (UV-Vis), infrared spectroscopy (FT-IR) and powder X-ray diffraction (XRD) have been used to characterize the optical properties, phase evolution and crystallinity of the obtained samples. X-ray diffraction patterns revealed that all the Al₂O₃ powders obtained were completely amorphous. An optical study was employed to determine the band gap of the samples. The transmittance had decreased from 90 to 86% and the band gap of pure Al₂O₃ was found to be 4.116 eV, and it was shifted to 4.038 eV for 3% Zr doped Al₂O₃. The results obtained in this study are discussed comparatively with those cited in the literature.     

Direct monitoring of broadband light absorbers

The final performances of manufactured thin film filters usually depend on to the monitoring strategy. Some optical monitoring systems provide transmittance measurements while others measure the reflectance. With our system, we are able to simultaneously measure both transmittance and reflectance over an extended spectral range [400 nm; 1000 nm]. This reflectance channel is necessary for direct monitoring of some kinds of filters like light absorbers. Indeed, in this case, transmittance is cancelled after the first metallic layer deposition. The optical system is also very useful for in situ characterization especially for metallic absorbing materials.     

Influence of Zr(50)Cu(50) thin film metallic glass as buffer layer on the structural and optoelectrical properties of AZO films

Aluminum-doped ZnO(AZO) thin films with thin film metallic glass of Zr(50)Cu(50) as buffer are prepared on glass substrates by the pulsed laser deposition. The influence of buffer thickness and substrate temperature on structural, optical, and electrical properties of AZO thin film are investigated. Increasing the thickness of buffer layer and substrate temperature can both promote the transformation of AZO from amorphous to crystalline structure, while they show(100)and(002) unique preferential orientations, respectively. After inserting Zr(50)Cu(50) layer between the glass substrate and AZO film, the sheet resistance and visible transmittance decrease, but the infrared transmittance increases. With substrate temperature increasing from 25℃ to 520℃, the sheet resistance of AZO(100 nm)/Zr(50)Cu(50)(4 nm) film first increases and then decreases, and the infrared transmittance is improved. The AZO(100 nm)/Zr(50)Cu(50)(4 nm) film deposited at a substrate temperature of 360℃ exhibits a low sheet resistance of 26.7 ?/, high transmittance of 82.1% in the visible light region, 81.6% in near-infrared region, and low surface roughness of 0.85 nm, which are useful properties for their potential applications in tandem solar cell and infrared technology.     

Tb3+掺杂高密度锗酸盐闪烁玻璃的发光性质

采用高温熔融法制备了Tb³⁺掺杂高密度锗酸盐玻璃。分别测试了该玻璃的透过光谱、密度、荧光光谱、荧光寿命及X射线激发发光光谱,揭示了该玻璃的物理化学性质和发光性质。透过光谱表明该玻璃具有良好的可见光透过率。高含量的Lu₂O₃和Gd₂O₃使得玻璃的密度高达6.4 g/cm³。该玻璃在377 nm光和X射线激发下发出强的绿光。544 nm发光的荧光寿命为1.325~1.836 ms。研究结果表明,Tb³⁺掺杂高密度锗酸盐玻璃是一种可用于慢速事件X射线探测器的候选闪烁材料。