| 新型毫微秒强流脉冲电子束和离子束发生装置 |
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| 引用本文： | 江兴流,陈克凡,朴禹伯.新型毫微秒强流脉冲电子束和离子束发生装置[J].物理学报,1983,32(10):1344-1348. |
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| 作者姓名： | 江兴流 陈克凡 朴禹伯 |
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| 作者单位： | 兰州大学现代物理系 |
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| 摘 要： | 本文讨论一种新的低气压放电型粒子源,用这种装置可以产生能量达70keV,电流密度超过106A/cm2,电流为几百安培的脉冲电子流和安培级的脉冲离子流,作者建议用“电场递增效应”来解释这种多极板放电室的放电机制,由于它造价低、结构简单、重复频率高、寿命长,可以预期,这一装置将会得到广泛应用。
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| 收稿时间： | 1982-11-29 |
A NEW TYPE OF PULSED ELECTRON AND ION SOURCE WITH A DURATION OF NANOSECONDS |
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| JIANG XING-LIU,CHEN KE-FAN and PIAO YU-BO.A NEW TYPE OF PULSED ELECTRON AND ION SOURCE WITH A DURATION OF NANOSECONDS[J].Acta Physica Sinica,1983,32(10):1344-1348. |
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| Authors: | JIANG XING-LIU CHEN KE-FAN and PIAO YU-BO |
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| Abstract: | This paper describes a new type of electron and ion source under low gas pressure. Pulsed electron beams with a current density greater than 106A/cm2 with total current up to several hundred amperes and pulsed ion beams of the order of amperes were produced by this device. A model of the field escalation effect is proposed to explain the discharge mechanism in the multiplate chamber. It is expected that this device may have a lot of applications . |
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