人工金刚石薄膜生长过程中有关反应活性的研究

用原子簇团模拟人工金刚石膜生长过程中的一些生长核,采用从头自治的DV-X_n方法对这些簇团和与生长过程有关的一些气相分子和基团(CH,CH_2,CH_3,·CH_3,CH_4·H,C_2H,C_2H_2,C_2H_4)进行了电子结构计算,从化学反应活性的角度探讨金刚石膜生长过程中这些气相分子和基团与生长核的反应活性,结果表明,CH,CH_2,CH_3,CH_4·H和变形的C_2H_2更易于与金刚石表面发生化学吸附。另外,通过分析簇团的电子态密度和前线分子轨道的组成情况,提出了人工金刚石膜生长中生长核长大的 关键词：     

CH_3OH在ZnO(0001)表面的光催化解离（英文）

本文利用266 nm波长的激光及程序升温脱附的方法研究了甲醇在ZnO(0001)表面的光催化反应.TPD结果显示部分的CH_3OH以分子的形式吸附在ZnO(0001)表面,而另外一部分在表面发生了解离.实验过程中探测到H_2,CH_3~·,H_2O,CO,CH_2O,CO_2和CH_3OH这些热反应产物.紫外激光照射实验结果表明光照可以促进CH_3OH/CH_3O解离形成CH_2O,在程序升温或光照的过程中它又可以转变为HCOO~-.CH_3OH_(Zn)与OH_(ad)反应在Zn位点上形成H20分子.升温或光照都能促进CH_3O~·转变为CH_3~·.该研究对CH_3OH在ZnO(0001)表面的光催化反应机理提供了一个新的见解.     

原子分子在Pt(100)表面吸附的第一性原理研究

本文系统研究了H、N、O、C、S等原子,N_2、NH_3、NO、CO等分子和CH_3、CH、CH_2和OH等自由基在Pt(100)表面的吸附.从能量上来看,吸附能力从小到大的顺序是N_2NH_3COCH_3NOHOHNCH2OSCHC.原子类吸附物中H、N、O的最稳定吸附位均为桥位,而S、C则倾向于四重空位.所研究的分子吸附物(N_2、NH3、CO、NO),N_2和NH_3有且只有一种顶位吸附结构,CO和NO均优先吸附在空位.自由基吸附物(CH、CH_2、CH_3、OH)在Pt(100)表面上的吸附,CH_3优先吸附在顶位,CH_2、OH它们的最稳定吸附位均为桥位.原子、分子和自由基吸附后,会引起Pt(100)原子层间距的改变.     

SO_2和NO_2在γ-Al_2O_3(110)表面吸附的第一性原理计算

采用基于平面波基组的Vienna Ab-initio Simulations Package (VASP)程序研究了SO_2和NO_2在γ-Al_2O_3(110)表面和羟基化γ-Al_2O_3(110)表面的吸附,获得了SO_2和NO_2吸附的不同构型和结构参数.对吸附能,电荷转移,差分电荷密度和投影态密度等进行分析和讨论.对比发现,在γ-Al_2O_3(110)表面SO_2的吸附能力强于NO_2.SO_2或NO_2在非羟基化γ-Al_2O_3(110)表面吸附时O原子的2p轨道和Al原子的3s3p轨道作用形成O-Al键,且SO_2吸附时键结强度高于NO_2.NO_2吸附时费米能级以下有部分反键态,削弱了与γ-Al_2O_3(110)表面相互作用.在羟基化γ-Al_2O_3(110)表面SO_2或NO_2的吸附能力会低于非羟基化表面,但是SO_2的吸附能力依旧强于NO_2.计算结果说明SO_2与γ-Al_2O_3(110)表面的相互作用强于NO_2.以上研究,将有助于理解SO_2和NO_2在γ-Al_2O_3的反应性,为进一步研究它们的非均相转化和在灰霾形成中的促进作用奠定基础.     

含氢碳膜的生长机制: 分子动力学模拟研究低能量CH基团的作用

探索等离子增强化学气相沉积(PECVD)技术中含氢碳膜的生长机理, 制备出常态超润滑含氢碳膜是表面工程技术领域的目标之一. 基于REBO势函数, 采用分子动力学模拟方法, 通过对比研究CH基团在清洁金刚石和吸氢金刚石表面的沉积行为, 发现低能量CH基团在清洁金刚石(111)面上的吸附效率大于98%, 而在吸氢金刚石(111)面上的吸附效率低于1%. 结果表明PECVD法制备含氢碳膜时, 低能量CH基团对薄膜生长的贡献主要来自于其在表面非饱和C位置的选择性吸附.     

燃煤过程中铝质矿物迁移转化机制的研究

采用低温灰化、高温灰化、沉降炉燃烧和热重实验等方法,利用X射线衍射仪(XRD)和场发射扫描电镜结合X射线能谱仪(FSEM-EDX)对灰化灰、燃烧产物以及燃烧高铝煤电厂灰样的物理化学特征进行了详细的研究。结果表明:高铝煤中的铝质矿物主要是勃姆石和高岭石;高岭石高温脱水分解最后形成莫来石,勃姆石500℃时脱水形成γ-Al_2O_3,γ-Al_2O_3随着温度升高转化为θ-Al_2O_3,θ-Al_2O_3微晶在1010℃高温下开始熔融聚合形成α-Al_2O_3;θ-Al_2O_3微晶向α-Al_2O_3的转变对细颗粒的生成具有重要影响。     

CH_4在Cu/γ-Al_2O_3颗粒上催化燃烧分区及反应特性

采用固定床微分反应器,实验研究了甲烷在不同氧烷分压比(P_(O_2)/P_(CH_4))下Cu/γ-Al_2O_3催化剂上的反应速率及燃烧特性,确定了反应动力学分区,并探讨了甲烷催化燃烧反应的表面机理及动力学特性。结果表明,当P_(O_2)/P_(CH_4)2时,微分反应器中的反应速率与CH_4分压成正比而与O_2分压无关,催化剂表面呈饱和氧吸附状态;0.1P_(O_2)/P_(CH_4)2时,反应速率受CH_4和O_2分压的共同影响,吸附氧未完全覆盖活性位表面;当0P_(O_2)/P_(CH_4)0.1时,反应速率仅与O_2分压呈正比关系,与CH_4无关,金属表面裸露,表面吸附氧被快速吹离。动力学研究表明,3个反应动力学区间所对应的催化剂表面吸附氧覆盖率有明显不同,3个区间依次为(O~*)、(O~*+*)和(*),所对应的表观活化能依次下降146.3kJ/mol、99.8 kJ/mol、60.8 kJ/mol。     

红外光谱研究异戊二烯在α-Al_2O_3表面的氧化反应

利用傅里叶变换显微红外光谱仪(micro-FTIR)研究异戊二烯在α-Al_2O_3表面的氧化反应。结果表明异戊二烯、臭氧和二氧化硫可以在α-Al_2O_3表面反应生成羰基化合物和硫酸盐,并且水的存在对硫酸盐的生成有抑制作用。     

涂层导体用CeO_2帽子层的表面特征及其温度依赖性

涂层导体中,作为多层织构模板中的最上层,帽子层的表面形貌、晶粒尺寸、表面粗糙度、平整度、致密度等表面特征将直接影响其上YBa_2Cu_3O_(7-δ)超导层的形核、织构形成和外延生长,表面特征的优化成为近期涂层导体缓冲层研究的重点.采用磁控溅射方法在LaMnO_3/Epi-MgO/IBAD-MgO/Y_2O_3/Al_2O_3/Hastelloy C276上动态外延生长CeO_2薄膜作为涂层导体帽子层,主要研究了沉积温度对CeO_2薄膜表面特征的影响.利用x射线衍射仪、扫描电子显微镜、原子力显微镜以及拉曼光谱仪等对CeO_2薄膜的织构、微结构及表面形貌、表面粗糙度、平整度等表面特性进行细致表征.研究结果表明:CeO_2薄膜的表面特征对沉积温度依赖性强;在沉积温度800℃左右获得了最好的织构和表面,CeO_2薄膜具有最好的(00l)取向,面内半高宽为7.1°,晶粒尺寸接近YBa_2Cu_3O_(7-δ)最高形核密度对应的CeO_2最佳尺寸,薄膜表面连续平整均匀,光滑致密无裂纹,其均方根粗糙度约1.4nm;而且,在此CeO2缓冲层上用三氟乙酸—金属有机沉积方法(TFA-MOD)外延生长的YBa_2Cu_3O_(7-δ)超导层具有良好的织构及致密平整的表面.     

不同退火温度的Al_2O_3:C薄膜热释光和光释光性能

α-Al_2O_3:C晶体的热释光和光释光性能优越,但其制备要求高,需高温和高还原气氛.与α-Al_2O_3:C晶体性能接近的α-Al_2O_3:C陶瓷,热释光峰不单一.本文采用两次阳极氧化法在0.5 mol/L的草酸溶液中5℃恒温制备高度均匀有序的多孔Al_2O_3:C薄膜,主要研究不同退火温度对其热释光和光释光特性的影响.结果表明,经不同温度退火后的Al_2O_3:C薄膜均为非晶结构;不同退火温度的Al_2O_3:C薄膜热释光的主发光峰约在310℃左右,符合通用级动力学模型.600℃退火后的Al_2O_3:C薄膜热释光灵敏度最强,其热释光剂量曲线在1-10 Gy范围内具有很好的线性响应,在剂量10-120 Gy范围内出现超线性响应;在相同的辐照剂量下,随着退火温度的升高(≤600℃)光释光的初始发光强度逐渐增强.不同退火温度的Al_2O_3:C薄膜光释光衰减曲线都呈典型的指数衰减且快衰减速率相比α-Al_2O_3:C晶体显著加快.600℃退火后的Al_2O_3:C薄膜光释光灵敏度最强,其光释光剂量响应曲线在1-200 Gy整体上都具有很好的剂量线性关系.与热释光相比,Al_2O_3:C薄膜的光释光具有更宽的线性剂量响应范围.此研究为Al_2O_3:C薄膜作为光释光辐射剂量材料做出了有益的探索.     

低温燃烧合成法制备的氧化铝陶瓷粉体的发光特性

α-Al₂O₃∶C单晶具有优良的热释光特性,被用做热释光剂量计,但α-Al₂O₃∶C晶体剂量计的形状不易加工,生产成本高且碳在晶体中难以掺杂均匀。采用低温燃烧合成法以无水乙醇为溶剂,尿素为染料,硝酸铝为反应物制备少团簇、分散均匀的片状α-Al₂O₃∶C陶瓷粉体。探讨不同点火温度和不同退火温度对其光致发光特性的影响,不同退火温度对热释光特性的影响以及热释光与辐射剂量(90Sr β)的关系。通过分析α-Al₂O₃∶C陶瓷粉体的光致发光光谱得出：α-Al₂O₃∶C陶瓷粉体的发射波长在395 nm附近,点火温度T≤800℃时,点火温度为500 ℃制备的α-Al₂O₃∶C陶瓷粉体的光致发光强度最强;在相同点火温度T=500 ℃下,经不同温度退火制备α-Al₂O₃∶C陶瓷粉体,点火温度为500 ℃制备的α-Al₂O₃∶C陶瓷粉体经1 000 ℃退火后光致发光强度最强。通过分析α-Al₂O₃∶C陶瓷粉体的热释光曲线得出：退火后的α-Al₂O₃∶C陶瓷粉体在200 ℃左右的热释光峰值占主导,900 ℃退火的α-Al₂O₃∶C陶瓷粉体在200 ℃附近的热释光峰值最强;通过峰高法对900 ℃高温退火处理后的α-Al₂O₃∶C陶瓷粉体位于200 ℃左右的热释光峰做剂量响应曲线,可以看出,在1～50 Gy剂量范围内具有良好的热释光剂量线性响应关系,在50～200 Gy剂量范围内出现超线性响应关系。与α-Al₂O₃∶C晶体(1～10 Gy)和多孔Al₂O₃∶C薄膜(1～10 Gy)相比,α-Al₂O₃∶C陶瓷粉体的线性剂量响应范围明显扩大。此研究可为提高氧化铝陶瓷粉体的热释光性能提供思路。     

Eu2O3在η-Al2O3和SiO2上固体-固体表面相互作用的研究

用穆斯堡尔谱和X射线衍射技术研究了Eu₂O₃在η-Al₂O₃和硅胶上的固体表面吸附。 关键词：     

Study of the interfacial structure and chemistry of CVD κ-Al2O3/TiC multilayer coatings

This article describes the interfacial regions in CVD grown TiC/κ-Al₂O₃ multilayers. A number of microanalytical techniques were used including HREM, EDX and EELS. Occasionally, the first 50 nm of the alumina layers deposited on the intermediate TiC layers grew as a cubic alumina, heavily faulted, containing small amounts of sulphur (S), maybe as a stabiliser. The presence of slightly rounded TiC (111) facets may act as preferred nucleation sites for the cubic Al₂O₃ phase, with a ‘cube on cube’ orientation relationship. In this way the nucleation of κ-Al₂O₃ is less favourable. After some tens of nanometres the cubic phase cannot be stabilised any longer and the layer continues to grow as κ-Al₂O₃. A number of observations point towards the reaction zone (RZ) being η- and/or γ-Al₂O₃. The diffraction work and the FFT analysis of the HREM images show that the RZ is an fcc phase with a=7.9 Å, which matches with η- and γ-Al₂O₃. The EELS Al fine structure indicate more tetrahedral Al ions than in κ-Al₂O₃, as in η- and γ-Al₂O₃. The RZ contains small amounts of S, as has been reported for γ-Al₂O₃. Due to the structural similarities between η- and γ-Al₂O₃ it was not possible to determine which of these cubic phases is present in the RZ.     

Surface and interface properties of epitaxial Fe3O4 films studied by Mössbauer spectroscopy

Stoichiometric Fe₃O₄ films have formed epitaxially on -Al₂O₃ and MgO single-crystal substrates by a reactive vapor deposition method. In order to apply conversion electron Mössbauer spectroscopy depth-selectively, a 5–7 Åthick probe layer containing ⁵⁷Fe was formed at various depths in inactive ⁵⁶Fe₃O₄ matrix films. At the topmost surfaces and also at the interfaces, the essential electronic features of bulk Fe₃O₄ are retained, including a rapid electron hopping between the Fe²⁺ and Fe³⁺ ions at B sites. Minor depth-dependent changes are confined to a few outermost atomic layers, and the changes depend on the orientation and the lattice mismatch with the substrate. For (111) growth on -Al₂O₃, the surface layer seems to be strongly relaxed to reduced the electric polarization, while a high density of defects seems to be concentrated at the interface with -Al₂O₃. For (001) growth on MgO, the surface retains the spinel lattice though slightly oxidized, while the interface with MgO has good crystallinity and stoichiometry. An enhanced thermal fluctuation of the Fe³⁺-spins in contact with the MgO substrate and in the topmost surface layer can be seen in their reduced magnetic hyperfine field at 300 K.     

W_(20)O_(58)(010)表面氢吸附机理的第一性原理研究

采用基于密度泛函理论的第一性原理平面波超软赝势方法,在广义梯度近似下,研究了W_(20)O_(58)晶胞、W_(20)O_(58)(010)表面结构及其氢吸附机理.计算结果表明:W_(20)O_(58)晶体理论带隙宽度为0.8 eV,为间接带隙,具有金属性.W_(20)O_(58)晶体中W—O共振较强,以共价键居多.W_(20)O_(58)(010)表面有WO终止(010)表面和O终止(010)表面,表面结构优化后使得W—O键长和W—O—W键角改变,从而实现表面弛豫.分别计算了H_2分子吸附在WO终止(001)表面和O终止(001)表面的WO-L-O_(1c),WO-V-O_(1c),WO-L-O_(2c),WO-V-O_(2c),O-L-O_(1c)和O-V-O_(1c)六种吸附构型,其中WO-L-O_(1c),WO-V-O_(1c)和WO-L-O_(2c)这三种吸附构型不稳定;而WO-V-O_(2c),O-L-O_(1c)和O-V-O_(1c)这三种吸附构型都很稳定,H_2分子都解离成两个H原子,吸附能均为负值,分别为-1.164,-1.021和-3.11 eV.WO-V-O_(2c)吸附构型的两个H原子分别吸附在O和W原子上;O-L-O_(1c)吸附构型的两个H原子,一个与O原子成键,另一个远离了表面.其中O-V-O_(1c)吸附构型最稳定,两个H原子失去电子,为O原子提供电子.分析其吸附前后的态密度,H的1s轨道电子与O的2p,2s轨道电子相互作用,均形成了一些较强的成键电子峰,两个H原子分别与O_(1c)形成化学键,最终吸附反应生成了一个H_2O分子,同时产生了一个表面氧空位.     

蓝光激发的Y2.93Al5O12∶0.07Ce3+黄色荧光粉的制备及光致发光

以Al₂(SO₄)₃·18H₂O、尿素为原料,采用水热-热解法制备了球形α-Al₂O₃粉体。以自制α-Al₂O₃、Y₂O₃及CeO₂为原料,固相法制备了白光LED用Y_2.93Al₅O₁₂∶0.07Ce3+黄色荧光粉,通过X射线衍射（XRD）、扫描电镜（SEM）、X射线能谱（EDS）及荧光光谱（PL）等对产物的物相、形貌及光致发光性能进行了表征。结果表明：水热-热解法制备出了物相纯净、分散性良好的球形α-Al₂O₃粉体,以该α-Al₂O₃为原料,合成出可被460 nm蓝光有效激发,发射光谱为峰值在550 nm宽带的Y_2.93Al₅O₁₂∶0.07Ce3+荧光粉,色坐标为（0.453,0.531 9）,采用GSAS软件对Y_2.93Al₅O₁₂∶0.07Ce3+荧光粉的XRD图进行了Rietveld结构精修,精修图与XRD测试图完全吻合,Y,Al,Ce,O四元素均匀地分布在黄色荧光粉产物中,Y_2.93Al₅O₁₂∶0.07Ce3+黄色荧光粉的激发光谱由两个部分组成,在340和460 nm处有两个非常明显的吸收峰,Ce3+的4f能级由于自旋-耦合而劈裂为两个光谱支项2F_7/2和2F_5/2,其中2F_5/2为基谱项。340 nm的激发峰对应于2F_5/2→5D_5/2的跃迁,460 nm的激发峰属于2F_7/2→5D_3/2的跃迁,并且460 nm处的激发强度强于340 nm处激发强度。以460 nm为监测波长得到的发射光谱,最强发射峰位于550 nm,Y_2.93Al₅O₁₂∶0.07Ce3+荧光粉是一种适用于白光LED的高性能黄色荧光粉。     

Interactions between vacancies and prismatic Σ3 grain boundary in α-Al_2O_3:First principles study

Interactions between vacancies and Σ3 prismatic screw-rotation grain boundary in α-Al_2O_3 are investigated by the first principles projector-augmented wave method.It turns out that the vacancy formation energy decreases with reducing the distance between vacancy and grain boundary(GB) plane and reaches the minimum on the GB plane(at the atomic layer next to the GB) for an O(Al) vacancy.The O vacancy located on the GB plane can attract other vacancies nearby to form an O–O di-vacancy while the Al vacancy cannot.Moreover,the O–O di-vacancy can further attract other O vacancies to form a zigzag O vacancy chain on the GB plane,which may have an influence on the diffusion behavior of small atoms such as H and He along the GB plane of α-Al_2O_3.     

Computer simulation of a carbon-deposition plasma in CH4

A transport and reaction model of a low-pressure, high-frequency (13.56 MHz) CH₄ plasma used for diamondlike carbon (a-C:H) deposition was developed. The model includes reactions among four molecular species (CH₄, C₂ H₆, C₂H₄, and H₂), five radicals and atom (CH₃, CH₂, CH, C₂H₅, and H), and four ions (CH₄⁺ , CH₃⁺, CH₅⁺, and C ₂H₅⁺). It also accounts for the influence of the sticking coefficient of species at the walls. Calculated values of the dissociation degree for several flow rates are in good agreement with experimental measurements made by quadrupole mass spectroscopy. A simple surface-model based on the hydrogen coverage of surface and ion flux and energy at the substrate surface was established. This model permitted the calculation of the deposition rate on the powered electrode as a function of the power applied to this electrode. Good agreement between experimental and calculated growth rates was obtained when CH₃, C₂H₅, and CH₂ were assumed to participate in film formation, and when hydrogen removal by ion bombardment with variable energy as a function of the power was included in the model     

Adsorption and reactions of CH2I2 on Ru(001) surface

The adsorption and dissociation of CH₂I₂ were studied at 110 K with the aim of generating CH₂ species on the Ru(001) surface. The methods used included X-ray photoelectron spectroscopy (XPS), ultraviolet photoelectron spectroscopy (UPS), temperature programmed desorption (TPD), Auger electron spectroscopy (AES) and work function measurements. Adsorption of CH₂I₂ is characterized by a work function decrease (0.96 eV at monolayer), indicating that adsorbed CH₂I₂ has a positive outward dipole moment. Three adsorption states were distinguished: a multilayer (T_p=200 K), a weakly bonded state (T_p=220 K) and an irreversibly adsorbed state. A new feature is the formation of CH₃I, which desorbs with T_p=160 K. The adsorption of CH₂I₂ at 110 K is dissociative at submonolayer, but molecular at higher coverages. Dissociation of the monolayer to CH₂ and I proceeded at 198–230 K, as indicated by a shift in the I(3d_5/2) binding energy from 620.6 eV to 619.9 eV. A fraction of adsorbed CH₂ is self-hydrogenated into CH₄ (T_p=220 K), and another one is coupled to di-σ-bonded ethylene, which — instead of desorption — is converted to ethylidyne at 220–300 K. Illumination of the adsorbed CH₂I₂ initiated the dissociation of CH₂I₂ monolayer even at 110 K, and affected the reaction pathways of CH₂.