KDP晶体本征中性点缺陷的第一性研究

 用第一性原理研究了KH2PO4(KDP)晶体中性本征点缺陷的形成能并计算了常温下点缺陷的浓度。计算得到中性填隙氢原子的形成能为2.05 eV，进而得到298 K下的浓度约为1.21×10^-17 mol/L。由于填隙氢原子在带隙中形成缺陷能级，并使能隙降低了2.6 eV, 因此消除填隙氢原子有利于提高晶体在355 nm附近的激光损伤阈值。计算得到的氧间隙、氧空位、钾空位和氢空位的形成能分别为0.60、5.25、6.50 和6.58 eV，常温下它们在晶体中也以较高的浓度存在。钾空位使晶胞体积增大约3.2%，并可能提高晶体电导率，从而降低光损伤阈值。P取代K的反位结构缺陷形成能尽管较低(4.1 eV), 但由于晶体生长溶液中P是以PO4四面体的形式存在，故此点缺陷的存在几率很小。     

KDP晶体中点缺陷Na取代K的电子结构研究

 对磷酸二氢钾(KDP)晶体中Na取代K点缺陷的几何结构及电子结构进行了第一性研究。计算的形成能约为0.46 eV，因此在KDP晶体中此类缺陷比较容易形成。Na取代K以后没有在带隙中形成缺陷态，但在价带中引入两个占据态。它们分别位于费米面以下49 eV和21.5 eV处，这两个占据态分别由Na原子的s和p轨道形成。相对于K来说，由于它们位于价带深处，具有很低的能量，因此Na在KDP中比K稳定。Na在KDP晶体中与周围氧原子的重叠布居仅为0.09, 故它不与主体原子发生共价作用，仅以静电库仑力影响周围原子，此缺陷周围晶格仅发生微小畸变。     

硫酸盐对KDP晶体质量的影响

 利用“点籽晶”快速生长技术生长了掺杂硫酸钾（K₂SO₄）的磷酸二氢钾（KDP）晶体，并对硫酸根类杂质离子对晶体的结构及光学质量的影响进行了研究。结果表明：在掺杂相对含量为50×10^-6条件下，K₂SO₄开始对KDP晶体产生一定影响，主要表现在不同扇形区域的结构略有改变，其原因主要在于硫酸根与KDP晶体各扇形结构有关；杂质粒子对晶体透过率、单轴性没有明显影响，但是热膨胀系数增大，光损伤阈值略有降低。     

α-Al2O3(0001)表面原子缺陷对ZnO吸附影响

采用基于密度泛函理论的分子动力学方法，对α-Al₂O₃(0001)表面 Al，O原子空位缺陷及其对ZnO吸附进行了理论计算.电子局域函数显示了表面空位处的电子密度变化，表面Al原子空缺处有非常明显的缺电子区域，悬挂键临近O的电子密度增大，有利于对Zn的吸附；O原子空缺处的Al原子处存在孤立电子，其ELF值为005—03，将有利于同电负性较大的O或O^2-结合.通过吸附动力学模拟与体系能量的计算发现，表面缺陷显著增强了表面 的化学吸附，空缺原子处都被吸附原子填补，吸附结合能远大于单晶表面的情况.在Al空缺的表面，由于ZnO的O与表面O形成双键，破坏了α-Al₂O₃(0001)表面O六 角对称结构，减小了 O的表面扩散，从而不利于规则的ZnO薄膜生长.相反，O的空缺表面，弥补了α-Al_{2O3(0001)表面O空位缺陷，不影响基片表面O六角对称结构.}     

CO和O2分子与TiO2(110)表面负载Pt单原子的相互作用

Pt单原子在低温CO氧化反应中具有很高的催化活性. 利用扫描隧道显微术与密度泛函理论，研究了Pt单原子在还原性TiO₂(110)表面的吸附行为及其与CO和O₂分子的相互作用. 研究发现在80 K低温下，TiO₂表面的氧空位缺陷是Pt单原子的最优吸附位. 将CO和O₂分子分别通入Pt单原子吸附后的TiO₂表面，研究相应的吸附构型. 实验表明在低覆盖度下，单个Pt原子会俘获一个CO分子，CO分子同时与表面次近邻的五配位Ti原子(Ti_5c)成键，进而形成非对称的Pt-CO 复合物构型. 将样品从80 K升温到100 K后，TiO₂表面的CO分子会迁移到Pt-CO处形成Pt-(CO)₂的复合结构. 对于O₂分子，单个Pt原子同样会吸附一个O₂分子，O₂分子也会与最近邻或次近邻的Ti_5c原子成键形成两种Pt-O₂构型. 这些结果在单分子尺度上揭示了CO和O₂与Pt单原子的相互作用，呈现了CO与O₂反应中的初始状态.     

PbWO4晶体中的填隙氧及其对晶体光学性质的影响

运用GULP计算软件模拟计算了PbWO₄(PWO)晶体中不同位置的填隙氧原子点缺陷的生成能，计算结果表明：当填隙氧原子存在于(WO₄)^2-的周围时，填隙氧原子点缺陷的生成能最低；进一步运用基于密度泛函理论的全数值自洽DV-Xα方法计算了包含填隙氧原子的PWO晶体的态密度，计算结果表明：当填隙氧处在(WO₄)^2-的周围时，容易与(WO₄)^2-上的一个或两个氧离子相互作用形成分子离子O₂^2-或O₃^4-，通过分析这些计算结果，认为PWO晶体中350 nm吸收带的出现很可能与晶体中的氧分子离子有关.     

CdTe太阳电池中起因于Cu的深能级

在CdTe太阳电池中,易引入并形成Cu深能级中心. 本文采用深能级瞬态谱测试法研究了ZnTe背接触和石墨背接触CdTe太阳电池的部分深能级中心. 研究中运用密度泛函相关理论,分析闪锌矿结构CdTe,Cd空位体系和掺Cu体系的电子态密度,计算得出T_d场和C_3v场下Cu²⁺ d轨道的分裂情况. 计算结果表明,CdTe太阳电池中的E_v+0206 eV和E_v+0122 eV两个深中心来源于Cu替代Cd原子. 计算结果还表明,掺入Cu可降低CdTe体系能量.     

金红石相和锐钛矿相TiO2本征缺陷的第一性原理计算

采用第一性原理的计算方法, 分别研究了金红石相和锐钛矿相TiO₂各种缺陷态形成的类型, 以及几何结构、生长气氛和Fermi能级位置对缺陷形成能的影响, 从理论上预测产生点缺陷的实验条件. 重点是讨论带电点缺陷的形成能, 并对结果进行适当修正. 研究发现, 本征缺陷的类型和浓度对 TiO₂的性能有一定的影响: 在富O条件下, TiO₂容易形成V_Ti(Ti空位)缺陷; 在富Ti条件下, TiO₂的Ti_i⁴⁺和V_O(O空位)缺陷将大量出现, 形成Schottky缺陷.     

MgH2(110)表面Pd单原子催化氢脱附反应的第一性原理研究

本文采用第一性原理密度泛函理论计算研究了MgH₂(110)表面吸附单原子Pd后的氢脱附反应. 计算发现,在吸附一个Pd单原子后,MgH₂(110)表面氢脱附反应的能垒可以从1.802 eV显著地降低到1.154 eV,表明Pd单原子对于氢脱附具有很强的催化效应. 并且,Pd单原子催化还可以将氢脱附的温度从573 K显著地降低到了367 K,从而使MgH₂(110)表面的氢脱附反应更加容易和快速地发生. 此外,通过MgH₂(110)表面氢溢出机制的反向过程来讨论了氢脱附反应的微观过程. 该研究表明Pd/MgH₂薄膜在未来的实验中可作为良好的储氢材料.     

质子对BaTiO3薄膜辐照损伤的计算机模拟

本文先应用分子动力学模拟BaTiO₃体系在初级击出原子(primary knock-on atom, PKA)轰击下缺陷产生和复合的动力学过程, 模拟结果表明：PKA的方向和能量对缺陷数目有重要影响, 并计算了Ba, O和Ti原子的平均位移阈能分别为69 eV, 51 eV和123 eV, 远大于SRIM程序默认的位移阈能25 eV. 然后应用蒙特卡罗软件包SRIM, 模拟质子在BaTiO₃薄膜中的能量损失过程, 比较位移阈能对模拟结果的影响, 分析质子能量和入射角度对空位数量以及分布的影响. 结果表明空位数量随着质子能量增加而增加, 增加的速率随能量的增加是降低的;当入射角度大于60°, 空位数量随入射角增大而明显减少.     

Formation energies and electronic structures of native point defects in potassium dihydrogen phosphate

The formation energies and the equilibrium concentration of vacancies,interstitial H,K,P,O and antisite structural defects with P and K in KH 2 PO 4 (KDP) crystals are investigated by ab initio total-energy calculations.The formation energy of interstitial H is calculated to be about 2.06 eV and we suggest that it may be the dominant defect in KDP crystal.The formation energy of an O vacancy (5.25 eV) is much higher than that of interstitial O (0.60 eV).Optical absorption centres can be induced by defects of O vacancies,interstitial O and interstitial H.We suggest that these defects may be responsible for the lowering of the damage threshold of the KDP.A K vacancy defect may increase the ionic conductivity and therefore the laser-induced damage threshold decreases.     

Effect of Ba in KDP crystal on the wavelength dependence of laser-induced damage

Ba impurity in potassium dihydrogen phosphate(KDP) is studied with the first-principle simulation method. The relaxed configurations and density of the states of KDP crystal with Ba impurity are calculated. We find that Ba can generate a K vacancy and an interstitial O-H unit for charge compensation. The band gap of KDP crystal narrowed down to about 3.9 eV,which is consistent with the experimental data from previously reported studies and indicates that Ba may be a source of low-damage threshold.     

Towards understanding the carbon trapping mechanism in copper by investigating the carbon-vacancy interaction

We propose a vacancy trapping mechanism for carbon-vacancy (C-V) complex formation in copper (Cu) according to the first-principles calculations of the energetics and kinetics of C-V interaction. Vacancy reduces charge density in its vicinity to induce C nucleation. A monovacancy is capable of trapping as many as four C atoms to form CnV (n=1,2,3,4) complexes. A single C atom prefers to interact with neighboring Cu at a vacancy with a trapping energy of 0.21 eV. With multiple C atoms added, they are preferred to bind with each other to form covalent-like bonds despite of the metallic Cu environment. For the CnV complexes, C2V is the major one due to its lowest average trapping energy (1.31 eV). Kinetically, the formation of the CnV complexes can be ascribed to the vacancy mechanism due to the lower activation energy barrier and the larger diffusion coefficient of vacancy than those of the interstitial C.     

Annealing of point defects in p-type germanium after electron irradiation at liquid nitrogen temperature

Annealing of radiation induced defects in p-type germanium was studied by measuring Hall coefficient and conductivity. The dopant was gallium or indium. It was concluded that the annealing stage between 80° and 140°K is caused by migration of the vacancy to the sink of an impurity atom. In this stage the vacancy migrates to a substitutional impurity atom and makes an association. The activation energy of the stage was found tO be 0.1 ev ad it is regarded to be that of the vacancy migration. The model for the annealing stage which occurs in the range 220 to 270°K is proposed as follows: An interstitial impurity atom migrates to a substitutional impurity atom and makes an association. From the activation energy of the stage, the migration energy of the interstitial impurity atom was concluded to be about 0.4 eV for gallium and 0.7 eV for indium atoms.     

Localized diffusion of helium atoms around indium impurities in aluminium observed by means of perturbed angular correlations

The behaviour of He atoms implanted in ¹¹¹In doped Al has been investigated by means of perturbed angular correlation (PAC) measurements. The onset of He mobility was found to be at about 250K, probably due to vacancy-assisted migration. Mobile helium is effectively trapped at In impurities in small vacancy clusters that accomodate at most 11 He atoms. The PAC spectra taken at temperatures from about 510 K to 670 K exhibit a relaxation effect that is ascribed to hopping of He atoms from one vacancy to another, the saddle-point energy for this localized diffusion being 0.67(5) eV. A tentative model of the cluster is given.     

Athermal migration of vacancies in iron and copper induced by electron irradiation

Abstract

Irradiation with high-energy particles induces athermal migration of point defects, which affects defect reactions at low temperatures where thermal migration is negligible. We conducted molecular dynamics simulations of vacancy migration in iron and copper driven by recoil energies under electron irradiation in a high-voltage electron microscope. Minimum kinetic energy required for migration was about 0.8 and 1.0 eV in iron and copper at 20 K, which was slightly higher than the activation energy for vacancy migration. Around the minimum energy, the migration succeeded only when a first nearest neighbour (1NN) atom received the kinetic energy towards the vacancy. The migration was induced by higher kinetic energies even with larger deflection angles. Above several electron-volts and a few 10s of electron-volts, vacancies migrated directly to 2NN and 3NN sites, respectively. Vacancy migration had complicated directional dependence at higher kinetic energies through multiple collisions and replacement of atoms. The probability of vacancy migration increased with the kinetic energy and remained around 0.3–0.5 jumps per recoil event for 20–100 eV. At higher temperatures, thermal energies slightly increased the probability for kinetic energies less than 1.5 eV. The cross section of vacancy migration was 3040 and 2940 barns for 1NN atoms in iron and copper under irradiation with 1.25 MV electrons at 20 K: the previous result was overestimated by about five times.     

Dependence of the activation energy of vacancy formation on the zinc content in alpha brasses

Observations on quenched-in resistivity in alpha brasses showed an apparent decrease in the activation energy of vacancy formation with increasing zinc content from a value of 0·85 eV for the analytically pure copper to 0·30 eV for the Cu-35% Zn alloy. This effect was attributed to the enhanced formation of zinc-vacancy pairs. A random distribution of zinc atoms in the lattice was noticed up to a concentration of 15% zinc content. Quenching was found to destroy the short-range ordering which appeared in annealed samples having higher zinc concentrations.     

低能原子沉积在Pt(111)表面的分子动力学模拟

采用嵌入原子方法的原子间相互作用势,利用分子动力学方法模拟了六种贵金属原子(Ni,Pd,Pt,Cu,Ag,Au)分别在Pt(111)表面低能沉积的动力学过程.结果表明:随着入射能量从0.1eV升高到200eV,基体表面原子是按层迁移的,沉积过程对基体表面的影响和沉积原子在基体表层的作用均存在两个转变能量(ET1≈5eV,ET2≈70eV).当入射能量低于5eV时,基体表面几乎没有吸附原子和空位形成,沉积原子在基体表层几乎没有注入产生;当入射能量在5—70eV范围内时,沉积原子在基体表层有注入产生,其注入深度小于两个原子层,即为亚注入,此时吸附原子主要由基体表层原子形成,基体表面第三层以下没有空位形成;当入射能量高于70eV时,沉积原子的注入深度大于两个原子层,将会导致表面以下第三层形成空位,并且空位产额随入射能量的升高而急剧增加.基于分子动力学模拟的结果,对低能沉积作用下的薄膜生长以及最优沉积参数的选择进行了讨论.