Basic technology for developing cost-effective thermal waste recycling industry

The advantages of electron-beam treatment of flue gases of industrial and power plants are discussed. The equations of the basic chemical reactions are presented, and a mathematical model of the cleaning process is developed. A conclusion on the self-repayment of this technology was drawn, which opens up new prospects for its implementation.     

铝合金焊前激光清洗的等离子体光谱在线检测

铝合金焊接技术在工业生产、制造和维修等领域有广泛的应用,焊缝内存在气孔导致焊接质量降低是铝合金焊接技术的常见问题。由于铝合金表面金属氧化物是导致气孔生成的主要来源,对激光清洗过程进行在线检测,不但可以实时分析表面氧化物的清洗状态,而且可以避免基体表面因为过度清洗造成损伤或二次氧化。提出采用激光诱导等离子体光谱(LIBS)在线检测铝合金焊前激光清洗过程,表征清洗后铝合金基体的表面状态。LIBS技术可以对多元素成分同时检测,拥有较低的检出限和较高的准确性。搭建基于Andor Mechelle 5000光谱仪的铝合金焊前激光清洗在线检测系统,剔除空气环境对实验结果的影响,测试6061铝合金表面氧化物和铝合金基体的LIBS光谱,分析两者独特的元素特征谱线,采用X射线能谱(EDS)测试结果验证元素特征谱线的准确性,并探讨激光清洗过程LIBS技术在线检测的可行性。实验测试等离子体光谱谱线强度与激光能量密度之间的关系,获得单次脉冲激光去除铝合金表面氧化物的损伤阈值,结合X射线能谱的检测结果研究激光损伤阈值的成因及影响。研究激光清洗过程等离子体光谱特征谱线与脉冲次数之间的关系,提出基于O/Al特征谱线强度比值作为在线检测清洗效果及二次氧化损伤的评判依据。为验证该评判依据的准确性,将O/Al特征谱线强度比值随清洗次数的变化趋势与X射线能谱测试获得的氧元素原子百分比变化趋势进行对比。实验结果表明:采用200~700 nm范围内激光诱导等离子体谱线特征分析激光清洗状态,可以剔除空气环境的影响;氧元素和铝元素特征谱线准确反映出表面氧化膜与铝合金基体的成分差异;X射线能谱检测元素成分和含量表明氧元素含量随着激光清洗能量密度先减后增,单次清洗铝合金的二次氧化损伤的激光能量阈值为11.46 J·cm-2,小于损伤阈值的激光能量密度对铝合金基体的多次清洗未造成损伤,等离子体光谱特征谱线强度与表面清洗状态相关, 656.5 nm(OⅡ)/396.2 nm(AlⅠ)谱线强度比值≤1.5%为激光清洗干净的依据。研究结果有利于铝合金的激光清洗实时控制技术和焊接装置集成化。     

激光清洗实时监测技术研究

针对目前在研激光清洗的实时监测问题进行实验和分析。得出两个结论:激光清洗具有传统方法无法具有的优越性,可以节省大量人力物力成为新型清洗方法而受到重视,激光清洗在设备维修保养中显示了良好的应用前景。激光清洗过程中产生的声发射信号包含了清洗过程的大量信息,利用声发射检测系统可以对激光清洗过程实时监控。     

FEM-based time-reversal enhanced ultrasonic cleaning

Pipe fouling is a challenging problem in many industrial applications. Current cleaning techniques require halting the production during the cleaning phase and the existing methods are unable to do targeted cleaning, even though fouling is often localized to certain areas inside the pipeline. To address this issue, we use FEM-simulated, time-reversed signals to focus ultrasound power onto a pre-determined location: a fouled pipe residing inside a Plexiglas container. Ultrasound cleaning with similar acoustic power was compared to the time-reversal enhanced method in terms of cleaning efficiency. The cleaning efficiency was determined by measuring how much fouling, by mass, both protocols removed from the surface of a Plexiglas pipe, using similar input electric power and equal cleaning time. Our results indicate that the proposed time-reversal-based technique removes three times more fouling than the standard ultrasound cleaning without focusing. The study extends our previous paper on FEM-based time-reversal focusing [1].     

The optimisation of ultrasonic cleaning procedures for dairy fouled ultrafiltration membranes

Ultrafiltration (UF) of whey is a major membrane based process in the dairy industry. However, commercialization of this application has been limited by membrane fouling, which has a detrimental influence on the permeation rate. There are a number of different chemical and physical cleaning methods currently used for cleaning a fouled membrane. It has been suggested that the cleaning frequency and the severity of such cleaning procedures control the membrane lifetime. The development of an optimal cleaning strategy should therefore have a direct implication on the process economics. Recently, the use of ultrasound has attracted considerable interest as an alternative approach to the conventional methods. In the present study, we have studied the ultrasonic cleaning of polysulfone ultrafiltration membranes fouled with dairy whey solutions. The effects of a number of cleaning process parameters have been examined in the presence of ultrasound and results compared with the conventional operation. Experiments were conducted using a small single sheet membrane unit that was immersed totally within an ultrasonic bath. Results show that ultrasonic cleaning improves the cleaning efficiency under all experimental conditions. The ultrasonic effect is more significant in the absence of surfactant, but is less influenced by temperature and transmembrane pressure. Our results suggest that the ultrasonic energy acts primarily by increasing the turbulence within the cleaning solution.     

Laser surface cleaning of organic contaminants

Laser surface cleaning process has been a useful and efficient technique for various industrial applications. The removal of photoresist contaminants on silicon wafers was investigated with a krypton fluoride (KrF) excimer laser, and the irradiated area was characterized using a profilometer, a scanning electronic microscopy (SEM), an Auger electron spectroscopy (AES) and a Fourier transition infrared spectroscopy (FT-IR). It was found that there exist an optimal number of pulses to remove the contaminant from the substrate surface without any laser-induced damage, depending on the laser density on the surface. A model to predict the optimal number of pulses, which agrees well with Beer–Lambert's law, is proposed and proved to be operable.     

清洗对偏振分光膜损伤阈值的影响

采用微分干涉显微镜、扫描电镜和聚焦离子束观察了偏振分光膜损伤的形貌,从损伤机理出发,研究了清洗对偏振分光膜损伤阈值的影响。结果表明:清洗能有效去除表面杂质,清洗质量越好,基板上的杂质尺寸越小,杂质密度也越小,相应的偏振分光膜S光的损伤阈值越高;清洗能有效去除基板表面的纳米吸收中心,吸收性杂质分布密度越小,吸收峰越低,P光的损伤阈值越高。     

碳纤维复合材料的激光清洗等离子体光谱在线检测研究

近年来碳纤维复合材料（CFRP）由于性能优异,受到工业领域广泛关注。采用激光清洗技术预处理碳纤维复合材料表面的污染物和环氧树脂等杂质,有利于改善碳纤维复合材料表面性能,提高碳纤维复合材料胶接界面的结合强度。在线检测激光清洗过程,实时判断碳纤维复合材料的表面清洗质量,是保证激光清洗效果的关键环节,也是激光清洗装置自动化、集成化的核心技术。激光诱导等离子体光谱技术可以快速分析材料表面元素变化,实现在线检测激光清洗表面状态,在激光清洗领域有很广的应用前景。采用Nd∶YAG高能量脉冲激光器产生的1 064 nm激光在空气环境中诱导产生等离子体,利用改进型光栅光谱仪(ME5000)获取等离子体光谱,在线检测激光清洗碳纤维复合材料。研究外界空气环境对等离子体光谱检测结果的影响,发现350~700 nm波段的元素谱线可用于碳纤维复合材料表面物质成分分析;采用电子扫描显微镜观测的激光清洗表面形貌和X射线电子能谱仪测得的元素变化共同表征等离子体光谱检测的有效性,通过采集不同激光能量以及不同作用次数的等离子体光谱图,获得碳纤维复合材料表层树脂物质通过激光单次清洗干净的阈值,研究激光清洗质量与激光诱导等离子体谱线成分及其强度变化的关系。结果表明：在获取的激光诱导等离子体光谱中,光谱图中谱线波长在393.3 nm的S(Ⅱ)和589.5 nm的S(Ⅱ)谱线可有效在线表征碳纤维复合材料表面清洗质量;激光单次去除干净表面环氧树脂的阈值为10.68 mJ;低激光能量时需要清洗多次可以去除干净表面树脂;高激光能量时清洗单次可使表面树脂去除干净,多次清洗易造成基体损伤。实验结果为激光清洗碳纤维复合材料的智能集成化应用提供工艺依据和技术支持。     

光学元件超声清洗工艺研究

系统开展了光学元件超声清洗工艺的实验研究。通过研究超声清洗剂、清洗温度等工艺参数的优化,找到了能够有效祛除元件表面无机污染物和有机污染物的较佳超声清洗工艺,且超声清洗没有对光学元件表面产生损伤,清洗后的光学元件接触角小于6,并不残留大于1 m的颗粒,超声清洗对光学元件表面污染物的祛除能力远胜于手工清洗。     

Chemical Analysis of Patterned Mask Cleaning in Organic Light Emitting Diode Fabrication with Raman Spectroscopy

Abstract

Despite the continually improving efficiency of the fabrication process used to manufacture the organic light emitting diode (OLED) emitter layer, which uses a shadow mask, a method for the cleaning and recycling of the shadow mask is still lacking. One of the main reasons for this is the absence of a quantitative/qualitative method to analyze the cleaning solution using simple in situ measurements. Recently, Raman analysis has become popular because of its convenience, ease of use, and suitability for in situ measurements. Thus, Raman spectroscopy has the capacity to analyze the solution used for cleaning shadow masks. A particular advantage of this approach is that it can detect organic contaminants in the cleaning solution, which are caused by the residue that remains on the shadow mask after the OLED emitter layer fabrication process. Raman spectroscopy has an advantage for analyzing solution condition and contaminant detection between the cleaning solution and organic chemical by using the Raman peak and fluorescence integration method.     

Ultrasonically improved galvanochemical technology for the remediation of industrial wastewater

Two general methodologies adopted for the decontamination of industrial wastewater containing oil and metal ions are flocculation and coagulation. Both methods require the addition of chemicals and in the case of electrocoagulation the additional use of electrical power. Another methodology that was developed in Russia some years ago involves the production of Fe₂O₃ particles as coagulants by a galvanochemical reaction between iron and coke. Both of these materials are inexpensive and generally available in bulk. Ultrasonic processing of the particles generated in this reaction reduces the particle size of the Fe₂O₃ particles and provides surface cleaning making them more effective. Trials have proved their efficiency for the decontamination of wastewater made up in a laboratory and real wastewater from a carriage cleaning station on the St. Petersburg Metro. A mathematical model for the process has been developed.     

Observations of water cavitation intensity under practical ultrasonic cleaning conditions

In the industrial cleaning processes either organic solvents or water solutions are used as the cleaning media. The primary causative factor of ultrasonic cleaning is cavitation. Below are presented results of investigations into the influence of temperature, gas content and the solution level in an ultrasonic cleaner on cavitation intensity in the tap water. Previous investigations have revealed a great deal of information on the influence of the above factors on the cavitation intensity and these are confirmed. It has now been found that the tap water reaches the highest cavitation intensity at temperatures below 20 degrees C but during heating at higher temperatures (20-40 degrees C) a second peak of cavitation intensity may appear-depending on the height of water in the bath and air content.     

Ultrasounds: an industrial solution to optimise costs, environmental requests and quality for textile finishing

Ultrasounds are widely used at industrial scale for cleaning of mechanical pieces for example. Potential applications exist for finishing of textiles. This work aimed to improve traditional textile finishing processes thanks to ultrasound. The technical objective was to develop specific applicators of ultrasonic energy which could be adapted on jigger, a widespread textile finishing machine. Laboratory studies have allowed to define the conditions for application of ultrasounds and check their effects on fibre structure, validated by trials in dynamic conditions. Ultrasound technology makes it possible to intensify the phenomena of diffusion and washing by the effect of cavitation and improves effectiveness of traditional washing treatments. Industrial ultrasound processes need further optimisation on industrial machines.     

Acoustic emission monitoring during laser shock cleaning of silicon wafers

A laser shock cleaning is a new dry cleaning methodology for the effective removal of submicron sized particles from solid surfaces. This technique uses a plasma shock wave produced by laser-induced air breakdown, which has applied to remove nano-scale silica particles from silicon wafer surfaces in this work. In order to characterize the laser shock cleaning process, acoustic waves generated during the shock process are measured in real time by a wide-band microphone and analyzed in the change of process parameters such as laser power density and gas species. It was found that the acoustic intensity is closely correlated with the shock wave intensity. From acoustic analysis, it is seen that acoustic intensity became stronger as incident laser power density increased. In addition, Ar gas has been found to be more effective to enhance the acoustic intensity, which allows higher cleaning performance compared with air or N₂ gas.     

Optoacoustic analysis of the laser-cleaning process

Laser cleaning is an optodynamic process in which the optically induced removal of a liquid or a solid contaminant from a substrate is accompanied by a optoacoustic wave in the surrounding air. In our experiments we used both dry and steam laser-cleaning techniques for various samples. Optoacoustic wave, produced by the abrupt heating and detachment of the contaminants, was observed with a probe-beam deflection technique. We determined two characteristic parameters of the optoacoustic wave: the amplitude and the time-of-flight of the acoustic signal. With an analysis of these waves we also determined possible generating mechanisms. The decrease of the amplitude and the velocity of propagation, which approaches sonic speed, of the consecutive waves indicate that the dynamics during the laser-cleaning process is progressively weakened. The cleaning process is over when both the parameters reach a constant value, so with measuring optoacoustic waves the progress of the cleaning process could be observed on-line.     

石英基片精密干冰清洗效果的红外光谱差示法

使用红外透过差示光谱法,对低羟基石英基片上的有机物吸收峰进行了定量测量表征。从理论上研究了该方法的可行性和特点,并初步检验了该方法的灵敏度。利用这种手段采集了大量真空精密干冰清洗石英基片的数据,统计发现这些数据能够体现一定的规律性:干冰清洗有机物的效果与原始污染状况紧密联系,某一时刻污染物越多,清洗效率越高;无机物或大颗粒的混入会降低有机物清洗效率;表面形态也能够影响清洗效率。这些成果证明了该定量表征方法的正确性和实用性。实验过程和所得结论表明,将清洗初始状态控制在相对一致的状态下,是精密干冰清洗定量研究和工程化参数优化的一个重要因素。     

In situ oxygen plasma cleaning of a PECVD source for hard disk overcoats

Reducing the thickness of the diamond-like carbon protective overcoat to a thickness of about 2–3 nm is one major key to increase the recording density of magnetic disk drives. Plasma-enhanced chemical vapor deposition (PECVD) deposited carbon layers have been shown to be denser and harder than those produced by conventional sputter deposition. One key problem of PECVD deposited carbon is the contamination of the carbon film by particles produced inside the carbon source after long-time operation. This particle production limits the runtime of the source drastically. To avoid this particle generation the source was cleaned by an intermittent in situ oxygen plasma process. The cleaning efficiency was investigated by recording the pressure change inside the source during the cleaning process caused by the CO production. The ratio of the cleaning time and the deposition time shows no significant dependence on the deposition time. An almost linear increase of the ratio with the acetylene flow was observed. This results from a higher deposition rate at higher acetylene flow, leading to a higher contamination inside the source. A strong dependence of the cleaning rate on the oxygen flow in the cleaning process was measured. More oxygen leads to a strong decrease of the needed cleaning time. Adding Ar gas to the oxygen discharge shows no improvement of the needed cleaning time. The cleaning process seems to be dependent only on the amount of reactive oxygen species in the discharge . PACS 62.20.Qp; 52.50.Dg; 52.77.Bm; 52.80.Pi     

Characterization of laser cleaning of limestone

The precise and controlled cleaning of polluted limestone sculpture by a Q-switched Nd:YAG laser is described. Acoustic monitoring of the cleaning process is used to demonstrate the selective removal of black crusts from stone surfaces. Results are also presented which show that by applying a thin layer of water to the surface of the crust prior to irradiation, cleaning can be achieved at a lower energy than with normal laser cleaning. The probability of damage to the underlying stone is, therefore, reduced.     

Removal of graffiti from the mortar by using Q-switched Nd:YAG laser

This paper presents part of the larger study on microstructural features of mortars and it's effects on laser cleaning process. It focuses on the influence of surface roughness, porosity and moisture content of mortars on the removal of graffiti by Nd:YAG laser. The properties of this laser are as follows: wavelength (λ) 1.06 μm, energy: 500 mJ per pulse, pulse duration: 10 ns. The investigation shows that the variation of laser fluence with the number of pulses required for the laser cleaning can be divided into two zones, namely effective zone and ineffective zone. There is a linear relationship observed between number of pulses required for laser cleaning and the laser fluence in the effective zone, while the number of pulses required for the laser cleaning is almost constant even though the laser fluence increases in the ineffective zone. Moreover, surface roughness, porosity and moisture content of mortar samples have influence on the laser cleaning process. The effect of these parameters become however negligible at the high level of laser fluence. The number of pulses required for the laser cleaning is low for smooth surface or less porous mortar. Furthermore, the wetness of the samples facilitates the cleaning process.     

一种手持便携式核磁共振样品管高压清洗器的设计与实现

在液体核磁共振（NMR）实验使用的耗材中，NMR样品管用量非常大，通常需经清洗后回收利用.NMR样品管的清洗效率及清洗后的洁净程度直接影响到NMR实验的进程，清洗过程中产生的废液也将对环境产生影响.本文首先介绍了一款自主设计的手持便携式NMR样品管高压清洗器，并对该装置的结构和功能做了详细的说明.然后，对曾装存过不同溶剂和溶液的NMR样品管，分别利用该装置和商用NMR样品管清洗装置进行清洗，并比较了清洗效率和效果.最后，对利用此高压清洗器清洗NMR样品管时，NMR样品管的损伤程度进行了评估.结果证实，对于没有样品严重附着管壁的NMR样品管，本文设计的装置清洗效果良好、效率高；并且清洗过程中不使用有毒的有机溶剂，非常环保；而且对NMR样品管损伤较小.