PECVD分层结构对提高氢化非晶硅TFT迁移率的影响

为了进一步提高氢化非晶硅薄膜晶体管 (a-Si:H TFT) 的场效应电子迁移率, 研究了批量生产条件下对欧姆接触层和栅极绝缘层进行多层 制备, 不同的工艺参数对a-Si:H TFT场效应电子迁移率的影响. 研究表明随着对欧姆接触层 (n⁺层) 分层数的增加, 以及低速生长的栅极绝缘层 (GL层) 和高速生长的栅极绝缘层 (GH 层) 厚度比值提高, a-Si:H TFT的场效应迁移率得到提升. 当n⁺层分层数达到 3层, GL层和GH层厚度比值为4:11 时, 器件的场效应电子迁移率达到0.66 cm²/V·s, 比传统工艺提高了约一倍, 显著改善了a-Si:H TFT 的电学特性, 并在量产线上得到了验证. 关键词： 非晶硅薄膜晶体管 电子迁移率 欧姆接触层 栅极绝缘层     

三组元声子晶体中的缺陷态

运用基于平面波的超元胞方法，研究作为缺陷引入的第三组元材料(四氯化碳、水)对二维二组元声子晶体(水/水银，四氯化碳/水银)带结构的影响.结果表明，二组元声子晶体在引入第三组元点缺陷/线缺陷后，在原来的带结构中会出现缺陷态/带，原带隙的位置、宽度变化不大；缺陷态/带频率主要受第三组元材料物性参数的影响；这些缺陷态都是局域化的.因此，在具有宽带隙的二组元体系中引入适当的第三组元点缺陷/线缺陷，让缺陷态/带频率落在二组元体系的带隙中，就可以形成特殊的滤声态/波导态.声子晶体的这一特性对于声波/弹性波的传播和新的声学应用具有重要意义. 关键词： 声子晶体 三组元 点缺陷 线缺陷     

Infrared absorption by sulfur-doped silicon formed by femtosecond laser irradiation

We microstructured silicon surfaces with femtosecond laser irradiation in the presence of SF₆. These surfaces display strong absorption of infrared radiation at energies below the band gap of crystalline silicon. We report the dependence of this below-band gap absorption on microstructuring conditions (laser fluence, number of laser pulses, and background pressure of SF₆) along with structural and chemical characterization of the material. Significant amounts of sulfur are incorporated into the silicon over a wide range of microstructuring conditions; the sulfur is embedded in a disordered nanocrystalline layer less than 1 m thick that covers the microstructures. The most likely mechanism for the below-band gap absorption is the formation of a band of sulfur impurity states overlapping the silicon band edge, reducing the band gap from 1.1 eV to approximately 0.4 eV. PACS 78.68.+m; 81.15.Fg; 81.40.Tv; 81.65.Cf; 85.60.Gz     

Lamb waves in two-dimensional phononic crystal plate with anisotropic inclusions

An analysis is given to the band structure of the two-dimensional phononic crystal plate constituted of a square array of elastic anisotropic, circular Pb cylinders embedded in elastic isotropic epoxy. The numerical results show that the band gap can be tuned by rotating the anisotropic material orientation. It is found that the influence of anisotropy on band gap of Lamb wave is clearly different from that on the band gap of bulk waves. The thickness of the system under study is a sensitive parameter to affect the influence of anisotropic materials on the normalized gap width.     

LCR分流电路下压电声子晶体智能材料的带隙

将带有LCR分流电路的压电陶瓷片对贴在铝和环氧树脂组成的声子晶体结构中.使智能材料的机械振动与压电陶瓷的压电效应耦合起来,推导出机械振动在压电陶瓷片上的等效附加应力;使LCR分流电路中的电磁振荡效应和声子晶体的能带特性有机结合,计算了在分流电路作用下智能材料扭转和弯曲振动的带隙特性,研究了电阻、电感、电容元件的改变对压电声子晶体智能材料带隙的影响.研究结果表明:在合理尺寸下,随着分流电路中电阻值的增大,带隙的频率范围变宽,但衰减幅值有所降低;电感和电容值的增大都可以使带隙向低频移动,带隙的衰减幅值随着电感值的增大而升高,但随着电容值的增大而降低.从而给压电声子晶体智能材料减震降噪的控制提供了一种新思路.     

A theoretical investigation of the band alignment of type-I direct band gap dilute nitride phosphide alloy of GaN_xAs_yP_(1-x-y)/GaP quantum wells on GaP substrates

The GaP-based dilute nitride direct band gap material Ga（NAsP） is gaining importance due to the monolithic integra- tion of laser diodes on Si microprocessors. The major advantage of this newly proposed laser material system is the small lattice mismatch between GaP and Si. However, the large threshold current density of these promising laser diodes on Si substrates shows that the carrier leakage plays an important role in Ga（NAsP）/GaP QW lasers. Therefore, it is necessary to investigate the band alignment in this laser material system. In this paper, we present a theoretical investigation to optimize the band alignment of type-I direct band gap GaNxAsyP1-x-y/GaP QWs on GaP substrates. We examine the effect of nitrogen （N） concentration on the band offset ratios and band offset energies. We also provide a comparison of the band alignment of type-I direct band gap GaNxAsyP1-x-y/GaP QWs with that of the GaNxAsyP1-x-y/Al2Ga1-2P QWs on GaP substrates. Our theoretical calculations indicate that the incorporations of N into the well and AI into the barrier improve the band alignment compared to that of the GaAsP/GaP QW laser heterostructures.     

Effect of point defects on electronic and magnetic properties of single-layer SiO

Based on spin-polarised density functional theory calculations, we investigated the effect of point defects on electronic and magnetic properties of the single-layer (SL) asymmetric washboard silicon oxide (aw-SiO). The SL-aw-SiO is a counterpart of black phosphorene, and a new candidate of two-dimensional material family. This structure is dynamically and thermally stable and is a nonmagnetic semiconductor with a direct band gap. We found that single vacancy and divacancy give rise to significant change in the electronic and magnetic properties of SL-aw-SiO. The band gap of aw-SiO can be tuned by the substitution of Si atom instead of O atom, the antisite defect, the O atom vacancy and two atom vacancies. In addition, impurity states due to the defects can occur in the band continua and hence the band gap of aw-SiO is reduced. Having an integer magnetic moment, SL-aw-SiO upon Si vacancy and by substitution of O atom instead of Si atom may display half-metallic features.     

立方KCaF3电子、弹性和光学性质的第一性原理研究

基于密度泛函理论和赝势平面波近似法计算研究了立方钙钛矿KCaF3的弹性、电子和光学性质。基态时,KCaF3平衡晶格常数、体积弹性模量和其他计实验和算值一致。根据Hooke定律和Christoffel方程,研究了KCaF3弹性常数Cij、体积弹性模量B、各向同性波速和弹性各向性异性因子随压力的变化关系。从电子能带理论出发,计算得到了KCaF3电子能带、态密度和Milliken电荷布居数,并对其电子性质进行了详细分析。结果显示：立方钙钛矿KCaF3为直接带隙绝缘体材料,其禁带宽度为6.22eV;电荷主要从Ca和K原子向F原子转移;立方钙钛矿KCaF3属于纯粹的共价型化合物。同时,本文还计算研究了KCaF3的光学介电函数、吸收系数、复折射率、能量损失谱和反射系数等光学性质。     

立方KCaF_3电子、弹性和光学性质的第一性原理研究

基于密度泛函理论和赝势平面波近似法计算研究了立方钙钛矿KCaF_3的弹性、电子和光学性质.基态时,KCaF_3平衡晶格常数、体积弹性模量和实验及其他计算值一致.根据Hooke定律和Christoffel方程,研究了KCaF_3弹性常数Cij、体积弹性模量B、各向同性波速和弹性各向性异性因子随压力的变化关系.从电子能带理论出发,计算得到了KCaF_3电子能带、态密度和Milliken电荷布居数,并对其电子性质进行了详细分析.结果显示:立方钙钛矿KCaF_3为直接带隙绝缘体材料,其禁带宽度为6.22 e V;电荷主要从Ca和K原子向F原子转移;立方钙钛矿KCaF_3属于纯粹的共价型化合物.同时,本文还计算研究了KCaF_3的光学介电函数、吸收系数、复折射率、能量损失谱和反射系数等光学性质.     

非晶硅锗电池性能的调控研究

采用射频等离子体增强化学气相沉积技术, 研究了非晶硅锗薄膜太阳电池. 针对非晶硅锗薄膜材料的本身特性, 通过调控硅锗合金中硅锗的比例, 实现了对硅锗薄膜太阳电池中开路电压和短路电流密度的分别控制. 借助于本征层硅锗材料帯隙梯度的设计, 获得了可有效用于多结叠层电池中的非晶硅锗电池. 关键词： 非晶硅锗薄膜太阳电池 短路电流密度 开路电压 带隙梯度     

非晶硅太阳电池宽光谱陷光结构的优化设计

陷光是改善薄膜太阳电池光吸收进而提高其效率的关键技术之一. 以非晶硅（α-Si）薄膜太阳电池为例,设计了一种新的复合陷光结构：在Ag背电极与硅薄膜之间制备一维Ag纳米光栅,并通过保形生长在电池前表面沉积织构的减反膜. 采用有限元数值模拟方法,研究了该复合陷光结构对电池光吸收的影响,并对Ag纳米光栅的结构参数进行了优化. 模拟结果表明：该复合陷光结构可在宽光谱范围内较大地提高太阳电池的光吸收;当Ag纳米光栅的周期P为600 nm,高度H为90 nm,宽度W为180 nm时,在AM1.5光谱垂直入射条件下α-Si薄膜电池在300–800 nm波长范围内总的光吸收较无陷光结构的参考电池提高达103%,其中在650–750 nm长波范围内的光子吸收率提高达300%以上. 结合电场强度分布,对电池在各个波段光吸收提高的物理机制进行了分析. 另外,该复合陷光结构的引入,还较大地改善了非晶硅电池对太阳光入射角度的敏感性. 关键词： 非晶硅太阳电池 陷光 银纳米光栅 数值模拟     

P掺杂硅纳米管电子结构与光学性质的研究

采用基于密度泛函理论的第一性原理计算,研究了P掺杂对单壁扶手型硅纳米管电子结构和光学性质的影响.结果表明:经过P掺杂,单壁扶手型硅纳米管的能带结构从间接带隙变为直接带隙,其价带顶主要由Si-3p态电子构成,导带底主要由Si-3p态电子和Si-3s态电子共同决定;同时通过P掺杂,使单壁扶手型硅纳米管的禁带宽度变窄,导电性增强,吸收光谱产生红移.研究结果为硅纳米管在光电器件方面的应用提供了理论基础.     

Luminescence investigations of the GaP-based dilute nitride Ga(NAsP) material system

Multi-quantum well heterostructures (MQWHs) of the novel Ga(NAsP)/GaP material system have been grown, pseudomorphically strained to GaP-substrate. The crystalline perfection is verified by transmission electron microscopy (TEM). For As-concentrations in excess of about 70%, a direct band structure and adequate luminescence efficiency for laser device application is observed. Temperature-dependent photoluminescence (PL) investigations show the influence of carrier localisation and non-radiative recombination processes typical for dilute nitride materials. With rising N content in the active material, the emission wavelength shifts towards longer wavelength, leading to Ga(NAs)/GaP MQW structures with photon energies below the indirect band gap of silicon (Si). At the same time the luminescence intensity drops due to an increase in non-radiative carrier traps and/or structural degradation.     

Physical Properties of C-Si Alloys in C2/m Structure

Using the first principles calculations based on density functional theory, the crystal structure, elastic anisotropy, and electronic properties of carbon, silicon and their alloys(C_(12)Si_4, C_8Si_8, and C_4Si_(12)) in a monoclinic structure(C2/m) are investigated. The calculated results such as lattice parameters, elastic constants, bulk modulus,and shear modulus of C_(16) and Si_(16) in C2/m structure are in good accord with previous work. The elastic constants show that C_(16), Si_(16), and their alloys in C2/m structure are mechanically stable. The calculated results of universal anisotropy index, compression and shear anisotropy percent factors indicate that C-Si alloys present elastic anisotropy,and C_8Si_8 shows a greater anisotropy. The Poisson's ratio and the B/G value show that C_8Si_8 is ductile material and other four C-Si alloys are brittle materials. In addition, Debye temperature and average sound velocity are predicted utilizing elastic modulus and density of C-Si alloys. The band structure and the partial density of states imply that C_(16) and Si_(16) are indirect band gap semiconductors, while C_(12)Si_4, C_8Si_8, and C_4Si_(12) are semi-metallic alloys.     

A new superhard carbon allotrope: Orthorhombic C20

A new superhard carbon orthorhombic allotrope oC20 is proposed, which exhibits distinct topologies including C4, C3 and two types of C6 carbon rings. The calculated elastic constants and phonon spectra reveal that oC20 is mechanically and dynamically stable at ambient pressure. The calculated electronic band structure of oC20 shows that it is an indirect band gap semiconductor with a band gap of 4.46 eV. The Vickers hardness of oC20 is 75 GPa. The calculated tensile and shear strength indicate that the weakest tensile strength is 64 GPa and the weakest shear strength is 48 GPa, which means oC20 is a potential superhard material.     

Band-gap modulation of graphane-like SiC nanoribbons under uniaxial elastic strain

The band-gap modulation of zigzag and armchair graphane-like SiC nanoribbons (GSiCNs) under uniaxial elastic strain is investigated using the density functional theory. The results show that band gap of both structures all decreases when being compressed or tensed. In compression, both zigzag and armchair GSiCNs are semiconductors with a direct band gap. However, in tension, the armchair GSiCNs undergo a direct-to-indirect band-gap transition but the zigzag GSiCNs still have a direct band gap. These results are also proved by HSE06 method. This implies a potential application of the graphane-like SiC nanoribbons in the future pressure sensor and optical electronics nanodevices.     

硅基超晶格Si1-xSnx/Si的能带结构

由于Si基发光材料能与现有的Si微电子工艺兼容,其应用前景被广泛看好. 设计具有直接带隙的Si基材料,备受实验和理论研究者的关注. 本文根据芯态效应、电负性差效应和对称性效应设计了Si基超晶格Si_1－xSn_x/Si. 其中Si_0.875Sn_0.125/Si为直接带隙材料. 在密度泛函框架内,采用平面波赝势法计算表明,Si_0.875Sn_{0.125相似文献}   

Mechanical stability and optoelectronic behavior of BeXP2 (X=Si and Ge) chalcopyrite

We have conducted a first-principles study on the structural, electronic, optical and elastic properties of BeSiP₂ and BeGeP₂ chalcopyrite compounds. Using the density functional theory (DFT), implemented in both full potential linear muffin-tin orbital (FP-LMTO) and Vienna Ab initio simulation (VASP) packages. The FP-LMTO is used for the determination of the structural, electronic and optical properties, while the VASP is used to determine the elastic constants that give indications about the material stability. The obtained equilibrium structural parameters are in good agreement with available results. An investigation of the band gap indicates that our compounds possess a semiconductor behavior with direct band gap for BeSiP₂ and with an indirect band gap for BeGeP₂. The energy band gaps decreased by changing Be atoms from Si to Ge. We have calculated the dielectric function ε(ω). The obtained results show that these materials are promising semiconductors for photovoltaic applications. For the elastic properties, the single-crystal elastic constants C_ij, shear anisotropic factors A, as well as polycrystalline bulk, shear and Young's modulus (B, G and E) and Poisson's ratio v have been predicted. The generalized elastic stability criteria for a tetragonal crystal are well satisfied, indicating that BeSiP₂ and BeGeP₂ are mechanically stable in the chalcopyrite structure.     

Band gap engineering in silicene: A theoretical study of density functional tight-binding theory

In this work, we performed first principles calculations based on self-consistent charge density functional tight-binding to investigate different mechanisms of band gap tuning of silicene. We optimized structures of silicene sheet, functionalized silicene with H, CH₃ and F groups and nanoribbons with the edge of zigzag and armchair. Then we calculated electronic properties of silicene, functionalized silicene under uniaxial elastic strain, silicene nanoribbons and silicene under external electrical fields. It is found that the bond length and buckling value for relaxed silicene is agreeable with experimental and other theoretical values. Our results show that the band gap opens by functionalization of silicene. Also, we found that the direct band gap at K point for silicene changed to the direct band gap at the gamma point. Also, the functionalized silicene band gap decrease with increasing of the strain. For all sizes of the zigzag silicene nanoribbons, the band gap is near zero, while an oscillating decay occurs for the band gap of the armchair nanoribbons with increasing the nanoribbons width. At finally, it can be seen that the external electric field can open the band gap of silicene. We found that by increasing the electric field magnitude the band gap increases.     

硅量子点的形状及其弯曲表面效应

硅量子点的弯曲表面引起系统的对称性破缺, 致使某些表面键合在能带的带隙中形成局域电子态.计算结果表明:硅量子点的表面曲率不同形成的表面键合结合能和电子态分布明显不同. 例如, Si–O–Si桥键在曲率较大的表面键合能够在带隙中形成局域能级, 而在硅量子点曲率较小的近平台表面上键合不会形成任何局域态, 但此时的键合结合能较低. 用弯曲表面效应(CS)可以解释较小硅量子点的光致荧光光谱的红移现象. CS效应揭示了纳米物理中又一奇妙的特性. 实验证实, CS效应在带隙中形成的局域能级可以激活硅量子点发光. 关键词： 硅量子点 弯曲表面效应 表面键合 局域能级