堆叠栅介质对称双栅单Halo应变Si金属氧化物半导体场效应管二维模型

提出了一种堆叠栅介质对称双栅单Halo应变Si金属氧化物半导体场效应管(metal-oxide semiconductor field effect transistor,MOSFET)新器件结构.采用分区的抛物线电势近似法和通用边界条件求解二维泊松方程,建立了全耗尽条件下的表面势和阈值电压的解析模型.该结构的应变硅沟道有两个掺杂区域,和常规双栅器件(均匀掺杂沟道)比较,沟道表面势呈阶梯电势分布,能进一步提高载流子迁移率;探讨了漏源电压对短沟道效应的影响;分析得到阈值电压随缓冲层Ge组分的提高而降低,随堆叠栅介质高k层介电常数的增大而增大,随源端应变硅沟道掺杂浓度的升高而增大,并解释了其物理机理.分析结果表明:该新结构器件能够更好地减小阈值电压漂移,抑制短沟道效应,为纳米领域MOSFET器件设计提供了指导.     

A Closed-Form Model for Position-Dependent Potential across the Channel in DG-MOSFETs

A closed-form model for electrostatic potential distribution in the direction normal to the channel for double-gate （DG） MOSFETs is presented. The effects of doping （NA for nMOS） and minority carriers both are taken into account for the first time, in solving Poisson＇s equation analytically. Excellent agreement between model-predicted results and numerical device simulation is achieved for a wide range of body thickness, light or high channeldoping, under various bias conditions. This complete closed form for position-dependent potential distribution has wide applications for MOS compact modelling and device design.     

Analytical modeling of subthreshold current and subthreshold swing of short-channel triple-material double-gate (TM-DG) MOSFETs

An analytical model for subthreshold current and subthreshold swing of short-channel triple-material double-gate (TM-DG) MOSFETs is presented in this paper. Both the drift and diffusion components of current densities are considered for the modeling of subthreshold current. Virtual cathode concept of DG MOSFETs is utilized to model the subthreshold swing of TM-DG MOSFETs. The effect of different length ratios of the three channel regions under three different gate materials of device on the subthreshold current and subthreshold swing of the short-channel TM-DG MOSFETs have been discussed. The dependencies of subthreshold current and subthreshold swing on various device parameters have been studied. The simulation data obtained by using the commercially available 2D device simulation software ATLAS™ has been used to validate the present model.     

PEG掺杂对钙钛矿太阳能电池的影响

为了提高钙钛矿太阳能电池的能量转化效率,减小回滞现象,研究了聚乙二醇(PEG)掺杂钙钛矿太阳能电池阳极修饰层PEDOT∶PSS对器件性能的影响。通过电容-电压(C-V)测试分析了PEDOT∶PSS修饰层和钙钛矿层之间的界面电荷积累情况,通过电流密度-时间(J-T)瞬态光电流的测量研究了修饰层和钙钛矿层之间缺陷态情况。结果表明,PEG掺杂阳极修饰层提高了器件的短路电流(J_(sc))、开路电压(V_(oc))和填充因子(FF),光电转化效率从7.5%提高到10.0%,光电转化效率提高了33%,经过掺杂后的器件回滞现象明显减弱。这种通过PEG掺杂PEDOT∶PSS的方法能够减少器件界面处的电荷积累和缺陷态,从而减小器件的回滞现象,提高器件的能量转化效率。     

An improved design approach for thin film solar cells

In this paper an improved design for thin film solar cells is proposed to enhance conversion efficiency. This proposed structure includes two pairs of additional contact to the reversed bias of absorber and buffer layers, directly. The purpose of additional electrodes is to control the carrier distribution in the active region of device. This idea has been implemented on the fabricated Copper indium gallium selenide solar cell with the record efficiency of 22%. The simulations show an improvement of 2% in the conversion efficiency is obtained by direct application of reverse biasing on the absorber and buffer layer. The increase of short circuit current more than 3 mA/cm² is responsible for the improved performance. The open circuit voltage and fill factor of cell can also be increased by the controlling reverse bias.     

Heterojunction between crystalline silicon and nanocomposite coupled ZnO·SnO2 and optimization of its photovoltaic performance

In this work coupled ZnO·SnO₂ nanocomposite has been used as heterojunction partner to Si for photovoltaic application and its performance is optimized. The interface defect more than 10¹² cm⁻² reduces the short circuit current density, fill factor and efficiency of the device. In addition, the best device performance is observed at the vicinity of 280K. The junction of the device has a dark saturation current density and ideality factor of the order of 10⁻⁴ Acm⁻² and 21 respectively. In addition, four different organic materials are used as back surface field layer (BSL) to the same device and performance is improved. The best conversion efficiency and open circuit voltage as high as 4.1% and 0.591 V respectively are obtained for the device with CuSCN as BSL. Consequently, a range of combined values of the energy band gap and electron affinity of the BSL materials are examined for optimal device performance.     

列车防滑器主机故障诊断系统设计

SAB型列车防滑制动系统应用于国内T型列车,数量多,为了提高列车防滑器主机故障检测和维修效率,针对SAB WABCO公司的SWKAS20C型列车防滑器主机,设计了元件级故障检测与定位专家系统。通过研究模拟电子电路故障诊断技术,设计了基于支持向量机的多故障分类器,用于主机模拟电路故障样本数据的训练和测试,并通过改进算法寻优向量机参数,提高了故障诊断的准确度。搭建了模拟列车运行环境的测试平台,用以模拟主机在多种状态下的故障模式;使用VS2010开发环境编写了MFC专家系统。     

DC and analog/RF performance of C-shaped pocket TFET (CSP-TFET) with fully overlapping gate

A C-shaped pocket tunnel field effect transistor (CSP-TFET) has been designed and optimized based on the traditional double-gate TFETs by introducing a C-shaped pocket region between the source and channel to improve the device performance. A gate-to-pocket overlapping structure is also examined in the proposed CSP-TFET to enhance the gate controllability. The effects of the pocket length, pocket doping concentration and gate-to-pocket overlapping structure on the DC and analog/RF characteristics of the CSP-TFET are estimated after calibrating the tunneling model in double-gate TFETs. The DC and analog/RF performance such as on-state current (I_on), on/off current ratio (I_on/I_off), subthreshold swing (SS) transconductance (g_m), cut-off frequency (f_T) and gain-bandwidth product (GBP) are investigated. The optimized CSPTFET device exhibits excellent performance with high I_on (9.98×10 ^{- 4} A/μm), high I_on/I_off (～ 10¹¹), as well as low SS (～ 12 mV/dec). The results reveal that the CSP-TFET device could be a potential alternative for the next generation of semiconductor devices.     

Demonstration of a 4H SiC Betavoltaic Nuclear Battery Based on Schottky Barrier Diode

A 4H SiC betavoltaic nuclear battery is demonstrated. A Schottky barrier diode is utilized for carrier separation. Under illumination of Ni-63 source with an apparent activity of 4mCi/cm^2, an open circuit voltage of 0.49 V and a short circuit current density of 29.44nA/cm^2 are measured. A power conversion efficiency of 1.2% is obtained. The performance of the device is limited by low shunt resistance, backscattering and attenuation of electron energy in air and Schottky electrode. It is expected to be significantly improved by optimizing the design and processing technology of the device.     

Two-dimensional models of threshold voltage and subthreshold current for symmetrical double-material double-gate strained Si MOSFETs

The two-dimensional models for symmetrical double-material double-gate(DM-DG) strained Si(s-Si) metal–oxide semiconductor field effect transistors(MOSFETs) are presented. The surface potential and the surface electric field expressions have been obtained by solving Poisson's equation. The models of threshold voltage and subthreshold current are obtained based on the surface potential expression. The surface potential and the surface electric field are compared with those of single-material double-gate(SM-DG) MOSFETs. The effects of different device parameters on the threshold voltage and the subthreshold current are demonstrated. The analytical models give deep insight into the device parameters design. The analytical results obtained from the proposed models show good matching with the simulation results using DESSIS.     

阳极界面修饰对钙钛矿太阳能电池性能的影响

采用在聚(3,4-乙撑二氧噻吩)∶聚苯乙烯磺酸(Poly(3,4-ethylenedioxythiophene)∶Poly(styrenesulfonate),PEDOT∶PSS)阳极界面层上直接旋涂二甲基亚砜(Dimethyl Sulfoxide,DMSO)的方法,对PEDOT∶PSS薄膜进行修饰,以提高所制得的钙钛矿太阳能电池器件性能.在5000rpm转速条件下旋涂DMSO后,器件的能量转换效率达到11.43%,与PEDOT∶PSS阳极界面层未做任何修饰的器件相比,效率提高了29.15%.测试表征了修饰前后PEDOT∶PSS薄膜的透光性、表面形貌、电导率、器件的外量子效率曲线以及器件在光照和暗态下的J-V特性曲线,分析了器件性能提高的原因.结果表明:经过修饰的PEDOT∶PSS薄膜导电性显著增强,从而更加有利于器件阳极对空穴的抽取和收集;较未修饰时,器件的短路电流密度得到了大幅度提升,进而使得器件获得更高的能量转换效率.     

MOSFET scaling into the 10 nm regime

Scaling limits of the double-gate MOSFET structure are explored. Because short-channel effects can be adequately controlled by thinning the silicon body, the eventual scaling limit will be determined by the ability to control off-state leakage due to quantum mechanical tunneling and thermionic emission between the source and drain. Depending on threshold voltage and the source/drain doping profile, this will restrict gate length scaling to 5–11 nm. As power supplies are scaled down, maintaining on-state drive current may become difficult due to threshold voltage limitations. Series resistance becomes important as the body thickness is reduced, but intrinsic device performance may still be improved.     

背照射和正照射p-i-n结构GaN紫外探测器的i-GaN和p-GaN厚度设计

研究了i-GaN和p-GaN厚度对背照射和正照射p-i-n结构GaN紫外探测器响应光谱的影响。模拟计算发现:对于背照射结构, 适当地减小i-GaN厚度有利于提高探测器的响应, 降低i-GaN层的本底载流子浓度也有利于提高探测器的响应;p-GaN的欧姆接触特性好坏对探测器的响应影响不大, 适当地增加p-GaN厚度可以改善探测器性能。而正照射结构则不同, i-GaN厚度对探测器的响应度影响不大, 但欧姆接触特性差将严重降低探测器的响应, 适当地减小p-GaN厚度可以大幅度改善探测器的响应特性。能带结构和入射光吸收的差别导致了正照射和背照射探测器结构中i层和p层厚度的选择和设计不同。     

Two-dimensional analytical models for asymmetric fully depleted double-gate strained silicon MOSFETs

This paper develops the simple and accurate two-dimensional analytical models for new asymmetric double-gate fully depleted strained-Si MOSFET. The models mainly include the analytical equations of the surface potential, surface electric field and threshold voltage, which are derived by solving two dimensional Poisson equation in strained-Si layer. The models are verified by numerical simulation. Besides offering the physical insight into device physics in the model, the new structure also provides the basic designing guidance for further immunity of short channel effect and drain-induced barrier-lowering of CMOS-based devices in nanometre scale.     

Small and large signal analysis using circuit model of InGaAs/InP based uni-travel carrier photodiode

An equivalent circuit model of uni-traveling carrier photodiode (UTC-PD) is developed from integral carrier density rate equation and few important properties of the device such as the electrical and optical characteristics are evaluated by employing advanced device physics. Circuit model incorporates chip and package parasitic of the device quite simply to provide practical behaviour of UTC-PD. We have developed small signal ac circuit model which is useful for the analysis of low power modulation characteristics of the device and dc circuit model which is advantageous to find wavelength dependent responsivity fairly accurately. At high optical input power the device bandwidth is found to be increased through enhancement of self-induced field in the absorption region and high output power can be derived from the device when absorption width is large. Such condition calls for large signal analysis. We have developed large signal circuit model by combining few mathematical transformations with small signal circuit model with different circuit element values. Our large signal model is unique that the same circuit can be used for both small and large signal analysis. With large signal model the optical power induced bandwidth improvement and output photocurrent saturation are explained. Large signal model is validated through linearity and IP3 analysis which found close agreement with the measured results.     

A novel equivalent circuit model for waveguide-separated absorption charge multiplication-avalanche photodetector (WG-SACM-APD)

Waveguide photodetectors are promising high-speed photodetectors compared to conventional photodetectors because of solving the problem of bandwidth efficiency tradeoff. The equivalent circuit model of detectors can be utilized to confirm the device performance prior to fabrication. In this paper a novel equivalent circuit model for waveguide-separated absorption charge multiplication avalanche photodetector (WG-SACM-APD) is presented. Using basic circuit components and considering the theory of linear time invariant system frequency domain modeling of this detector including parasitic sources are achieved. Finally the transfer function and detector's bandwidth with respect to the multiplication gain are also investigated and there are good agreements with experimental results.     

单轴应变SiNMOSFET源漏电流特性模型

本文在建立单轴应变Si NMOSFET迁移率模型和阈值电压模型的基础上, 基于器件不同的工作区域, 从基本的漂移扩散方程出发, 分别建立了单轴应变Si NMOSFET源漏电流模型. 其中将应力的影响显式地体现在迁移率和阈值电压模型中, 使得所建立的模型能直观地反映出源漏电流特性与应力强度的关系. 并且对于亚阈区电流模型, 基于亚阈区反型电荷, 而不是采用常用的有效沟道厚度近似的概念, 从而提高了模型的精度. 同时将所建模型的仿真结果与实验结果进行了比较, 验证了模型的可行性. 该模型已经被嵌入进电路仿真器中, 实现了对单轴应变Si MOSFET 器件和电路的模拟仿真.     

Improved double-gate armchair silicene nanoribbon field-effect-transistor at large transport bandgap

The electrical characteristics of a double-gate armchair silicene nanoribbon field-effect-transistor(DG ASi NR FET)are thoroughly investigated by using a ballistic quantum transport model based on non-equilibrium Green's function(NEGF) approach self-consistently coupled with a three-dimensional(3D) Poisson equation. We evaluate the influence of variation in uniaxial tensile strain, ribbon temperature and oxide thickness on the on-off current ratio, subthreshold swing, transconductance and the delay time of a 12-nm-length ultranarrow ASi NR FET. A novel two-parameter strain magnitude and temperature-dependent model is presented for designing an optimized device possessing balanced amelioration of all the electrical parameters. We demonstrate that employing Hf O2 as the gate insulator can be a favorable choice and simultaneous use of it with proper combination of temperature and strain magnitude can achieve better device performance.Furthermore, a general model power(GMP) is derived which explicitly provides the electron effective mass as a function of the bandgap of a hydrogen passivated ASi NR under strain.     

Intensification of heat exchange in a device for gas-dynamic energy separation

The operating efficiency of a gas-dynamic energy-separation device is analyzed, and it is shown that it can be improved if we deposit a regular relief on the wall separating the supersonic and subsonic channels. To decrease the total pressure losses on the side of the supersonic channel, shallow spherical dimples (stampings) are deposited, creating spherical ledges in the subsonic channel because of the small thickness of the wall. The calculation technique is modernized, and modeling is carried out, which shows that by introducing intensified heat exchange, it is possible to improve the efficiency of this device by 1.2–1.4 times in air and in natural gas with a simultaneous decrease in the device size by 20–25%.     

对称三材料双栅应变硅金属氧化物半导体场效应晶体管二维解析模型

提出了对称三材料双栅应变硅金属氧化物半导体场效应晶体管器件结构,为该器件结构建立了全耗尽条件下的表面势模型、表面场强和阈值电压解析模型,并分析了应变对表面势、表面场强和阈值电压的影响,讨论了三栅长度比率对阈值电压和漏致势垒降低效应的影响,对该结构器件与单材料双栅结构器件的性能进行了对比研究.结果表明,该结构能进一步提高载流子的输运速率,更好地抑制漏致势垒降低效应.适当优化三材料栅的栅长比率,可以增强器件对短沟道效应和漏致势垒降低效应的抑制能力.