ZnO纳米棒的低温溶液法制备、光电特性研究及其在有机/无机复合电致发光中的应用

利用水热法制备了垂直于衬底的定向生长的ZnO纳米棒,利用扫描电子显微镜及光致发光的方法对其形貌及光学特性进行了表征,利用场发射性能测试装置对ZnO纳米棒的场发射性能进行了测试.结果表明:利用水热法在较低的温度(95 ℃) 下生长了具有较好形貌和结构的ZnO纳米棒,并表现出了较好的场发射特性,当电流密度为1 μA/cm²时,开启电场是2.8 V/μm,当电场为6.4 V/μm时,电流密度可以达到0.67 mA/cm²,场增强因子为3360.稳定性测试表明,在5 h内,4.5 V/μm的电场下,其波动不超过25%.将制备的ZnO纳米棒应用到有机/无机电致发光中,其中ZnO纳米棒为电子传输层,m-MTDATA(4,4',4″-tris{N,(3-methylphenyl)-N-phenylamino}-triphenylamine) 为空穴传输层,得到了ZnO的342 nm的紫外电致发光,此发光较ZnO纳米棒光致发光的紫外发射有约40 nm的蓝移. 关键词： ZnO纳米棒 场发射 水热法 有机/无机复合电致发光     

InN纳米线的低压化学气相沉积及其场发射特性研究

利用低压化学气相沉积方法在以Au作催化剂的Si衬底上生长了InN纳米线. 扫描电子显微镜分析表明，这些纳米线的直径在60—100 nm的范围内, 而其长度大于1 μm.高分辨透射电子显微镜图像表明，合成的纳米线中含有六方相和立方相的InN晶体.这些InN纳米线具有良好的场发射特性和稳定的场发射电流，其开启场为10.02 V/μm(电流密度为10 μA/cm²)，在24 V/μm 的电场下，其电流密度达到5.5 mA/cm².此外，对InN纳米线的场发射机理也进行了讨论. 关键词： InN纳米线 场电子发射 非线性Fower-Nordheim曲线     

丝网印刷制备碳纳米管阴极的强流脉冲发射特性研究

采用丝网印刷法制备了一种大面积的碳纳米管阴极,表征了阴极表面碳纳米管的形貌及分布.研究了该阴极在不同脉冲条件下的高压脉冲发射特性,分析了发射时阴极面等离子体产生和发射点的分布.研究表明：碳纳米管阴极的脉冲发射机制为爆炸电子发射,在平均场强为16.7V/μm的单脉冲电场下,阴极的最高发射电流密度为99 A/cm².在平均场强为15.4 V/μm的双脉冲电场下,阴极的最高发射电流密度为267 A/cm².碳纳米管阴极可以作为强流电子束源在高能微波器件中得到应用. 关键词： 强流脉冲电子束 碳纳米管 阴极 丝网印刷     

Morphological effects on the field emission characteristics of zinc oxide nanotetrapods films

The direct growth of a tetrapod-like ZnO nanostructure has been accomplished by using a thermal oxidation method without any catalysts. Studies on the field emission properties of the ordered ZnO nanotetrapods films found that the shape of the ZnO nanotetrapods has considerable effect on their field emission properties, especially the turn-on field and the emission current density. Compared with the rod-like legs ZnO nanotetrapods, the nanotetrapods with acicular legs have a lower turn-on field of 2.7 V/μm at a current density of 10 μA/cm², a high field enhancement factor of 1830, and an available stability. More importantly, the emission current density reached 1 mA/cm² at a field of 4.8 V/μm without showing saturation. The results could be valuable for using the ZnO nanostructure as a cold-cathode field-emission material.      

The enhanced field-emission properties of screen-printed single-wall carbon-nanotube film by electrostatic field

In this work, we improved the field-emission properties of a screen-printed single-wall carbon-nanotube (SWCNT) film by applying a strong electrostatic field during the drying process after the printing. By applying the strong field, more tips of SWCNTs could emerge from the screen-printed film and turn somewhat toward the erecting direction because of the repulsive force among the SWCNTs. The field-emission properties of the film were thus improved obviously. The improved field emitters sample has low electron emission turn-on field (E_to = 1.22 V/μm), low electron emission threshold field (E_th = 2.32 V/μm) and high brightness with good uniformity and stability. The lowest operating field of the improved sample is below 1.0 V/μm and its optimum current density exceeds 3.5 mA/cm².     

类富勒烯纳米晶CNx薄膜及其场致电子发射特性

利用微波等离子体增强化学气相沉积技术制备出了CN_x薄膜,并利用x射线光电子能谱、x射线衍射、扫描电子显微镜和Raman光谱等测试手段对所制备的CN_x薄膜的微结构和成分进行了分析.研究了其场致电子发射特性.发现薄膜的结构和场发射特性与反应系中的甲烷、氮气及氢气的流量比有关,当甲烷、氢气及氮气流量比为8/50/50 sccm时,制备的薄膜具有弯曲层状的纳米石墨晶体结构（类富勒烯结构）和很好的场发射特性.场发射阈值电场降低至1.1V/μm.当电场为5.9V/μm时,平 关键词： 类富勒烯 x薄膜')" href="#">CN_x薄膜 场致电子发射 微波等离子体增强化学气相沉积     

大电流碳纳米管场发射阴极研究

报道了在较大发射面积上获得较大场发射电流的碳纳米管场发射阴极。为了加强场发射电流,在丝网印刷浆料中增加一种金属纳米颗粒,金属颗粒增强了碳纳米管发射体和衬底的接触,提高碳纳米管和衬底的粘附作用。利用改进后的丝网印刷方法制备了大电流碳纳米管场发射阴极,测得最大发射电流为68.0 mA,阴极有效发射面积约1.1 mm2,发射电流密度约6.2 A/cm2;并成功将改进方法制备的大电流场发射碳纳米管阴极应用于场发射真空器件原型。实验证明这种具有较大发射电流和较大发射电流密度的场发射能够满足部分大功率电子器件的需求。收稿日期:; 修订日期:     

Enhanced field emission from ZnO nanopencils by using pyramidal Si(1 0 0) substrates

Zinc oxide nanopencil arrays were synthesized on pyramidal Si(1 0 0) substrates via a simple thermal evaporation method. Their field emission properties have been investigated: the turn-on electric field (at the current density of 10 μA/cm²) was about 3.8 V/μm, and the threshold electric field (at the current density of 1 mA/cm²) was 5.8 V/μm. Compared with similar structures grown on flat Si substrates, which were made as references, the pyramidal Si-based ZnO nanopencil arrays appeared to be superior in field emission performance, thus the importance of the non-flat substrates has been accentuated. The pyramidal Si substrates could not only suppress the field screening effect but also improve the field enhancement effect during the field emission process. These findings indicated that using non-flat substrates is an efficient strategy to improve the field emission properties.     

Synthesis and field-emission of aligned SnO2 nanotubes arrays

Aligned tin dioxide (SnO₂) nanotubes have been synthesized by high-frequency inductive heating. Nanotubes with high yield were grown on silicon substrates in less than 5 min, using SnO₂ and graphite as the source powder. Scanning electron microscopy and transmission electron microscopy showed nanotube with diameters from 50 to 100 nm and lengths up to tens of mircrometers. The SnO₂ nanotubes synthesized under the optimum condition have better field-emission characteristics. The turn-on field needed to produce a current density of 10 μA/cm² is found to be 1.64 V/μm. The samples show good field-emission properties with a fairly stable emission current. This type of SnO₂ nanotubes can be applied as field emitters in displays as well as vacuum electric devices.     

钛碳化物改性碳纳米管的场发射性能

通过在碳纳米管(CNTs)表面沉积钛薄膜并经过高温真空退火处理,在CNTs表面形成了低功函数的钛碳化物.研究了钛碳化物改性CNTs的场发射性能,并利用X射线光电子能谱(XPS)对改性碳管进行了结构表征.实验结果表明,高温真空退火可使沉积在CNTs表面的钛原子与碳原子发生化学反应生成钛碳化物;经钛碳化物改性处理的CNTs的场发射性能明显改善,开启电场由改性前的121降低到104V/μm,当电场强度为234V/μm时,场发射电流密度由改性前的23增大到改性后的13.5mA/cm²,同时,CNTs的表面抗离子轰击能力增强,发射稳定性改善.对钛碳化物改性增强CNTs薄膜场发射性能的机理进行了分析. 关键词： 碳纳米管 钛碳化物 场发射 结构表征     

激光晶化形成纳米硅材料的场电子发射性质研究

利用KrF准分子激光退火超薄非晶硅膜,并结合热退火技术制备了单层纳米硅薄膜并研究了薄膜的场电子发射性质.在晶化形成的纳米硅薄膜中可以观测到稳定的场电子发射现象,其开启电场从原始淀积的非晶硅薄膜的17V/μm降低到8.5V/μm,而场发射电流密度可以达到0.1mA/cm².激光晶化后形成的纳米硅材料的场电子发射特性的改善可以从薄膜表面形貌的改变以及高密度纳米硅的形成所导致的内部电场增强作用来解释. 关键词： 纳米硅 场发射 激光晶化     

Carbon nanotube field emission cathodes fabricated with trivalent chromium conversion coated substrates

The properties of carbon nanotube (CNT) field emission cathodes fabricated by a dip coating method with trivalent chromium conversion coated substrates are studied. Two kinds of substrates with different morphologies, one with a rough crackled surface and the other with a smooth surface, were used for making the CNT cathodes, and their I-V curves and emission patterns were evaluated. The results show that, as compared to the smooth substrate surface, the rough surface with self-assembled sub-micro-cracks on the substrate can dramatically enhance the uniformity of the emission pattern and the emission efficiency. The cathode fabricated with the crackled substrate shows good field emission properties such as high brightness, good uniformity, a low turn-on field (0.86 V/μm) and a high current density of 10 mA/cm² at 2.5 V/μm.     

Field emission property of copper nitride thin film deposited by reactive magnetron sputtering

Copper nitride (Cu₃N) thin film was deposited on silicon (Si) substrate by reactive magnetron sputtering method. X-ray diffraction measurement showed that the film was composed of Cu₃N crystallites with anti-ReO₃ structure and exhibited preferential orientation of [1 0 0] direction. The field emission (FE) result showed that Cu₃N film had a turn-on electric field of about 3 V/μm at a current density of 1 μA/cm² and a current density of 700 μA/cm² was obtained at the electric field of 24 V/μm. The emission mechanism inferred by Fowler-Nordheim (FN) plot is shown as following: thermal electron emission at low field region and tunneling electron emission at high field region.     

Field electron emission from HfNxOy thin films deposited by direct current sputtering

HfN_xO_y thin films were deposited on Si substrates by direct current sputtering at room temperature. The samples were characterized by scanning electron microscopy (SEM), atomic force microscopy (AFM) and X-ray diffraction (XRD). SEM indicates that the film is composed of nanoparticles. AFM indicates that there are no sharp protrusions on the surface of the film. XRD pattern shows that the films are amorphous. The field electron emission properties of the film were also characterized. The turn-on electric field is about 14 V/μm at the current density of 10 μA/cm², and at the electric field of 24 V/μm, the current density is up to 1 mA/cm². The field electron emission mechanism of the HfN_xO_y thin film is also discussed.     

Field emission properties of carbon nanotube cathodes produced using composite plating

Field emission properties of carbon nanotube field emission cathodes (CNT-FECs) produced using composite plating are studied. The experiment uses a CNT suspension and electroless Ni plating bath to carry out composite plating. The CNTs were first purified by an acid solution, dispersed in a Ni electrobath, and finally co-deposited with Ni on glass substrates to synthesize electrically conductive films. Field emission scanning electron microscopy and Raman spectroscopy results show that the field emission characteristics and graphitic properties of CNT-FECs depend on the pH value of the electrobath. Experiments show that the optimum electrobath pH value is 5.4, achieving a field emission current density of 1.0 mA/cm² at an applied electric field of 1.5 V/μm. The proposed CNT-FECs possess good field emission characteristics and have potential for backlight unit application in liquid crystal displays.     

Emission properties of Ti-DLC films prepared by unbalanced magnetron sputtering

The field emission properties of Ti-DLC films in diode and coplanar device structures were studied. An emission current density of 1.14 A/cm² could be obtained at an applied field of 33 V/μm and the threshold field was 24 V/μm for the coplanar emission structure. The silicon substrate was found to limit the emission current in the diode structure because of its high resistivity.     

A comparative study of field emission properties of carbon nanotube films prepared by vacuum filtration and screen-printing

A comprehensive comparative study of electron field emission properties of carbon nanotube (CNT) films prepared by vacuum filtration and screen-printing was carried out. Field emission performance of vacuum filtered CNT films with different filtered CNT suspension volumes was systematically studied, and the optimum electron emission was obtained with a low turn on field of ∼0.93 V/μm (at 1 μA/cm²) and a high field enhancement factor β of ∼9720. Comparing with screen-printed CNT films, vacuum filtered CNT films showed better electron emission performance, longer lifetime, and greater adhesive strength to substrates. This work reveals a potential use of vacuum filtered CNT films as field emission cathodes.     

太赫兹源场致发射电子源

通过粒子模拟(PIC)软件模拟计算了在ps级别下二极与三极结构碳纳米管场致发射的电流密度与电子注聚焦性能。阳极电压在2 kV时,二极结构下电流密度达到1.85 A/cm2;三极结构下,栅压700 V时发射电流密度达到2.3 A/cm2,且在一定的三极结构参数与电极电压下,可以获得较好的电子注聚束效果。通过碳纳米管二极管发射实验,获得了6.6 A/cm2的发射电流密度,总发射电流达到52.1 mA,可以为太赫兹器件提供连续发射的电子注。     

Synthesis of ZnO films with a special texture and enhanced field emission properties

ZnO films with special textures are fabricated on Mo-coated Al₂O₃ ceramic substrates by the catalyst-free electron beam evaporation method, and the as-deposited films are treated by hydrogen plasma. It is found that the surface morphologies of the films are changed significantly after hydrogen plasma treatment and that the films consist of vertically standing and intersecting nanosheets. A lower turn-on field of 1.2 V/μm and an enhanced current density ～0.11 mA/cm² at 2.47 V/μm are achieved. The low threshold field and the high emission current density are attributed primarily to the unique shape and smaller resistivity of the ZnO nanosheet films.     

Preparation and field emission properties of carbon nanotubes cold cathode using melting Ag nano-particles as binder

A new preparation process for carbon nanotubes (CNTs) cold cathode was studied through the replacement of traditional organic or inorganic binder with Ag nano-particles. This method has the advantages of low preparation temperature and fine electrical contact between CNTs paste and substrate. A mixture paste of CNTs, Ag nano-particles and other organic solvents was spreaded on Si substrate. By melting and connecting of Ag nano-particles after sintered 30 min at 250 °C, a flat CNTs films with good field emission properties was obtained. The measurements reveal that the turn on electric field and the threshold electric field of as-prepared CNTs cathode are 2.1 and 3.9 V/μm respectively and the field emission current density is up to 41 mA/cm² at an applied electric field of 4.7 V/μm.