镝掺杂锆钛酸铅镧透明陶瓷的结构和电光性能

针对锆钛酸铅镧(PLZT)电光陶瓷在光调制器应用中存在工作电压偏高、场致滞后明显等不足,以镧系镝(Dy)元素对锆钛酸铅镧(Pb0.88La0.12)(Zr0.4Ti0.6)0.96O3 [PLZT(12/40/60)]线性电光材料进行掺杂改性.采用热压技术研制镝掺杂锆钛酸铅镧[Pb0.88(La1-xDyx)0.12](Zr0.40Ti0.60)0.96O3](PLDZT)(x=0.1～0.5)透明电光陶瓷.系统考察了PLDZT透明陶瓷的光学性能和电光特性及其与材料结构的相关性.研究表明,Dy掺杂导致材料晶格畸变,微量Dy掺杂有效提高了 PLZT(12/40/60)透明陶瓷的光学透过率,并且使典型的线性电光材料呈现二次电光效应特征,二次电光系数R约为5.59×10-15m2/V2;同时掺杂改性的PLDZT(x=0.1)透明陶瓷的驱动电压较未改性PLZT材料明显降低.     

纳米Ce_(1-x)(Fe_(0.5)La_(0.5)x)O_(2-δ)固溶体的水热合成及光谱分析

采用水热方法合成Ce1-x(Fe0.5La0.5)xO2-δ固溶体。利用X射线衍射技术(X-ray diffraction tech-nique,XRD)表征样品的相结构,并对固溶体的晶胞参数进行拟合,通过紫外可见漫反射光谱(UV-Vis dif-fraction spectrum)及拉曼光谱(Raman spectrum)表征其电子跃迁性能及由于双离子掺杂所引起的一系列掺杂效应。XRD结果表明,Ce1-x(Fe0.5La0.5)xO2-δ固溶体为CeO2立方萤石结构,当掺杂量增加到x=0.30时出现了微弱的Fe2O3杂相衍射峰;讨论了两种离子在晶格中不同的取代位置。晶胞参数随着掺杂量的增大而逐渐增大,当掺杂量达到x=0.18后保持基本不变。紫外漫反射光谱表明,随着掺杂量的增大,固溶体的带隙吸收边红移,即能隙逐渐减小,Fe离子在CeO2晶格中表现为+3价。Raman光谱F2g振动峰位逐渐向低波数方向移动,同时振动峰逐渐宽化,进一步证明了掺杂离子的影响效应。     

沉积工艺条件对金刚石薄膜红外椭偏光学性质的影响

采用红外椭圆偏振光谱仪对不同工艺条件下制备的CVD金刚石薄膜在红外波长范围内的光学参量进行了测量，分析了工艺条件对金刚石薄膜红外光学性质的影响.获得了最佳的沉积工艺参数，优化了薄膜的制备工艺.结果表明薄膜的折射率和消光系数与薄膜质量密切相关，当温度为750℃，碳源浓度为0.9%和压强为4.0 kPa时，金刚石薄膜的红外椭偏光学性质最佳，折射率平均值为2.385，消光系数在10^-4范围内，在红外波段具有良好的透过性. 关键词： 薄膜光学 红外光学性质 工艺条件 金刚石薄膜     

酞菁氯镓复合凝胶玻璃的谱学性能研究

采用溶胶-凝胶(Sol-Gel)湿化学工艺将酞菁氯镓(GaPcCl)掺入二氧化硅(SiO₂)凝胶玻璃基质,制备出均匀掺杂的GaPcCl复合凝胶玻璃,并对复合体系的红外光谱(IR)、紫外-可见吸收光谱(UV-Vis)及荧光光谱等谱学性能进行了测试。结果表明：GaPcCl的掺杂对凝胶玻璃基质的红外光谱没有产生显著影响;掺杂GaPcCl在复合体系中二聚体吸收峰的强度较其DMF溶液有所增大;掺杂GaPcCl在复合体系中荧光强度随浓度的增加远大于DMF溶液。     

硅掺杂辉光放电聚合物薄膜的热稳定性研究

采用等离子体辉光放电聚合技术,在不同四甲基硅烷(TMS)流量条件下制备了硅掺杂辉光放电聚合物(Si-GDP)薄膜,采用傅里叶变换红外光谱、X射线光电子能谱和热重(TG)分析技术分析了不同TMS流量对Si-GDP薄膜结构与热稳定性的影响.结果表明:随着TMS流量在0–0.06 cm³/min范围变化,Si-GDP薄膜中Si的原子含量C_Si为0–16.62%;含Si红外吸收峰的相对强度随TMS流量的增加而明显增大;Si-GDP薄膜的TG分析显示,温度在300 ℃时,随TMS流量的增加,Si-GDP薄膜的失重减少,热稳定性增强. 关键词： 硅掺杂辉光放电聚合物薄膜 X射线光电子能谱 热稳定性     

化学溶液法制备的Bi3.25La0.75Ti3O12和Bi3.25Nd0.75Ti3O12薄膜的光学特性

采用化学溶液方法在(111)Pt／Ti/SiO2/Si衬底上制备了Bi3.25La0.75Ti3O12(BLT)和Bi3.25Nd0.75Ti3O12(BNT)薄膜．x射线衍射测试表明，两种薄膜都为单一的层状钙钛矿结构．扫描电子显微镜分析显示，BNT薄膜由大而均匀的棒状晶粒组成，BLT薄膜的组成晶粒则较小．采用紫外一近红外椭圆偏振光谱仪测试了200-100nm波长范围的椭圆偏振光谱，拟合得到薄膜的光学常数(折射率和消光系数)和厚度，确定BLT薄膜的禁带宽度分别为4．30和3．61eV，并采用单电子振子模型分析了薄膜在带间跃迁区的折射率色散关系．     

纳米TiO_2∶Zn薄膜电极紫外光电特性研究

采用sol-gel法制备了Zn2 掺杂的锐钛矿相纳米TiO2薄膜电极.通过光电流作用谱和电流-电位(I-U)曲线研究了掺杂不同浓度Zn2 的TiO2薄膜电极的光电特性.由光电流作用谱可知,Zn2 的掺杂可显著影响薄膜电极的光电流大小,且掺杂的最佳浓度与薄膜晶粒尺度有关.在320nm单色光照射下,掺杂浓度(摩尔浓度)为0.1%的薄膜电极光电流最大,与未掺杂的本征薄膜电极相比增幅达40%.I-U曲线表明,光照下,随电极电位由正到负逐渐降低,不同掺杂浓度的TiO2薄膜电极中均出现了阳极电流向阴极电流转换的现象,且Zn2 掺杂浓度可影响电极阳极电流的初始电位.另外,无光照的暗态下,各薄膜在负电位区域观察到了相似的随电位降低而迅速增大的阴极暗电流.     

含氮氟化类金刚石(FN-DLC)薄膜的研究：(Ⅳ)氮掺杂对薄膜结构的影响

不同条件下，在单晶硅基片上沉积了含氮氟化类金刚石(FN-DLC)薄膜.原子力显微(AFM)形貌显示，掺N后，薄膜变得致密均匀.傅里叶变换吸收红外光谱(FTIR)表明，随着r(r=N₂/［N₂+CF₄+CH₄］)的增大薄膜中C—H键的逐渐减少，C〖FY=,1〗N和C≡N键含量逐渐增加.X射线光电子能谱(XPS)的C1s和N1s峰拟合结果发现，N掺入导致在薄膜中出现β-C₃N₄和a-CN_x(x=1,2,3)成分.Roman散射谱的G峰向高频方向位移和峰值展宽等证明：随着r的增大，薄膜内sp²键态含量增加. 关键词： 氟化类金刚石膜 键结构 氮掺杂     

溶胶-凝胶法制备Ni_xZn_(1-x)S薄膜的磁性分析

由于离子掺杂可有效改善ZnS薄膜的特性,故本研究以溶胶-凝胶法制备Ni_xZn_(1-x)S薄膜(x=0.00, 0.05, 0.10, 0.15),并利用XRD、PL光谱及磁性测试仪分析Ni掺杂对其磁性的影响.研究结果表明Ni掺杂量x为0.00、0.05、0.10及0.15时薄膜的饱和磁化强度随分别为6.59×10~(-6) emu/cm~3、4.61×10~(-6) emu/cm~3、3.88×10~(-6) emu/cm~3及3.52×10~(-6) emu/cm~3,即饱和磁化强度随x增加而减小. PL分析表明缺陷发光强度随x增加而减弱,能隙发光强度则随之增强,结合束缚极化子理论便知饱和磁化强度会随x增加而减小. XRD分析表示结晶品质随x增加而变好,说明薄膜中的缺陷数量会随x增加而减少,使得磁信号无法通过缺陷方式传导而导致其磁性减弱.     

溶胶-凝胶法制备Ni_xZn_(1-x)S薄膜的磁性分析

由于离子掺杂可有效改善ZnS薄膜的特性,故本研究以溶胶-凝胶法制备Ni_xZn_(1-x)S薄膜(x=0.00,0.05,0.10,0.15),并利用XRD、PL光谱及磁性测试仪分析Ni掺杂对其磁性的影响.研究结果表明Ni掺杂量x为0.00、0.05、0.10及0.15时薄膜的饱和磁化强度随分别为6.59×10~(-6)emu/cm~3、4.61×10~(-6)emu/cm~3、3.88×10~(-6)emu/cm~3及3.52×10~(-6)emu/cm~3,即饱和磁化强度随x增加而减小.PL分析表明缺陷发光强度随x增加而减弱,能隙发光强度则随之增强,结合束缚极化子理论便知饱和磁化强度会随x增加而减小.XRD分析表示结晶品质随x增加而变好,说明薄膜中的缺陷数量会随x增加而减少,使得磁信号无法通过缺陷方式传导而导致其磁性减弱.     

Infrared spectroscopic ellipsometry of (Pb, La)(Zr, Ti)O3 thin films on platinized silicon

Lead lanthanum zirconate titanate (PLZT) thin films with different La concentrations (x), whose composition is x/40/60, have been grown directly on Pt/Ti/SiO₂/Si (100) substrates by a modified sol-gel method. X-ray diffraction analysis shows that the PLZT thin films are polycrystalline. The infrared optical properties of the PLZT thin films have been investigated using the infrared spectroscopic ellipsometry in the spectral range of 2.5–12.5 μm. By fitting the measured ellipsometric spectra (Ψ and Δ) with a three-phase model (air/PLZT/Pt), and a derived classical dispersion relation for the thin films, the optical constants and thicknesses of the thin films have been obtained. The refractive index of the PLZT thin films decreases with increasing La concentrations, however, the extinction coefficient increases with increasing La concentrations except for the PLZT(4/40/60) thin films. The values of the effective static charge calculated for the PLZT thin films, which state that PLZT belongs to a mixed ionic-covalent compound, decrease with increasing La concentrations. Moreover, the refractive index at the wavelength of 2.5 μm changes linearly with the effective static charge. The plot of the calculated infrared optical absorption versus wavelength for the Ni/PLZT/Pt multilayer structures with various La concentrations is given and indicates that the PLZT thin films are excellent candidates for ferroelectric infrared detectors and focal plane arrays.     

Spectroscopic ellipsometry investigations of PLT ferroelectric thin films with various La concentrations in the mid-infrared spectral region

(Pb_1-xLa_x)Ti_1-x/4O₃ (PLT) ferroelectric thin films with various La concentrations have been grown on LaNiO₃/Si(100) substrates by a modified sol-gel technique. X-ray-diffraction analyses show that the PLT and LaNiO₃ thin films are polycrystalline and entirely perovskite phase. The infrared optical properties of the PLT thin films have been investigated using infrared spectroscopic ellipsometry in the wavelength range of 2.5–12.5 m. By fitting the measured ellipsometric parameter (cos and cos) data with a four-phase model (air/PLT/LaNiO₃/Si), and a derived dispersion relation for the PLT thin films, the optical constants and thicknesses of the thin films have been determined. The refractive index of the PLT thin films decreases with increasing wavelength; however, by a Kramers–Kronig analysis the extinction coefficient increases with increasing wavelength. Moreover, the refractive index and extinction coefficient of the PLT thin films increase with increasing La concentration. This indicates that the infrared optical constants of the PLT thin films are a function of the La concentration. It is believed that the increase in the infrared optical constants of the PLT thin films with increasing La concentration is mainly due to the crystallinity and the electronic band structure of the PLT thin films. PACS 77.55.+f; 78.66.-w; 78.30.Am; 81.70.Fy     

Structure-related infrared optical properties of BaTiO3 thin films grown on Pt/Ti/SiO2/Si substrates

BaTiO₃ thin films with different thickness have been grown on Pt/Ti/SiO₂/Si substrates by a modified sol-gel method. X-ray diffraction analyses show that the BaTiO₃ thin films are polycrystalline. The crystalline quality of the films is improved with increasing thickness. The infrared optical properties of the BaTiO₃ thin films have been investigated using an infrared spectroscopic ellipsometry in the wave number range of 800-4000 cm⁻¹ (2.5-12.5 μm). By fitting the measured pseudodielectric functions with a three-phase model (Air/BaTiO₃/Pt), and a derived classical dispersion relation for the thin films, the optical constants and thicknesses of the thin films have been simultaneously obtained. The refractive index of the BaTiO₃ thin films increases and on the other hand, the extinction coefficient does not change with increasing thickness in the entirely measured wave number range. The dependence of the refractive index on the film thickness has been discussed in detail and was mainly due to both the crystalline quality of the films and packing density. Finally, the absorption coefficient was calculated in the infrared region for applications in the pyroelectric IR detectors.     

Epitaxial growth of ferroelectric PLZT thin film and their optical properties

A series of experiments for growing epitaxial PLZT thin films has been made with rf sputtering. X-ray and electron diffraction analyses confirm that the fabricated films grow epitaxially on SrTiO₃ and MgO crystals. A good transparency in the region above 0.4 μm to infrared with good ferroelectric properties is obtained. Propagation loss of He−Ne laser light is less than 6 dB/cm, and the PLZT thin film is a promising candidate for the optical modulator and other functional elements for integrated optics.     

Large nonlinear optical response of polycrystalline Bi3.25La0.75Ti3O12 ferroelectric thin films on quartz substrates

We measure the nonlinear susceptibility of Bi(3.25)La(0.75)Ti(3)O(12) (BLT) thin films grown on quartz substrates using the Z-scan technique with picosecond laser pulses at a wavelength of 532 nm. The third-order nonlinear refractive index coefficient gamma and absorption coefficient beta of the BLT thin film are 3.1 x 10(-10) cm(2)/W and 3 x 10(-5) cm/W, respectively, which are much larger than those of most ferroelectric films. The results show that the BLT thin films on quartz substrates are good candidate materials for applications in nonlinear optical devices.     

Determination of optical properties in nanostructured thin films using the Swanepoel method

We present the methodological framework of the Swanepoel method for the spectrophotometric determination of optical properties in thin films using transmittance data. As an illustrative case study, we determined the refractive index, thickness, absorption index, and extinction coefficient of a nanostructured 3 mol% Y₂O₃-doped ZrO₂ (yttria stabilized zirconia, 3YSZ) thin film prepared by the sol-gel method and deposited by dipping onto a soda-lime glass substrate. In addition, using the absorption index obtained with the Swanepoel method, we calculated the optical band gap of the film. The refractive index was found to increase, then decrease, and finally stabilize with increasing wavelength of the radiation, while the absorption index and extinction coefficient decreased monotonically to zero. These trends are explained in terms of the location of the absorption bands. We also deduced that this 3YSZ thin film has a direct optical band gap of 4.6 eV. All these results compared well with those given in the literature for similar thin films. This suggests that the Swanepoel method has an important role to play in the optical characterization of ceramic thin films.     

Infrared Optical Characterization of PLT Thin Films for Applications in Uncooled Infrared Detectors

Lanthanum-modified lead titanate (PLT) thin films have been grown directly on Pt/Ti/SiO₂/Si (100) and LaNiO₃/Si (100) substrates by a modified sol-gel method. X-ray diffraction analysis shows that the PLT thin films are polycrystalline. The infrared optical properties of the thin films were investigated using infrared spectroscopic ellipsometry (IRSE) in the spectral range of 2.5–12.5 m. By fitting the measured ellipsometric parameter (tan and cos) data with a three phase model (air/PLT/Pt) for the PLT thin films on Pt/Ti/SiO₂/Si (100) and a four phase model (air/PLT/LNO/Si) for the PLT thin films on LaNiO₃/Si (100) substrates, and a derived classical dispersion relation for the thin films, the optical constants and thicknesses of the thin films have been simultaneously obtained. The refractive index and extinction coefficient of the PLT thin films on Pt/Ti/SiO₂/Si (100) substrates are slightly larger than those on LaNiO₃/Si (100) substrates. Given the infrared semitransparent metal of Nickel currently used, the absorption of the Ni/PLT/Pt and Ni/PLT/LNO/Si multilayer thin films in this study is very large around 3.0 m and 5.7 m wavelength range and decrease to 15% or 20% in the 8–12.5 m wavelength region.     

Characterization of evaporated selenide semiconductor alloy on p-type substrates

The properties of chalcogenides that are most important for applications as infrared transmitting materials are reported and their mutual relationships are given. Si₅Se₈₀In₁₅ films were produced by means of thermal evaporation. The refractive index and the optical energy gap were determined by transmission measurements. Parameters considered in this study are density, molar volume, transition temperatures, electrical properties, infrared transmission, extinction coefficient and refractive index. This composition has no extrinsic and intrinsic absorption between 14 and 20 μm and the value of absorption coefficient is estimated lower than 10⁻³ cm⁻¹ at 10.6 μm. This glass is also suitable for infrared optical elements. A p-n junction is observed due to evaporated thin film of alloy on p-type Ge substrate.     

Ferroelectric SrxBa1-xNb2O6 optical waveguiding thin films on SiO2-coated Si(100) substrates

x Ba_1-xNb₂O₆ (x=0.5) films (abbreviated as SBN:0.5) on SiO₂-coated Si substrates are potential components for the application of integrated electro-optics devices. SBN:0.5 optical waveguiding thin films on SiO₂-coated Si substrates with a very thin MgO diffusion buffer have been successfully prepared by pulsed laser deposition. The as-grown films have a refractive index of 2.28, which is close to that of bulk SBN. X-ray analysis showed that the as-grown films have a single-phase tetragonal tungsten bronze structure. The SBN:0.5 thin films prepared by PLD exhibit favorable ferroelectric and optical waveguiding properties. The composition and the morphology of the films were also examined by XPS and by SEM, respectively. Ferroelectric SBN:0.5 optical waveguiding thin films on SiO₂-coated Si substrates are expected to be used in integrated electro-optic devices. Received: 27 February 1997/Accepted: 17 October 1997